专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

71. 发明申请

WO0190437A3 CONFIGURABLE VACUUM SYSTEM AND METHOD 审中-公开
标题翻译：可配置真空系统和方法
公开(公告)号：WO0190437A3
公开(公告)日：2002-05-30
申请号：PCT/US0116668
申请日：2001-05-22
申请人： BASIC RESOURCES INC , KIDD JERRY D , HARRINGTON CRAIG D , HOPKINS DANIEL N
发明人： KIDD JERRY D , HARRINGTON CRAIG D , HOPKINS DANIEL N
IPC分类号： C23C14/24 , C23C14/26 , C23C14/32 , C23C14/34 , C23C14/50 , H01J37/32 , H01J37/16
CPC分类号： H01J37/32422 , C23C14/26 , C23C14/32 , C23C14/505
摘要： An exemplary configurable vacuum system and method are provided for use in coating or plating that provides the capability to handle substrates of significantly different shapes and sizes. The configurable vacuum system includes a vacuum table assembly and a vacuum chamber. The vacuum table assembly may include a support frame, an insulated surface, a mechanical drive mounted to the support frame, an electrical feed through mounted to the support frame, a filament positioned above the insulated surface between a first filament conductor and a second filament conductor, a filament power connector electrically coupled to the first filament conductor through a first filament power contact pad of the filament power connector and to the second filament conductor through a second filament power contact pad of the filament power connector, and a platform operable to support the substrate. The vacuum chamber may include a vacuum chamber having a main opening at a door, a wall that defines an interior volume, a filament power connector, an electrical feed through connector, a mechanical drive connector, a railing operable to receive and support the vacuum table assembly within the internal volume of the vacuum chamber. The various connectors of the vacuum table assembly and vacuum chamber may automatically couple with one another.
摘要翻译：提供了用于涂覆或电镀中的示例性可配置真空系统和方法，其提供处理显着不同形状和尺寸的基底的能力。可配置的真空系统包括真空台组件和真空室。真空台组件可以包括支撑框架，绝缘表面，安装到支撑框架的机械驱动器，安装到支撑框架上的电子馈送，位于第一细丝导体和第二细丝导体之间的绝缘表面上方的细丝，灯丝电源连接器，其通过灯丝电源连接器的第一灯丝电源接触焊盘和第二灯丝导体通过灯丝电源连接器的第二灯丝电源接触焊盘电耦合到第一灯丝导体，以及平台，其可操作以支撑基质。真空室可以包括具有门的主开口的真空室，限定内部容积的壁，灯丝电源连接器，电馈通连接器，机械驱动连接器，可操作以接收和支撑真空表的栏杆在真空室的内部容积内组装。真空台组件和真空室的各种连接器可以自动地相互连接。

72. 发明申请

WO0067290A3 INTEGRATED MICROCOLUMN AND SCANNING PROBE MICROSCOPE ARRAYS 审中-公开
标题翻译：集成微波和扫描探针微阵列阵列
公开(公告)号：WO0067290A3
公开(公告)日：2001-03-08
申请号：PCT/US0012241
申请日：2000-05-04
申请人： ETEC SYSTEMS INC
发明人： MURAY LAWRENCE P , KIM HO-SEOB , CHANG T H PHILIP
IPC分类号： G01B7/30 , G01B7/00 , G01B21/30 , G01N23/225 , G01Q30/02 , G01Q60/00 , H01J37/16 , H01J37/28 , H01J37/317 , G03F9/00 , H01J37/304
CPC分类号： G01Q30/02 , H01J37/28 , H01J37/3174 , H01J2237/1205 , H01J2237/2818 , Y10S977/707 , Y10S977/849 , Y10S977/86 , Y10S977/869 , Y10S977/874 , Y10S977/881 , Y10S977/887
摘要： An apparatus for surface inspection and processing of a wafer (12) includes a microcolumn (14) and an associated scanning probe microscope (16). The microcolumn enables high speed scanning of the wafer at a relatively high resolution, while the scanning probe microscope provides atomic resolution of highly localized areas of the wafer. The microcolumn and scanning probe microscope can be partially fabricated out of the same substrate. Additionally, the microcolumn and scanning probe microscope can be a portion of an array of microcolumns and/or scanning probe microscopes. The apparatus may be used for imaging, lithography and spectroscopy.
摘要翻译：用于晶片（12）的表面检查和处理的设备包括微柱（14）和相关联的扫描探针显微镜（16）。微柱可以以相对高的分辨率高速扫描晶片，而扫描探针显微镜提供晶片的高度局部化区域的原子分辨率。微柱和扫描探针显微镜可以由相同的基底部分制成。另外，微柱和扫描探针显微镜可以是微柱阵列和/或扫描探针显微镜的一部分。该装置可用于成像，光刻和光谱学。

