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1. 发明申请

WO2022165400A1 A METHOD FOR FOCUSING AN ELECTRON BEAM ON A WAFER HAVING A TRANSPARENT SUBSTRATE 审中-公开
公开(公告)号：WO2022165400A1
公开(公告)日：2022-08-04
申请号：PCT/US2022/014669
申请日：2022-02-01
申请人： APPLIED MATERIALS ISREAL LTD. , APPLIED MATERIALS, INC.
发明人： BADER, Arie , NUNA, Tamir
IPC分类号： G01N23/2251 , H01J37/21 , H01J37/26 , H01L21/66
摘要： A method, a non-transitory computer readable medium and a system for focusing an electron beam. The method may include focusing the electron beam on at least one evaluated area of a wafer, based on a height parameter of each one of the at least one evaluated area. The wafer includes a transparent substrate. The height parameter of each one of the at least one evaluated area is determined based on detection signals generated as a result of an illumination of one or more height-measured areas of the wafer with a beam of photons. The illumination occurs while one or more supported areas of the wafer contact one or more supporting elements of a chuck, and while each one of the one or more height-measured areas are spaced apart from the chuck by a distance that exceeds a depth of field of the optics related to the beam of photons.

2. 发明申请

WO2020139720A1 SOLID-STATE ELECTRONIC SCANNING LASER ARRAY WITH HIGH-SIDE AND LOW-SIDE SWITCHES FOR INCREASED CHANNELS 审中-公开
公开(公告)号：WO2020139720A1
公开(公告)日：2020-07-02
申请号：PCT/US2019/067667
申请日：2019-12-19
申请人： OUSTER, INC.
发明人： PACALA, Angus , SHU, Marvin Liu
IPC分类号： G01C3/08 , G01S17/06 , G01S17/93
摘要： An electronically scanning emitter array that includes a two-dimensional array of light emitters arranged in k emitter banks. Each of the k emitter banks can include a subset of the light emitters in the two-dimensional array and can be independently operable to emit light from its subset of emitters. The electronically scanning emitter array can further include first and second capacitor banks coupled to provide energy to the two-dimensional array of light emitters and emitter array driving circuitry coupled to the first and second capacitor banks and to the k emitter banks. Each of the first and second capacitor banks can include at least one capacitor. The emitter array driving circuitry can include a first high-side switch coupled between the first capacitor bank and a voltage source, a second high-side switch coupled between the second capacitor bank and the voltage source, and k/2 low-side switches coupled between the k emitter banks and ground; and the emitter driving circuitry can be configured to fire one emitter bank in the k emitter banks at a time according to a firing sequence until each of the k emitter banks are fired.

3. 发明申请

WO2016037195A1 MEDIA STREAMING METHODS, APPARATUS AND SYSTEMS 审中-公开
标题翻译：媒体流程方法，装置和系统
公开(公告)号：WO2016037195A1
公开(公告)日：2016-03-10
申请号：PCT/US2015/050012
申请日：2015-09-14
申请人： AIRA TECH CORPORATION
发明人： KANUGANTI, Suman , CHANG, Yuja , BOCK, Lawrence
IPC分类号： H04N7/18
CPC分类号： G09B21/001 , G06K9/00624 , G09B21/003 , G09B21/006 , H04M1/72588 , H04N7/183 , H04N21/25841 , H04N21/2743 , H04N21/4223 , H04N21/8545
摘要： Techniques and systems are provided for assisting a user through a guidance mode activity. Such a user may be visually or otherwise impaired, or a user requiring help for other reasons. In some embodiments, a client device, held or worn by the user, may comprise a video capture device and several sensors, and may send video data and sensor data to a server. The server may comprise a processor and artificial intelligence. The server may send the video data and sensor data to an agent device. The agent device may provide content for display on an agent interface. An agent may view the agent interface, and assist the user in real time through audio instructions or other feedback.
摘要翻译：技术和系统被提供用于通过引导模式活动来帮助用户。这样的用户可能是视觉上或其他方式受损，或者由于其他原因需要帮助的用户。在一些实施例中，由用户保持或佩戴的客户端设备可以包括视频捕获设备和若干传感器，并且可以将视频数据和传感器数据发送到服务器。服务器可以包括处理器和人工智能。服务器可以将视频数据和传感器数据发送到代理设备。代理设备可以提供用于在代理接口上显示的内容。代理可以查看代理界面，并通过音频指令或其他反馈实时帮助用户。

