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1. 发明申请

WO2006138438A3 SYSTEM AND METHOD OF PROCESSING SUBSTRATES USING SONIC ENERGY HAVING CAVITATION CONTROL 审中-公开
标题翻译：使用具有加密控制的SONIC能量处理基板的系统和方法
公开(公告)号：WO2006138438A3
公开(公告)日：2009-05-07
申请号：PCT/US2006023270
申请日：2006-06-15
申请人： AKRION INC , KASHKOUSH ISMAIL
发明人： KASHKOUSH ISMAIL
IPC分类号： B08B3/12 , B08B6/00 , C25F3/30
CPC分类号： H01L21/67051 , B08B3/12 , H01L21/02052
摘要： A system and method for the acoustic-assisted processing of a substrate, such as a semiconductor wafer, that reduces and/or eliminates damage. The invention suppresses cavitation and pressure effects within the cleaning liquid that may damage devices on the wafer by maintaining the liquid under a constant positive pressure. In one aspect, the invention is a method of processing a substrate comprising: a) supporting a substrate; b) applying a film of liquid to at least one surface of the substrate; c) positioning a transmitter so that at least a portion of the transmitter is in contact with the film of liquid, the transmitter operably coupled to a transducer; d) generating acoustical energy with the transducer; and e) transmitting the acoustical energy to the film of liquid via the transmitter so that the liquid is under only positive pressure during application of the acoustical energy.
摘要翻译：用于对诸如半导体晶片的基板进行声学辅助处理的系统和方法，其减少和/或消除损坏。本发明通过将液体保持恒定的正压力来抑制清洁液体内的气蚀和压力作用，从而可能损坏晶片上的装置。一方面，本发明是一种处理衬底的方法，包括：a）支撑衬底; b）将液体膜施加到所述基底的至少一个表面; c）定位发射器，使得所述发射器的至少一部分与所述液体膜接触，所述发射器可操作地耦合到换能器; d）用传感器产生声能; 以及e）通过发射器将声能传递到液体膜，使得液体在施加声能期间仅处于正压力。

2. 发明申请

WO2006096814A3 METHOD AND SYSTEM FOR PROCESSING SUBSTRATES WITH SONIC ENERGY THAT REDUCES OR ELIMINATES DAMAGE TO SEMICONDUCTOR DEVICES 审中-公开
标题翻译：使用能够减少或消除对半导体器件造成损害的SONIC能量处理衬底的方法和系统
公开(公告)号：WO2006096814A3
公开(公告)日：2007-01-25
申请号：PCT/US2006008452
申请日：2006-03-08
申请人： AKRION INC , KASHKOUSH ISMAIL , PEJMAN FANI , KORBLER JOHN , VIVEK VOHRA , WALTER ALAN
发明人： KASHKOUSH ISMAIL , PEJMAN FANI , KORBLER JOHN , VIVEK VOHRA , WALTER ALAN
IPC分类号： B08B3/12 , B08B3/00 , B08B6/00 , B08B7/00 , B08B7/02 , C03C23/00 , C23G1/00 , C25F1/00 , C25F3/30 , C25F5/00
CPC分类号： B08B3/12 , H01L21/67051
摘要： A system and method for processing and/or cleaning substrates using sonic energy that eliminates or reduces damage to the substrates. In one aspect, the invention utilizes and produces low power density sonic energy to effectively remove particles from a substrate. Fig. 1 is a cleaning system (100) comprising a controller (1), an amplifier (8), a transducer (10), a transmitter (11), a process chamber (14), a support (15), a nozzle (16). Once the substrate (13) is supported and being rotated within the process chamber (14), a cleaning fluid is supplied to the top surface of the substrate via nozzle (16) so that a layer/meniscus (12) of fluid is foemed on the top surface of the substrate. Sonic energy is created by the transducer (11), sonic energy is transmitted by the elongate prode transmitter (11) to the layer 12. The sonic energy loosens particles on the top surface of the substrate, which are then carried away.
摘要翻译：使用消除或减少对基底的损伤的声能处理和/或清洁基底的系统和方法。一方面，本发明利用并产生低功率密度的声能以有效地从基底去除颗粒。图。 1是包括控制器（1），放大器（8），换能器（10），发射器（11），处理室（14），支撑件（15），喷嘴（16））。一旦基板（13）被支撑并且在处理室（14）内旋转，则通过喷嘴（16）将清洁流体供应到基板的顶表面，使得流体的层/半月板（12）被衬底的顶表面。声能由传感器（11）产生，声能由细长导体发射器（11）传输到层12.声能减弱衬底顶表面上的颗粒，然后将其带走。

