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31. 发明申请

WO2011004247A2 SECONDARY BATTERY TEMPERATURE-INCREASING CONTROL APPARATUS, VEHICLE INCLUDING THE SAME, AND SECONDARY BATTERY TEMPERATURE-INCREASING CONTROL METHOD 审中-公开
标题翻译：二次电池温度升高控制装置，包括其的车辆和二次电池温度升高控制方法
公开(公告)号：WO2011004247A2
公开(公告)日：2011-01-13
申请号：PCT/IB2010/001666
申请日：2010-07-07
申请人： TOYOTA JIDOSHA KABUSHIKI KAISHA , TAKAHASHI, Hidenori , NISHI, Yuji , TAZAWA, Masatoshi , MATSUSAKA, Masanobu
发明人： TAKAHASHI, Hidenori , NISHI, Yuji , TAZAWA, Masatoshi , MATSUSAKA, Masanobu
IPC分类号： B60L11/18
CPC分类号： B60L11/1872 , B60L11/1875 , B60L2240/526 , B60L2240/545 , B60L2260/56 , Y02T10/7011 , Y02T10/705
摘要： Λ first calculating section (118) calculates an allowable output power (WoutA) of the secondary battery before a ripple temperature increase operation for increasing the temperature of a secondary battery by causing a ripple current to flow in the secondary battery is performed, the allowable output power being determined in advance based on the temperature and a state of charge (SOC) of the secondary battery. A second calculating section (120) calculates the allowable output power (WoutB) achieved when the ripple temperature increase operation is performed. A determining section (122) determines whether to perform the ripple temperature increase operation so that when the allowable output power (WoutB) is equal to or greater than the allowable output power (WoutA), the ripple temperature increase operation is performed and, when the allowable output power (WoutB) is smaller than the allowable output power (WoutA), the ripple temperature increase operation is not performed.
摘要翻译：？第一计算部分（118）计算在通过使二次电池中的纹波电流流动来提高二次电池的温度的纹波升高操作之前，计算二次电池的容许输出功率（WoutA），允许的输出功率基于二次电池的温度和充电状态（SOC）预先确定。第二计算部（120）计算进行纹波升温动作时的容许输出功率（WoutB）。确定部分（122）确定是否进行纹波温度升高操作，使得当允许输出功率（WoutB）等于或大于容许输出功率（WoutA）时，执行纹波升高操作，并且当允许输出功率（WoutB）小于容许输出功率（WoutA）时，不进行纹波升温动作。

32. 发明申请

WO2009023655A1 QUINAZOLINEDIONE CHYMASE INHIBITORS 审中-公开
标题翻译：喹诺酮类抑制剂
公开(公告)号：WO2009023655A1
公开(公告)日：2009-02-19
申请号：PCT/US2008/072849
申请日：2008-08-12
申请人： BOEHRINGER INGELHEIM INTERNATIONAL GMBH , BOEHRINGER INGELHEIM PHARMA GMBH & CO. KG , GOU, Xin , LO, Ho Yin , MAN, Chuk Chui , TAKAHASHI, Hidenori
发明人： GOU, Xin , LO, Ho Yin , MAN, Chuk Chui , TAKAHASHI, Hidenori
IPC分类号： C07D403/06 , C07D417/06 , A61K31/517 , A61P9/00
CPC分类号： C07D403/06 , C07D417/06
摘要： Disclosed are small molecule inhibitors which are useful in treating various diseases and conditions involving Chymase.
摘要翻译：公开了可用于治疗涉及糜酶的各种疾病和病症的小分子抑制剂。