4. 发明申请

WO2014039116A1 PLUG CONNECTOR MODULES 审中-公开
标题翻译：插头连接器模块
公开(公告)号：WO2014039116A1
公开(公告)日：2014-03-13
申请号：PCT/US2013/038008
申请日：2013-04-24
申请人： APPLE INC.
发明人： GOLKO, Albert J. , STANLEY, Craig M. , THOMPSON, Paul J. , JONES, Warren Z. , KAMEI, Ibuki
IPC分类号： H01R13/648
CPC分类号： H01R13/648 , H01R13/6594 , H01R13/6658 , H01R24/60 , H01R29/00 , H01R43/24
摘要： A plug connector module that includes a metal frame having a base portion, an insertion end and a cavity that extends from the base portion into the insertion end. The insertion end is configured to be inserted into a cavity of a corresponding receptacle connector. A substrate extends through the base portion of the frame and into the insertion end and has a plurality of contact bonding pads at one end positioned within the frame, a plurality of conductor bonding pads at the opposing end and at least one ground pad contact between the contact bonding pads and conductor bonding pads. A first plurality of external contacts is positioned in a first opening and bonded to some of the plurality of contact bonding pads on the substrate and a second plurality of contacts positioned within a second opening and bonded to some of the contact bonding pads on the substrate.
摘要翻译：一种插头连接器模块，其包括金属框架，所述金属框架具有基部，插入端和从基部延伸到插入端的空腔。插入端构造成插入到相应的插座连接器的空腔中。衬底延伸穿过框架的基部并进入插入端，并且在位于框架内的一端具有多个接触焊盘，在相对端处具有多个导体接合焊盘，以及至少一个接地焊盘接触点接触焊盘和导体接合焊盘。第一多个外部触头位于第一开口中并且接合到衬底上的多个接触焊盘中的一些，以及位于第二开口内的第二多个触点并且接合到衬底上的一些接触焊盘。

5. 发明申请

WO2013081704A1 CONNECTORS FOR ELECTRONIC DEVICES 审中-公开
标题翻译：电子设备连接器
公开(公告)号：WO2013081704A1
公开(公告)日：2013-06-06
申请号：PCT/US2012/054318
申请日：2012-09-07
申请人： APPLE INC. , GOLKO, Albert J. , JOL, Eric S. , SCHMIDT, Mathias , FIENNES, Jesse J. , FIENNES, Hugo , TERLIZZI, Jeffrey J.
发明人： GOLKO, Albert J. , JOL, Eric S. , SCHMIDT, Mathias , FIENNES, Jesse J. , FIENNES, Hugo , TERLIZZI, Jeffrey J.
IPC分类号： H01R29/00 , H01R13/642
CPC分类号： H01R24/60 , H01R13/642 , H01R29/00 , H01R2201/06
摘要： A dual orientation connector having a connector tab with first and second major opposing sides and a plurality of electrical contacts carried by the connector tab. The plurality of contacts includes a first set of external contacts formed at the first major side and a second set of external contacts formed at the second major side. The first plurality of contacts are symmetrically spaced with the second plurality of contacts and the connector tab is shaped to have 180 degree symmetry so that it can be inserted and operatively coupled to a corresponding receptacle connector in either of two insertion orientations.
摘要翻译：一种双向连接器，具有具有第一和第二主要相对侧面的连接器接头以及由连接器接头承载的多个电触点。多个触点包括形成在第一主侧的第一组外部触点和形成在第二主侧的第二组外部触点。第一组多个触点与第二组多个触点对称地间隔开，并且连接器凸片成形为具有180度对称性，使得其可以插入并且在两个插入取向中的任一个中可操作地连接到相应的插座连接器。

6. 发明申请

WO2011139435A2 HIGH-TEMPERATURE SELECTIVE DRY ETCH HAVING REDUCED POST-ETCH SOLID RESIDUE 审中-公开
标题翻译：具有减少后固化残留物的高温选择性干燥剂
公开(公告)号：WO2011139435A2
公开(公告)日：2011-11-10
申请号：PCT/US2011/030582
申请日：2011-03-30
申请人： APPLIED MATERIALS, INC. , THADANI, Kiran V. , TANG, Jing , INGLE, Nitin , YANG, Dongqing
发明人： THADANI, Kiran V. , TANG, Jing , INGLE, Nitin , YANG, Dongqing
IPC分类号： H01L21/3065
CPC分类号： H01L21/31116 , H01J37/32357
摘要： Methods of dry etching silicon-containing dielectric films are described. The methods include maintaining a relatively high temperature of the dielectric films while etching in order to achieve reduced solid residue on the etched surface. Partially or completely avoiding the accumulation of solid residue increases the etch rate.
摘要翻译：描述了干法蚀刻含硅介电膜的方法。这些方法包括在蚀刻时保持电介质膜的较高温度，以便在蚀刻表面上实现减少的固体残余物。部分或完全避免固体残余物的积累增加了蚀刻速率。

