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61. 发明申请

WO2011061665A1 A TOOL FOR WORKING STONE MATERIALS AND THE LIKE 审中-公开
标题翻译：用于工作石料的工具和类似物
公开(公告)号：WO2011061665A1
公开(公告)日：2011-05-26
申请号：PCT/IB2010/055160
申请日：2010-11-15
申请人： AROS S.R.L. , FIORATTI, Stefano
发明人： FIORATTI, Stefano
IPC分类号： B24D7/06 , B24B41/047 , B24B7/22
CPC分类号： B24D7/066 , B24B7/22 , B24B41/0475
摘要： The present invention relates to a tool for stone material finishing working comprising a support component or base (2) for anchoring to a machine tool, at least one abrasive work component (3), at least one housing seat (SA) delimited between the support component (2) and the at least one work component (3), at least one elastic vibration absorption component (6, 6a, 6b) arranged, in use, in a respective housing seat (SA), the support component (2) and the at least one abrasive work component (3) comprising mutual engagement means (4, 4b, 4c, 5, 5a, 5b, 5c, 5d, 5f), the mutual engagement means comprise snap-mutual engagement means (4, 4b, 4c, 5, 5a, 5b, 5c, 5d, 5f).
摘要翻译：本发明涉及一种用于石材整理加工的工具，其包括用于锚定到机床的支撑部件或基座（2），至少一个磨料加工部件（3），至少一个壳体座（SA）组件（2）和至少一个工作部件（3），至少一个弹性振动吸收部件（6,6a，6b）在使用中在相应的壳体座（SA）中布置，支撑部件（2）和所述至少一个研磨作业组件（3）包括相互接合装置（4,4b，4c，5,5a，5b，5c，5d，5f），所述相互接合装置包括卡扣互作用装置（4,4b，4c），5,5a，5b，5c，5d，5f）。

62. 发明申请

WO2011024086A1 METHOD OF OBTAINING A TOOL FOR WORKING STONE MATERIALS 审中-公开
标题翻译：获得工作石材的工具的方法
公开(公告)号：WO2011024086A1
公开(公告)日：2011-03-03
申请号：PCT/IB2010/053281
申请日：2010-07-19
申请人： AROS S.R.L. , Fioratti, Stefano
发明人： Fioratti, Stefano
IPC分类号： B24D3/34 , B24D7/14 , B24D18/00 , B24B7/22
CPC分类号： B24D18/0009 , B24D3/346 , B24D7/14
摘要： The present invention relates to a method of obtaining a block tool (4), particularly for working stone materials, a block tool (4) for working both natural and artificial stone materials, and a support or base element (7) for a block tool (4).
摘要翻译：本发明涉及一种获得块工具（4）的方法，特别是用于加工石材，用于工作天然和人造石材的块工具（4）和用于块工具的支撑件或基座元件（7）（4）。

63. 发明申请

WO2010106389A1 HEAD FOR THE TREATMENT OF STONE AND CERAMIC MATERIALS 审中-公开
标题翻译：石材和陶瓷材料处理方法
公开(公告)号：WO2010106389A1
公开(公告)日：2010-09-23
申请号：PCT/IB2009/000571
申请日：2009-03-18
申请人： CO.ME.S. S.R.L. , SIGNORINI, Roberto
发明人： SIGNORINI, Roberto
IPC分类号： B24B41/047 , B24B7/22
CPC分类号： B24B41/0475 , B24B7/22
摘要： Head for the treatment of stone and ceramic material, comprising a main casing (3), at least one toolholder shaft (8) of (x) axis supported by the casing (3) and capable of rotating and reciprocating with respect to said axis (x), first transmission means (31) for driving said at least one toolholder shaft (8) into rotation about said axis (x), and second transmission means (32) for driving said at least one toolholder shaft (8) into a reciprocating motion along said axis (x).
摘要翻译：用于处理石材和陶瓷材料的头部，包括主壳体（3），由壳体（3）支撑并且能够相对于所述轴线旋转和往复运动的至少一个（x）轴线的至少一个刀架轴（8） x），用于驱动所述至少一个刀架轴（8）围绕所述轴线（x）旋转的第一传动装置（31）和用于将所述至少一个刀夹轴（8）驱动成往复运动的第二传动装置（32）沿着所述轴（x）的运动。