73. 发明申请

WO99045565A1 ELECTRON-BEAM MICROCOLUMN AS A GENERAL PURPOSE SCANNING ELECTRON MICROSCOPE 审中-公开
标题翻译：电子束微波作为一般用途扫描电子显微镜
公开(公告)号：WO99045565A1
公开(公告)日：1999-09-10
申请号：PCT/US1999/004472
申请日：1999-03-02
IPC分类号： H01J37/26 , G01Q30/02 , G01Q30/20 , G01Q70/08 , H01J37/16 , H01J37/28
CPC分类号： H01J37/28 , H01J2237/1205
摘要： A charged particle-beam microcolumn, which for example may be used for charged particle microscopy, with a T-shape configuration has a relatively narrow base structure supporting the beam forming charged particle optical column. The narrow base structure permits the T-shaped microcolumn and sample to be positioned at an angle other than normal with respect to each other, which allows generation of three-dimensional-like images of the sample surface. Thus, the incidence angle of the charged particle beam generated by the T-shaped microcolumn may be varied while a short working distance is maintained. A conventional secondary/backscattered charged particle detector may be used because the reflected angle of the charged particles allows a charged particle detector separated from the T-shaped microcolumn. Further, the small size of the T-shaped microcolumn permits observation of different parts of a large stationary sample by moving the T-shaped microcolumn with respect to the sample. Moreover, multiple T-shaped microcolumns may be arrayed to improve throughput.
摘要翻译：具有T形构造的例如可用于带电粒子显微镜的带电粒子束微柱具有支撑束形成带电粒子光学柱的相对狭窄的基底结构。狭窄的基部结构允许T形微柱和样品相对于彼此以正常的角度定位，这允许产生样品表面的三维样图像。因此，由T形微柱产生的带电粒子束的入射角可以变化，同时保持短的工作距离。可以使用常规的二次/反向散射带电粒子检测器，因为带电粒子的反射角允许带电粒子检测器与T形微柱分离。此外，T形微柱的小尺寸允许通过相对于样品移动T形微柱来观察大的固定样品的不同部分。此外，可以排列多个T形微柱以提高产量。

74. 发明申请

WO2023009287A1 SHAPED REPELLER FOR AN INDIRECTLY HEATED CATHODE ION SOURCE 审中-公开
公开(公告)号：WO2023009287A1
公开(公告)日：2023-02-02
申请号：PCT/US2022/036350
申请日：2022-07-07
申请人： APPLIED MATERIALS, INC.
发明人： PEREL, Alexander, S. , JOHNSON, Jay, S. , MADUNTS, Suren , MCLAUGHLIN, Adam, M. , WRIGHT, Graham
IPC分类号： H01J37/08 , H01J27/02 , H01J37/16 , H01J37/317
摘要： A system for extending the life of a repeller in an IHC ion source is disclosed. The system includes an IHC ion source wherein the back surface of the repeller has been shaped to reduce the possibility of electrical shorts. The separation distance between the back surface of the repeller and the chamber wall behind the repeller is increased along its outer edge, as compared to the separation distance near the center of the repeller. This separation distance reduces the possibility that deposited material will flake and short the repeller to the chamber wall. Further, in certain embodiments, the separation distance between the back surface of the repeller and the chamber wall near the center of the repeller is unchanged, so as to minimize the flow of gas that exits from the chamber. The back surface of the repeller may be tapered, stepped or arced to achieve these criteria.

