专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

71. 发明申请

WO2016192918A1 MONITORING APPARATUS, LITHOGRAPHIC APPARATUS AND METHOD OF MONITORING A CHANGE IN A PROPERTY 审中-公开
标题翻译：监控设备，地平线设备和监控物业变更的方法
公开(公告)号：WO2016192918A1
公开(公告)日：2016-12-08
申请号：PCT/EP2016/060002
申请日：2016-05-04
申请人： ASML NETHERLANDS B.V.
发明人： LEIJTENS, Johannes, Adrianus, Petrus , AKKERMANS, Johannes, Antonius, Gerardus , HAVERDINGS, Michael, Benjamin , KAT, Pieter, Lucas , LEENKNEGT, George, Alois, Leonie
IPC分类号： G03F7/20 , G01L1/24 , G01B11/16
CPC分类号： G03F7/70783 , G01B11/165 , G03F7/7085 , G03F7/70875
摘要： Disclosed is a monitoring apparatus configured to monitor a change in a property. The monitoring apparatus comprises a fiber-Bragg grating sensor, an amplifier, an integrator and a processor. The fiber-Bragg grating sensor is operable to sense a band of wavelengths of incident radiation and to output a corresponding sensor output signal. The band of radiation is centered upon a first value representing a Bragg wavelength. The amplifier is arranged to separate the sensor output signal in a first part and a second part, to create an inverted first part by inverting the first part, and to create an amplified signal based on the inverted first part and the second part. The integrator is operable to integrate the amplified signal to obtain an integrated signal. The processor operable to derive a second value representative of a shift of the Bragg wavelength based on the integrated signal.
摘要翻译：公开了一种监视设备，用于监视属性的变化。监测装置包括光纤布拉格光栅传感器，放大器，积分器和处理器。光纤布喇格光栅传感器可操作以感测入射辐射的波段并输出相应的传感器输出信号。辐射带以表示布拉格波长的第一值为中心。放大器被布置成在第一部分和第二部分中分离传感器输出信号，以通过反转第一部分来产生反相的第一部分，并且基于倒置的第一部分和第二部分创建放大的信号。积分器可操作以集成放大的信号以获得积分信号。所述处理器可操作以基于所述积分信号导出表示所述布拉格波长的偏移的第二值。

72. 发明申请

WO2016150622A1 A LITHOGRAPHY APPARATUS AND A METHOD OF MANUFACTURING A DEVICE 审中-公开
标题翻译：一种平面设备和一种制造设备的方法
公开(公告)号：WO2016150622A1
公开(公告)日：2016-09-29
申请号：PCT/EP2016/053228
申请日：2016-02-16
申请人： ASML NETHERLANDS B.V.
发明人： NAKIBOGLU, Günes
IPC分类号： G03F7/20
CPC分类号： G03F7/70858 , G03F7/70341 , G03F7/70716 , G03F7/70758 , G03F7/70875 , G03F7/70891 , G03F7/709
摘要： A lithography apparatus comprising: a projection system configured to project a desired image onto a substrate; an active module (120) that generates a time-varying heat load; a temperature conditioning system (100) configured to maintain a component of the lithography apparatus at a predetermined target temperature; and a heat buffer (110) comprising a phase change material in thermal contact with the active module, the phase change material having a phase change temperature such that the phase change material is caused to undergo a phase change by the time-varying heat load; and wherein the phase change material is stationary relative to the projection systems during critical operations of the lithography apparatus.
摘要翻译：一种光刻设备，包括：投影系统，被配置为将期望的图像投影到基板上; 产生时变热负荷的有源模块（120）; 温度调节系统（100），被配置为将所述光刻设备的部件保持在预定目标温度; 以及包括与所述有源模块热接触的相变材料的热缓冲器（110），所述相变材料具有相变温度，使得所述相变材料通过所述随时间变化的热负载而发生相变; 并且其中所述相变材料在所述光刻设备的关键操作期间相对于所述投影系统是静止的。