64. 发明申请

WO2010004374A1 HEAD FOR THE TREATMENT OF STONE AND CERAHIC MATERIALS 审中-公开
标题翻译：石材和陶瓷材料处理方法
公开(公告)号：WO2010004374A1
公开(公告)日：2010-01-14
申请号：PCT/IB2009/000147
申请日：2009-01-26
申请人： CO.ME.S S.R.L. , SIGNORINI, Roberto
发明人： SIGNORINI, Roberto
IPC分类号： B24B7/22 , B24B41/00
CPC分类号： B24B7/22 , B24B41/047 , B24B41/0475
摘要： Head for the treatment of stone and ceramic material, comprising a main casing (2) rotating about a first vertical axis (X), at least one head tool (10) supported by said main casing (2), rotating about a second vertical axis (Y) and kinematically connected to said main casing (2) through first transmission means (15), and at least a toolholder (3) provided with working motion relative to a work plane (P).
摘要翻译：用于处理石材和陶瓷材料的头部，包括围绕第一垂直轴线（X）旋转的主壳体（2），由所述主壳体（2）支撑的至少一个头部工具（10），围绕第二垂直轴线（Y），并且通过第一传动装置（15）运动地连接到所述主壳体（2），以及至少一个相对于工作平面（P）提供工作运动的刀架（3）。

65. 发明申请

WO2008097627A1 CLEANING CUP SYSTEM FOR CHEMICAL MECHANICAL PLANARIZATION APPARATUS 审中-公开
标题翻译：化学机械平面设备清洁杯系统
公开(公告)号：WO2008097627A1
公开(公告)日：2008-08-14
申请号：PCT/US2008/001656
申请日：2008-02-07
申请人： TBW INDUSTRIES, INC. , BENNER, Stephen, J.
发明人： BENNER, Stephen, J.
IPC分类号： B24B7/22
CPC分类号： B24B53/017 , B24B57/02
摘要： The present invention is related to an improved cleaning cup arrangement for CMP systems that efficiently and effectively removes most, if not all, of any slurry material present on the abrasive conditioning disk and conditioner head as they are resting in the cup between conditioning cycles. The cleaning cup of the present invention includes an underside water knife for directing a high velocity stream of cleaning fluid against the rotating abrasive disk (or conditioning brush, which may be used instead of a disk) surface, and at least a pair of spray stems for directing columns of cleaning fluid with sufficient cleaning force against all exposed portions of the conditioner head.
摘要翻译：本发明涉及一种用于CMP系统的改进的清洁杯装置，其可有效且有效地去除磨损调理盘和调节器头上存在的大部分（如果不是全部）淤浆材料，因为它们在调节循环之间搁置在杯中。本发明的清洁杯包括用于将清洁流体的高速流引导到旋转研磨盘（或可用于代替盘）的旋转研磨盘（或调节刷），以及至少一对喷杆的下侧水刀用于以足够的清洁力将清洁液体列导向调节头的所有暴露部分。

