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1. 发明申请

WO2012081865A3 CLEANING LIQUID COMPOSITION FOR PHOTOLITHOGRAPHY 审中-公开
标题翻译：清洗液相组合物用于光刻
公开(公告)号：WO2012081865A3
公开(公告)日：2012-09-07
申请号：PCT/KR2011009526
申请日：2011-12-12
申请人： DONGJIN SEMICHEM CO LTD , OH SEUNG-KEUN , LEE JAE-WOO , LEE JUNG-YOUL , KIM JEONG-SIK , KIM JAE-HYUN
发明人： OH SEUNG-KEUN , LEE JAE-WOO , LEE JUNG-YOUL , KIM JEONG-SIK , KIM JAE-HYUN
IPC分类号： C11D3/37 , G03F7/42
CPC分类号： C11D3/43 , C11D3/378 , G03F7/425 , G03F7/426
摘要： Disclosed is a cleaning liquid composition for preventing resist scum formation and pattern collapse, which can occur when a photoresist pattern is formed, and for preventing (improving) an increase in linewidth roughness (LWR). The cleaning liquid composition comprises: water-soluble polymers including a repeated unit that is represented by chemical formula 1 of claim 1; a surfactant; and a solvent.
摘要翻译：本发明公开了一种清洁液体组合物，用于防止形成光致抗蚀剂图案时可能发生的抗蚀剂浮渣形成和图案坍塌，并防止（改善）线宽粗糙度（LWR）的增加。清洁液体组合物包含：包含由权利要求1的化学式1表示的重复单元的水溶性聚合物; 表面活性剂; 和溶剂。

2. 发明申请

WO2012064097A3 PHOTORESIST TOPCOAT COMPOSITION FOR EXTREME ULTRAVIOLET LITHOGRAPHY, AND PATTERN-FORMING METHOD USING SAME 审中-公开
标题翻译：用于极端超紫外线光刻的光电复合材料组合物和使用其的图案形成方法
公开(公告)号：WO2012064097A3
公开(公告)日：2012-09-07
申请号：PCT/KR2011008498
申请日：2011-11-09
申请人： DONGJIN SEMICHEM CO LTD , LEE JAE WOO , OH SEUNG KEUN , LEE JUNG YOUL , KIM JEONG SIK , KIM JAE HYUN
发明人： LEE JAE WOO , OH SEUNG KEUN , LEE JUNG YOUL , KIM JEONG SIK , KIM JAE HYUN
IPC分类号： G03F7/004 , H01L21/027
CPC分类号： H01L21/0271 , G03F7/091 , G03F7/11
摘要： Disclosed are a photoresist topcoat for use in a mask for extreme ultraviolet lithography, and a composition for preparing the photoresist topcoat. The composition for preparing the photoresist topcoat comprises: a) 100 parts by weight of a water-soluble binder resin; b) 0.01 to 30 parts by weight of an ultraviolet screening agent for screening out-of-extreme-ultraviolet-band radiation; and c) 1,000 to 10,000 parts by weight of a protic solvent. When the photoresist topcoat of the present invention is used, defects of a circuit pattern caused by out-of-band ultraviolet rays of extreme ultraviolet lithography may be remarkably reduced and a rough line width may be improved.
摘要翻译：公开了用于极紫外光刻用掩模的光致抗蚀剂外涂层和用于制备光致抗蚀剂外涂层的组合物。用于制备光致抗蚀剂顶涂层的组合物包括：a）100重量份的水溶性粘合剂树脂; b）0.01至30重量份用于筛选超临界紫外线辐射的紫外线屏蔽剂; 和c）1,000至10,000重量份的质子溶剂。当使用本发明的光致抗蚀剂外涂层时，可以显着降低由极紫外光刻的带外紫外线引起的电路图案的缺陷，并且可以提高粗线宽度。