73. 发明申请

WO2015165653A1 SUPPORT TABLE FOR A LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：平面设备支持表，平面设备和设备制造方法
公开(公告)号：WO2015165653A1
公开(公告)日：2015-11-05
申请号：PCT/EP2015/056364
申请日：2015-03-25
申请人： ASML NETHERLANDS B.V.
发明人： VAN SOMMEREN, Daan, Daniel, Johannes, Antonius , POIESZ, Thomas
IPC分类号： G03F7/20
CPC分类号： G03F7/70875 , G03F7/70341 , G03F7/707 , G03F7/70716 , G03F7/70866 , H01L21/67028 , H01L21/67051 , H01L21/6875
摘要： A support table (WT) for a lithographic apparatus, the support table is configured to support a lower surface of a substrate (W). The support table comprises: a base surface (22) configured to be substantially parallel to the lower surface of the substrate supported on the support table, a plurality of burls (20) protruding above the base surface, each of the plurality of burls having a respective distal end and a first height above the base surface, the plurality of burls arranged such that, when the substrate is supported by the support table, the substrate is supported by the respective distal end of each of the plurality of the burls, and a plurality of elongate raised protrusions (45) protruding above the base surface, each of the elongate raised protrusions having a second height above the base surface, wherein the second height is less than the first height. The base surface comprises a plurality of regions within each of which some of the elongate raised protrusions are located. All of the elongate raised protrusions located within each region have substantially the same direction of elongation such that they are substantially parallel to each other so as to form between the elongate raised protrusions at least one gas flow path substantially parallel to the elongate raised protrusions.
摘要翻译：一种用于光刻设备的支撑台（WT），所述支撑台被配置为支撑衬底（W）的下表面。所述支撑台包括：基部表面（22），其被构造成基本上平行于支撑在所述支撑台上的所述基板的下表面;多个凸起（20），突出在所述基座表面上方，所述多个毛刺中的每一个具有相应的远端和在基底表面上方的第一高度，所述多个毛刺被布置成使得当所述基底被所述支撑台支撑时，所述基底由所述多个毛刺中的每一个的相应远端支撑，并且多个在基座表面上突出的细长凸起突起（45），每个细长凸起突起在基面上方具有第二高度，其中第二高度小于第一高度。基部表面包括多个区域，每个区域中的一些细长凸起突起位于其中。位于每个区域内的所有细长凸起突起具有基本上相同的伸长方向，使得它们彼此基本平行，从而在细长凸起之间形成基本上平行于细长凸起突起的至少一个气流路径。

74. 发明申请

WO2015110240A1 COIL ASSEMBLY, ELECTROMAGNETIC ACTUATOR, STAGE POSITIONING DEVICE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：线圈组件，电磁致动器，阶段定位装置，平面装置和装置制造方法
公开(公告)号：WO2015110240A1
公开(公告)日：2015-07-30
申请号：PCT/EP2014/078677
申请日：2014-12-19
申请人： ASML NETHERLANDS B.V. , ASML HOLDING NV
发明人： HUANG, Yang-Shan , KIM, Minkyu , NIJSSE, Gerard, Johannes, Pieter
IPC分类号： G03F7/20 , H02K41/03 , H02K1/14 , H02K3/18 , H02K1/20 , H02K3/24
CPC分类号： G03F7/70725 , G03F7/70758 , G03F7/70858 , G03F7/70875 , H01F7/10 , H02K3/24 , H02K3/48 , H02K9/005 , H02K9/19 , H02K41/031
摘要： A coil assembly for an electromagnetic actuator or motor is described, the coil assembly including a magnetic core comprising at least one pair of slots; a coil, at least partly mounted inside the at least one pair of slots; and a cooling member, the cooling member being mounted to a surface of the coil.
摘要翻译：描述了用于电磁致动器或电动机的线圈组件，线圈组件包括包含至少一对槽的磁芯; 至少部分地安装在所述至少一对槽中的线圈; 以及冷却部件，所述冷却部件安装在所述线圈的表面。

75. 发明申请

WO2015107976A1 露光装置及び露光方法、並びにデバイス製造方法审中-公开
标题翻译：曝光装置，曝光方法和装置制造方法
公开(公告)号：WO2015107976A1
公开(公告)日：2015-07-23
申请号：PCT/JP2015/050404
申请日：2015-01-08
申请人：株式会社ニコン
发明人：柴崎　祐一
IPC分类号： H01L21/027 , G01B11/00 , G03F7/20
CPC分类号： G03F7/70583 , G03F7/32 , G03F7/706 , G03F7/70716 , G03F7/70775 , G03F7/7085 , G03F7/70875
摘要：　照明光（ＩＬ）をレチクル（Ｒ）に照射してレチクル（Ｒ）のパターン面に形成されたパターンをウエハ（Ｗ）に転写する露光装置（１００）は、レチクル（Ｒ）を保持して移動するレチクルステージ（ＲＳＴ）と、レチクルステージ（ＲＳＴ）に保持されたレチクル（Ｒ）の前記パターン面に対して計測光を照射し、パターン面からのスペックルを検出するセンサ（３０）と、を備えている。
摘要翻译：曝光装置（100）通过用照射光（IL）照射掩模版（R）将图案转印到晶片（W），所述图案形成在掩模版（R）的图案表面上。曝光装置设有：保持并移动掩模版（R）的标线片台（RST）。以及传感器（30），其将测量光照射到通过标线片载台（RST）保持的掩模版（R）的图案表面，并且检测来自图案表面的斑点。

