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1. 发明申请

WO2009051763A3 APPARATUS AND METHODS FOR OPTIMIZING CLEANING OF PATTERNED SUBSTRATES 审中-公开
公开(公告)号：WO2009051763A3
公开(公告)日：2009-04-23
申请号：PCT/US2008/011830
申请日：2008-10-15
申请人： LAM RESEARCH CORPORATION , DE LARIOS, John, M. , FREER, Erik, M. , RAVKIN, Michael , MARKS, Jeffrey
发明人： DE LARIOS, John, M. , FREER, Erik, M. , RAVKIN, Michael , MARKS, Jeffrey
IPC分类号： H01L21/302
摘要： Methods and apparatus for cleaning wafer surfaces are provided, especially for cleaning surfaces of patterned wafers. The cleaning apparatus includes a cleaning head with channels on the surface facing the patterned wafer, which has a predominant pattern. Cleaning material flowing the channels exerts a shear force on the surface of a patterned wafer, which is oriented in a specific direction to the cleaning head. The shear force and the specific orientation between the patterned wafer and the cleaning head improve the removal efficiency of the surface contaminants.

2. 发明申请

WO2007079036A3 METHOD AND APPARATUS FOR CLEANING A SEMICONDUCTOR SUBSTRATE 审中-公开
公开(公告)号：WO2007079036A3
公开(公告)日：2007-07-12
申请号：PCT/US2006/049109
申请日：2006-12-21
申请人： LAM RESEARCH CORPORATION , FREER, Erik, M. , DE LARIOS, John, M. , MIKHAYLICHENKO, Katrina , RAVKIN, Michael , KOROLIK, Mikhail , REDEKER, Fred, C.
发明人： FREER, Erik, M. , DE LARIOS, John, M. , MIKHAYLICHENKO, Katrina , RAVKIN, Michael , KOROLIK, Mikhail , REDEKER, Fred, C.
IPC分类号： C25F1/00
摘要： A method for cleaning a substrate is provided. The method initiates with disposing a fluid layer having solid components therein to a surface of the substrate. A shear force directed substantially parallel to the surface of the substrate and toward an outer edge of the substrate is then created. The shear force may result from a normal or tangential component of a force applied to a solid body in contact with the fluid layer in one embodiment. The surface of the substrate is rinsed to remove the fluid layer. A cleaning system and apparatus are also provided.

3. 发明申请

WO2007078642A2 METHOD AND APPARATUS FOR REMOVING CONTAMINATION FROM SUBSTRATE 审中-公开
标题翻译：从基板去除污染的方法和装置
公开(公告)号：WO2007078642A2
公开(公告)日：2007-07-12
申请号：PCT/US2006/047119
申请日：2006-12-08
申请人： LAM RESEARCH CORPORATION , FREER, Erik, M. , DE LARIOS, John, M. , MIKHAYLICHENKO, Katrina , RAVKIN, Michael , KOROLIK, Mikhail , REDEKER, Fred, C. , THOMAS, Clint , PARKS, John
发明人： FREER, Erik, M. , DE LARIOS, John, M. , MIKHAYLICHENKO, Katrina , RAVKIN, Michael , KOROLIK, Mikhail , REDEKER, Fred, C. , THOMAS, Clint , PARKS, John
IPC分类号： C23G1/00 , B08B7/00 , B08B7/04 , B08B3/00 , B08B3/12
CPC分类号： H01L21/02057 , B05D3/10 , B08B7/02 , C11D1/04 , C11D3/042 , C11D3/044 , C11D3/18 , C11D3/2079 , C11D3/222 , C11D3/225 , C11D3/3765 , C11D9/00 , C11D9/02 , C11D9/267 , C11D11/0047 , C11D17/0004 , C11D17/0013 , C11D17/0017 , C11D17/003 , C11D17/041 , C23G1/00 , C23G1/18 , G03F7/42 , G03F7/423 , H01L21/02052 , H01L21/02096 , H01L21/31133 , H01L21/67051 , H01L21/67057 , H01L21/6708 , H01L21/67086
摘要： A cleaning material is disposed over a substrate. The cleaning material includes solid components dispersed within a liquid medium. A force is applied to the solid components within the liquid medium to bring the solid components within proximity to contaminants present on the substrate. The force applied to the solid components can be exerted by an immiscible component within the liquid medium. When the solid components are brought within sufficient proximity to the contaminants, an interaction is established between the solid components and the contaminants. Then, the solid components are moved away from the substrate such that the contaminants having interacted with the solid components are removed from the substrate.
摘要翻译：清洁材料设置在基板上。清洁材料包括分散在液体介质中的固体组分。将力施加到液体介质中的固体组分以使固体组分接近存在于基底上的污染物。施加到固体组分的力可以通过液体介质中的不混溶组分施加。当固体组分被充分接近污染物时，在固体组分和污染物之间建立了相互作用。然后，将固体组分从衬底移开，使得与固体组分相互作用的污染物从衬底上除去。