3. 发明申请

WO2011014011A9 PHOTORESIST COMPOSITION COMPRISING A CROSSLINKABLE CURING SUBSTANCE 审中-公开
标题翻译：包含可交联固化物质的光电组合物
公开(公告)号：WO2011014011A9
公开(公告)日：2011-03-24
申请号：PCT/KR2010004969
申请日：2010-07-28
申请人： DONGJIN SEMICHEM CO LTD , JANG EU-JEAN , LEE JUN-GYEONG , HAN DONG-WOO , KIM JEONG-SIK , LEE JUNG-YOUL , LEE JAE-WOO , KIM DEOG-BAE , KIM JAE-HYUN
发明人： JANG EU-JEAN , LEE JUN-GYEONG , HAN DONG-WOO , KIM JEONG-SIK , LEE JUNG-YOUL , LEE JAE-WOO , KIM DEOG-BAE , KIM JAE-HYUN
IPC分类号： G03F7/032 , G03F7/004
CPC分类号： G03F7/0035 , G03F7/0382 , G03F7/405
摘要： Disclosed is a photoresist composition comprising a crosslinkable curing substance, able to form a pattern-protecting film on the surface of a photoresist pattern by first forming a photoresist pattern and then heating or exposing to light and heat, in a pattern-forming method employing the double patterning technique. The photoresist composition comprises: from 3 to 30 wt.% of a light-sensitive polymer; from 0.5 to 75 parts by weight of a crosslinking curing agent or agents represented by Chemical formula 1 and/or Chemical formula 2 of Claim 1, with respect to 100 parts by weight of the light-sensitive polymer; from 0.05 to 15 parts by weight of a photoacid generator, with respect to 100 parts by weight of the light-sensitive polymer; and a balance of solvent.
摘要翻译：公开了包含可交联固化物质的光致抗蚀剂组合物，其能够通过首先形成光致抗蚀剂图案然后加热或暴露于光和热而在光致抗蚀剂图案的表面上形成图案保护膜，图案形成方法使用双重图案化技术。光致抗蚀剂组合物包含：3至30重量％的光敏聚合物; 相对于100重量份的光敏聚合物，0.5至75重量份的交联固化剂或由化学式1和/或权利要求1的化学式2表示的试剂; 相对于100重量份的光敏聚合物，为0.05〜15重量份的光酸发生剂; 和溶剂的平衡。

4. 发明申请

WO2006009348A1 SLIDE-TYPE RANGE HOOD 审中-公开
标题翻译：幻灯片类型
公开(公告)号：WO2006009348A1
公开(公告)日：2006-01-26
申请号：PCT/KR2005/001087
申请日：2005-04-14
申请人： DAE SUNG ENGINEERING & RESEARCH CO., LTD , KIM, Jeong, Sik
发明人： KIM, Jeong, Sik
IPC分类号： F24F7/06
CPC分类号： F24C15/2092 , F24C15/2028
摘要： Disclosed herein is a slide-type range hood. The range hood is constructed so that a slider (30) is mounted to the lower portion of a hood housing (21) to be pushed into or pulled out from the hood housing, an exhaust fan (24) is installed in the hood housing and operated to suck odors or the like from a room through exhaust filters mounted to the bottom of the hood housing and the slider, prior to discharging the odors through a backdraft exhaust damper (23) to the atmosphere, an air supply housing (50) having an air supply fan (53) is mounted on the hood housing, and a front injection trough having a nozzle is mounted to the front of the slider, thus jetting exterior air, drawn by the operation of the air supply fan, through the nozzle, therefore forming an air curtain under the front of the range hood.
摘要翻译：这里公开了一种滑盖式抽油烟机。抽油烟机构造成使得滑块（30）安装到发动机罩壳体（21）的下部以被推入或从发动机罩壳体中拉出，排气扇（24）安装在发动机罩壳体中，通过安装在发动机罩壳体和滑块的底部的排气过滤器在将气味通过反气流排气风门（23）排放到大气之前从房间吸入气味等;空气供应壳体（50），其具有在发动机罩壳体上安装有供气风扇53，并且具有喷嘴的前喷射槽安装在滑块的前部，从而通过喷嘴喷射由供气风扇的操作引起的外部空气，因此在抽油烟机前面形成一个气帘。

5. 发明申请

WO2005076307A1 SHADOW-MASK MADE BY ELECTRO-FORMING MASTER OF SHADOW-MASK HAVING A PIN PORTION, AND THE MANUFACTURING METHOD OF SHADOW-MASK 审中-公开
标题翻译：通过电子形成具有引脚部分的阴影的主体制成的阴影掩模，以及阴影掩模的制造方法
公开(公告)号：WO2005076307A1
公开(公告)日：2005-08-18
申请号：PCT/KR2004/000240
申请日：2004-02-07
申请人： GRAPHION TECHNOLOGIES USA, LLC , KIM, Jeong-Sik
发明人： KIM, Jeong-Sik
IPC分类号： H01J9/02
CPC分类号： H01J9/142 , H01J29/07
摘要： Disclosed is a shadow mask, capable of being repeatedly produced using an electro-forming master through an electro-forming process, and a method of manufacturing the same. The electro-forming master used for manufacturing the shadow mask includes an electrode base having an insulating part and a current-carrying part, and a plurality of metal layers formed on the current-carrying part of the electrode base through an electro-forming process and a plurality of exposure layers formed on the insulating part of the electrode base, each of which increases in height in a sequentially layering manner, in which the exposure layers are removed from the electrode base to form a depression part when the metal layers and the exposure layers reach predetermined heights, whereby the depression part is filled with an insulating material and the metal layers are removed from the electrode base, to form an insulating layer having a predetermined height.
摘要翻译：公开了一种能够通过电铸工艺使用电铸母机重复制造的荫罩及其制造方法。用于制造荫罩的电铸母头包括具有绝缘部分和载流部分的电极基体，以及通过电铸工艺形成在电极基体的载流部分上的多个金属层，形成在电极基体的绝缘部分上的多个曝光层，每个曝光层以依次分层的方式增加高度，其中当金属层和曝光时，从电极基底去除曝光层以形成凹陷部分层到达预定高度，由此凹陷部分填充有绝缘材料，并且金属层从电极基底移除，以形成具有预定高度的绝缘层。

