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61. 发明申请

WO2014081409A1 CIRCUMFERENTIAL ORIENTATION OF PIEZOELECTRIC DEVICE IN TIRE TO IMPROVE SIGNAL QUALITY 审中-公开
标题翻译：压电元件在轮胎中的循环方向提高信号质量
公开(公告)号：WO2014081409A1
公开(公告)日：2014-05-30
申请号：PCT/US2012/065996
申请日：2012-11-20
申请人： COMPAGNIE GENERALE DES ETABLISSEMENTS MICHELIN , MICHELIN RECHERCHE ET TECHNIQUE, S.A. , WESTON, David, Alan
发明人： WESTON, David, Alan
IPC分类号： B60C23/08
CPC分类号： B60C23/0408 , B60C23/0411 , B60C23/0493 , B60C23/064 , B60C23/20 , G01M17/02
摘要： An apparatus and method for monitoring parameters of a tire using a piezoelectric device is provided. The piezoelectric device is mounted as part of a tire mountable apparatus with a circumferential orientation in a tire such that that the direction defined by length of the piezoelectric device is generally aligned with the direction of rotation of the tire. This can lead to increased coupling of the piezoelectric device to changing circumferential tire shape as the piezoelectric device enters and exits the contact patch of the tire while at the same time reducing the coupling of the piezoelectric device to changing lateral tire shape. Contact patch entry and exit times from piezoelectric signals generated by the piezoelectric device can be more readily identified, leading to increased accuracy of tire parameters determined from the contact patch entry and exit times, such as tire revolution count, tire speed, and contact patch angle.
摘要翻译：提供了一种使用压电装置监测轮胎的参数的装置和方法。压电装置作为轮胎安装装置的一部分安装，其在轮胎中具有圆周方向，使得由压电装置的长度限定的方向大致与轮胎的旋转方向对准。这可能导致随着压电装置进入和离开轮胎接触片而使压电装置与轮胎周向变化的耦合增加，同时减小了压电装置与轮胎轮胎形状变化的耦合。可以更容易地识别由压电装置产生的压电信号的接触片进入和退出时间，从而提高从接触片进入和退出时间确定的轮胎参数的精度，例如轮胎转数，轮胎速度和接触片角度。

62. 发明申请

WO2011062712A1 SYSTEM AND METHOD FOR REDUCING RADIO FREQUENCY INTERFERENCE 审中-公开
标题翻译：减少无线电频率干扰的系统和方法
公开(公告)号：WO2011062712A1
公开(公告)日：2011-05-26
申请号：PCT/US2010/052678
申请日：2010-10-14
申请人： FRANKLIN TECHNOLOGIES, INC. , FRANKLIN, Roger, James
发明人： FRANKLIN, Roger, James
IPC分类号： H04B15/02
CPC分类号： H04W24/00 , H04W16/14
摘要： A system and method for determining the source of and/or reducing radio frequency interference in an RF communications system is disclosed. The system and method is configured to compare first transmission data and second transmission data for conflicts and provide notification of a conflict to a relevant entity. The first transmission data can include first frequency data, first destination data, and first time data for an RF transmission associated with the first RF device. The second transmission data can include second frequency data, second destination data, and second time data. The system and method analyzes the first transmission data and the second transmission data for any conflicts and can provide notification of any conflicts or potential conflicts to interested parties.
摘要翻译：公开了一种用于确定RF通信系统中的射频干扰源和/或降低射频干扰的系统和方法。该系统和方法被配置为比较第一传输数据和用于冲突的第二传输数据，并向相关实体提供冲突的通知。第一传输数据可以包括与第一RF设备相关联的RF传输的第一频率数据，第一目的地数据和第一时间数据。第二传输数据可以包括第二频率数据，第二目的地数据和第二时间数据。该系统和方法针对任何冲突分析第一传输数据和第二传输数据，并可向有关方提供任何冲突或潜在冲突的通知。

