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1. 发明申请

WO2022260784A1 BATH SYSTEMS AND METHODS THEREOF 审中-公开
公开(公告)号：WO2022260784A1
公开(公告)日：2022-12-15
申请号：PCT/US2022/027865
申请日：2022-05-05
申请人： TOKYO ELECTRON LIMITED , TOKYO ELECTRON U.S. HOLDINGS, INC.
发明人： CARCASI, Michael , SIMMS, Ihsan , ESTRELLA, Joel , ROTONDARO, Antonio Luis Pacheco , HOOGE, Joshua , MARUMOTO, Hiroshi
IPC分类号： H01L21/67
摘要： A method of processing a plurality of substrates includes immersing the plurality of substrates into a bath solution contained in a bath chamber; generating gas bubbles in the bath solution; projecting light from a light source toward the bath chamber; generating light sensor data by capturing light emanating off the bath chamber after interacting with the gas bubbles with a light sensor; and converting the light sensor data into a metric for the bath solution.

2. 发明申请

WO2021183332A1 LONG WAVE INFRARED THERMAL SENSOR FOR INTEGRATION INTO TRACK SYSTEM 审中-公开
公开(公告)号：WO2021183332A1
公开(公告)日：2021-09-16
申请号：PCT/US2021/020577
申请日：2021-03-03
申请人： TOKYO ELECTRON LIMITED , TOKYO ELECTRON U.S. HOLDINGS, INC.
发明人： CARCASI, Michael , SHIBA, Kazuhiro , TADOKORO, Masahide , ENOMOTO, Masashi , TSURUDA, Toyohisa
IPC分类号： H01L21/67 , H01L21/687 , G01J5/10 , G01J5/12
摘要： Various embodiments of systems and methods for monitoring thermal characteristics of substrates, substrate processes and/or substrate processing module components are disclosed herein. More specifically, the present disclosure provides various embodiments of a thermal imaging sensor within various substrate processing modules (e.g., a liquid dispense module, a baking module or combined bake module, an interface block, a wafer inspection system (WIS) module, a plating dispense module or another processing module) of a substrate processing system. By positioning the thermal imaging sensor at various locations within the substrate processing system, the present disclosure enables thermal data to be remotely collected from the substrate surface, a liquid dispensed onto the substrate surface, a processing space surrounding the substrate, or a component included within a substrate processing module (e.g., a liquid dispense nozzle, a spin chuck, a spin coat cup, a cooling arm, a WIS component, a heating component, etc.).

3. 发明申请

WO2021076320A1 SYSTEMS AND METHODS FOR MONITORING ONE OR MORE CHARACTERISTICS OF A SUBSTRATE 审中-公开
公开(公告)号：WO2021076320A1
公开(公告)日：2021-04-22
申请号：PCT/US2020/053302
申请日：2020-09-29
申请人： TOKYO ELECTRON LIMITED , TOKYO ELECTRON U.S. HOLDINGS, INC.
发明人： CARCASI, Michael , SOMERVELL, Mark , HOOGE, Joshua , TADOKORO, Masahide
IPC分类号： H01L21/66 , H01L21/67 , G01B11/06 , H01L21/677
摘要： A substrate inspection system is provided to monitor characteristics of a substrate, while the substrate is disposed within (or being transferred into/out of) a processing unit of a liquid dispense substrate processing system. The inspection system is integrated within a liquid dispense substrate processing system and includes one or more optical sensors of a reflectometer (such as a spectrometer or laser-based transceiver) configured to obtain spectral data from a substrate. A controller is coupled to receive the spectral data from the optical sensors(s). The one or more optical sensors (or one or more optical fibers coupled to the rest of the optical sensor hardware) are coupled at locations within the substrate processing system. The controller analyzes the spectral data received from the optical sensors(s) to detect characteristic(s) of the substrate including, but not limited to, film thickness (FT), refractive index changes, and associated critical dimension (CD) changes.