66. 发明申请

WO2008066801A1 PRECISION ABRASIVE MACHINING OF WORK PIECE SURFACES 审中-公开
标题翻译：精密磨床加工工作表面
公开(公告)号：WO2008066801A1
公开(公告)日：2008-06-05
申请号：PCT/US2007/024417
申请日：2007-11-26
申请人： CORNING INCORPORATED , STOCKER, Mark A
发明人： STOCKER, Mark A
IPC分类号： B24B7/22 , B24B13/01 , B24B49/16
CPC分类号： B24B49/16 , B24B7/228 , B24B13/01
摘要： The spacing between an abrasive type surface polishing tool and the surface of the work piece that is being polished is controlled dynamically so that variations in the area of the abrasive pad in contact with the surface of the work piece compensated, thereby eliminating size variations in this contact area and the accompanying variations in material removal that produce surface height fluctuations.
摘要翻译：研磨型表面抛光工具与正被抛光的工件表面之间的间距被动态地控制，使得与工件表面接触的磨料区域的变化被补偿，由此消除了这种尺寸变化接触面积以及产生表面高度波动的材料去除的伴随变化。

67. 发明申请

WO2005059962A3 TEMPERATURE CONTROLLED HOT EDGE RING ASSEMBLY FOR REDUCING PLASMA REACTOR ETCH RATE DRIFT 审中-公开
标题翻译：温度控制热边缘组件，用于降低等离子体反应器蚀刻速率
公开(公告)号：WO2005059962A3
公开(公告)日：2006-02-23
申请号：PCT/US2004041768
申请日：2004-12-10
申请人： LAM RES CORP , FISCHER ANDREAS , LOEWENHARDT PETER
发明人： FISCHER ANDREAS , LOEWENHARDT PETER
IPC分类号： H01J37/32 , H01L21/00 , H01L21/687 , H01L21/306 , B24B5/00 , B24B7/22 , B24B29/00 , B24B37/04 , B24B41/06 , C23F1/02
CPC分类号： H01L21/68735 , H01J37/32642 , H01L21/67069
摘要： A temperature-controlled hot edge ring assembly adapted to surround a substrate support in a plasma reaction chamber. The assembly includes a conductive lower ring, a ceramic intermediate ring, and an upper ring. The intermediate ring overlies the lower ring and is adapted to be attached via the lower ring to an RF electrode. The upper ring overlies the intermediate ring, and has an upper surface exposed to an interior of a plasma reaction chamber.
摘要翻译：适于围绕等离子体反应室中的衬底支撑件的温度控制的热边缘环组件。组件包括导电下环，陶瓷中间环和上环。中间环覆盖在下环上并且适于经由下环连接到RF电极。上环覆盖中间环，并且具有暴露于等离子体反应室内部的上表面。

68. 发明申请

WO2004078441B1 BLOCK TEXTURE-MODIFYING APPARATUS AND METHOD 审中-公开
标题翻译：块纹理修改装置和方法
公开(公告)号：WO2004078441B1
公开(公告)日：2005-02-17
申请号：PCT/CA2004000345
申请日：2004-03-08
申请人： CORREIA HORACIO
发明人： CORREIA HORACIO
IPC分类号： B24B7/22 , B28B11/08 , B28D1/30
CPC分类号： B24B1/007 , B24B7/22 , B28B11/0818 , B28D1/30
摘要： A block texture-modifying apparatus (128) for modifying the surface texture of blocks. The apparatus (128) comprises a block support (12'), a block-texture-modifying assembly (130) and a translational movement assembly (132). The block support (12') supports the blocks thereon. The block-texture-modifying assembly (130) engages the blocks on the support (12'). The translational movement assembly (132) provides a translational movement between the blocks on the support (12') and the block-texture-modifying assembly (130). The block-texture-modifying assembly (130) acts on the blocks it engaged during this translational movement in order to modify their respective surface texture.
摘要翻译：一种用于修改块的表面纹理的块纹理修改设备（128）。装置（128）包括块支撑件（12'），块纹理修改组件（130）和平移运动组件（132）。块支撑件（12'）支撑其上的块。块状纹理修改组件（130）与支撑件（12'）上的块接合。平移运动组件（132）提供在支撑件（12'）上的块和块纹理修改组件（130）之间的平移运动。块纹理修改组件（130）作用于在该平移运动期间接合的块，以便修改它们各自的表面纹理。

