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1. 发明申请

WO2013047899A1 ACTINIC RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY- OR RADIATION-SENSITIVE FILM AND METHOD OF FORMING PATTERN 审中-公开
标题翻译：丙酰胺或辐射敏感性树脂组合物，丙烯酰胺或辐射敏感性膜及其形成方法
公开(公告)号：WO2013047899A1
公开(公告)日：2013-04-04
申请号：PCT/JP2012/075738
申请日：2012-09-27
申请人： FUJIFILM Corporation
发明人： KATAOKA, Shohei , SHIBUYA, Akinori , ITO, Junichi , MATSUDA, Tomoki , FUKUHARA, Toshiaki , TANGO, Naohiro , IWATO, Kaoru , YOSHIDOME, Masahiro , SUGIYAMA, Shinichi , TOKUGAWA, Yoko
IPC分类号： G03F7/039 , C08F220/28
CPC分类号： G03F7/038 , C08F220/28 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： According to one embodiment, there is provided an actinic ray- or radiation-sensitive resin composition containing (A) a resin containing a repeating unit represented by general formula (1) below and a repeating unit that is decomposed by an action of an acid to generate an alkali-soluble group, and (B) a compound that generates the acid when exposed to actinic rays or radiation, where L represents a bivalent connecting group, R 1 represents a hydrogen atom or an alkyl group, and Z represents a cyclic acid anhydride structure.
摘要翻译：根据一个实施方案，提供了一种光化射线或辐射敏感性树脂组合物，其含有（A）含有下述通式（1）表示的重复单元的树脂和通过酸作用分解的重复单元产生碱溶性基团，（B）当暴露于光化学射线或辐射时产生酸的化合物，其中L表示二价连接基团，R 1表示氢原子或烷基，Z表示环状酸酐结构体。

2. 发明申请

WO2014142360A1 METHOD OF FORMING PATTERN, ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM, PROCESS FOR MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE 审中-公开
标题翻译：形成图案，丙烯酸或辐射敏感性树脂组合物的方法，紫外线或辐射敏感膜，制造电子器件和电子器件的方法
公开(公告)号：WO2014142360A1
公开(公告)日：2014-09-18
申请号：PCT/JP2014/057940
申请日：2014-03-14
申请人： FUJIFILM CORPORATION
发明人： ITO, Junichi , SHIBUYA, Akinori , GOTO, Akiyoshi , SHIRAKAWA, Michihiro , YAMAMOTO, Kei , YOSHINO, Fumihiro
IPC分类号： G03F7/039 , C08F220/10 , G03F7/004 , G03F7/038 , H01L21/027
CPC分类号： G03F7/038 , C07C381/12 , C08F220/14 , C08F220/18 , C08F220/26 , C08F220/28 , C08F220/30 , C08F220/36 , C08F232/08 , G03F7/0045 , G03F7/0397 , G03F7/20 , G03F7/2041 , G03F7/325 , H01L21/0274
摘要： According to one embodiment, a method of forming a pattern includes (a) forming a film of an actinic-ray- or radiation-sensitive resin composition, (b) exposing the film to light, and (c) developing the exposed film with a developer comprising an organic solvent to thereby form a negative pattern. The actinic-ray- or radiation-sensitive resin composition includes (A) a resin whose solubility in the developer comprising an organic solvent is lowered when acted on by an acid, which resin contains a repeating unit with any of lactone structures of general formula (1) below, and (B) a compound that when exposed to actinic rays or radiation, generates an acid.
摘要翻译：根据一个实施方案，形成图案的方法包括（a）形成光化学射线或辐射敏感性树脂组合物的膜，（b）将膜曝光，和（c）将曝光的膜用显影剂包括有机溶剂，从而形成负图案。光化射线或辐射敏感性树脂组合物包括（A）当在含有有机溶剂的显影剂中的溶解度降低的树脂（A）作用于酸时，树脂含有具有通式（III）的内酯结构的重复单元 1）和（B）当暴露于光化射线或辐射时产生酸的化合物。

3. 发明申请

WO2013176294A1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE 审中-公开
标题翻译：图案形成方法，电泳敏感性或辐射敏感性树脂组合物，电阻膜，电子器件的制造方法和电子器件
公开(公告)号：WO2013176294A1
公开(公告)日：2013-11-28
申请号：PCT/JP2013/064967
申请日：2013-05-23
申请人： FUJIFILM CORPORATION
发明人： ITO, Junichi , YAMAGUCHI, Shuhei , TAKAHASHI, Hidenori , YAMAMOTO, Kei
IPC分类号： G03F7/038 , G03F7/004 , G03F7/039 , G03F7/32 , H01L21/027
CPC分类号： G03F7/0046 , C08F220/18 , C08F220/22 , G03F7/004 , G03F7/038 , G03F7/039 , G03F7/0397 , G03F7/091 , G03F7/11 , G03F7/2041 , G03F7/32 , G03F7/325 , G03F7/40 , H01L21/027 , H01L21/0273
摘要： There is provided a pattern forming method comprising (i) a step of forming a film by an actinic ray-sensitive or radiation-sensitive resin composition; (ii) a step of exposing the film; and (iii) a step of performing development by using a developer containing an organic solvent to form a negative pattern, wherein the actinic ray-sensitive or radiation-sensitive resin composition contains (A) a resin capable of increasing the polarity by an action of an acid to decrease the solubility in a developer containing an organic solvent, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (C) a solvent, and (D) a resin having a repeating unit having a fluorine atom and not having a CF 3 partial structure.
摘要翻译：提供了一种图案形成方法，其包括（i）通过光化射线敏感或辐射敏感树脂组合物形成膜的步骤; （ii）曝光胶片的步骤; （iii）通过使用含有有机溶剂的显影剂形成负型图案进行显影的工序，其中，所述光化射线敏感性或辐射敏感性树脂组合物含有（A）能够通过降低在含有有机溶剂的显影剂中的溶解性的酸，（B）在用光化射线或辐射照射时能够产生酸的化合物，（C）溶剂，（D）具有重复单元的树脂，不具有CF 3部分结构的氟原子。