4. 发明申请

WO2015148637A1 THIN FILM SOLAR CELLS WITH METALLIC GRID CONTACTS 审中-公开
标题翻译：薄膜太阳能电池与金属网格接触
公开(公告)号：WO2015148637A1
公开(公告)日：2015-10-01
申请号：PCT/US2015/022442
申请日：2015-03-25
申请人： TEL SOLAR AG
发明人： MULTONE, Xavier , STEINHAUSER, Jerome , VALLAT-SAUVAIN, Evelyne , MEIER, Johannes
IPC分类号： H01L31/0224 , H01L31/0236 , H01L31/04
CPC分类号： H01L31/022425 , H01L31/022466 , H01L31/0392 , Y02E10/50
摘要： An improved solar cell is disclosed having metallic grid contacts alone, or in combination with a transparent conductive oxide (TCO) contact layer or a p-oxide contact layer. A method of forming such solar cells is also disclosed. Metallic grid contacts, with or without transparent conductive oxide (TCO) layer or p-oxide contact layer can be used with various types of thin film solar cell current-generating layer stacks, and optionally combined with textured, diffusing, or patterned or imprinted glass substrates for improved solar cell electrical and optical characteristics.
摘要翻译：公开了一种改进的太阳能电池，其单独具有金属栅极触点，或者与透明导电氧化物（TCO）接触层或p-氧化物接触层组合。还公开了一种形成这种太阳能电池的方法。具有或不具有透明导电氧化物（TCO）层或p-氧化物接触层的金属栅极触点可用于各种类型的薄膜太阳能电池电流产生层堆叠，并且可选地与织构化，扩散或图案化或印刷玻璃组合用于改善太阳能电池电气和光学特性的基板。

5. 发明申请

WO2013049694A1 PLASMA TUNING RODS IN MICROWAVE PROCESSING SYSTEMS 审中-公开
标题翻译：微波加工系统中的等离子体调谐棒
公开(公告)号：WO2013049694A1
公开(公告)日：2013-04-04
申请号：PCT/US2012/058088
申请日：2012-09-28
申请人： TOKYO ELECTRON LIMITED , TOKYO ELECTRON U.S. HOLDINGS, INC.
发明人： ZHAO, Jianping , CHEN, Lee , FUNK, Merritt , IWAO, Toshihiko , VENTZEK, Peter
IPC分类号： H01J37/32
CPC分类号： H01J37/32192 , H01J37/32247 , H01J37/32256 , Y10T29/49002
摘要： The invention provides a plurality of plasma tuning rod subsystems. The plasma tuning rod subsystems can comprise one or more microwave cavities configured to couple electromagnetic (EM) energy in a desired EM wave mode to a plasma by generating resonant microwave energy in one or more plasma tuning rods within and/or adjacent to the plasma. One or more microwave cavity assemblies can be coupled to a process chamber, and can comprise one or more tuning spaces/cavities. Each tuning space/cavity can have one or more plasma tuning rods coupled thereto. Some of the plasma tuning rods can be configured to couple the EM energy from one or more of the resonant cavities to the process space within the process chamber and thereby create uniform plasma within the process space.
摘要翻译：本发明提供了多个等离子体调谐棒子系统。等离子体调谐杆子系统可以包括一个或多个微波空腔，其被配置为通过在等离子体内和/或邻近等离子体中的一个或多个等离子体调谐杆中产生共振微波能量将所期望的EM波模式中的电磁（EM）能量耦合到等离子体。一个或多个微波空腔组件可以耦合到处理室，并且可以包括一个或多个调谐空间/空腔。每个调谐空间/空腔可以具有耦合到其上的一个或多个等离子体调谐杆。等离子体调谐棒中的一些可被配置为将EM能量从一个或多个谐振腔耦合到处理室内的处理空间，从而在工艺空间内产生均匀的等离子体。

6. 发明申请

WO2023022825A1 RAMAN SENSOR FOR SUPERCRITICAL FLUIDS METROLOGY 审中-公开
公开(公告)号：WO2023022825A1
公开(公告)日：2023-02-23
申请号：PCT/US2022/037464
申请日：2022-07-18
申请人： TOKYO ELECTRON LIMITED , TOKYO ELECTRON U.S. HOLDINGS, INC.
发明人： MALEEV, Ivan
IPC分类号： G01N21/65 , G01N21/41 , G01J3/44 , G01B11/02 , H01L21/66 , H01L21/67 , H01L21/02
摘要： An apparatus includes a measurement chamber configured to retain one or more sample substances. The apparatus includes an entrance window mounted on a side of the measurement chamber. The apparatus includes a light source configured to generate an incident light beam. The apparatus includes a Raman sensor configured to collect inelastically scattered light from the chamber, and measure an intensity of a Raman peak of a first substance from the one or more sample substances based on the collected inelastically scattered light. The apparatus further includes a processor configured to (i) calculate a concentration of the first substance based on at least the measured intensity of the Raman peak of the first substance, (ii) determine the end point of a wafer cleaning process based on a calculated concentration of the first substance, and (iii) terminate the wafer cleaning process based on the determined end point.