6. 发明申请

WO2004064156A1 LAMINATE MADE BY ELECTRO-FORMING AND METHOD FOR MANUFACTURING THE SAME 审中-公开
标题翻译：通过电铸形成的层压体及其制造方法
公开(公告)号：WO2004064156A1
公开(公告)日：2004-07-29
申请号：PCT/KR2003/002856
申请日：2003-12-26
申请人： KIM, Jeong-Sik
发明人： KIM, Jeong-Sik
IPC分类号： H01L23/52
CPC分类号： C25D1/00 , C25D1/10 , H01L21/2885 , H01L21/76838
摘要： A method for manufacturing a laminated electroforming member includes the steps of forming a conducting portion on a surface of an electrode base at the same shape as that of the laminated electroforming member, forming an insulating portion insulated by an exposing portion of photoresist and interposed in the conducting portion, forming metal layers on the conducting portion by repeatedly performing an electroforming process in the electrode base, forming exposing portions in the insulating portion by repeatedly performing an exposing process, the height of the exposing portions and the height of the metal layers being increased as they are repeatedly formed in turn, and removing the metal layers from the electrode base when the metal layers and the exposing portions reach a certain height. The layering process is repeated two or more times. If the exposing portions are formed at the same position as that of the first exposing portion, the electroforming member has a linear shaped section. However, if not so, the electroforming member has various curved sections, not linear shaped section.
摘要翻译：一种叠层电铸件的制造方法包括以下步骤：在电极基体的表面形成与层压电铸件相同形状的导电部分，形成由光致抗蚀剂的曝光部分绝缘的绝缘部分，通过在电极基体中重复进行电铸工序，在导电部分上形成金属层，通过重复进行曝光工艺，在绝缘部分形成曝光部分，使曝光部分的高度和金属层的高度增加因为它们依次重复地形成，并且当金属层和暴露部分达到一定高度时，从电极基底去除金属层。分层过程重复两次或更多次。如果曝光部分形成在与第一曝光部分相同的位置处，则电铸部件具有线状部分。然而，如果不是这样，电铸部件具有各种弯曲部分，而不是直线形部分。

7. 发明申请

WO2004053975A1 CHIP-ON-FILM AND ITS METHODS OF MANUFACTURING BY ELECTRO-FORMING 审中-公开
标题翻译：芯片薄膜及其制备方法
公开(公告)号：WO2004053975A1
公开(公告)日：2004-06-24
申请号：PCT/KR2003/002726
申请日：2003-12-12
申请人： KIM, Jeong-Sik
发明人： KIM, Jeong-Sik
IPC分类号： H01L21/60
CPC分类号： H01L21/4846 , H01L21/4821 , H01L23/4985 , H01L2924/0002 , H01L2924/00
摘要： A chip-on-film and its manufacturing method are disclosed. The chip-on-film in which a thin base portion is attached to a minute pattern of thin metal is manufactured by including the steps of forming the minute pattern by performing an electro-forming process in an electro-forming process in an electro-forming master including an elecrrode base and an insulating hetero-portion having elasticity formed in the electrode base, forming the base, forming the base portion on the electro-forming master in an integral form with the minute pattern, and detaching the minute pattern and the base portion from the electro-forming master.
摘要翻译：公开了片上胶片及其制造方法。通过在电成膜中的电成型工序中进行电铸成形工序，制作将薄基部附着在细金属薄片上的片上胶片主电极包括电极基体和具有形成在电极基体中的弹性的绝缘异质部分，形成基底，以微小图案以整体形式在电成形母版上形成基部，并且分离微小图案和基底部分来自电铸主体。

