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1. 发明申请

WO2014191320A1 INFRARED REFLECTIVE FILM, AND LAMINATED GLASS EMPLOYING SAME 审中-公开
标题翻译：红外反射膜和采用同样的层压玻璃
公开(公告)号：WO2014191320A1
公开(公告)日：2014-12-04
申请号：PCT/EP2014/060698
申请日：2014-05-23
申请人： NIPPON KAYAKU CO., LTD. , CENTRAL GLASS CO.LTD. , BASF SE
发明人： TANAKA, Kouichi , FUJISAWA, Hideyoshi , IZUTANI, Kensuke , NISHIYAMA, Satoshi , TAKAMATSU, Atsushi , MATSUMOTO, Akira , FURUKAWA, Masayoshi
IPC分类号： B32B7/06 , B32B17/10 , C08J7/04 , G02B5/30
CPC分类号： G02B5/208 , B32B7/06 , B32B17/10036 , B32B17/10458 , B32B17/10633 , B32B17/10761 , B32B17/10788 , G02B5/0816 , G02B5/26 , G02B5/282 , G02B5/3016 , B32B17/10 , B32B2367/00
摘要： The present invention has the objective of providing an infrared reflective film by means of which it is possible to achieve an effective heat-shielding performance with a smaller number of layers than hitherto using a construction employing specified infrared reflective layers. Solution Means The infrared reflective film of the present invention has at least two infrared reflective layers and, of these infrared reflective layers, the center reflective wavelength of at least one infrared reflective layer is between 1200 and 1300 nm. Furthermore, the laminated glass of the present invention is formed by interposing this infrared reflective film between two sheets of intermediate film, and laminating these between two sheets of glass.
摘要翻译：本发明的目的是提供一种红外线反射膜，通过该红外线反射膜，可以实现比迄今为止使用具有特定的红外线反射层的结构更少数量的层的有效的热屏蔽性能。解决方案本发明的红外反射膜具有至少两个红外反射层，并且在这些红外反射层中，至少一个红外反射层的中心反射波长在1200和1300nm之间。此外，本发明的夹层玻璃通过将该红外线反射膜夹在两片中间膜之间并将其层压在两片玻璃之间而形成。

2. 发明申请

WO2005106585A1 PHOTOSENSITIVE ORIGINAL PRINTING PLATE FOR RELIEF PRINTING, METHOD FOR PRODUCING RELIEF PRINTING PLATE, AND LIGHT-SHIELDING INK FOR PERFORMING THE METHOD 审中-公开
标题翻译：用于缓解印刷的感光原版印刷板，用于生产可靠印刷板的方法和用于执行该方法的遮光油墨
公开(公告)号：WO2005106585A1
公开(公告)日：2005-11-10
申请号：PCT/JP2005/008329
申请日：2005-04-25
申请人： TOKYO OHKA KOGYO CO., LTD. , NIPPON KAYAKU CO., LTD. , TAKAGI, Toshiya , FUJIMOTO, Takashi , TABE, Tadahiko
发明人： TAKAGI, Toshiya , FUJIMOTO, Takashi , TABE, Tadahiko
IPC分类号： G03F1/00
CPC分类号： G03F7/2018
摘要： Provided are an original printing plate for relief printing that solves both the problems of the prior-art negative film or its alternatives, and problems of mask pattern formation directly on the surface of the photosensitive resin layer by an ink composition, as well as a method for forming an relief printing plate using the same. Employing a photosensitive original printing plate for relief printing including a support substrate (A); a photosensitive resin layer (B) provided thereon and having a photosensitivity to light in a predetermined wavelength region; and an ink holding layer (C) provided thereon; wherein the layer (C) is capable of retaining a light-shielding ink, and capable of constituting a light-shielding pattern inside the layer (C), the light-shielding pattern being formed by applying the light-shielding ink to the (C) in accordance with the pattern; and wherein the (C) at the area to which the light-shielding ink is not applied is substantially transparent to the light in the predetermined wavelength region.
摘要翻译：本发明提供一种用于浮雕印刷的原版印版，其解决了现有技术的负片或其替代品的问题，以及通过油墨组合物直接在感光性树脂层的表面上形成的掩模图案的问题，以及方法用于形成使用其的凸版印刷版。采用包括支撑基板（A）的凸版印刷用光敏原版印刷板; 其上设置有对预定波长区域的光敏感的感光性树脂层（B）和设置在其上的墨水保持层（C）其中，所述层（C）能够保持遮光油墨，并且能够在所述层（C）内部构成遮光图案，所述遮光图案是通过将遮光油墨施加到（C ）按照模式; 并且其中在未被施加遮光油墨的区域处的（C）对于预定波长区域中的光基本上是透明的。