7. 发明申请

WO2022265733A1 WAFER BATH IMAGING 审中-公开
公开(公告)号：WO2022265733A1
公开(公告)日：2022-12-22
申请号：PCT/US2022/028276
申请日：2022-05-09
申请人： TOKYO ELECTRON LIMITED , TOKYO ELECTRON U.S. HOLDINGS, INC.
发明人： ESTRELLA, Joel , SIMMS, Ihsan , CARCASI, Michael , HOOGE, Joshua , MARUMOTO, Hiroshi
IPC分类号： H01L21/67 , G06T7/11 , G06T7/00
摘要： An exemplary method of monitoring a bath process includes processing a first wafer by submerging the first wafer within a bath solution; capturing a video of the bath solution containing the first wafer during a first time interval; analyzing the video based on intensity of light captured in a frame of the video; and based on analyzing the video, determining a first metric of the bath solution during the first time interval.

8. 发明申请

WO2022072048A1 QUANTIFICATION OF PROCESSING CHAMBER SPECIES BY ELECTRON ENERGY SWEEP 审中-公开
公开(公告)号：WO2022072048A1
公开(公告)日：2022-04-07
申请号：PCT/US2021/043736
申请日：2021-07-29
申请人： TOKYO ELECTRON LIMITED , TOKYO ELECTRON U.S. HOLDINGS, INC.
发明人： ZHAO, Jianping , VENTZEK, Peter , SCHLECHTE, Charles , HUMMEL, Michael
IPC分类号： H01J37/32 , H01J49/00
摘要： A plasma processing system includes a plasma chamber configured to contain a plasma, a shutter chamber fluidically coupled to the plasma chamber via a first orifice, a mass spectrometer fluidically coupled to the shutter chamber, and a shutter disposed in the shutter chamber between the first orifice and the mass spectrometer in the path of a particle beam. The first orifice is configured to generate the particle beam from the plasma using a pressure differential between the shutter chamber and the plasma chamber. The mass spectrometer includes an ionizer configured to ionize species of the particle beam by sweeping through a range of electron energies in a plurality of energy steps. The shutter is configured to open and close during each of the plurality of energy steps.

9. 发明申请

WO2020237016A1 OPTICAL DIAGNOSTICS OF SEMICONDUCTOR PROCESS USING HYPERSPECTRAL IMAGING 审中-公开
公开(公告)号：WO2020237016A1
公开(公告)日：2020-11-26
申请号：PCT/US2020/033939
申请日：2020-05-21
申请人： TOKYO ELECTRON LIMITED , TOKYO ELECTRON U.S. HOLDINGS, INC.
发明人： CHEN, Yan , XINKANG, Tian
IPC分类号： G01J3/443 , G01J3/02 , G01N21/73 , G01N21/15 , H01J37/32 , H01L21/66 , G01N21/17 , G01N21/84
摘要： Disclosed are embodiments of an improved apparatus and system, and associated methods for optically diagnosing a semiconductor manufacturing process. A hyperspectral imaging system is used to acquire spectrally-resolved images of emissions from the plasma, in a plasma processing system. Acquired hyperspectral images may be used to determine the chemical composition of the plasma and the plasma process endpoint. Alternatively, a hyperspectral imaging system is used to acquire spectrally-resolved images of a substrate before, during, or after processing, to determine properties of the substrate or layers and features formed on the substrate, including whether a process endpoint has been reached; or before or after processing, for inspecting the substrate condition.

10. 发明申请

WO2017172536A1 CONTROLLING DRY ETCH PROCESS CHARACTERISTICS USING WAFERLESS DRY CLEAN OPTICAL EMISSION SPECTROSCOPY 审中-公开
标题翻译：采用无辐射干洗光学发射光谱法控制干法蚀刻工艺特性
公开(公告)号：WO2017172536A1
公开(公告)日：2017-10-05
申请号：PCT/US2017/024138
申请日：2017-03-24
申请人： TOKYO ELECTRON LIMITED , TOKYO ELECTRON U.S. HOLDINGS, INC.
发明人： COPPA, Brian J. , VEDHACHALAM, Deepak , DASSAPA, Francois C.
IPC分类号： H01L21/3065 , H01L21/66 , H01L21/02 , H01L21/67 , H05H1/46
CPC分类号： B08B7/0035 , B08B9/0865 , G01N21/73 , G01N21/94 , H01J37/32146 , H01J37/32669 , H01J37/32697 , H01J37/32862 , H01J37/32972 , H01J37/32981 , H01J2237/335 , H01L21/67023 , H01L21/67069 , H01L22/12
摘要： Described herein are architectures, platforms and methods for acquiring optical emission spectra from an optical emission spectroscopy system by flowing a dry cleaning gas into a plasma processing chamber of the plasma processing system and igniting a plasma in the plasma processing chamber to initiate the waferless dry cleaning process.
摘要翻译：这里描述的是用于通过使干净的清洁气体流入等离子体处理系统的等离子体处理室并且点燃等离子体中的等离子体来从光学发射光谱系统获取光学发射光谱的架构，平台和方法处理室开始无晶圆干洗过程。

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