75. 发明申请

WO2022215212A1 荷電粒子線装置および試料の解析方法审中-公开
公开(公告)号：WO2022215212A1
公开(公告)日：2022-10-13
申请号：PCT/JP2021/014821
申请日：2021-04-07
申请人：株式会社日立ハイテク
发明人：吉岡　正義 , 坂本　直樹 , 北山　真也
IPC分类号： H01J37/16 , H01J37/18 , H01J37/28 , H01J37/30 , H01J37/305
摘要：荷電粒子線装置（１）は、試料（ＳＡＭ）を保持した試料ホルダ（ＨＬ）がステージ（２３）上に設置された際に、コントローラによって実行される解析手段を備える。上記解析手段は、（ａ）ゲートバルブ（ＶＬ５）を開状態にし、バルブ（ＶＬ１）を開状態にし、バルブ（ＶＬ２）を閉状態にし、且つ、真空ポンプ（４０）を駆動することで、観察室（１０）および前処理室（２０）の各々の真空度を高くするステップ、（ｂ）前記ステップ（ａ）の後、ゲートバルブ（ＶＬ５）を閉状態にし、且つ、バルブ（ＶＬ２）を開状態にするステップ、（ｃ）前記ステップ（ｂ）の後、真空ポンプ（４０）によって前処理室（２０）の真空排気を行いながら、イオン源（２２）から試料（ＳＡＭ）へイオンビームを照射することで、試料（ＳＡＭ）の加工を行うステップ、を有する。上記解析手段によって、前処理室（２０）の真空排気を短時間で行った後、迅速に試料（ＳＡＭ）の加工を行える。

76. 发明申请

WO2022060536A1 AN AUTONOMOUS MICROFLUIDIC DEVICE FOR SAMPLE PREPARATION 审中-公开
公开(公告)号：WO2022060536A1
公开(公告)日：2022-03-24
申请号：PCT/US2021/047081
申请日：2021-08-23
申请人： INTELLIGENT VIRUS IMAGING INC
发明人： HAUSER, Janosch , KYLBERG, Gustaf , STEMME, Göran , SINTORN, Ida-Maria , ROXHED, Niclas
IPC分类号： B01L3/502738 , G01N1/30 , G01N1/31 , H01J37/16 , H01J37/20 , H01J37/252
摘要： The microfluidic device (100, 200) has a first reservoir (102, 202) that preferably includes a first liquid (108, 208). The first liquid (108, 208) is being held by a capillary stop valve (228, 230) in the first reservoir (102, 202). A second reservoir (104, 204) is in fluid communication with the first reservoir (102, 202). The second reservoir (104, 204) has a second liquid (110, 210) and a sample support (116, 216) disposed therein. The second reservoir (104, 204) has an inlet opening (145, 236) defined therein. A draining unit (106, 206) is adjacent to the second reservoir (104, 204). The draining unit (106, 206) is in fluid communication with the second reservoir (104, 204). The draining unit (106, 206) has a first absorption member (158, 218, 858) disposed therein.

77. 发明申请

WO2021126820A2 MODULAR GUN ASSEMBLY FOR MELT FURNACES 审中-公开
公开(公告)号：WO2021126820A2
公开(公告)日：2021-06-24
申请号：PCT/US2020/065060
申请日：2020-12-15
申请人： TITANIUM METALS CORPORATION
发明人： MAY, David, M.
IPC分类号： H01J37/305 , H01J37/065 , H01J37/16 , C22B9/228 , F27B5/04 , F27B5/14 , H01J2237/3128
摘要： An electron beam (EB) gun assembly for an EB furnace is provided. The EB gun assembly includes an EB gun-frame assembly including a skeleton frame (100) and at least one EB gun (22) mounted to the skeleton frame, and the EB gun-frame assembly is configured to rigidly mount onto a first EB chamber lid (40a) and melt material in a first EB chamber and be removed and rigidly mount onto a second EB chamber lid (40b) and melt material in a second EB chamber. In some forms, the EB gun assembly includes at least one mounting frame (120) and the at least one EB gun is mounted to the at least one mounting frame and the at least one mounting frame is mounted to the skeleton frame.