63. 发明申请

WO2011022612A2 INDUCTIVE PLASMA SOURCE 审中-公开
标题翻译：电感等离子体源
公开(公告)号：WO2011022612A2
公开(公告)日：2011-02-24
申请号：PCT/US2010/046110
申请日：2010-08-20
申请人： MATTSON TECHNOLOGY, INC. , GODYAK, Valery, A. , CRAPUCHETTES, Charles , NAGORNY, Vladimir
发明人： GODYAK, Valery, A. , CRAPUCHETTES, Charles , NAGORNY, Vladimir
IPC分类号： H05H1/34 , H05H1/40
CPC分类号： H01J37/3211 , H01J37/321 , H01J37/32119 , H01J37/32137 , H01J37/32174 , H01J37/32183 , H01J37/32449 , H01J37/32651 , H05H1/46 , H05H2001/4652
摘要： Methods and apparatus to provide efficient and scalable RF inductive plasma processing are disclosed. In some aspects, the coupling between an inductive RF energy applicator and plasma and/or the spatial definition of power transfer from the applicator are greatly enhanced. The disclosed methods and apparatus thereby achieve high electrical efficiency, reduce parasitic capacitive coupling, and/or enhance processing uniformity. Various embodiments comprise a plasma processing apparatus having a processing chamber bounded by walls, a substrate holder disposed in the processing chamber, and an inductive RF energy applicator external to a wall of the chamber. The inductive RF energy applicator comprises one or more radiofrequency inductive coupling elements (ICEs). Each inductive coupling element has a magnetic concentrator in close proximity to a thin dielectric window on the applicator wall.
摘要翻译：公开了提供有效和可缩放的RF感应等离子体处理的方法和装置。在一些方面，电感RF能量施加器和等离子体之间的耦合和/或来自施加器的功率传递的空间定义大大增强。所公开的方法和装置由此实现高电效率，减少寄生电容耦合和/或增强处理均匀性。各种实施例包括具有由壁界定的处理室的等离子体处理装置，设置在处理室中的衬底保持器以及在室的壁外部的感应RF能量施加器。感应RF能量施加器包括一个或多个射频感应耦合元件（ICE）。每个电感耦合元件具有紧密靠近施加器壁上的薄介电窗口的磁集中器。

64. 发明申请

WO2022140067A1 WORKPIECE PROCESSING APPARATUS WITH VACUUM ANNEAL REFLECTOR CONTROL 审中-公开
公开(公告)号：WO2022140067A1
公开(公告)日：2022-06-30
申请号：PCT/US2021/062554
申请日：2021-12-09
申请人： MATTSON TECHNOLOGY, INC. , BEIJING E-TOWN SEMICONDUCTOR TECHNOLOGY CO., LTD.
发明人： YANG, Michael , SOHN, Manuel , BREMENSDORFER, Rolf
IPC分类号： H01L21/67 , G01J5/00
摘要： A workpiece processing apparatus is provided. The workpiece processing apparatus can include a processing chamber and a workpiece disposed on a workpiece support within the processing chamber. The workpiece processing apparatus can include a gas delivery system and one or more exhaust ports for removing gas from the processing chamber such that a vacuum pressure can be maintained. The workpiece processing apparatus can include radiative heating sources configured to heat the workpiece. The workpiece processing apparatus can further include a plurality of reflectors. The workpiece processing apparatus can include a control system configured to control one or more positions of the reflectors.

65. 发明申请

WO2020131989A1 SURFACE SMOOTHING OF WORKPIECES 审中-公开
公开(公告)号：WO2020131989A1
公开(公告)日：2020-06-25
申请号：PCT/US2019/067039
申请日：2019-12-18
申请人： MATTSON TECHNOLOGY, INC. , BEIJING E-TOWN SEMICONDUCTOR TECHNOLOGY CO., LTD.
发明人： ZHANG, Qi , LU, Xinliang , CHUNG, Hua
IPC分类号： H01L21/3065 , H01L21/3213 , H01L21/3205 , H01L21/02 , H01L21/67 , H01J37/32
摘要： Apparatus, systems, and methods for processing workpieces are provided. In one example implementation, a fluorine and oxygen plasma-based process can be used to smooth a roughened surface of a silicon and/or a silicon containing structure. The process can include generating species from a process gas using an inductive coupling element in a first chamber. The process can include introducing a fluorine containing gas and an oxygen containing gas with the species to create a mixture. The process can further include exposing the silicon and/or the silicon containing structure to the mixture such that the mixture at least partially etches a roughened portion to leave a smoother surface of the silicon and/or the silicon containing structure.