3. 发明申请

WO2006031991A2 SYSTEM AND METHOD OF POWERING A SONIC ENERGY SOURCE AND USE OF THE SAME TO PROCESS SUBSTRATES 审中-公开
标题翻译：提供SONIC能量源的系统和方法及其使用方法来处理基板
公开(公告)号：WO2006031991A2
公开(公告)日：2006-03-23
申请号：PCT/US2005/033023
申请日：2005-09-15
申请人： AKRION, INC. , KORBLER, John , KASHKOUSH, Ismail , VOLKERT, John , PETERS, Michael
发明人： KORBLER, John , KASHKOUSH, Ismail , VOLKERT, John , PETERS, Michael
IPC分类号： B08B3/12
CPC分类号： H01L21/67051 , B08B3/12
摘要： A system and method of supplying power to a sonic energy source that minimizes damage to substrate devices during processing while increasing processing efficiency and/or effectiveness. The system and method utilize the concept of ramping the amplitude and/or varying the frequency of the electrical signal used to drive the sonic energy source, thereby resulting in corresponding ramping and/or variations in the amplitude and frequency of the resulting sonic energy being applied to the substrate. A method of processing a substrate with sonic energy comprising: a) supporting at least one substrate in a process chamber; b) generating a base electrical signal; c) transmitting the base electrical signal to an amplifier, the amplifier converting the base electrical signal into an output electrical signal having a peak amplitude; d) transmitting the output electrical signal to a transducer, the transducer converting the output electrical signal into corresponding sonic energy; e) applying the sonic energy to the at least on substrate supported in the process chamber; and f) ramping the peak amplitude of the output electrical signal.
摘要翻译：一种向声能量源供电的系统和方法，其在处理过程中使衬底装置的损害最小化，同时提高处理效率和/或有效性。该系统和方法利用斜率振幅和/或改变用于驱动声能量的电信号的频率的概念，从而导致所应用的声能的振幅和频率的相应斜坡和/或变化到基底。一种用声能处理衬底的方法，包括：a）在处理室中支撑至少一个衬底; b）产生基本电信号; c）将基本电信号发送到放大器，放大器将基本电信号转换成具有峰值振幅的输出电信号; d）将输出电信号传输到换能器，换能器将输出电信号转换成相应的声能; e）将声能施加到所述处理室中支撑的所述至少一个衬底上; 以及f）斜率输出电信号的峰值幅度。

4. 发明申请

WO2006138438A2 SYSTEM AND METHOD OF PROCESSING SUBSTRATES USING SONIC ENERGY HAVING CAVITATION CONTROL 审中-公开
标题翻译：使用具有加密控制的SONIC能量处理基板的系统和方法
公开(公告)号：WO2006138438A2
公开(公告)日：2006-12-28
申请号：PCT/US2006/023270
申请日：2006-06-15
申请人： AKRION, INC. , KASHKOUSH, Ismail
发明人： KASHKOUSH, Ismail
IPC分类号： B08B3/00 , H01L21/302
CPC分类号： H01L21/67051 , B08B3/12 , H01L21/02052
摘要： A system and method for the acoustic-assisted processing of a substrate, such as a semiconductor wafer, that reduces and/or eliminates damage. The invention suppresses cavitation and pressure effects within the cleaning liquid that may damage devices on the wafer by maintaining the liquid under a constant positive pressure. In one aspect, the invention is a method of processing a substrate comprising: a) supporting a substrate; b) applying a film of liquid to at least one surface of the substrate; c) positioning a transmitter so that at least a portion of the transmitter is in contact with the film of liquid, the transmitter operably coupled to a transducer; d) generating acoustical energy with the transducer; and e) transmitting the acoustical energy to the film of liquid via the transmitter so that the liquid is under only positive pressure during application of the acoustical energy.
摘要翻译：用于对诸如半导体晶片的基板进行声学辅助处理的系统和方法，其减少和/或消除损坏。本发明通过将液体保持恒定的正压力来抑制清洁液体内的气蚀和压力作用，从而可能损坏晶片上的装置。一方面，本发明是一种处理衬底的方法，包括：a）支撑衬底; b）将液体膜施加到所述基底的至少一个表面; c）定位发射器，使得所述发射器的至少一部分与所述液体膜接触，所述发射器可操作地耦合到换能器; d）用传感器产生声能; 以及e）通过发射器将声能传递到液体膜，使得液体在施加声能期间仅处于正压力。

