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1. 发明申请

WO2022201213A1 ABRASIVE MODULE AND CORRESPONDING MODULAR ABRASIVE BELT 审中-公开
公开(公告)号：WO2022201213A1
公开(公告)日：2022-09-29
申请号：PCT/IT2022/050066
申请日：2022-03-22
申请人： SURFACES TECHNOLOGICAL ABRASIVES S.P.A.
发明人： ROTA, Giuseppe
IPC分类号： B24B7/06 , B24B7/22 , B24B21/08 , B24D3/00 , B24D11/00 , B24D7/06 , B24D5/06 , B24D18/00 , B24B21/04
摘要： Abrasive module (10) made of composite material comprising a base membrane (11) from which a plurality of abrasive heads (12) project.

2. 发明申请

WO2021092572A1 METHOD AND APPARATUS FOR APPLYING A UNIFORM TEXTURE TO AN AGGREGATE SURFACE 审中-公开
公开(公告)号：WO2021092572A1
公开(公告)日：2021-05-14
申请号：PCT/US2020/059709
申请日：2020-11-09
申请人： VERTICAL CONCRETE POLISHING INC.
发明人： RICHARDSON, Mark
IPC分类号： B24B7/18 , B24B7/22 , B24B23/00 , B24B23/02 , B24B23/03 , B24B27/00 , B24B41/02
摘要： An apparatus is provided for texturing a work surface comprised of aggregate, that includes: a texturing carriage; a carriage rotation device coupled to the texturing carriage and configured to selectively rotate the texturing carriage; a vertical frame member configured to guide the texturing carriage or the carriage rotation device, or both, in a vertical direction in relation to a surface on which the apparatus rests. Alternately, the apparatus can include: a texturing carriage, the texturing carriage including a texturing head configured to hold one or more texturing pads and a texturing head motor, the texturing head motor configured to move the one or more texturing pads across a work surface, the texturing carriage configured to extend and retract the texturing head towards and away from the work surface.

3. 发明申请

WO2020149468A1 엔지니어드 스톤 재질의 상판 가공방법 审中-公开
公开(公告)号：WO2020149468A1
公开(公告)日：2020-07-23
申请号：PCT/KR2019/008135
申请日：2019-07-03
申请人： 엄지혜
发明人： 엄지혜
IPC分类号： B24B7/22 , B24B37/04 , A47B77/02 , B05D3/02 , B05D7/24
摘要： 본 발명은 엔지니어드 스톤 재질의 상판 가공방법으로서, (a) 엔지니어드 스톤 재질의 싱크대 상판이 광택제로 연마되는 단계를 포함하며, 상기 광택제는 액상 상태에서 나노입자를 포함하는 엔지니어드 스톤 재질의 싱크대 상판 가공방법에 관한 것이다.

4. 发明申请

WO2019245875A1 COMPENSATION FOR SUBSTRATE DOPING FOR IN-SITU ELECTROMAGNETIC INDUCTIVE MONITORING 审中-公开
公开(公告)号：WO2019245875A1
公开(公告)日：2019-12-26
申请号：PCT/US2019/037060
申请日：2019-06-13
申请人： APPLIED MATERIALS, INC.
发明人： LU, Wei , GAGE, David Maxwell , LEE, Harry Q. , XU, Kun , ZHANG, Jimin
IPC分类号： B24B49/10 , B24B7/22
摘要： A method of chemical mechanical polishing includes bringing a substrate having a conductive layer disposed over a semiconductor wafer into contact with a polishing pad, generating relative motion between the substrate and the polishing pad, monitoring the substrate with an in-situ electromagnetic induction monitoring system as the conductive layer is polished to generate a sequence of signal values that depend on a thickness of the conductive layer, determining a sequence of thickness values for the conductive layer based on the sequence of signal values, and at least partially compensating for a contribution of conductivity of the semiconductor wafer to the signal values.