4. 发明申请

WO2008121190A1 PROXIMITY HEAD WITH ANGLED VACUUM CONDUIT SYSTEM, APPARATUS AND METHOD 审中-公开
标题翻译：具有真空真空管道系统的附件头，装置和方法
公开(公告)号：WO2008121190A1
公开(公告)日：2008-10-09
申请号：PCT/US2008/002414
申请日：2008-02-22
申请人： LAM RESEARCH CORPORATION , RAVKIN, Michael , DE LARIOS, John , REDEKER, Fred, C. , KOROLIK, Mikhail , FREER, Erik, M.
发明人： RAVKIN, Michael , DE LARIOS, John , REDEKER, Fred, C. , KOROLIK, Mikhail , FREER, Erik, M.
IPC分类号： H01L21/00
CPC分类号： H01L21/67051
摘要： A proximity head including a head surface. The head surface including a first flat region and a plurality of first conduits. Each one of the plurality of first conduits being defined by corresponding one of a plurality of first discrete holes. The plurality of first discrete holes residing in the head surface and extending through the first flat region. The head surface also including a second flat region and a plurality of second conduits. The plurality of second conduits being defined by a corresponding plurality of second discrete holes that reside in the head surface and extend through the second flat region. The head surface also including a third flat region disposed between and adjacent to the first flat region and the second flat region and a plurality of third conduits. The plurality of third conduits being defined by a corresponding plurality of third discrete holes that reside in the head surface and extend through the third flat region. The third conduits being formed at a first angle relative to the third flat region. The first angle being between 30 and 60 degrees. A system and method for processing a substrate with a proximity head is also described.
摘要翻译：包括头表面的接近头。头表面包括第一平坦区域和多个第一管道。多个第一导管中的每一个由多个第一离散孔中的对应的一个限定。多个第一离散孔位于头表面并延伸穿过第一平坦区域。头表面还包括第二平坦区域和多个第二管道。多个第二导管由位于头表面中并延伸穿过第二平坦区域的相应多个第二离散孔限定。头表面还包括设置在第一平坦区域和第二平坦区域之间并与其相邻的第三平坦区域和多个第三导管。多个第三导管由位于头表面中并延伸穿过第三平坦区域的对应的多个第三离散孔限定。第三导管相对于第三平坦区域以第一角度形成。第一个角度在30到60度之间。还描述了用于处理具有邻近头的衬底的系统和方法。

