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    • 9. 发明申请
    • METHOD AND APPARATUS FOR ATOMIC LAYER DEPOSITION USING AN ATMOSPHERIC PRESSURE GLOW DISCHARGE PLASMA
    • 使用大气压力辉放电等离子体进行原子层沉积的方法和设备
    • WO2009031886A3
    • 2009-06-04
    • PCT/NL2008050557
    • 2008-08-20
    • FUJIFILM MFG EUROPE BVDE VRIES HINDRIK WILLEM
    • DE VRIES HINDRIK WILLEM
    • C23C16/02C23C16/455
    • C23C16/452C23C16/0245C23C16/4554
    • Apparatus and method for atomic layer deposition on a surface of a substrate (6) in a treatment space. A gas supply device (15, 16) is present for providing various gas mixtures to the treatment space (1, 2). The gas supply device (15, 16) is arranged to provide a gas mixture with a precursor material to the treatment space for allowing reactive surface sites to react with precursor material molecules to give a surface covered by a monolayer of precursor molecules attached via the reactive sites to the surface of the substrate. Subsequently, a gas mixture comprising a reactive agent capable to convert the attached precursor m molecules to active precursor sites is provided. A plasma generator (10) is present for generating an atmospheric pressure plasma in the gas mixture comprising the reactive agent, the plasma generator being arranged remote from the treatment space (1, 2).
    • 用于在处理空间中的基板(6)的表面上进行原子层沉积的设备和方法。 存在用于向处理空间(1,2)提供各种气体混合物的气体供应装置(15,16)。 气体供应装置(15,16)被布置为向处理空间提供具有前体材料的气体混合物,以允许反应性表面位点与前体材料分子反应,从而产生被单层前体分子覆盖的表面,所述单体前体分子经由反应物 位点到基底表面。 随后,提供包含能够将连接的前体m分子转化为活性前体位点的反应剂的气体混合物。 存在等离子体发生器(10),用于在包含反应剂的气体混合物中产生大气压等离子体,等离子体发生器远离处理空间(1,2)布置。