76. 发明申请

WO2015034686A1 APPARATUS FOR AND METHOD OF TEMPERATURE COMPENSATION IN HIGH POWER FOCUSING SYSTEM FOR EUV LPP SOURCE 审中-公开
标题翻译：用于EUV LPP源的高功率聚焦系统中的温度补偿装置和方法
公开(公告)号：WO2015034686A1
公开(公告)日：2015-03-12
申请号：PCT/US2014/052173
申请日：2014-08-21
申请人： ASML NETHERLANDS B.V.
发明人： ERSHOV, Alexander, I.
IPC分类号： H01S3/139
CPC分类号： G03F7/70008 , G03F7/70033 , G03F7/70041 , G03F7/70341 , G03F7/70875
摘要： Apparatus for and method of temperature compensating a focusing system In which the focusing system has at least one transmissive optical element having a thermal lens. A reflective optical element is added to the system that has a thermal lens that is complementary to the thermal lens of the transmissive optical element so that the optical characteristics of the two optical elements combined are substantially temperature independent The respective thermal lenses of the two optical elements are balanced by selecting materials for the reflective optical element that have the correct optical absorption based on the absorption of the transmissive optical element and the relative strengths of the thermal lenses.
摘要翻译：聚焦系统的温度补偿装置和方法其中聚焦系统具有至少一个具有热透镜的透射光学元件。反射型光学元件被添加到具有与透射光学元件的热透镜互补的热透镜的系统中，使得组合的两个光学元件的光学特性基本上是温度独立的。两个光学元件的各个热透镜通过根据透射光学元件的吸收和热透镜的相对强度选择具有正确光吸收的反射光学元件的材料进行平衡。

77. 发明申请

WO2014172400A1 AN EXPOSURE APPARATUS AND A METHOD FOR EXPOSING A PHOTOSENSITIVE ELEMENT AND A METHOD FOR PREPARING A PRINTING FORM FROM THE PHOTOSENSITIVE ELEMENT 审中-公开
标题翻译：曝光装置和曝光感光元件的方法以及从感光元件制备印刷形式的方法
公开(公告)号：WO2014172400A1
公开(公告)日：2014-10-23
申请号：PCT/US2014/034261
申请日：2014-04-16
申请人： E. I. DU PONT DE NEMOURS AND COMPANY
发明人： STRUEWE, Volker , LUETKE, Helmut
IPC分类号： G03F7/20
CPC分类号： G03F7/201 , B41C1/00 , G03F7/20 , G03F7/2002 , G03F7/2008 , G03F7/2014 , G03F7/2041 , G03F7/2051 , G03F7/70558 , G03F7/70858 , G03F7/70875
摘要： The invention pertains to an exposure apparatus, a method for exposing a photosensitive element to radiation using the exposure apparatus, and a method for preparing a printing form from the photosensitive element. The exposure apparatus includes a base assembly having an exposure bed that supports the photosensitive element, and a lamp housing assembly having one or more lamps. The base assembly includes an assembly for controlling the temperature of the exposure bed to heat and cool the bed; and an assembly configured to remove air between the photosensitive element and an exterior top surface of the exposure bed.
摘要翻译：本发明涉及一种曝光装置，一种使用该曝光装置将光敏元件暴露于辐射的方法，以及一种从感光元件制备印刷形式的方法。曝光装置包括具有支撑感光元件的曝光床的基座组件和具有一个或多个灯的灯壳体组件。基座组件包括用于控制曝光床的温度以加热和冷却床的组件; 以及构造成去除感光元件和曝光床的外部顶表面之间的空气的组件。