5. 发明申请

WO2007078975A3 METHOD AND SYSTEM FOR USING A TWO-PHASES SUBSTRATE CLEANING COMPOUND 审中-公开
标题翻译：使用两相基板清洗化合物的方法和系统
公开(公告)号：WO2007078975A3
公开(公告)日：2008-08-28
申请号：PCT/US2006048706
申请日：2006-12-19
申请人： LAM RES CORP , KOROLIK MIKHAIL , FREER ERIK M , DE LARIOS JOHN M , MIKHAYLICHENKO KATRINA , RAVKIN MIKE , REDEKER FRED
发明人： KOROLIK MIKHAIL , FREER ERIK M , DE LARIOS JOHN M , MIKHAYLICHENKO KATRINA , RAVKIN MIKE , REDEKER FRED
IPC分类号： C09G1/00 , C09G1/02
CPC分类号： C11D11/0047 , B08B7/02 , C11D1/146 , C11D3/2079 , C11D9/02 , C11D17/0013 , C11D17/0017 , C23G1/18 , G03F7/423 , H01L21/02052 , H01L21/31133 , H01L21/6708 , H01L21/67086
摘要： Cleaning compounds, apparatus, and methods to remove contaminants from a substrate surface are provided. An exemplary cleaning compound to remove particulate contaminants from a semiconductor substrate surface is provided. The cleaning compound includes a viscous liquid with a viscosity between about 1 cP to about 10,000 cP. The cleaning compound also includes a plurality of solid components dispersed in the viscous liquid, the plurality of. solid components interact with the particulate contaminants on the substrate surface to remove the particulate contaminants from the substrate surface.
摘要翻译：提供了清除化合物，设备和从基材表面除去污染物的方法。提供了从半导体衬底表面去除颗粒污染物的示例性清洁化合物。清洁化合物包括粘度在约1cP至约10,000cP之间的粘性液体。清洁化合物还包括分散在粘稠液体中的多个固体成分，多个。固体组分与基底表面上的颗粒污染物相互作用以从基底表面去除颗粒污染物。

6. 发明申请

WO2007078642A3 METHOD AND APPARATUS FOR REMOVING CONTAMINATION FROM SUBSTRATE 审中-公开
标题翻译：用于从基板去除污染的方法和设备
公开(公告)号：WO2007078642A3
公开(公告)日：2007-12-27
申请号：PCT/US2006047119
申请日：2006-12-08
申请人： LAM RES CORP , FREER ERIK M , DE LARIOS JOHN M , MIKHAYLICHENKO KATRINA , RAVKIN MICHAEL , KOROLIK MIKHAIL , REDEKER FRED C , THOMAS CLINT , PARKS JOHN
发明人： FREER ERIK M , DE LARIOS JOHN M , MIKHAYLICHENKO KATRINA , RAVKIN MICHAEL , KOROLIK MIKHAIL , REDEKER FRED C , THOMAS CLINT , PARKS JOHN
IPC分类号： B08B7/00
CPC分类号： H01L21/02057 , B05D3/10 , B08B7/02 , C11D1/04 , C11D3/042 , C11D3/044 , C11D3/18 , C11D3/2079 , C11D3/222 , C11D3/225 , C11D3/3765 , C11D9/00 , C11D9/02 , C11D9/267 , C11D11/0047 , C11D17/0004 , C11D17/0013 , C11D17/0017 , C11D17/003 , C11D17/041 , C23G1/00 , C23G1/18 , G03F7/42 , G03F7/423 , H01L21/02052 , H01L21/02096 , H01L21/31133 , H01L21/67051 , H01L21/67057 , H01L21/6708 , H01L21/67086
摘要： A cleaning material is disposed over a substrate. The cleaning material includes solid components dispersed within a liquid medium. A force is applied to the solid components within the liquid medium to bring the solid components within proximity to contaminants present on the substrate. The force applied to the solid components can be exerted by an immiscible component within the liquid medium. When the solid components are brought within sufficient proximity to the contaminants, an interaction is established between the solid components and the contaminants. Then, the solid components are moved away from the substrate such that the contaminants having interacted with the solid components are removed from the substrate.
摘要翻译：清洁材料设置在基板上。清洁材料包括分散在液体介质内的固体组分。对液体介质内的固体组分施加力以使固体组分接近衬底上存在的污染物。施加到固体组分上的力可以由液体介质内的不混溶组分施加。当固体组分充分接近污染物时，在固体组分和污染物之间建立相互作用。然后，将固体组分移离基底，使得从基底去除与固体组分相互作用的污染物。