5. 发明申请

WO2006031991A3 SYSTEM AND METHOD OF POWERING A SONIC ENERGY SOURCE AND USE OF THE SAME TO PROCESS SUBSTRATES 审中-公开
标题翻译：提供SONIC能量源的系统和方法及其使用方法来处理基板
公开(公告)号：WO2006031991A3
公开(公告)日：2007-10-04
申请号：PCT/US2005033023
申请日：2005-09-15
申请人： AKRION INC , KORBLER JOHN , KASHKOUSH ISMAIL , VOLKERT JOHN , PETERS MICHAEL
发明人： KORBLER JOHN , KASHKOUSH ISMAIL , VOLKERT JOHN , PETERS MICHAEL
IPC分类号： B08B3/12 , B08B7/04
CPC分类号： H01L21/67051 , B08B3/12
摘要： A system and method of supplying power to a sonic energy source that minimizes damage to substrate devices during processing while increasing processing efficiency and/or effectiveness. The system and method utilize the concept of ramping the amplitude and/or varying the frequency of the electrical signal used to drive the sonic energy source, thereby resulting in corresponding ramping and/or variations in the amplitude and frequency of the resulting sonic energy being applied to the substrate. A method of processing a substrate with sonic energy comprising: a) supporting at least one substrate in a process chamber; b) generating a base electrical signal; c) transmitting the base electrical signal to an amplifier, the amplifier converting the base electrical signal into an output electrical signal having a peak amplitude; d) transmitting the output electrical signal to a transducer, the transducer converting the output electrical signal into corresponding sonic energy; e) applying the sonic energy to the at least on substrate supported in the process chamber; and f) ramping the peak amplitude of the output electrical signal.
摘要翻译：一种向声能量源供电的系统和方法，其在处理过程中使衬底装置的损害最小化，同时提高处理效率和/或有效性。该系统和方法利用斜率振幅和/或改变用于驱动声能量的电信号的频率的概念，从而导致所应用的声能的振幅和频率的相应斜坡和/或变化到基底。一种用声能处理衬底的方法，包括：a）在处理室中支撑至少一个衬底; b）产生基本电信号; c）将基本电信号发送到放大器，放大器将基本电信号转换成具有峰值振幅的输出电信号; d）将输出电信号传输到换能器，换能器将输出电信号转换成相应的声能; e）将声能施加到所述处理室中支撑的所述至少一个衬底上; 以及f）斜率输出电信号的峰值幅度。

6. 发明申请

WO2006096814A2 METHOD AND SYSTEM FOR PROCESSING SUBSTRATES WITH SONIC ENERGY THAT REDUCES OR ELIMINATES DAMAGE TO SEMICONDUCTOR DEVICES 审中-公开
标题翻译：使用能够减少或消除对半导体器件造成损害的SONIC能量处理衬底的方法和系统
公开(公告)号：WO2006096814A2
公开(公告)日：2006-09-14
申请号：PCT/US2006/008452
申请日：2006-03-08
申请人： AKRION, INC. , KASHKOUSH, Ismail , PEJMAN, Fani , KORBLER, John , VIVEK, Vohra , WALTER, Alan
发明人： KASHKOUSH, Ismail , PEJMAN, Fani , KORBLER, John , VIVEK, Vohra , WALTER, Alan
IPC分类号： B08B3/04
CPC分类号： B08B3/12 , H01L21/67051
摘要： A system and method for processing and/or cleaning substrates using sonic energy that eliminates or reduces damage to the substrates. In one aspect, the invention utilizes and produces low power density sonic energy to effectively remove particles from a substrate. In another aspect, the invention utilizes and generates a clean electrical signal for driving a source of sonic energy, such as a transducer.
摘要翻译：使用消除或减少对基底的损伤的声能处理和/或清洁基底的系统和方法。一方面，本发明利用并产生低功率密度的声能以有效地从基底去除颗粒。在另一方面，本发明利用并产生用于驱动声能源的清洁电信号，例如换能器。

7. 发明申请

WO2006055308A1 APPARATUS AND METHOD FOR REMOVING TRACE AMOUNTS OF LIQUID FROM SUBSTRATES DURING SINGLE-SUBSTRATE PROCESSING 审中-公开
标题翻译：单基板加工过程中从基板上移除液体痕迹的装置和方法
公开(公告)号：WO2006055308A1
公开(公告)日：2006-05-26
申请号：PCT/US2005/040251
申请日：2005-11-03
申请人： AKRION, INC. , WALTER, Alan
发明人： WALTER, Alan
IPC分类号： F26B5/08
CPC分类号： H01L21/68728 , H01L21/67034 , H01L21/68757
摘要： An apparatus and method for drying substrates in single-wafer processing chambers by providing capillary material at those areas where the substrate contacts a rotatable support. The capillary material will draw in, by capillary force, any liquid that is trapped between the substrate and the support at the areas of contact, thus reducing the edge exclusion area of the substrate and incresing yield. The inventive apparatus, in one aspect, comprises : a rotatable support comprising a fixture for supporting a substrate in a substantially horizontal orientation by contacting only a perimeter region of a substrate; the fixture comprising one or more contact surfaces that contact surfaces comprise a capillary material.
摘要翻译：一种用于在单晶片处理室中干燥基板的装置和方法，该方法是在基板接触可旋转支撑件的那些区域处提供毛细管材料。毛细管材料将通过毛细管力吸入在接触区域被捕获在衬底和支撑体之间的任何液体，从而减少衬底的边缘排除面积并且增加产量。本发明的装置在一个方面包括：可旋转支撑件，其包括用于通过仅接触基板的周边区域而以基本水平的取向支撑基板的固定装置; 包括接触表面的一个或多个接触表面的夹具包括毛细管材料。

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