33. 发明申请

WO2005079791A1 THIOPHENE -2- CARBOXYLIC ACID - (1H - BENZIMIDAZOL - 2 YL) - AMIDE DERIVATIVES AND RELATED COMPOUNDS AS INHIBITORS OF THE TEC KINASE ITK (INTERLEUKIN -2- INDUCIBLE T CELL KINASE) FOR THE TREATMENT OF INFLAMMATION, IMMUNOLOGICAL AND ALLERGIC DISORDERS 审中-公开
标题翻译：噻吩-2-羧酸 - （1H-苯并咪唑-2YL） - 酰胺衍生物和作为TEC激酶ITK（白介素-2诱导性T细胞激酶）的抑制剂的相关化合物用于治疗炎症，免疫和过敏性疾病
公开(公告)号：WO2005079791A1
公开(公告)日：2005-09-01
申请号：PCT/US2005/004183
申请日：2005-02-09
申请人： BOEHRINGER INGELHEIM PHARMACEUTICALS, INC. , BENTZIEN, Joerg, Martin , COOK, Brian, Nicholas , LI, Xiang , LO, Ho Yin , MAN, Chuk, Chui , MUGGE, Ingo, Andreas , PULLEN, Steven, S. , ROTH, Gregory, Paul , SOLEYMANZADEH, Fariba , TAKAHASHI, Hidenori , WANG, Ji , WHITE, Andre , ZINDELL, Renee, M. , RIETHER, Doris, Edith , NEMOTO, Peter, Allen , YAO, Xin , MANGETTE, John Edward
发明人： BENTZIEN, Joerg, Martin , COOK, Brian, Nicholas , LI, Xiang , LO, Ho Yin , MAN, Chuk, Chui , MUGGE, Ingo, Andreas , PULLEN, Steven, S. , ROTH, Gregory, Paul , SOLEYMANZADEH, Fariba , TAKAHASHI, Hidenori , WANG, Ji , WHITE, Andre , ZINDELL, Renee, M. , RIETHER, Doris, Edith , NEMOTO, Peter, Allen , YAO, Xin , MANGETTE, John Edward
IPC分类号： A61K31/4184
CPC分类号： C07D235/30 , C07D401/14 , C07D409/12 , C07D409/14 , C07D413/12 , C07D413/14 , C07D417/14 , C07D491/10
摘要： Disclosed are compounds of formula (I): wherein Ar 1 , Ar 2 , R 1 , R 2 , R 3 , R 4 and X a are defined herein. The compounds of the invention inhibit Itk kinase and are therefore useful for treating diseases and pathological conditions involving inflammation, immunological disorders and allergic disorders. Also disclosed are processes for preparing these compounds and to pharmaceutical compositions comprising these compounds.
摘要翻译：公开了式（I）的化合物：其中Ar1，Ar2，R1，R2，R3，R4和Xa在本文中定义。本发明的化合物抑制Itk激酶，因此可用于治疗涉及炎症，免疫学障碍和过敏性疾病的疾病和病理状况。还公开了制备这些化合物的方法和包含这些化合物的药物组合物。

34. 发明申请

WO2004108468A1 ONBOARD BATTERY CONTROL DEVICE AND CONTROL METHOD 审中-公开
标题翻译： ONBOARD电池控制装置和控制方法
公开(公告)号：WO2004108468A1
公开(公告)日：2004-12-16
申请号：PCT/JP2004/006230
申请日：2004-04-28
申请人： TOYOTA JIDOSHA KABUSHIKI KAISHA , ISHISHITA, Teruo , TAKAHASHI, Hidenori
发明人： ISHISHITA, Teruo , TAKAHASHI, Hidenori
IPC分类号： B60L11/12
CPC分类号： B60W10/26 , B60K6/445 , B60L11/1851 , B60L2240/445 , B60W2510/068 , F02D41/0245 , F02D41/10 , F02D2041/026 , Y02T10/26 , Y02T10/6239 , Y02T10/7005 , Y02T10/705 , Y02T10/7077
摘要： A hybrid ECU sets a charge power limit value W (IN) and a discharge power limit value W (OUT) that are respective limits of electric power to charge a battery and electric power to be discharged therefrom. The charge power limit value W (IN) and the discharge power limit value W (OUT) are set in such a manner that, in a case where warm-up of a catalyst is necessary, charging and discharging of the battery is permitted even if the battery temperature TB is higher as compared with that in a case where warm-up of the catalyst is unnecessary. Thus, if warm-up of the catalyst is necessary, the limitation on the charge/discharge electric power are relaxed with respect to the battery temperature so as to increase the chargeable/dischargeable temperature region for the battery. In this way, a motor generator can be driven while the battery temperature is high.
摘要翻译：混合动力ECU设置充电功率限制值W（IN）和放电功率限制值W（OUT），其为相应的电力限制以对电池充电和从其中放电的电力。充电功率限制值W（IN）和放电功率限制值W（OUT）被设定为在需要预热催化剂的情况下，允许电池的充电和放电，即使与不需要催化剂预热的情况相比，电池温度TB更高。因此，如果需要对催化剂进行预热，则对于电池温度来说放电电力的限制放宽，从而增加电池的可充放电温度区域。以这种方式，电池温度高时可以驱动电动发电机。