7. 发明申请

WO2007079036A2 METHOD AND APPARATUS FOR CLEANING A SEMICONDUCTOR SUBSTRATE 审中-公开
标题翻译：用于清洁半导体衬底的方法和装置
公开(公告)号：WO2007079036A2
公开(公告)日：2007-07-12
申请号：PCT/US2006049109
申请日：2006-12-21
申请人： LAM RES CORP , FREER ERIK M , DE LARIOS JOHN M , MIKHAYLICHENKO KATRINA , RAVKIN MICHAEL , KOROLIK MIKHAIL , REDEKER FRED C
发明人： FREER ERIK M , DE LARIOS JOHN M , MIKHAYLICHENKO KATRINA , RAVKIN MICHAEL , KOROLIK MIKHAIL , REDEKER FRED C
IPC分类号： B08B3/00
CPC分类号： B08B7/00 , B08B3/00 , B08B7/02 , C11D9/02 , C11D11/0047 , C11D17/0017 , C23G1/18 , G03F7/423 , H01L21/02052 , H01L21/31133 , H01L21/67028 , H01L21/6708 , H01L21/67086
摘要： A method for cleaning a substrate is provided. The method initiates with disposing a fluid layer having solid components therein to a surface of the substrate. A shear force directed substantially parallel to the surface of the substrate and toward an outer edge of the substrate is then created. The shear force may result from a normal or tangential component of a force applied to a solid body in contact with the fluid layer in one embodiment. The surface of the substrate is rinsed to remove the fluid layer. A cleaning system and apparatus are also provided.
摘要翻译：提供一种清洗基板的方法。该方法通过将其中具有固体组分的流体层设置在基底的表面来启动。然后产生基本上平行于衬底的表面并朝向衬底的外边缘的剪切力。在一个实施例中，剪切力可以由施加到与流体层接触的固体的力的正常或切向分量产生。漂洗基材的表面以除去流体层。还提供清洁系统和装置。

8. 发明申请

WO2007078955A3 SUBSTRATE PREPARATION USING STABILIZED FLUID SOLUTIONS AND METHODS FOR MAKING STABLE FLUID SOLUTIONS 审中-公开
标题翻译：使用稳定流体解决方案的基板制备和制备稳定流体溶液的方法
公开(公告)号：WO2007078955A3
公开(公告)日：2008-02-07
申请号：PCT/US2006048548
申请日：2006-12-18
申请人： LAM RES CORP , FREER ERIK M , DE LARIOS JOHN M , RAVKIN MICHAEL , KOROLIK MIKHAIL , MIKHAYLICHENKO KATRINA , REDEKER FRED C
发明人： FREER ERIK M , DE LARIOS JOHN M , RAVKIN MICHAEL , KOROLIK MIKHAIL , MIKHAYLICHENKO KATRINA , REDEKER FRED C
IPC分类号： C11D7/32
CPC分类号： H01L21/6715 , B05D3/10 , C11D3/14 , C11D11/0047 , C11D17/0004 , C11D17/0013 , C23G1/00 , G03F7/42 , H01L21/02052 , H01L21/02057 , H01L21/02096 , H01L21/67051
摘要： A method for making a solution for use in preparing a surface of a substrate is provided. The method includes providing a continuous medium that adds a polymer material to the continuous medium. A fatty acid is adding to the continuous medium having the polymer material, and the polymer material defines a physical network that exerts forces in the solution that overcome buoyancy forces experienced by the fatty acid, thus preventing the fatty acids from moving within the solution until a yield stress of the polymer material is exceeded by an applied agitation. The applied agitation is from transporting the solution from a container to a preparation station that applies the solution to the surface of the substrate.
摘要翻译：提供了制备用于制备基底表面的溶液的方法。该方法包括提供将聚合物材料添加到连续介质的连续介质。将脂肪酸加入到具有聚合物材料的连续介质中，并且聚合物材料限定了在溶液中施加力的物理网络，其克服了脂肪酸所经受的浮力，从而防止脂肪酸在溶液中移动直到通过施加的搅拌超过聚合物材料的屈服应力。施加的搅拌是将溶液从容器运输到将溶液施加到基材表面的制备工位上。

