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1. 发明申请

WO1998005061A1 METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE 审中-公开
标题翻译：制造半导体器件的方法
公开(公告)号：WO1998005061A1
公开(公告)日：1998-02-05
申请号：PCT/JP1997002666
申请日：1997-07-31
申请人： SONY CORPORATION , KOKUSAI ELECTRIC CO., LTD. , FUJITA, Shigeru , FURUNO, Makoto , ITATANI, Hideharu
发明人： SONY CORPORATION , KOKUSAI ELECTRIC CO., LTD.
IPC分类号： H01L21/31
CPC分类号： C23C16/46 , Y10T29/41
摘要： In a method for manufacturing semiconductor device, wafers W are respectively placed on the wafer mounting stages (2) of a single wafer processing low-pressure CVD system including a heat-treating chamber (1) and the wafer mounting stages (2) which are vertically provided in the chamber, and films are formed on the wafers W while the wafers W are heated. At the time of loading the wafers W into the chamber preheated to a desired heat-treating temperature, at least the wafers W placed on the stages (2) other than the lowest stage (2) are not immediately placed on the stages, but left in the chamber (1) until the temperatures at the central parts of the wafers W rise to near the temperature in the chamber (1). Thereafter, the wafers W are placed on the prescribed stages of the stages (2) and the films are formed on the wafers W.
摘要翻译：在制造半导体器件的方法中，将晶片W分别放置在包括热处理室（1）和晶片安装级（2）的单晶片处理低压CVD系统的晶片安装级（2）上，垂直设置在腔室中，并且在晶片W被加热的同时在晶片W上形成膜。在将晶片W装载到预热到期望的热处理温度的室中时，至少放置在除了最低级（2）之外的级（2）上的晶片W不会立即放置在级上，而是留下在腔室（1）中直到晶片W的中心部分的温度升高到接近室（1）中的温度。此后，将晶片W放置在级（2）的规定级上，并且在晶片W上形成膜。

2. 发明申请

WO2011129456A1 DEPOSITION METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE 审中-公开
标题翻译：沉积方法和制造半导体器件的方法
公开(公告)号：WO2011129456A1
公开(公告)日：2011-10-20
申请号：PCT/JP2011/059473
申请日：2011-04-12
申请人： SEMICONDUCTOR ENERGY LABORATORY CO., LTD. , YAMAZAKI, Shunpei , SAKATA, Junichiro , FURUNO, Makoto
发明人： YAMAZAKI, Shunpei , SAKATA, Junichiro , FURUNO, Makoto
IPC分类号： H01L21/316 , C23C14/08 , C23C14/34 , H01L29/786
CPC分类号： H01L21/02266 , C23C14/0036 , C23C14/08 , C23C14/3407 , C23C14/3414 , H01L21/02112 , H01L21/8232 , H01L27/0688 , H01L27/11521 , H01L27/11551 , H01L27/1156 , H01L27/1207 , H01L27/1225 , H01L27/1251 , H01L28/60 , H01L29/4908 , H01L29/66477 , H01L29/66742 , H01L29/66969 , H01L29/78645 , H01L29/7869
摘要： An object is to provide a deposition method in which a gallium oxide film is formed by a DC sputtering method. Another object is to provide a method for manufacturing a semiconductor device using a gallium oxide film as an insulating layer such as a gate insulating layer of a transistor. An insulating film is formed by a DC sputtering method or a pulsed DC sputtering method, using an oxide target including gallium oxide (also referred to as GaO X ). The oxide target includes GaO X , and X is less than 1.5, preferably more than or equal to 0.01 and less than or equal to 0.5, further preferably more than or equal to 0.1 and less than or equal to 0.2. The oxide target has conductivity, and sputtering is performed in an oxygen gas atmosphere or a mixed atmosphere of an oxygen gas and a rare gas such as argon.
摘要翻译：本发明的目的是提供一种通过DC溅射法形成氧化镓膜的沉积方法。另一个目的是提供一种使用氧化镓膜作为绝缘层的半导体器件的制造方法，例如晶体管的栅极绝缘层。使用包含氧化镓（也称为GaO X）的氧化物靶，通过DC溅射法或脉冲DC溅射法形成绝缘膜。氧化物靶包括GaO X，X小于1.5，优选大于或等于0.01且小于或等于0.5，进一步优选大于或等于0.1且小于或等于0.2。氧化物靶具有导电性，并且在氧气气氛或氧气和稀有气体如氩气的混合气氛中进行溅射。

