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    • 4. 发明申请
    • PHOTOACTIVABLE NITROGEN BASES
    • 可摄氮
    • WO2003033500A1
    • 2003-04-24
    • PCT/EP2002/011238
    • 2002-10-08
    • CIBA SPECIALTY CHEMICALS HOLDING INC.BAUDIN, GisèleDIETLIKER, KurtJUNG, Tunja
    • BAUDIN, GisèleDIETLIKER, KurtJUNG, Tunja
    • C07D487/04
    • C07D487/04B33Y70/00G03F7/0045G03F7/0295G03F7/031
    • Compounds of the formula I R7"N-R6 RS-C,N-R4 H C, R'/ I R, 3 R 2 (I) in which R, is an aromatic or heteroaromatic radical which is capable of absorbing light in the wave-length range from 200 nm to 650 nm and which is unsubstituted or substituted one or more times by C,-C,8alkyl, C2-C,ealkenyl, C2-C,8alkynyl, C,-C,ehaloalkyl, N02, NR,OR , CN, OR,2, SR,2, C(O)R,3, C(O)OR,4, halogen or a radical of the formula II R∼-N' R6 1 R5-C,N.R4 H I C - R3 I R2 (II) and which on absorption brings about a photoelimination which leads to the generation of an amidine group, R2 and R3 independently of one another are hydrogen, C,-C,ealkyl or phenyl which is unsubstituted or is substituted one or more times by C,-C,8alkyl, CN, OR,2, SR,2, halogen or C,-C,ehaloalkyl; R5 is C,-C,ealkyl or NR8R9; R4, R6, R,, R8, R9, R,o and R inde-pendently of one another are hydrogen or C,-C,8alkyl; or R4 and R6 together form a C2-C,2alkylene bridge which is unsubstituted or is substituted by one or more C1-C4alkyl radicals; or R5 and R,, independently of R4 and R6, together form a C2-C,2alkylene bridge which is unsubstituted or is substituted by one or more C1-C4alkyl radicals; or, if R5 is a radi-cal NR8R9, R, and R9 together form a C2-C,2alkylene bridge which is unsubstituted or is sub-stituted by one or more C1-C4alkyl radicals; and R,2, R,3 and R,4 independently of one another are hydrogen or C,-C,ealkyl; are suitable as photoinitiators for compounds which react under base catalysis.
    • 式I R7“N-R6RS-C,N-R4H HC,R'/ IR,3R2(I)的化合物,其中R 1是能够吸收波浪中的光的芳族或杂芳族基团, 长度范围为200nm至650nm,其未被取代或被C 1 -C 8烷基,C 2 -C 6烯基,C 2 -C 8炔基,C 1 -C 8卤代烷基,N 2 NR,OR ,CN,OR,2,SR,2,C(O)R,3,C(O)OR 4,卤素或式II的基团R 1 -C 6R 5 R 5 -C - R3 I R2(II),其吸收引起导致脒基的生成的光致游离,R 2和R 3彼此独立地是氢,C 1 -C 6烷基或未取代或被取代的苯基 C 1 -C 8烷基,CN,OR 2,SR 2,卤素或C 1 -C 6卤代烷基; R 5为C 1 -C 6烷基或NR 8 R 9; R 4,R 6, R 1,R 2,R 3和R 4彼此独立地是氢或C 1 -C 8烷基;或者R 4和R 6一起形成未被取代或被一个或多个C 1 -C 4烷基取代的C 2 -C 2亚烷基桥 自由基; 或R 5和R 7独立于R 4和R 6一起形成未被取代或被一个或多个C 1 -C 4烷基取代的C 2 -C 2亚烷基桥; 或者如果R 5是辐射级NR 8 R 9,则R 3和R 9一起形成未被取代或由一个或多个C 1 -C 4烷基取代的C 2 -C 2亚烷基桥; 和R,2,R 3和R 4彼此独立地是氢或C 1 -C 6烷基; 适用于在碱催化下反应的化合物的光引发剂。
    • 10. 发明申请
    • METHOD OF BONDING
    • 结合方法
    • WO2008009575A3
    • 2008-03-27
    • PCT/EP2007056917
    • 2007-07-09
    • CIBA SC HOLDING AGSTUDER KATJAJUNG TUNJADIETLIKER KURT
    • STUDER KATJAJUNG TUNJADIETLIKER KURT
    • C08K5/34C09J5/00C09J175/04
    • C08G18/3876C08G18/10C08G18/1841C08G18/2063C09J5/00C09J175/04C09J2475/00C08G18/40C08G18/6618
    • The invention relates to a first method of bonding a first substrate to a second substrate, comprising the steps of a) applying an UV-curable adhesive resin composition comprising a photolatent base to at least one transparent surface of at least one of said first and second substrates, b) bringing said first and second substrates together with said adhesive composition there between, c) exposing said adhesive composition to actinic radiation to effect curing or alternatively to a second method of bonding a first substrate to a second substrate, comprising the steps of a) applying a UV-curable adhesive resin composition comprising a photolatent base to one surface, b) exposing said adhesive composition to actinic radiation to effect curing, c) bringing said first and second substrates together with said adhesive composition there between.
    • 本发明涉及将第一衬底粘合到第二衬底的第一种方法,包括以下步骤:a)将包含光致变色基底的UV可固化粘合剂树脂组合物施加到所述第一和第二衬底中的至少一个的至少一个透明表面上 衬底,b)将所述第一和第二衬底与其间的所述粘合剂组合物一起,c)将所述粘合剂组合物暴露于光化辐射以实现固化,或者替代地将第一衬底结合到第二衬底的第二种方法,包括以下步骤: a)将包含光致变色基底的UV可固化粘合剂树脂组合物施加到一个表面上,b)将所述粘合剂组合物暴露于光化辐射以进行固化,c)将所述第一和第二基底与其间的所述粘合剂组合物一起使用。