5. 发明申请

WO2019146336A1 単結晶４Ｈ－ＳｉＣ成長用種結晶及びその加工方法审中-公开
公开(公告)号：WO2019146336A1
公开(公告)日：2019-08-01
申请号：PCT/JP2018/047225
申请日：2018-12-21
申请人：昭和電工株式会社 , 株式会社デンソー
发明人：貴堂　高徳 , 長屋　正武 , 鷹羽　秀隆
IPC分类号： C30B29/36 , B24B7/22 , C30B23/00 , C30B33/00 , H01L21/304
摘要：本発明の単結晶４Ｈ－ＳｉＣ成長用種結晶は、直径が１５０ｍｍより大きく、厚みが１ｍｍ以上かつ前記直径の０．０３倍以下の範囲内である円板状の単結晶４Ｈ－ＳｉＣ成長用種結晶であって、単結晶４Ｈ－ＳｉＣを成長させる一方の面が鏡面であり、他方の面のＲａが１０ｎｍより大きく、かつ、内部応力分布が低減するように、自由変形した状態でのうねりの大きさの絶対値が１２μｍ以下である。

6. 发明申请

WO2018226912A1 GRINDING RING WITH CONCAVE ABRASIVE SEGMENTS 审中-公开
公开(公告)号：WO2018226912A1
公开(公告)日：2018-12-13
申请号：PCT/US2018/036386
申请日：2018-06-07
申请人： SAINT-GOBAIN ABRASIVES, INC. , SAINT-GOBAIN ABRASIFS
发明人： GOSAMO, Ignazio
IPC分类号： B24D7/06 , B24B7/22
摘要： An abrasive article including a base having an annular shape defining a central opening, and an abrasive segment coupled to the base, the abrasive segment having at least one side surface with a non-linear shape. In particular, the abrasive segment can have a first and a second side surface, each having a non-linear shape. More particularly, the abrasive segment can have a biconcave shape.

7. 发明申请

WO2018079105A1 ウェーハの製造方法およびウェーハ审中-公开
标题翻译：晶圆制造方法和晶圆
公开(公告)号：WO2018079105A1
公开(公告)日：2018-05-03
申请号：PCT/JP2017/032814
申请日：2017-09-12
申请人：株式会社SUMCO
发明人：田中　利幸 , 又川　敏 , 中島　亮
IPC分类号： H01L21/304 , B24B7/22
CPC分类号： B24B7/22 , H01L21/304
摘要：ウェーハ（Ｗ）の一方の面（Ｗ１）に樹脂層（ＲＨ）を形成する樹脂層形成工程は、ウェーハ（Ｗ）の他方の面（Ｗ２）を保持手段で吸引保持する保持工程と、平板の平坦部とウェーハ（Ｗ）の一方の面（Ｗ１）との間に粘度が１０００ｍＰａ・ｓ以下の硬化性樹脂を挟み、平坦部に倣う硬化前平坦面を硬化性樹脂に形成する平坦面形成工程と、他方の面（Ｗ２）の吸引保持を解除する保持解除工程と、硬化性樹脂を硬化させて樹脂層（ＲＨ）を形成する硬化工程と、平坦部を樹脂層（ＲＨ）から離間させる離間工程とを含んでいる。
摘要翻译：
晶片在形成形成树脂层（RH）时，保持装置的抽吸晶片（W）其它表面（W2）的工序中的树脂层的一个面（W1）的宽度（W）的保持，粘度三明治保持步骤可固化树脂为1000mPa·平板的平坦部的一个表面（W1）和晶片（W）之间s时，可固化的平坦表面以下固化跟随平坦部前一个解除另一个表面（W 2）的吸附保持的保持步骤;固化步骤，固化该固化树脂以形成树脂层（RH）;固化该树脂并将其与层（RH）分开。