69. 发明申请

WO2004078410A3 AGENT FOR INCREASING SELECTION RATIO OF POLISHING RATES 审中-公开
标题翻译：增加抛光率选择比例的代理
公开(公告)号：WO2004078410A3
公开(公告)日：2004-11-04
申请号：PCT/JP2004002680
申请日：2004-03-03
申请人： KAO CORP , EBARA CORP , HAGIHARA TOSHIYA , WADA YUTAKA , AKATSUKA TOMOHIKO , SASAKI TATSUYA
发明人： HAGIHARA TOSHIYA , WADA YUTAKA , AKATSUKA TOMOHIKO , SASAKI TATSUYA
IPC分类号： B24B7/22 , B24B37/00 , B24B57/00 , C09G1/00 , C09K3/14 , H01L21/304 , H01L21/3105
CPC分类号： C09G1/04 , B24B7/228 , B24B57/00 , H01L21/31053
摘要： An agent for increasing a selection ratio of polishing rates, wherein the agent comprises an organic cationic compound, which increases a ratio of a polishing rate of a silicon nitride film to a polishing rate of a silicon oxide film, wherein the agent is provided as a component of a polishing composition used together with a fixed abrasive polishing tool comprising a polishing member comprising abrasive grains and a resin; a polishing composition which increases a ratio of a polishing rate of a silicon nitride film to a polishing rate of a silicon oxide film, wherein the polishing composition comprises the above agent, and wherein the polishing composition is used together with a fixed abrasive polishing tool comprising a polishing member comprising abrasive grains and a resin; and a process for increasing a ratio of a polishing rate of a silicon nitride film to a polishing rate of a silicon oxide film, comprising the step of applying the polishing composition to a fixed abrasive polishing tool comprising a polishing member comprising abrasive grains and a resin.
摘要翻译：一种用于提高抛光速率选择率的试剂，其中所述试剂包括有机阳离子化合物，其增加了氮化硅膜的研磨速率与氧化硅膜的研磨速率的比率，其中所述试剂被提供为与固定研磨抛光工具一起使用的抛光组合物的组分，其包括包含磨料颗粒和树脂的抛光构件; 抛光组合物，其将氮化硅膜的研磨速度与氧化硅膜的研磨速度的比率增加，其中所述抛光组合物包含上述试剂，并且其中所述抛光组合物与固定的研磨抛光工具一起使用，所述固定研磨抛光工具包括包括磨粒和树脂的抛光构件; 以及提高氮化硅膜的研磨速度与氧化硅膜的研磨速度的比例的方法，其特征在于，包括将研磨用组合物涂布在固定研磨用抛光工具上的工序，所述研磨抛光工具包括研磨材料，所述研磨部件包括磨粒和树脂。

70. 发明申请

WO03053632A8 SYSTEM AND METHOD FOR AUTOMATIC GEMSTONE POLISHING 审中-公开
标题翻译：用于自动宝石抛光的系统和方法
公开(公告)号：WO03053632A8
公开(公告)日：2003-12-04
申请号：PCT/IL0201003
申请日：2002-12-12
申请人： DIALIT LTD , PORAT ZVI
发明人： PORAT ZVI
IPC分类号： B24B9/16 , B24B7/22 , B24B49/00
CPC分类号： B24B9/167
摘要： The invention is of a polishing system and method, which provide a combination of vertical and angular displacement of a gemstone relative to a polishing wheel, the apparatus including a tang, a polishing wheel, a vertical displacement element attached to the tang, and an angular displacement element, attached to the tang. The system of the invention can be readily incorporated into an existing automatic gemstone polishing machine.
摘要翻译：本发明是一种抛光系统和方法，其提供宝石相对于抛光轮的垂直和角位移的组合，该装置包括柄脚，抛光轮，连接到柄脚的垂直位移元件和角状物位移元件，附着在柄上。本发明的系统可以容易地结合到现有的自动宝石抛光机中。

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