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1. 发明申请

WO2006134512A3 DEBRIS MITIGATION SYSTEM WITH IMPROVED GAS DISTRIBUTION 审中-公开
标题翻译：具有改进气体分配的减震系统
公开(公告)号：WO2006134512A3
公开(公告)日：2007-03-29
申请号：PCT/IB2006051795
申请日：2006-06-06
申请人： PHILIPS INTELLECTUAL PROPERTY , KONINKL PHILIPS ELECTRONICS NV , DERRA GUENTHER HANS , KRUECKEN THOMAS
发明人： DERRA GUENTHER HANS , KRUECKEN THOMAS
IPC分类号： G03F7/20
CPC分类号： G03F7/70916 , G03F7/70883 , G03F7/70908 , G03F7/70933
摘要： The present invention relates to a debris mitigation system, in particular for use in a radiation unit for EUV radiation and/or X-rays. The debris mitigation system comprises a foil trap (11) having several passages allowing a straight passage of radiation and one or several feed pipes (5) for gas supply of buffer gas (7) to said foil trap. The foil trap has at least one interior space (14) extending over several of said passages, wherein the feed pipes open into that space. The present debris mitigation system allows effective debris mitigation.
摘要翻译：本发明涉及一种碎片减轻系统，特别是用于用于EUV辐射和/或X射线的辐射单元。碎片缓解系统包括箔捕集器（11），其具有允许辐射的直线通过的多个通道和用于向所述箔捕获器供气缓冲气体（7）的一个或多个供给管道（5）。箔捕集器具有至少一个在几个所述通道上延伸的内部空间（14），其中进料管打开进入该空间。目前的碎片减缓系统可以有效减少碎片。

2. 发明申请

WO2006137014A1 METHOD OF CLEANING AND AFTER TREATMENT OF OPTICAL SURFACES IN AN IRRADIATION UNIT 审中-公开
标题翻译：辐射单位光源表面清洁处理方法
公开(公告)号：WO2006137014A1
公开(公告)日：2006-12-28
申请号：PCT/IB2006/051984
申请日：2006-06-20
申请人： PHILIPS INTELLECTUAL PROPERTY & STANDARDS GMBH , KONINKLIJKE PHILIPS ELECTRONICS N. V. , DERRA, Guenther Hans , KRUECKEN, Thomas , METZMACHER, Christof , WEBER, Achim , ZINK, Peter
发明人： DERRA, Guenther Hans , KRUECKEN, Thomas , METZMACHER, Christof , WEBER, Achim , ZINK, Peter
IPC分类号： B08B7/00 , G03F7/20
CPC分类号： G03F7/70925 , B08B7/00 , B08B7/0035
摘要： The present invention relates to a method of cleaning and after treatment of optical surfaces in an irradiation unit, said irradiation unit comprising a radiation source (1, 31) emitting EUV-radiation and/or soft X-rays, a first volume (40) following said radiation source (1, 31) and containing first optical components (3, 33) with said optical surfaces, and a second volume (41) following said first volume (40) and containing second optical components (38). The method comprises at least one cleaning step in which a first gas or gas mixture is brought into contact with said optical surfaces, thereby forming volatile compounds with contaminations deposited on said optical surfaces, wherein said compounds are pumped out of the first volume (40) together with the first gas or gas mixture. In an after treatment step following said cleaning step the radiation source (1, 31) is operated once or several times in order to release residues of the cleaning step from the optical surfaces by irradiating said optical surfaces with said EUV-radiation or soft X-rays while the first volume (40) is separated from the second volume (41), wherein said released residues are pumped out of the first volume (40). With this method an improved cleaning result is achieved.
摘要翻译：本发明涉及一种在照射单元中清洁和处理光学表面的方法，所述照射单元包括发射EUV辐射和/或软X射线的辐射源（1,31），第一体积（40）沿着所述辐射源（1,31）并且包含具有所述光学表面的第一光学部件（3,33）和跟随所述第一容积（40）并包含第二光学部件（38）的第二容积（41）。该方法包括至少一个清洁步骤，其中第一气体或气体混合物与所述光学表面接触，从而形成具有沉积在所述光学表面上的污染物的挥发性化合物，其中所述化合物被泵出第一体积（40）与第一种气体或气体混合物。在所述清洁步骤之后的后处理步骤中，辐射源（1,31）被操作一次或数次，以便通过用所述EUV辐射或软X-射线照射所述光学表面来从光学表面释放清洁步骤的残留物，而所述第一体积（40）与所述第二容积（41）分离，其中所述释放的残余物从所述第一体积（40）中泵出。利用该方法，可以实现改进的清洗结果。