9. 发明申请

WO2007078956A3 METHOD AND APPARATUS FOR PARTICLE REMOVAL 审中-公开
标题翻译：方法和装置去除颗粒
公开(公告)号：WO2007078956A3
公开(公告)日：2008-01-03
申请号：PCT/US2006048552
申请日：2006-12-18
申请人： LAM RES CORP , FREER ERIK M , DELARIOS JOHN M , MIKHAYLICHENKO KATRINA , RAVKIN MICHAEL , KOROLIK MIKHAIL , REDEKER FRITZ C
发明人： FREER ERIK M , DELARIOS JOHN M , MIKHAYLICHENKO KATRINA , RAVKIN MICHAEL , KOROLIK MIKHAIL , REDEKER FRITZ C
IPC分类号： B08B3/00
CPC分类号： B08B3/024 , B08B3/003 , B08B3/08 , B08B6/00 , H01L21/67051
摘要： A method and system for cleaning a surface, having particulate matter thereon, of a substrate features impinging upon the surface a jet of a liquid having coupling elements entrained therein. A sufficient drag force is imparted upon the coupling elements to have the same move with respect to the liquid and cause the particulate matter to move with respect to the substrate.
摘要翻译：一种用于清洁其上具有颗粒物质的表面的表面的方法和系统，其特征在于其表面上具有夹带在其中的具有耦合元件的液体的射流。赋予耦合元件足够的阻力以相对于液体具有相同的移动并使颗粒物质相对于基底移动。

10. 发明申请

WO2007078955A2 SUBSTRATE PREPARATION USING STABILIZED FLUID SOLUTIONS AND METHODS FOR MAKING STABLE FLUID SOLUTIONS 审中-公开
标题翻译：使用稳定流体解决方案的基板制备和制备稳定流体溶液的方法
公开(公告)号：WO2007078955A2
公开(公告)日：2007-07-12
申请号：PCT/US2006/048548
申请日：2006-12-18
申请人： LAM RESEARCH CORPORATION , FREER, Erik, M. , DE LARIOS, John, M. , RAVKIN, Michael , KOROLIK, Mikhail , MIKHAYLICHENKO, Katrina , REDEKER, Fred, C.
发明人： FREER, Erik, M. , DE LARIOS, John, M. , RAVKIN, Michael , KOROLIK, Mikhail , MIKHAYLICHENKO, Katrina , REDEKER, Fred, C.
IPC分类号： C23G1/00 , B08B7/00 , B08B7/04 , B08B3/00 , B08B3/12
CPC分类号： H01L21/6715 , B05D3/10 , C11D3/14 , C11D11/0047 , C11D17/0004 , C11D17/0013 , C23G1/00 , G03F7/42 , H01L21/02052 , H01L21/02057 , H01L21/02096 , H01L21/67051
摘要： A method for making a solution for use in preparing a surface of a substrate is provided. The method includes providing a continuous medium that adds a polymer material to the continuous medium. A fatty acid is adding to the continuous medium having the polymer material, and the polymer material defines a physical network that exerts forces in the solution that overcome buoyancy forces experienced by the fatty acid, thus preventing the fatty acids from moving within the solution until a yield stress of the polymer material is exceeded by an applied agitation. The applied agitation is from transporting the solution from a container to a preparation station that applies the solution to the surface of the substrate.
摘要翻译：提供了制备用于制备基底表面的溶液的方法。该方法包括提供将聚合物材料添加到连续介质的连续介质。将脂肪酸加入到具有聚合物材料的连续介质中，并且聚合物材料限定了在溶液中施加力的物理网络，其克服了脂肪酸所经受的浮力，从而防止脂肪酸在溶液中移动直到通过施加的搅拌超过聚合物材料的屈服应力。施加的搅拌是将溶液从容器运输到将溶液施加到基材表面的制备工位上。

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