3. 发明申请

WO1997045494A1 RECORDING FLUIDS CONTAINING COPPER-PHTHALOCYANINE COMPOUNDS 审中-公开
标题翻译：含有铜酞菁化合物的记录液
公开(公告)号：WO1997045494A1
公开(公告)日：1997-12-04
申请号：PCT/JP1997001859
申请日：1997-05-30
申请人： NIPPON KAYAKU CO., LTD. , OJIMA, Masayoshi , KAJIURA, Noriko
发明人： NIPPON KAYAKU CO., LTD.
IPC分类号： C09D11/00
CPC分类号： C09D11/32 , C07F1/005 , C09B47/26 , C09D11/17 , C09D11/328
摘要： Recording fluids containing copper-phthalocyanine compounds of general formula (I), wherein PC is a copper-phthalocyanine skeleton; B is C2-C4 alkylene or optionally carboxylated or sulfonated phenylene; R is lower alkyl or lower alkoxy lower alkyl; M is hydrogen or an alkali or alkaline earth metal; 1 is 1 to 3; m is 0 to 2; and n is 1 or 2; with the sum of 1, m and n being 2 to 4. The images formed by using the recording fluids have a high density and a clear tone and are excellent in storage stability, particularly in water resistance.
摘要翻译：记录含有通式（I）的铜酞菁化合物的液体，其中PC是铜 - 酞菁骨架; B是C 2 -C 4亚烷基或任选羧基或磺化亚苯基; R是低级烷基或低级烷氧基低级烷基; M是氢或碱金属或碱土金属; 1为1〜3; m为0〜2; n为1或2; 其总和为1，m和n为2至4.通过使用记录液形成的图像具有高密度和清晰的色调，并且储存稳定性，特别是耐水性优异。

4. 发明申请

WO1997034955A1 HEAT-STABLE CRYSTAL MODIFICATION OF DYE, PROCESS FOR THE PREPARATION OF THE SAME, AND PROCESSES FOR DYEING HYDROPHOBIC FIBERS WITH THE SAME 审中-公开
标题翻译：染色体的热稳定性晶体修饰，其制备方法以及用于染色具有相似性的疏水性纤维的方法
公开(公告)号：WO1997034955A1
公开(公告)日：1997-09-25
申请号：PCT/JP1997000921
申请日：1997-03-19
申请人： NIPPON KAYAKU CO., LTD. , MURAKAMI, Yasuo , AKATANI, Yoshiki
发明人： NIPPON KAYAKU CO., LTD.
IPC分类号： C09B67/48
CPC分类号： C09B67/0029 , C09B67/0015 , Y10S8/922
摘要： Novel beta -crystal of the compound of chemical formula (1) useful as a dye, which is characterized by excellent dispersion stability at high temperature and by the presence of a sharp peak at a specific position in the X-ray diffraction pattern. A process for the preparation of the above beta -crystal, which comprises heating alpha -crystal of the above compound, which has already been known and is heat unstable, in water or a mixture of water with a water-soluble organic solvent or an anionic or nonionic surfactant at 15 DEG C or above, preferably 40 DEG C or above. The invention also relates to dye compositions comprising the above beta -crystal and processes for dyeing with the beta -crystal or the dye compositions.
摘要翻译：用作染料的化学式（1）化合物的新型β-晶体，其特征在于在高温下具有优异的分散稳定性和在X射线衍射图谱中在特定位置存在尖峰。一种制备上述β-晶体的方法，其包括在水或水与水溶性有机溶剂或阴离子的水的混合物中加热上述化合物的α-结晶，其已经已知并且是热不稳定的或非离子表面活性剂在15℃以上，优选为40℃以上。本发明还涉及包含上述β-晶体的染料组合物和用β-结晶或染料组合物进行染色的方法。