35. 发明申请

WO2014051018A1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE 审中-公开
标题翻译：图案形成方法，抗紫外线敏感性或辐射敏感性树脂组合物，电阻膜，制造电子器件的方法和电子器件
公开(公告)号：WO2014051018A1
公开(公告)日：2014-04-03
申请号：PCT/JP2013/076178
申请日：2013-09-19
申请人： FUJIFILM CORPORATION
发明人： KAMIMURA, Sou , TAKAHASHI, Hidenori , KATO, Keita
IPC分类号： G03F7/038 , C08F212/14 , C08F220/04 , C08F220/18 , C08F220/26 , C08F220/28 , C08F220/58 , C08F232/00 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0388 , C08F212/14 , C08F212/32 , C08F220/04 , C08F220/18 , C08F220/26 , C08F220/28 , C08F220/58 , G03F7/038 , G03F7/0392 , G03F7/0397 , G03F7/20 , G03F7/2002 , G03F7/2037 , G03F7/30 , G03F7/325 , G03F7/40
摘要： The pattern forming method of the present invention includes (i) forming a film using an actinic ray-sensitive or radiation-sensitive resin composition which contains a resin (A) which has a repeating unit including a group capable of generating a polar group by being decomposed due to an action of an acid and a repeating unit including a carboxyl group, a compound (B) which generates an acid according to irradiation with actinic rays or radiation, and a solvent (C); (ii) exposing the film using a KrF excimer laser, extreme ultraviolet rays, or an electron beam; and (iii) forming a negative tonetone pattern by developing the exposed film using a developer which includes an organic solvent.
摘要翻译：本发明的图案形成方法包括：（i）使用含有具有包含能够产生极性基团的重复单元的树脂（A）的光化射线敏感性或辐射敏感性树脂组合物形成膜，由于酸和包含羧基的重复单元的作用，根据光化射线或辐射照射产生酸的化合物（B）和溶剂（C）而分解; （ii）使用KrF准分子激光器，极紫外线或电子束曝光该膜; 和（iii）通过使用包括有机溶剂的显影剂显影所述曝光的膜来形成阴性图案。

36. 发明申请

WO2013154210A1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, ELECTRONIC DEVICE MANUFACTURING METHOD USING THE SAME, AND ELECTRONIC DEVICE 审中-公开
标题翻译：图案形成方法，抗紫外线敏感性或辐射敏感性树脂组合物，电阻膜，使用其的电子设备制造方法和电子设备
公开(公告)号：WO2013154210A1
公开(公告)日：2013-10-17
申请号：PCT/JP2013/061433
申请日：2013-04-11
申请人： FUJIFILM CORPORATION
发明人： YAMAGUCHI, Shuhei , TAKAHASHI, Hidenori , KOSHIJIMA, Kousuke
IPC分类号： G03F7/038 , G03F7/039 , G03F7/32
CPC分类号： G03F7/40 , G03F7/0397 , G03F7/11 , G03F7/2041 , G03F7/325
摘要： There is provided a pattern forming method comprising: (i) a step of forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a resin having a weight average molecular weight of 7,000 or more and having (I) a structure containing a group having basicity or capable of decomposing by an action of an acid to increase basicity and (II) a structure being different from the structure (I) and containing a group capable of decomposing by the action of an acid to produce a polar group, and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (ii) a step of exposing the film; and (iii) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern.
摘要翻译：提供一种图案形成方法，其包括：（i）通过使用光敏射线敏感性或辐射敏感性树脂组合物形成膜的步骤，所述树脂组合物含有（A）重均分子量为7,000以上的树脂，并具有（ I）包含具有碱性或能够通过酸的作用分解以增加碱度的基团的结构，和（II）不同于结构（I）的结构，并且含有能够通过酸的作用分解的基团至产生极性基团，和（B）能够在用光化射线或辐射照射时能产生酸的化合物; （ii）曝光胶片的步骤; 和（iii）通过使用含有机溶剂的显影剂显影曝光的薄膜以形成负图案的步骤。