78. 发明申请

WO2019156770A1 EMBEDDED FEATURES FOR INTERLOCKS USING ADDITIVE MANUFACTURING 审中-公开
公开(公告)号：WO2019156770A1
公开(公告)日：2019-08-15
申请号：PCT/US2019/013014
申请日：2019-01-10
申请人： VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.
发明人： CHANEY, Craig R. , MCLAUGHLIN, Adam M.
IPC分类号： H01J37/317 , H01J37/16
摘要： The present disclosure describes a method and apparatus for determining whether components in a semiconductor manufacturing system are authorized for use in that system. By embedding an identification feature in the component, it is possible for a controller to determine whether that component is qualified for use in the system. Upon detection of an unauthorized component, the system may alert the user or, in certain embodiments, stop operating of the system. This identification feature is embedded in a component by using an additive manufacturing process that allows the identification feature to be embedded in the component without subjecting the identification feature to extreme temperatures.

79. 发明申请

WO2018225546A1 荷電粒子線装置审中-公开
公开(公告)号：WO2018225546A1
公开(公告)日：2018-12-13
申请号：PCT/JP2018/020241
申请日：2018-05-25
申请人：株式会社日立ハイテクノロジーズ
发明人：榎本　裕久 , 鈴木　渡 , 小柳　宗和 , 羽根田　茂 , 菊池　秀樹
IPC分类号： H01J37/20 , F16F7/01 , F16F15/02 , F16F15/04 , H01J37/16
摘要：環境音などの外乱が装置に作用して試料ステージを振動させたときに、この試料ステージの振動を低減させる支持部材の剛性を維持したまま減衰を付与する技術を提供する。本開示による荷電粒子線装置は、試料を移動可能な試料ステージと、当該試料ステージの振動を減衰する減衰部と、試料ステージと減衰部とを収容する試料室と、を備える。当該荷電粒子線装置では、試料ステージと減衰部とは水平に配置されている。また、試料ステージは、減衰部と筐体の第１側面との間に挟まれて支持される構成をなし、減衰部の筐体の内部には、複数の摩擦体が充填されている（図２）。

80. 发明申请

WO2018055715A1 電子顕微鏡审中-公开
标题翻译：电子显微镜
公开(公告)号：WO2018055715A1
公开(公告)日：2018-03-29
申请号：PCT/JP2016/077926
申请日：2016-09-23
申请人：株式会社日立ハイテクノロジーズ
发明人：大西　崇
IPC分类号： H01J37/16 , H01J7/18 , H01J37/073 , H01J37/28
摘要：本発明の解決する課題は、電子源周辺の引出電極にＮＥＧを配置することで、適切な温度に活性化することができる電子顕微鏡を提供することである。　本発明は、電子銃を備えた電子顕微鏡において、前記電子銃は、電子源と、引出電極と、加速管と、を備え、前記加速管は接続部位において前記引出電極と接続されており、前記引出電極は第一のヒータと第一のＮＥＧを備え、前記第一のヒータと前記第一のＮＥＧは前記電子源から射出される電子線の軸方向に離間していることを特徴とする電子顕微鏡である。
摘要翻译：
本发明中，由NEG布置到围绕电子源引出电极的解决问题是提供一种能够激活合适的温度的电子显微镜。本发明是具有电子枪，电子枪，电子源的电子显微镜，以及引出电极包括一个加速管，其中所述加速管设置在连接部位连接到所述引出电极，所述其中，引出电极包括第一加热器和第一NEG，并且第一加热器和第一NEG在从电子源发射的电子束的轴向方向上间隔开这是一个显微镜。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式