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    • 4. 发明申请
    • NOVEL APPROACH IN CONTROLLING DSP SCALE IN THE BAYER PROCESS
    • 在贝叶斯过程中控制DSP规模的新方法
    • WO2010117949A2
    • 2010-10-14
    • PCT/US2010/029968
    • 2010-04-05
    • NALCO COMPANYLA, TimothyCUI, JiKILDEA, John D.SLINKMAN, David H.COLEMAN, Kim Richard
    • LA, TimothyCUI, JiKILDEA, John D.SLINKMAN, David H.COLEMAN, Kim Richard
    • C01F7/06
    • C01F7/0606C01F7/47
    • The invention provides a method of controlling silica in the liquor circuit of the Bayer process. The method involves addition of a promoter material to enhance the precipitation of DSP and includes adding one or more silica dispersion materials or dry silica forms to those parts of the circuit where precipitation of DSP and removal of silica from solution is desirable; for example the desilication stage of a Bayer process plant. The removal of DSP from solution reduces silica concentration in the liquor and thereby enables better control of process issues such as silica contamination in alumina product and DSP formation in later stages of the process where precipitation as scale onto vessel walls and equipment is problematical. As a result, the invention provides a significant reduction in the total cost of operating a Bayer process.
    • 本发明提供了一种在拜耳方法的液体回路中控制二氧化硅的方法。 该方法包括添加助催化剂材料以增强DSP的沉淀,并且包括向需要沉淀DSP并从溶液中除去二氧化硅的电路部分添加一种或多种二氧化硅分散体材料或干燥二氧化硅形式; 例如拜耳加工厂的脱硅阶段。 从溶液中除去DSP会降低液体中的二氧化硅浓度,从而可以更好地控制工艺问题,例如氧化铝产品中的二氧化硅污染物和过程后期阶段的DSP形成,其中沉淀作为鳞片沉积到容器壁和设备上是有问题的。 因此,本发明大大降低了操作拜耳过程的总成本。
    • 7. 发明申请
    • APPROACH IN CONTROLLING DSP SCALE IN THE BAYER PROCESS
    • 在贝叶斯过程中控制DSP尺度的方法
    • WO2010117949A3
    • 2010-12-16
    • PCT/US2010029968
    • 2010-04-05
    • NALCO COLA TIMOTHYCUI JIKILDEA JOHN DSLINKMAN DAVID HCOLEMAN KIM RICHARD
    • LA TIMOTHYCUI JIKILDEA JOHN DSLINKMAN DAVID HCOLEMAN KIM RICHARD
    • C01F7/06C01F7/47
    • C01F7/0606C01F7/47
    • The invention provides a method of controlling silica in the liquor circuit of the Bayer process. The method involves addition of a promoter material to enhance the precipitation of DSP and includes adding one or more silica dispersion materials or dry silica forms to those parts of the circuit where precipitation of DSP and removal of silica from solution is desirable; for example the desilication stage of a Bayer process plant. The removal of DSP from solution reduces silica concentration in the liquor and thereby enables better control of process issues such as silica contamination in alumina product and DSP formation in later stages of the process where precipitation as scale onto vessel walls and equipment is problematical. As a result, the invention provides a significant reduction in the total cost of operating a Bayer process.
    • 本发明提供了一种在拜耳法的液体回路中控制二氧化硅的方法。 该方法包括添加助催化剂材料以增强DSP的沉淀,并且包括向需要沉淀DSP并从溶液中除去二氧化硅的电路部分添加一种或多种二氧化硅分散体材料或干燥二氧化硅形式; 例如拜耳加工厂的脱硅阶段。 从溶液中除去DSP会降低液体中的二氧化硅浓度,从而可以更好地控制工艺问题,例如氧化铝产品中的二氧化硅污染和在过程中的后期阶段的DSP形成,其中沉淀作用在容器壁和设备上的沉淀是有问题的。 结果,本发明大大降低了操作拜耳工艺的总成本。