3. 发明申请

WO2009031059A1 ROTATING WHEEL ELECTRODE DEVICE FOR GAS DISCHARGE SOURCES COMPRISING WHEEL COVER FOR HIGH POWER OPERATION 审中-公开
标题翻译：用于高功率运行的包含轮盖的气体放电源旋转电极装置
公开(公告)号：WO2009031059A1
公开(公告)日：2009-03-12
申请号：PCT/IB2008/053262
申请日：2008-08-14
申请人： PHILIPS INTELLECTUAL PROPERTY & STANDARDS GMBH , KONINKLIJKE PHILIPS ELECTRONICS N.V. , ZHOKHAVETS, Uladzimir , KRUECKEN, Thomas , DERRA, Guenther, H.
发明人： ZHOKHAVETS, Uladzimir , KRUECKEN, Thomas , DERRA, Guenther, H.
IPC分类号： H05G2/00 , H01J1/88
CPC分类号： H01J1/88 , H05G2/005
摘要： The present invention relates to an electrode device (1, 2) for gas discharge sources and to a gas discharge source having one or two of said electrode devices (1, 2). The electrode device (1, 2) comprises an electrode wheel (7) rotatable in a rotational direction around a rotational axis (22), said electrode wheel (7) having an outer circumferential surface (24) between two side surfaces (25). An electrode wheel cover (8) is provided which covers a portion of the outer circumferential surface (24) and the side surfaces (25) of the electrode wheel (24). The cover (8) is designed to form a cooling channel (12) in the circumferential direction between the cover (8), the outer circumferential surface (24) and radially outer portions part of the side surfaces (25), and to form a gap (23) between the cover (8) and the outer circumferential surface (24) in extension of the cooling channel (12) in the circumferential direction. The gap (23) has a smaller flow cross section than the cooling channel (12) and limits a thickness of the liquid material film formed on the outer circumferential surface (24) during rotation of the electrode wheel (7). Alternatively to the gap (23) the cover (8) may be designed to inhibit the formation of such a film from the liquid material flowing through the cooling channel (12). The cooling channel (12) allows at the same time cooling of the electrode wheel (7) by the liquid material circulating through the cooling channel (12). With the proposed design of the cover (8), an efficient cooling of the electrode wheel (7) is achieved, allowing high electrical powers for operating gas discharge sources with such an electrode device.
摘要翻译：本发明涉及一种用于气体放电源的电极装置（1,2）和具有一个或两个所述电极装置（1,2）的气体放电源。电极装置（1,2）包括可围绕旋转轴线（22）沿旋转方向旋转的电极轮（7），所述电极轮（7）在两个侧表面（25）之间具有外圆周表面（24）。设置有覆盖电极轮（24）的外周面（24）的一部分和侧面（25）的电极轮罩（8）。盖（8）被设计成在盖（8），外周面（24）和侧面（25）的径向外部部分之间沿圆周方向形成冷却通道（12），并形成在周向上在冷却通道（12）延伸的盖（8）和外周面（24）之间的间隙（23）。间隙（23）具有比冷却通道（12）更小的流动横截面，并限制了在电极轮（7）旋转期间形成在外圆周表面（24）上的液体材料膜的厚度。可替换地，间隙（23），盖（8）可以设计成阻止从流过冷却通道（12）的液体材料形成这种膜。冷却通道（12）同时允许通过冷却通道（12）循环的液体材料冷却电极轮（7）。通过提出的盖（8）的设计，实现了电极轮（7）的有效冷却，允许用这种电极装置操作气体放电源的高电功率。