8. 发明申请

WO2013036027A3 PHENOL-BASED SELF-CROSSLINKING POLYMER AND RESIST UNDERLAYER FILM COMPOSITION INCLUDING SAME 审中-公开
标题翻译：基于酚醛的自交联聚合物和电阻膜包括其中的胶片组合物
公开(公告)号：WO2013036027A3
公开(公告)日：2013-05-02
申请号：PCT/KR2012007102
申请日：2012-09-05
申请人： DONGJIN SEMICHEM CO LTD , KIM JEONG-SIK , KIM JAE-HYUN , LEE JAE-WOO
发明人： KIM JEONG-SIK , KIM JAE-HYUN , LEE JAE-WOO
IPC分类号： C08G61/00 , C08G65/38 , G03F7/004 , G03F7/11
CPC分类号： H01L21/0271 , C08G8/08 , C08G8/12 , C08G8/28 , C08G61/02 , C08G65/4006 , C08G65/48 , C08G65/485 , C08G73/0655 , C08G2261/135 , C08G2261/3424 , C08G2261/76 , C09D161/14 , C09D179/04 , G03F7/094
摘要： Disclosed are a phenol-based self-crosslinking polymer exhibiting a self-crosslinking reaction when heated even without an additive for hardening the polymer, and to a resist underlayer film composition including the phenol-based self-crosslinking polymer. The phenol-based self-crosslinking polymer is selected from the group consisting of a polymer represented by chemical formula 1, a polymer represented by chemical formula 2, and a polymer represented by chemical formula 3, which are set forth in the present description.
摘要翻译：公开了一种苯酚类自交联聚合物，即使没有用于固化聚合物的添加剂，也被加热而显示出自交联反应，以及含有酚系自交联聚合物的抗蚀剂下层膜组合物。酚系自交联聚合物选自由化学式1表示的聚合物，由化学式2表示的聚合物和由化学式3表示的聚合物组成的组，其在本说明书中阐述。

9. 发明申请

WO2008140226A1 METHOD FOR MANUFACTURING MOLTEN IRON COMPRISING NICKEL 审中-公开
标题翻译：制造含镍铁的方法
公开(公告)号：WO2008140226A1
公开(公告)日：2008-11-20
申请号：PCT/KR2008/002627
申请日：2008-05-09
申请人： POSCO , SEO, Sung-Mo , KEUM, Chang-Hun , HUH, Wan-Wook , LEE, Joung-Mo , KIM, Jeong-Sik , CHOI, Ju-Han
发明人： SEO, Sung-Mo , KEUM, Chang-Hun , HUH, Wan-Wook , LEE, Joung-Mo , KIM, Jeong-Sik , CHOI, Ju-Han
IPC分类号： C21B5/02
CPC分类号： C21B5/02 , C21B5/04
摘要： The present invention relates to a method for manufacturing molten iron containing nickel. The method for manufacturing molten iron containing nickel includes: i) providing sintered nickel ore by sintering nickel oxide ore; ii) charging a mixture containing the sintered nickel ore, coke, and at least one material selected from a group consisting of a material containing boron oxide and a material containing alumina into a blast furnace; iii) manufacturing slag and molten iron containing nickel by injecting hot gas into the blast furnace; and iv) tapping the slag and the molten iron containing nickel from the blast furnace.
摘要翻译：本发明涉及一种制造含镍的铁水的方法。制造含镍的铁水的方法包括：i）通过烧结氧化镍矿提供烧结镍矿; ii）将含有所述烧结镍矿石，焦炭和至少一种选自含氧化硼和含有氧化铝的材料的材料的混合物的混合物加入高炉中; iii）通过将热气体注入高炉来制造含镍的炉渣和铁水; 以及iv）从高炉中抽出炉渣和含镍的铁水。

10. 发明申请

WO2005092919A1 FLOWERING TIME-CONTROLLING GENE COG2 ISOLATED FROM ARABIDOPSIS THALIANA 审中-公开
标题翻译：从ARABIDOPSIS THALIANA分离的花粉时间控制基因COG2
公开(公告)号：WO2005092919A1
公开(公告)日：2005-10-06
申请号：PCT/KR2005/000910
申请日：2005-03-29
申请人： POSTECH FOUNDATION , NAM, Hong Gil , KIM, Jeong Sik , PARK, Don Ha , LIM, Pyung Ok
发明人： NAM, Hong Gil , KIM, Jeong Sik , PARK, Don Ha , LIM, Pyung Ok
IPC分类号： C07K14/415
CPC分类号： C12N15/827 , C07K14/415
摘要： A flowering time-controlling gene, COG2 , isolated from Arabidopsis thaliana , and a protein expressed therefrom delay the flowering time of a plant and, accordingly, are useful for improving a flowering-associated character of a plant and for the identification of other flowering-associated genes or proteins.
摘要翻译：从拟南芥分离的开花时间控制基因COG2和由其表达的蛋白质延迟植物的开花时间，因此可用于改善植物的开花相关特征，并且用于鉴定其他开花 - 相关基因或蛋白质。

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