37. 发明申请

WO2013147311A1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION USED THEREIN, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE 审中-公开
标题翻译：图案形成方法，使用其的抗紫外线敏感性或辐射敏感性组合物，电阻膜，使用其的电子器件的制造方法和电子器件
公开(公告)号：WO2013147311A1
公开(公告)日：2013-10-03
申请号：PCT/JP2013/060138
申请日：2013-03-27
申请人： FUJIFILM CORPORATION
发明人： TAKAHASHI, Hidenori
IPC分类号： G03F7/004 , C07C39/17 , C07C69/734 , C07C69/96 , G03F7/038 , G03F7/039 , G03F7/32 , H01L21/027
CPC分类号： G03F7/038 , C07C217/18 , G03F7/0392 , G03F7/325
摘要： There is provided a pattern forming method comprising (i) a step of forming a film by using an actinic ray-sensitive or radiation-sensitive composition containing (A) a non-polymeric acid-decomposable compound having an aromatic ring and a molecular weight of 500 to 5,000 and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (ii) a step of exposing the film, and (iii) a step of performing development by using an organic solvent-containing developer to form a negative pattern.
摘要翻译：提供了一种图案形成方法，其包括（i）通过使用光化射线敏感或辐射敏感性组合物形成膜的步骤，所述组合物含有（A）具有芳环的非聚合酸可分解化合物和分子量为 500至5,000，和（B）能够在用光化射线或辐射照射时能产生酸的化合物; （ii）曝光该薄膜的步骤，和（iii）通过使用含有机溶剂的显影剂进行显影以形成负图形的步骤。

38. 发明申请

WO2013081168A1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE 审中-公开
标题翻译：图案形成方法，抗紫外线敏感性或辐射敏感性树脂组合物，电阻膜，制造电子器件的方法和电子器件
公开(公告)号：WO2013081168A1
公开(公告)日：2013-06-06
申请号：PCT/JP2012/081427
申请日：2012-11-28
申请人： FUJIFILM CORPORATION
发明人： KATO, Keita , SHIRAKAWA, Michihiro , TAKAHASHI, Hidenori , KAMIMURA, Sou
IPC分类号： G03F7/039 , C08F212/00 , C08F220/12 , G03F7/038 , G03F7/32 , H01L21/027
CPC分类号： G03F7/0388 , C08F220/18 , G03F7/0392 , G03F7/0397 , G03F7/325 , H01L21/0274
摘要： A pattern forming method including: (i) forming a film using an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (A) having a repeating unit having a group generating a polar group upon being decomposed by the action of an acid, and a repeating unit having an aromatic group, a compound (B) generating an acid upon irradiation with actinic rays or radiation, and a solvent (C); (ii) exposing the film; and (iii) developing the exposed film using a developer including an organic solvent to form a negative tone pattern, wherein the resin (A) is a resin having a repeating unit having a naphthyl group, and the like, and/or the actinic ray-sensitive or radiation-sensitive resin composition contains a compound (D) having a naphthalene ring, and the like.
摘要翻译：一种图案形成方法，包括：（i）使用含有具有通过酸的作用分解产生极性基团的重复单元的树脂（A）的光化射线敏感性或辐射敏感性树脂组合物形成膜和具有芳基的重复单元，在用光化射线或辐射照射时产生酸的化合物（B）和溶剂（C）; （ii）曝光胶片; 和（iii）使用包含有机溶剂的显影剂显影曝光的膜以形成负色调图案，其中树脂（A）是具有萘基的重复单元的树脂等，和/或光化射线敏感性或辐射敏感性树脂组合物含有具有萘环的化合物（D）等。