78. 发明申请

WO2014122151A2 LITHOGRAPHIC APPARATUS AND METHOD 审中-公开
标题翻译： LITHOGRAPHIC设备和方法
公开(公告)号：WO2014122151A2
公开(公告)日：2014-08-14
申请号：PCT/EP2014/052204
申请日：2014-02-05
申请人： ASML HOLDING N.V. , ASML NETHERLANDS B.V.
发明人： DELPUERTO, Santiago, E , LIPSON, Matthew , HENDERSON, Kenneth , LAFARRE, Raymond , MARKOYA, Louis, John , UITTERDIJK, Tammo , VERMEULEN, Johannes, Petrus, Martinus, Bernardus , DE GROOT, Antonius, Franciscus, Johannes , VAN DER WILK, Ronald
IPC分类号： G03F7/20
CPC分类号： G03F7/70875 , G03F7/70708 , H01L21/67109 , H01L21/6831 , H01L21/6875
摘要： A support such as a clamp is configured to releasably hold a patterning device such as a reticle to secure it and prevent heat-induced deformation of it. For example, an electrostatic clamp includes a first substrate having opposing first and second surfaces, a plurality of burls located on the first surface and configured to contact the reticle, a second substrate having opposing first and second surfaces. The first surface of the second substrate is coupled to the second surface of the first substrate. A plurality of cooling elements is located between the first surface of the second substrate and the second surface of the first substrate. The cooling elements are configured to cause electrons to travel from the second surface of the first substrate to the first surface of the second substrate. Each cooling element is substantially aligned with a respective burl.
摘要翻译：诸如夹具的支撑件被配置为可释放地保持诸如掩模版的图案形成装置以固定它并防止其热引起的变形。例如，静电夹具包括具有相对的第一表面和第二表面的第一基底，位于第一表面上并被构造成接触掩模版的多个毛刺，具有相对的第一和第二表面的第二基底。第二衬底的第一表面耦合到第一衬底的第二表面。多个冷却元件位于第二基板的第一表面和第一基板的第二表面之间。冷却元件构造成使电子从第一衬底的第二表面行进到第二衬底的第一表面。每个冷却元件基本上与相应的毛刺对齐。

79. 发明申请

WO2013072144A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：WO2013072144A1
公开(公告)日：2013-05-23
申请号：PCT/EP2012/070247
申请日：2012-10-12
申请人： ASML NETHERLANDS B.V.
发明人： RANJAN, Manish , LUIJTEN, Carlo , JANSSEN, Frank , CHERNYSHOV, Maksym
IPC分类号： G03F7/20
CPC分类号： G03F7/70875 , G03F7/70633 , G03F7/70716 , G03F7/70933
摘要： A lithographic apparatus (100) includes a substrate table (WT) constructed to hold a substrate (W), a projection system (PS) configured to project a patterned radiation beam through an opening (301) and onto a target portion of the substrate, and a conduit (305, 306) having an outlet (306) in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus includes a temperature control apparatus (330) controlled by a control system and configured to control the temperature of the gas, and in particular to cool the gas, in the space between the projection system and the substrate.
摘要翻译：光刻设备（100）包括构造成保持衬底（W）的衬底台（WT），被配置为将图案化的辐射束通过开口（301）突出并投影到衬底的目标部分上的投影系统（PS）以及在开口中具有出口（306）的导管（305,306）。导管构造成将气体输送到开口。光刻设备包括由控制系统控制并被配置为控制气体的温度，特别是在投影系统和基板之间的空间中冷却气体的温度控制装置（330）。

80. 发明申请

WO2013066468A1 ENHANCED STABILITY PREDICTION FOR INCREMENTALLY GENERATED SPEECH RECOGNITION HYPOTHESES 审中-公开
标题翻译：增强的语音识别假设的增强稳定性预测
公开(公告)号：WO2013066468A1
公开(公告)日：2013-05-10
申请号：PCT/US2012/050612
申请日：2012-08-13
申请人： GOOGLE INC. , MCGRAW, Ian C. , GRUENSTEIN, Alexander H.
发明人： MCGRAW, Ian C. , GRUENSTEIN, Alexander H.
IPC分类号： G10L15/08 , G10L15/22
CPC分类号： G03F7/70708 , G03F7/707 , G03F7/70875 , G03F7/70908 , G10L15/08 , G10L2015/223 , H01L21/6831
摘要： Methods, systems, and apparatus, including computer programs encoded on a computer storage medium, for predicting the stability of speech recognition results. In one aspect, a method includes determining a length of time, or a number of occasions, in which a word has remained in an incremental speech recognizer's top hypothesis, and assigning a stability metric to the word based on the length of time or number of occasions.
摘要翻译：方法，系统和装置，包括在计算机存储介质上编码的计算机程序，用于预测语音识别结果的稳定性。在一个方面，一种方法包括确定一个单词在增量语音识别器的最高假设中保留的时间长度或多个场合，并且基于时间长度或数量的长度来分配稳定性量度场合。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式