8. 发明申请

WO2018077925A1 SANDING-POLISHING MACHINE FOR PLATE-LIKE PRODUCTS MADE OF STONE MATERIAL 审中-公开
标题翻译：用石材制成的板状产品用砂光抛光机
公开(公告)号：WO2018077925A1
公开(公告)日：2018-05-03
申请号：PCT/EP2017/077254
申请日：2017-10-25
申请人： LO PICCOLO, Rosario , TUPINI, Giovanni
发明人： LO PICCOLO, Rosario , TUPINI, Giovanni
IPC分类号： B24B7/06 , B24B7/22 , B24B41/047 , B24B41/02
CPC分类号： B24B7/06 , B24B7/224 , B24B41/02 , B24B41/047 , B24B41/0475
摘要： The invention concerns a sanding-polishing machine for plate-like products made of stone material of a type comprising a plurality of machining stations (101) containing operating heads positioned above a supporting pallet (102), where a conveyor belt (103) slides supporting a plate, arranged in series, and each machining station (101) containing movable operating heads provided with spindles with abrasive tools. Said sanding-polishing machine (100) is characterized in that each machining station (101) moves specifically and solely in the only transverse direction (lag motion) with respect to the longitudinal direction of the conveyor belt (103) and in a mutually independent manner with respect to the transverse movement of the other machining stations (101) and wherein said single transverse movement of the entire above- mentioned machining station (101) is realized by the action of a specific and dedicated lag mechanism (20) to which said mechanism is associated.
摘要翻译：本发明涉及一种用于由石材制成的板状产品的砂光抛光机，所述砂光机包括多个加工站（101），所述加工站包含位于支撑托盘（102）上方的操作头，其中传送带（103）滑动支撑板，串联布置，并且每个加工站（101）包含可移动的操作头，所述可移动的操作头设置有具有研磨工具的心轴。所述砂光 - 抛光机（100）的特征在于，每个加工站（101）相对于传送带（103）的纵向方向并且以相互独立的方式特别且仅在唯一的横向方向上移动（滞后运动）相对于其他加工工位（101）的横向运动，并且其中整个上述加工工位（101）的所述单个横向运动通过特定且专用的滞后机构（20）的作用来实现，所述机构是关联的。

9. 发明申请

WO2017168366A1 COOLING AND SUCTION SYSTEM FOR HEADS FOR POLISHING CERAMIC MANUFACTURED ITEMS OR NATURAL STONES 审中-公开
标题翻译：用于抛光陶瓷制品或天然石材的头部冷却和吸尘系统
公开(公告)号：WO2017168366A1
公开(公告)日：2017-10-05
申请号：PCT/IB2017/051829
申请日：2017-03-30
申请人： ANCORA S.P.A.
发明人： CORRADINI, Mario
IPC分类号： B24B55/02 , B24B55/06 , B24B41/047 , B24B7/22 , B28D7/02
摘要： A cooling and suction system for polishing heads (5) for polishing, for example by smoothing, lapping or the like, ceramic manufactured items (8) or natural stones, comprises at least one polishing head (5), provided with a plurality of tools (10), and first cooling and suction devices (13) arranged around each polishing head (5), second cooling and suction devices (14) arranged around the perimeter of the work zone of the ceramic manufactured items (8), or of the natural stones, and third cooling devices (15) arranged at the center and/or within each polishing head (5).
摘要翻译：用于抛光的抛光头（5）的冷却和抽吸系统包括至少一个抛光头（5），抛光头（5）例如通过平滑，抛光等，陶瓷制品（8）或天然宝石），设置有多个工具（10）以及围绕每个抛光头（5）布置的第一冷却和抽吸装置（13），围绕所制造的陶瓷的工作区的周边布置的第二冷却和抽吸装置（14）物品（8）或天然宝石，以及布置在每个抛光头（5）的中心和/或内部的第三冷却装置（15）。

10. 发明申请

WO2017081617A1 HEAD FOR POLISHING CERAMIC PRODUCTS OR NATURAL STONES 审中-公开
标题翻译：抛光陶瓷产品或天然石头
公开(公告)号：WO2017081617A1
公开(公告)日：2017-05-18
申请号：PCT/IB2016/056736
申请日：2016-11-09
申请人： ANCORA S.P.A.
发明人： CORRADINI, Mario
IPC分类号： B24B41/047 , B24B55/02 , B24B7/22
CPC分类号： B24B41/0475 , B24B7/22 , B24B55/02 , Y02P40/30
摘要： The head (1) for polishing of ceramic or natural stone articles comprising a main body (2), at least one support element (3) attached to the main body (2) and supporting at least one tool (4), and means of air cooling (5, 6, 7) said tool (4) comprising an air introduction duct (5) air that extends externally to the main body (2) and is interposed between the latter and the support element (3).
摘要翻译：用于抛光陶瓷或天然石制品的头部（1）包括主体（2），至少一个支撑元件（3），所述支撑元件（3）附接到主体（2）并支撑至少一个工具（4）和空气冷却装置（5,6,7），所述工具（4）包括空气引入管道（5），所述空气从外部延伸到所述主体（2）并且介于所述主体（2）和所述支撑件元素（3）。

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