39. 发明申请

WO2013122264A1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE 审中-公开
标题翻译：图案形成方法，抗紫外线敏感性或辐射敏感性树脂组合物，电阻膜，制造电子器件的方法和电子器件
公开(公告)号：WO2013122264A1
公开(公告)日：2013-08-22
申请号：PCT/JP2013/054424
申请日：2013-02-15
申请人： FUJIFILM CORPORATION
发明人： YAMAMOTO, Kei , TAKAHASHI, Hidenori , YAMAGUCHI, Shuhei , ITO, Junichi
IPC分类号： G03F7/038 , G03F7/004 , G03F7/32 , H01L21/027
CPC分类号： G03F7/0388 , G03F7/0048 , G03F7/038 , G03F7/0397 , G03F7/11 , G03F7/20 , G03F7/2041 , G03F7/325 , G03F7/40
摘要： There is provided a pattern forming method, including: (a) forming a film by an actinic ray-sensitive or radiation-sensitive resin composition containing: (A) a resin capable of increasing polarity by an action of an acid to decrease solubility in an organic solvent-containing developer, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (C) a solvent, and (D) a resin, which contains substantially no fluorine atom and silicon atom and is other than the resin (A), (b) exposing the film; and (c) performing development using the organic solvent-containing developer to form a negative type pattern, wherein a receding contact angle of water on the film formed by (a) is 70C or more.
摘要翻译：提供了一种图案形成方法，其包括：（a）通过光化射线敏感或辐射敏感性树脂组合物形成膜，所述树脂组合物包含：（A）能够通过酸的作用增加极性的树脂，以降低溶解度含有有机溶剂的显影剂，（B）能够以光化射线或辐射照射后能够产生酸的化合物，（C）溶剂，（D）基本上不含氟原子和硅原子的树脂，比树脂（A），（b）曝光该膜; 和（c）使用含有机溶剂的显影剂进行显影以形成负型图案，其中由（a）形成的膜上的水的后退接触角为70℃以上。

40. 发明申请

WO2013115345A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME, PATTERN FORMING METHOD, MANUFACTURING METHOD OF ELECTRONIC DEVICE AND ELECTRONIC DEVICE 审中-公开
标题翻译：丙烯酸类敏感性或辐射敏感性树脂组合物，使用其的耐腐蚀膜，图案形成方法，电子器件和电子器件的制造方法
公开(公告)号：WO2013115345A1
公开(公告)日：2013-08-08
申请号：PCT/JP2013/052296
申请日：2013-01-25
申请人： FUJIFILM CORPORATION
发明人： YAMAGUCHI, Shuhei , TAKAHASHI, Hidenori , ITO, Junichi , YAMAMOTO, Kei
IPC分类号： G03F7/039 , C08F220/10 , G03F7/004 , G03F7/038 , G03F7/32 , H01L21/027
CPC分类号： G03F7/0388 , C08F220/18 , G03F7/0045 , G03F7/0046 , G03F7/038 , G03F7/0392 , G03F7/0397 , G03F7/11 , G03F7/20 , G03F7/2041 , G03F7/325
摘要： There is provided an actinic ray-sensitive or radiation-sensitive resin composition, having: (A) a resin having a repeating unit represented by formula (I); (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and (C) a resin having at least one repeating unit (x) out of a repeating unit represented by formula (II) and a repeating unit represented by formula (III) and containing substantially neither fluorine atom nor silicon atom, wherein the content of the repeating unit (x) is 90% or more by mole based on all repeating units in the resin (C): wherein Xa represents a hydrogen atom, an alkyl group, a cyano group or a halogen atom, each of R 1a , R 1b and R 1c independently represents an alkyl group or a cycloalkyl group, two members of R 1a , R 1b and R 1c may combine to form a ring structure, X b1 represents a hydrogen atom, an alkyl group, a cyano group or a halogen atom, R 2 represents an organic group having one or more CH 3 partial structures and being stable to acid, X b2 represents a hydrogen atom, an alkyl group, a cyano group or a halogen atom, R 3 represents an organic group having one or more CH 3 partial structures and being stable to acid, and n represents an integer of 1 to 5.
摘要翻译：提供了一种光化射线敏感或辐射敏感性树脂组合物，其具有：（A）具有由式（I）表示的重复单元的树脂; （B）能够在用光化射线或辐射照射时能产生酸的化合物; 和（C）具有由式（II）表示的重复单元中的至少一个重复单元（x）和基本上不包含氟原子或硅原子的式（III）表示的重复单元的树脂，其中，重复单元（x）基于树脂（C）中的所有重复单元为90％或更多摩尔：其中Xa表示氢原子，烷基，氰基或卤素原子，R1a，R1b和 R1c独立地表示烷基或环烷基，R1a，R1b和R1c的两个成员可以结合形成环结构，Xb1表示氢原子，烷基，氰基或卤素原子，R2表示有机基团具有一个或多个CH3部分结构并且对酸稳定，Xb2表示氢原子，烷基，氰基或卤素原子，R3表示具有一个或多个CH3部分结构并且对酸稳定的有机基团，以及 n表示1〜5的整数。

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