66. 发明申请

WO2020131793A1 SILICON MANDREL ETCH AFTER NATIVE OXIDE PUNCH-THROUGH 审中-公开
公开(公告)号：WO2020131793A1
公开(公告)日：2020-06-25
申请号：PCT/US2019/066725
申请日：2019-12-17
申请人： MATTSON TECHNOLOGY, INC. , BEIJING E-TOWN SEMICONDUCTOR TECHNOLOGY CO., LTD.
发明人： YAN, Chun , SUNG, Tsai Wen , LO, Sio On , CHUNG, Hua , YANG, Michael X.
IPC分类号： H01L21/3213 , H01L21/3205 , H01L21/02 , H01L21/311 , H01L21/677 , H01L21/67 , H01J37/32
摘要： Apparatus, systems, and methods for conducting a silicon containing material removal process on a workpiece are provided. In one example implementation, the method can include generating species from a process gas in a first chamber using an inductive coupling element. The method can include introducing a fluorine containing gas with the species to create a mixture. The mixture can include exposing a silicon structure of the workpiece to the mixture to remove at least a portion of the silicon structure.

67. 发明申请

WO2020033000A3 DOME-SHAPED PHASED ARRAY ANTENNA 审中-公开
公开(公告)号：WO2020033000A3
公开(公告)日：2020-02-13
申请号：PCT/US2019/016775
申请日：2019-02-06
申请人： AVX CORPORATION
发明人： SMITH, David M.
IPC分类号： H01Q21/06 , H01Q1/42
摘要： A phased array antenna is provided. The phased array antenna includes a dome shaped substrate. The phased array antenna further includes a plurality of antenna elements disposed on the substrate.

68. 发明申请

WO2019240907A1 METHOD FOR PROCESSING A WORKPIECE USING A MULTI-CYCLE THERMAL TREATMENT PROCESS 审中-公开
公开(公告)号：WO2019240907A1
公开(公告)日：2019-12-19
申请号：PCT/US2019/032811
申请日：2019-05-17
申请人： MATTSON TECHNOLOGY, INC. , BEIJING E-TOWN SEMICONDUCTOR TECHNOLOGY, CO., LTD
发明人： YANG, Michael X. , MA, Shawming
IPC分类号： H01L21/67 , H01L21/683
摘要： A method for processing a workpiece is provided. The method can include placing a workpiece on a susceptor disposed within a processing chamber. The method can include performing a multi-cycle thermal treatment process on the workpiece in the processing chamber. The multi-cycle thermal treatment process can include at least two thermal cycles. Each thermal cycle of the at least two thermal cycles can include performing a first treatment on the workpiece at a first temperature; heating a device side surface of the workpiece to a second temperature in less than one second; performing a second treatment on the workpiece at approximately the second temperature; and cooling the workpiece subsequent to performing the second treatment.

69. 发明申请

WO2019157016A1 TUBE-SHAPED PHASED ARRAY ANTENNA 审中-公开
公开(公告)号：WO2019157016A1
公开(公告)日：2019-08-15
申请号：PCT/US2019/016784
申请日：2019-02-06
申请人： AVX CORPORATION
发明人： SMITH, David M.
IPC分类号： H01Q21/22 , H01Q3/36
摘要： A phased array antenna is provided. The phased array antenna includes a tube shaped substrate. The phased array antenna further includes a plurality of antenna elements disposed on the substrate.

70. 发明申请

WO2019018487A1 BALANCING CIRCUIT FOR AN ELECTRICAL ENERGY STORAGE DEVICE 审中-公开
公开(公告)号：WO2019018487A1
公开(公告)日：2019-01-24
申请号：PCT/US2018/042624
申请日：2018-07-18
申请人： AVX CORPORATION
发明人： HOCK, Joseph M.
IPC分类号： H02J7/00 , H01M10/42
摘要： Balancing circuits for an ultracapacitor module are provided. In some implementations, the balancing circuit can include a regulator having an input. The regulator can be configured to compare an input voltage associated with the ultracapacitor received at the input to a reference voltage and to provide an output via an output node. The balancing circuit can further include a switching circuit coupled to the regulator. The switching circuit can be configured to discharge the ultracapacitor based at least in part on the output of the regulator. The switching circuit can include at least one semiconductor switching element operated in a hard switching manner during operation of the switching element.

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