5. 发明申请

WO2005079330A2 PERMANENT RESIST COMPOSITION, CURED PRODUCT THEREOF, AND USE THEREOF 审中-公开
标题翻译：永久耐蚀组合物，固化产品及其用途
公开(公告)号：WO2005079330A2
公开(公告)日：2005-09-01
申请号：PCT/US2005/004504
申请日：2005-02-10
申请人： MICROCHEM CORP. , NIPPON KAYAKU CO., LTD.
发明人： WEBER, William , MORI, Satoshi , HONDA, Nao , JOHNSON, Donald , DOCANTO, Manuel
IPC分类号： C08G59/32 , C08G59/68 , G03C1/492 , G03F7/00 , G03F7/038
CPC分类号： G03F7/0385 , B82Y10/00 , B82Y40/00 , C08G59/3218 , C08G59/687 , G03F7/0002 , G03F7/001 , G03F7/038 , H05K3/287
摘要： A permanent photoresist composition comprising: (A) one or more bisphenol A-novolac epoxy resins according to Formula I; wherein each group R in Formula I is individually selected from glycidyl or hydrogen and k in Formula I is a real number ranging from 0 to about 30; (B) one or more epoxy resins selected from the group represented by Formulas BIIa and BIIb; wherein each R 1 , R 2 and R 3 in Formula BIIa are independently selected from the group consisting of hydrogen or alkyl groups having 1 to 4 carbon atoms and the value of p in Formula BIIa is a real number ranging from 1 to 30; the values of n and m in Formula BIIb are independently real numbers ranging from 1 to 30 and each R4 and R5 in Formula BIIb are independently selected from hydrogen, alkyl groups having 1 to 4 carbon atoms, or trifluoromethyl; (C) one or more cationic photoinitiators (also known as photoacid generators or PAGs); and (D) one or more solvents.
摘要翻译：一种永久性光致抗蚀剂组合物，其包含：（A）根据式I的一种或多种双酚A-酚醛清漆环氧树脂; 其中式I中的每个基团R各自选自缩水甘油基或氢，式I中的k为0至约30的实数; （B）选自由式BIIa和BIIb表示的基团中的一种或多种环氧树脂; 其中式BIIa中的每个R 1，R 2和R 3独立地选自氢或具有1至4个碳原子的烷基，式BIIa中p的值为1至30的实数; 式BIIb中的n和m的值独立地为1至30的实数，并且式BIIb中的每个R 4和R 5独立地选自氢，具有1至4个碳原子的烷基或三氟甲基; （C）一种或多种阳离子光引发剂（也称为光酸产生剂或PAG）; 和（D）一种或多种溶剂。

6. 发明申请

WO1997046752A1 PROCESS FOR DYEING TEXTILES CONTAINING POLYESTER FIBERS AND DYEING AUXILIARIES 审中-公开
标题翻译：用于染色聚酯纤维和染色辅料的纺织品的工艺
公开(公告)号：WO1997046752A1
公开(公告)日：1997-12-11
申请号：PCT/JP1997001961
申请日：1997-06-09
申请人： NIPPON KAYAKU CO., LTD. , SHIRASAKI, Yasuo , OGAWA, Eiichi , AIZAWA, Yoshikazu , YABE, Shigemitsu
发明人： NIPPON KAYAKU CO., LTD.
IPC分类号： D06P01/62
CPC分类号： D06P1/628 , D06P3/54 , D06P3/8238 , Y10S8/922
摘要： A process for dyeing textiles containing polyester fibers in an aqueous medium in an alkaline region by exhaustion dyeing; dyeing auxiliaries for the process, containing compounds of general formula (I) (wherein R is H or CH3; n is 1 to 3; and X is H, an alkali metal or an organic base); and textiles containing polyester fibers dyed by the above process.
摘要翻译：通过耗尽染色在碱性区域的水性介质中染色含有聚酯纤维的纺织品的方法; 含有通式（I）的化合物（其中R为H或CH 3; n为1至3; X为H，碱金属或有机碱）的染色助剂; 和含有通过上述方法染色的聚酯纤维的纺织品。