3. 发明申请

WO2005041310A1 DISPLAY DEVICE AND METHOD FOR MANUFACTURING THE SAME, AND TELEVISION RECEIVER 审中-公开
标题翻译：显示装置及其制造方法以及电视接收机
公开(公告)号：WO2005041310A1
公开(公告)日：2005-05-06
申请号：PCT/JP2004/016169
申请日：2004-10-25
申请人： SEMICONDUCTOR ENERGY LABORATORY CO., LTD. , YAMAZAKI, Shunpei , MAEKAWA, Shinji , FURUNO, Makoto , NAKAMURA, Osamu , IMAI, Keitaro
发明人： YAMAZAKI, Shunpei , MAEKAWA, Shinji , FURUNO, Makoto , NAKAMURA, Osamu , IMAI, Keitaro
IPC分类号： H01L29/786
CPC分类号： H01L27/12 , H01L27/1292 , H01L27/3276 , H01L29/66757 , H01L29/66765 , H01L51/56
摘要： According to the present invention, which is a display device in which a light-emitting element where an organic substance generating luminescence referred to as electroluminescence or a medium including a mixture of an organic substance and an inorganic substance is sandwiched between electrodes is connected to a TFT, the invention is to manufacture a display panel by forming at least one or more of a conductive layer which forms a wiring or an electrode and a pattern necessary for manufacturing a display panel such as a mask layer for forming a predetermined pattern is formed by a method capable of selectively forming a pattern. A droplet discharge method capable of forming a predetermined pattern by selectively discharging a droplet of a composition in accordance with a particular object and by forming a conductive layer or an insulating layer is used as a method capable of selectively forming a pattern.
摘要翻译：根据本发明，其中将发出被称为电致发光的有机物质的发光元件或包含有机物和无机物的混合物的介质夹在电极之间的发光元件连接到 TFT，本发明通过形成至少一个或多个形成布线或电极的导电层以及用于制造用于形成预定图案的掩模层等显示面板所需的图案来制造显示面板，由能够选择性地形成图案的方法。使用能够通过选择性地排出根据特定目的的组合物的液滴并且通过形成导电层或绝缘层来形成预定图案的液滴喷射方法作为能够选择性地形成图案的方法。

4. 发明申请

WO2005041311A1 LIQUID CRYSTAL DISPLAY DEVICE AND METHOD FOR MANUFACTURING THE SAME, AND LIQUID CRYSTAL TELEVISION RECIEVER 审中-公开
标题翻译：液晶显示装置及其制造方法及液晶电视接收机
公开(公告)号：WO2005041311A1
公开(公告)日：2005-05-06
申请号：PCT/JP2004/016183
申请日：2004-10-25
申请人： SEMICONDUCTOR ENERGY LABORATORY CO., LTD. , YAMAZAKI, Shunpei , MAEKAWA, Shinji , FURUNO, Makoto , NAKAMURA, Osamu , IMAI, Keitaro
发明人： YAMAZAKI, Shunpei , MAEKAWA, Shinji , FURUNO, Makoto , NAKAMURA, Osamu , IMAI, Keitaro
IPC分类号： H01L29/786
CPC分类号： H01L33/08 , G02F1/1368 , G02F2001/136295 , H01L21/76838 , H01L27/12 , H01L27/1285 , H01L27/1292 , H01L29/66765 , H01L2924/0002 , Y10T428/24421 , H01L2924/00
摘要： At least one or more of a conductive layer which forms a wiring or an electrode and a pattern necessary for manufacturing a display panel such as a mask for forming a predetermined pattern is formed by a method capable of selectively forming a pattern to manufacture a liquid crystal display device. A droplet discharge method capable of forming a predetermined pattern by selectively discharging a droplet of a composition in accordance with a particular object is used as a method capable of selectively forming a pattern in forming a conductive layer, an insulating layer, or the like.
摘要翻译：通过能够选择性地形成图案以制造液晶的方法形成至少一个或多个形成布线或电极的导电层和制造用于形成预定图案的掩模等显示面板所需的图案显示设备。使用能够通过根据特定目的选择性地排出组合物的液滴来形成预定图案的液滴喷射方法作为能够在形成导电层，绝缘层等中选择性地形成图案的方法。

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