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    • 1. 发明申请
    • NOVEL APPROACH IN CONTROLLING DSP SCALE IN THE BAYER PROCESS
    • 在贝叶斯过程中控制DSP规模的新方法
    • WO2010117949A2
    • 2010-10-14
    • PCT/US2010/029968
    • 2010-04-05
    • NALCO COMPANYLA, TimothyCUI, JiKILDEA, John D.SLINKMAN, David H.COLEMAN, Kim Richard
    • LA, TimothyCUI, JiKILDEA, John D.SLINKMAN, David H.COLEMAN, Kim Richard
    • C01F7/06
    • C01F7/0606C01F7/47
    • The invention provides a method of controlling silica in the liquor circuit of the Bayer process. The method involves addition of a promoter material to enhance the precipitation of DSP and includes adding one or more silica dispersion materials or dry silica forms to those parts of the circuit where precipitation of DSP and removal of silica from solution is desirable; for example the desilication stage of a Bayer process plant. The removal of DSP from solution reduces silica concentration in the liquor and thereby enables better control of process issues such as silica contamination in alumina product and DSP formation in later stages of the process where precipitation as scale onto vessel walls and equipment is problematical. As a result, the invention provides a significant reduction in the total cost of operating a Bayer process.
    • 本发明提供了一种在拜耳方法的液体回路中控制二氧化硅的方法。 该方法包括添加助催化剂材料以增强DSP的沉淀,并且包括向需要沉淀DSP并从溶液中除去二氧化硅的电路部分添加一种或多种二氧化硅分散体材料或干燥二氧化硅形式; 例如拜耳加工厂的脱硅阶段。 从溶液中除去DSP会降低液体中的二氧化硅浓度,从而可以更好地控制工艺问题,例如氧化铝产品中的二氧化硅污染物和过程后期阶段的DSP形成,其中沉淀作为鳞片沉积到容器壁和设备上是有问题的。 因此,本发明大大降低了操作拜耳过程的总成本。
    • 8. 发明申请
    • APPROACH IN CONTROLLING DSP SCALE IN THE BAYER PROCESS
    • 在贝叶斯过程中控制DSP尺度的方法
    • WO2010117949A3
    • 2010-12-16
    • PCT/US2010029968
    • 2010-04-05
    • NALCO COLA TIMOTHYCUI JIKILDEA JOHN DSLINKMAN DAVID HCOLEMAN KIM RICHARD
    • LA TIMOTHYCUI JIKILDEA JOHN DSLINKMAN DAVID HCOLEMAN KIM RICHARD
    • C01F7/06C01F7/47
    • C01F7/0606C01F7/47
    • The invention provides a method of controlling silica in the liquor circuit of the Bayer process. The method involves addition of a promoter material to enhance the precipitation of DSP and includes adding one or more silica dispersion materials or dry silica forms to those parts of the circuit where precipitation of DSP and removal of silica from solution is desirable; for example the desilication stage of a Bayer process plant. The removal of DSP from solution reduces silica concentration in the liquor and thereby enables better control of process issues such as silica contamination in alumina product and DSP formation in later stages of the process where precipitation as scale onto vessel walls and equipment is problematical. As a result, the invention provides a significant reduction in the total cost of operating a Bayer process.
    • 本发明提供了一种在拜耳法的液体回路中控制二氧化硅的方法。 该方法包括添加助催化剂材料以增强DSP的沉淀,并且包括向需要沉淀DSP并从溶液中除去二氧化硅的电路部分添加一种或多种二氧化硅分散体材料或干燥二氧化硅形式; 例如拜耳加工厂的脱硅阶段。 从溶液中除去DSP会降低液体中的二氧化硅浓度,从而可以更好地控制工艺问题,例如氧化铝产品中的二氧化硅污染和在过程中的后期阶段的DSP形成,其中沉淀作用在容器壁和设备上的沉淀是有问题的。 结果,本发明大大降低了操作拜耳工艺的总成本。
    • 10. 发明申请
    • MONITORING A COATING APPLIED TO A METAL SURFACE
    • 监测适用于金属表面的涂料
    • WO2008154155A3
    • 2009-01-29
    • PCT/US2008064847
    • 2008-05-27
    • NALCO COCUI JIBANKS RODNEY H
    • CUI JIBANKS RODNEY H
    • G01N21/64B05D7/14C09D183/00C23F11/18
    • B05D5/06B05D7/14G01B11/0658G01N21/643G01N21/8422G01N21/91G01N2021/646G01N2021/8416G01N2021/8427
    • A method of monitoring a coating applied to a metal surface is disclosed. Specifically, the method comprises the following: applying a sol composition to a metal surface, wherein said composition contains one or more alkoxysilyl group containing compounds, a fluorophore, and a solvent; forming a gelled coating on said surface from said composition; measuring the fluorescence of said coating with a fluorometer, wherein said fluorometer is capable of measuring reflective fluorescence emission measurements; correlating the fluorescence of said coating with the thickness or weight of said coating, and/or with the concentration of alkoxysilyl group containing compound in the coating composition; and optionally applying an additional coating to said metal surface when the thickness of the coating is less than a desired amount or adjusting the concentration of the alkoxysilyl group containing compound applied to said surface.
    • 公开了一种监测施加到金属表面的涂层的方法。 具体地说,该方法包括以下步骤:将溶胶组合物施用于金属表面,其中所述组合物含有一种或多种含烷氧基甲硅烷基的化合物,荧光团和溶剂; 在所述表面上从所述组合物形成凝胶涂层; 用荧光计测量所述涂层的荧光,其中所述荧光计能够测量反射荧光发射测量; 将所述涂层的荧光与所述涂层的厚度或重量相关,和/或与涂料组合物中含烷氧基甲硅烷基的化合物的浓度相关; 并且当涂层的厚度小于所需量或调节施加到所述表面的含烷氧基甲硅烷基的化合物的浓度时,任选地向所述金属表面施加另外的涂层。