7. 发明申请

WO2011115761A2 INVERTABLE PATTERN LOADING WITH DRY ETCH 审中-公开
标题翻译：无法模式加载干燥刻蚀
公开(公告)号：WO2011115761A2
公开(公告)日：2011-09-22
申请号：PCT/US2011/027221
申请日：2011-03-04
申请人： APPLIED MATERIALS, INC. , TANG, Jing , INGLE, Nitin , YANG, Dongqing , VENKATARAMAN, Shankar
发明人： TANG, Jing , INGLE, Nitin , YANG, Dongqing , VENKATARAMAN, Shankar
IPC分类号： H01L21/3065
CPC分类号： H01L21/31116 , H01J37/32091
摘要： A method of etching silicon oxide from a narrow trench and a wide trench (or open area) is described which allows the etch in the wide trench to progress further than the etch in the narrow trench. The method includes two dry etch cycles. The first dry etch cycle involves a low intensity or abbreviated sublimation step which leaves solid residue in the narrow trench. The remaining solid residue inhibits etch progress in the narrow trench during the second dry etch cycle allowing the etch in the wide trench to overtake the etch in the narrow trench.
摘要翻译：描述了从窄沟槽和宽沟槽（或开口区域）蚀刻氧化硅的方法，其允许宽沟槽中的蚀刻比窄沟槽中的蚀刻更进一步。该方法包括两个干法蚀刻循环。第一次干蚀刻循环涉及低强度或缩短的升华步骤，在狭窄的沟槽中留下固体残余物。剩余的固体残余物在第二干法蚀刻循环期间抑制了窄沟槽中的蚀刻进程，从而允许宽沟槽中的蚀刻超过了窄沟槽中的蚀刻。

8. 发明申请

WO2003089681A3 MIXED FREQUENCY HIGH TEMPERATURE NITRIDE CVD PROCESS 审中-公开
公开(公告)号：WO2003089681A3
公开(公告)日：2003-10-30
申请号：PCT/US2003/012437
申请日：2003-04-17
申请人： APPLIED MATERIALS, INC.
发明人： TANG, Sum-Yee, Betty , WANG, Yuxiang, May , D'CRUZ, Lester
IPC分类号： C23C16/34
摘要： A mixed-frequency, high temperature PECVD process is utilized to create a high quality silicon nitride layer having highly conformal properties. Deposition in an ammonia rich ambient at high temperature reduces microloading between dense and isolated features by improving surface mobility of precursors. High quality nitride films formed by the instant process are particularly suited for front-end applications such as the formation of spacer structures and the formation of contact etch stop layers.

9. 发明申请

WO2023009295A1 TEMPERATURE-CONTROLLED SURFACE WITH A CRYO-NANOMANIPULATOR FOR IMPROVED DEPOSITION RATE 审中-公开
公开(公告)号：WO2023009295A1
公开(公告)日：2023-02-02
申请号：PCT/US2022/036530
申请日：2022-07-08
申请人： APPLIED MATERIALS ISRAEL LTD. , APPLIED MATERIALS, INC.
发明人： ZUR, Yehuda
IPC分类号： H01L21/66 , G01N23/225
摘要： A method of depositing material over a sample in a deposition region of the sample with a charged particle beam column, the method comprising: positioning a sample within a vacuum chamber such that the deposition region is under a field of view of the charged particle beam column; cooling the deposition region by contacting the sample with a cyro-nanomanipulator tool in an area adjacent to the deposition region; injecting a deposition precursor gas into the vacuum chamber at a location adjacent to the deposition region; generating a charged particle beam with a charged particle beam column and focusing the charged particle beam on the sample; and scanning the focused electron beam across the localized region of the sample to activate molecules of the deposition gas that have adhered to the sample surface in the deposition region and deposit material on the sample within the deposition region

10. 发明申请

WO2022231673A1 BACK-SCATTER ELECTRONS (BSE) IMAGING WITH A SEM IN TILTED MODE USING CAP BIAS VOLTAGE 审中-公开
公开(公告)号：WO2022231673A1
公开(公告)日：2022-11-03
申请号：PCT/US2022/013479
申请日：2022-01-24
申请人： APPLIED MATERIALS ISRAEL LTD. , APPLIED MATERIALS, INC.
发明人： ZUR, Yehuda , PETROV, Igor
IPC分类号： G01N23/2251 , G01N23/203 , H01J37/05 , H01J37/244 , H01J37/28
摘要： A method of evaluating a region of a sample, the method comprising: positioning a sample within a vacuum chamber; generating an electron beam with a scanning electron microscope (SEM) column that includes an electron gun at one end of the column and a column cap at an opposite end of the column; focusing the electron beam on the sample and scanning the focused electron beam across the region of the sample, while the SEM column is operated in tilted mode, thereby generating secondary electrons and backscattered electrons from within the region; and during the scanning, collecting backscattered electrons with one or more detectors while applying a negative bias voltage to the column cap to alter a trajectory of the secondary electrons preventing the secondary electrons from reaching the one or more detectors.

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