7. 发明申请

WO1997028114A1 2,3-DISUBSTITUTED CYCLOPENTANONE DERIVATIVES, PROCESS FOR PRODUCING THE SAME, AND MEDICINAL USE THEREOF 审中-公开
标题翻译： 2,3-取代的环戊烷酮衍生物，其生产方法及其药物用途
公开(公告)号：WO1997028114A1
公开(公告)日：1997-08-07
申请号：PCT/JP1997000247
申请日：1997-01-31
申请人： NIPPON KAYAKU CO., LTD. , SAITO, Seiichi , MORINO, Tomio , MASUDA, Kuniko
发明人： NIPPON KAYAKU CO., LTD.
IPC分类号： C07C49/517
CPC分类号： C07D213/80 , C07C49/517 , C07C62/26 , C07C323/22 , C07C323/41 , C07C323/59 , C07C2601/08 , C07D239/38 , C07D317/22 , C07D317/72
摘要： Compounds represented by general formula (I) and pharmacologically acceptable salts thereof {excluding (1R,2S)-2-[(2R)-(2-acetylamino-2-carboxyethyl)thiomethyl]-3-oxo-1-cyclopentanecarboxylic acid (cystacycline)}, wherein X represents O, S, SO, SO2, or NH; Y represents a C1-6 (un)substituted hydrocarbon residue having a molecular weight of 15 to 400, provided that when it is cyclic, it may contain one or two heteroatoms; and Z represents carboxy, a group derived therefrom, or a C1-4 (un)substituted aliphatic hydrocarbon residue. The compounds are useful as a neuron differentiation accelerator.
摘要翻译：由通式（I）表示的化合物及其药理学上可接受的盐（不包括（1R，2S）-2 - [（2R） - （2-乙酰氨基-2-羧乙基）硫甲基] -3-氧代-1-环戊烷甲酸（cystacycline ）}，其中X表示O，S，SO，SO 2或NH; Y表示分子量为15〜400的C1-6（un）取代的烃残基，条件是当其为环状时，其可以含有一个或两个杂原子; 和Z代表羧基，衍生自其的基团或C1-4（未）取代的脂族烃残基。这些化合物可用作神经元分化促进剂。

8. 发明申请

WO2005067567A2 PHOTORESIST COMPOSITIONS AND PROCESSESS OF USE 审中-公开
标题翻译：光电组合物和使用过程
公开(公告)号：WO2005067567A2
公开(公告)日：2005-07-28
申请号：PCT/US2005/000156
申请日：2005-01-05
申请人： MICROCHEM CORP. , NIPPON KAYAKU CO., LTD
发明人： WEBER, William , MORI, Satoshi , HONDA, Nao
IPC分类号： G03C1/76 , G03F7/038 , G03F7/40
CPC分类号： G03F7/40 , G03F7/038
摘要： Photoresist compositions that demonstrate superior photolithographic performance and hardened resist films that show superior resistance to solvents, have excellent resistance to under plating during the electrodeposition of metals, and show excellent resist stripping characteristics. These photoresist compositions according to the invention are well-suited as for applications in the manufacture of MEMS and micromachine devices. These photoresist compositions according to the invention comprise one or more epoxide-substituted, polycarboxylic acid Resin Component (A), one or more photoacid generator compounds (B), and one or more solvent (C).
摘要翻译：显示优异的光刻性能的光刻胶组合物和显示出优异的耐溶剂性的硬化抗蚀剂膜，在金属电沉积期间具有优异的耐电镀性，并且显示出优异的抗剥离特性。根据本发明的这些光致抗蚀剂组合物非常适用于制造MEMS和微机械装置的应用。根据本发明的这些光致抗蚀剂组合物包含一种或多种环氧化物取代的多元羧酸树脂组分（A），一种或多种光酸产生剂化合物（B）和一种或多种溶剂（C）。

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