4. 发明申请

WO2006136967A3 METHOD OF CLEANING OPTICAL SURFACES OF AN IRRADIATION UNIT IN A TWO-STEP PROCESS 审中-公开
标题翻译：在两步过程中清洁辐照单元的光学表面的方法
公开(公告)号：WO2006136967A3
公开(公告)日：2007-08-09
申请号：PCT/IB2006051814
申请日：2006-06-07
申请人： PHILIPS INTELLECTUAL PROPERTY , KONINKL PHILIPS ELECTRONICS NV , DERRA GUENTHER HANS , KRUECKEN THOMAS , METZMACHER CHRISTOF , WEBER ACHIM , ZINK PETER
发明人： DERRA GUENTHER HANS , KRUECKEN THOMAS , METZMACHER CHRISTOF , WEBER ACHIM , ZINK PETER
IPC分类号： G03F7/20
CPC分类号： B82Y10/00 , G03F7/70166 , G03F7/70916 , G03F7/70925
摘要： The present invention provides a method of cleaning optical surfaces in an irradiation unit in order to remove contaminations deposited on said optical surfaces. The method includes a cleaning step in which a first gas or gas mixture is brought into contact with said optical surfaces thereby forming a volatile compound with a first portion of said contaminations. In an operation pause of the irradiation unit prior to the cleaning step, a pretreatment step is performed, in which a second gas or gas mixture is brought into contact with said optical surfaces. Said second gas or gas mixture is selected to react with a second portion of said contaminations different from said first portion to form a reaction product, which is able to form a volatile compound with said first gas or gas mixture.
摘要翻译：本发明提供一种清洗照射单元中的光学表面以消除沉积在所述光学表面上的污染物的方法。该方法包括清洗步骤，其中第一气体或气体混合物与所述光学表面接触，从而形成具有所述污染物的第一部分的挥发性化合物。在清洁步骤之前的照射单元的操作暂停中，执行预处理步骤，其中第二气体或气体混合物与所述光学表面接触。选择所述第二气体或气体混合物与不同于所述第一部分的所述污染物的第二部分反应以形成能够与所述第一气体或气体混合物形成挥发性化合物的反应产物。

5. 发明申请

WO2006136967A2 METHOD OF CLEANING OPTICAL SURFACES OF AN IRRADIATION UNIT IN A TWO-STEP PROCESS 审中-公开
标题翻译：在两步过程中清洁辐照单元的光学表面的方法
公开(公告)号：WO2006136967A2
公开(公告)日：2006-12-28
申请号：PCT/IB2006/051814
申请日：2006-06-07
申请人： PHILIPS INTELLECTUAL PROPERTY & STANDARDS GMBH , KONINKLIJKE PHILIPS ELECTRONICS N. V. , DERRA, Guenther Hans , KRUECKEN, Thomas , METZMACHER, Christof , WEBER, Achim , ZINK, Peter
发明人： DERRA, Guenther Hans , KRUECKEN, Thomas , METZMACHER, Christof , WEBER, Achim , ZINK, Peter
CPC分类号： B82Y10/00 , G03F7/70166 , G03F7/70916 , G03F7/70925
摘要： The present invention provides a method of cleaning optical surfaces in an irradiation unit in order to remove contaminations deposited on said optical surfaces. The method includes a cleaning step in which a first gas or gas mixture is brought into contact with said optical surfaces thereby forming a volatile compound with a first portion of said contaminations. In an operation pause of the irradiation unit prior to the cleaning step, a pretreatment step is performed, in which a second gas or gas mixture is brought into contact with said optical surfaces. Said second gas or gas mixture is selected to react with a second portion of said contaminations different from said first portion to form a reaction product, which is able to form a volatile compound with said first gas or gas mixture.
摘要翻译：本发明提供一种清洗照射单元中的光学表面以消除沉积在所述光学表面上的污染物的方法。该方法包括清洗步骤，其中第一气体或气体混合物与所述光学表面接触，从而形成具有所述污染物的第一部分的挥发性化合物。在清洁步骤之前的照射单元的操作暂停中，执行预处理步骤，其中第二气体或气体混合物与所述光学表面接触。选择所述第二气体或气体混合物与不同于所述第一部分的所述污染物的第二部分反应以形成能够与所述第一气体或气体混合物形成挥发性化合物的反应产物。

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