4. 发明申请

WO2013100189A1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE 审中-公开
标题翻译：图案形成方法，电泳敏感性或辐射敏感性树脂组合物，电阻膜，电子器件的制造方法和电子器件
公开(公告)号：WO2013100189A1
公开(公告)日：2013-07-04
申请号：PCT/JP2012/084294
申请日：2012-12-27
申请人： FUJIFILM CORPORATION
发明人： ITO, Junichi , TAKAHASHI, Hidenori , YAMAGUCHI, Shuhei , YAMAMOTO, Kei
IPC分类号： G03F7/004 , G03F7/038 , G03F7/32
CPC分类号： G03F7/0388 , C08F220/18 , G03F7/0045 , G03F7/0046 , G03F7/038 , G03F7/0397 , G03F7/11 , G03F7/2041 , G03F7/325 , H01L21/0274
摘要： There is provided a pattern forming method comprising (i) a step of forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a resin capable of increasing the polarity by the action of an acid to decrease the solubility for an organic solvent-containing developer, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (C) a solvent, and (D) a resin substantially free from a fluorine atom and a silicon atom and different from the resin (A), (ii) a step of exposing the film, and (iii) a step of performing development by using an organic solvent-containing developer to form a negative pattern.
摘要翻译：提供了一种图案形成方法，其包括（i）通过使用光化学射线敏感或辐射敏感性树脂组合物形成膜的步骤，所述树脂组合物含有（A）能够通过酸的作用增加极性的树脂，以减少对于含有机溶剂的显影剂的溶解度，（B）在用光化学射线或辐射照射时能够产生酸的化合物，（C）溶剂，（D）基本上不含氟原子和硅原子的树脂并且不同于树脂（A），（ii）曝光膜的步骤，和（iii）通过使用含有机溶剂的显影剂进行显影以形成负图案的步骤。

5. 发明申请

WO2013069753A1 ACTINIC RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY- OR RADIATION-SENSITIVE FILM AND METHOD OF FORMING PATTERN 审中-公开
标题翻译：丙酰胺或辐射敏感性树脂组合物，丙烯酰胺或辐射敏感性膜及其形成方法
公开(公告)号：WO2013069753A1
公开(公告)日：2013-05-16
申请号：PCT/JP2012/079055
申请日：2012-11-02
申请人： FUJIFILM Corporation
发明人： SHIBUYA, Akinori , TOKUGAWA, Yoko , MATSUDA, Tomoki , ITO, Junichi , KATAOKA, Shohei , FUKUHARA, Toshiaki , TANGO, Naohiro , IWATO, Kaoru , YOSHIDOME, Masahiro , SUGIYAMA, Shinichi
IPC分类号： G03F7/004 , G03F7/038 , G03F7/039
CPC分类号： G03F7/038 , C07C303/32 , C07C309/04 , C07C309/12 , C07D295/16 , C07D327/06 , C07D339/08 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/11 , G03F7/2041 , G03F7/325
摘要： According to one embodiment, there is provided an actinic ray- or radiation-sensitive resin composition including (A) a compound represented by a general formula (1) below that generates an acid when exposed to actinic rays or radiation, and (B) a resin. (1)
摘要翻译：根据一个实施方案，提供了一种光化射线或辐射敏感性树脂组合物，其包含（A）下述通式（1）表示的化合物，当暴露于光化射线或辐射时产生酸，和（B）树脂。（1）

6. 发明申请

WO2011046192A1 COLORED CURABLE COMPOSITION, RESIST LIQUID, INK FOR INKJET PRINTING, COLOR FILTER, METHOD OF PRODUCING COLOR FILTER, SOLID-STATE IMAGE SENSOR, LIQUID CRYSTAL DISPLAY, ORGANIC EL DISPLAY, IMAGE DISPLAY DEVICE AND COLORANT COMPOUND 审中-公开
标题翻译：彩色固化组合物，电阻液体，用于喷墨打印的墨水，彩色滤光片，生产彩色滤光片的方法，固态图像传感器，液晶显示器，有机EL显示器，图像显示装置和着色剂化合物
公开(公告)号：WO2011046192A1
公开(公告)日：2011-04-21
申请号：PCT/JP2010/068098
申请日：2010-10-07
申请人： FUJIFILM Corporation , ITO, Junichi , MIZUKAWA, Yuki , YABUKI, Yoshiharu , KANNA, Shinichi , INABE, Haruki , KANEKO, Yushi , GOTO, Akiyoshi
发明人： ITO, Junichi , MIZUKAWA, Yuki , YABUKI, Yoshiharu , KANNA, Shinichi , INABE, Haruki , KANEKO, Yushi , GOTO, Akiyoshi
IPC分类号： C09B23/00 , C09B67/20 , C09D11/00 , G02B5/20 , G02B5/22 , G03F7/004 , H01L51/50 , H05B33/12
CPC分类号： C09D11/101 , C09B57/10 , C09B69/109 , C09D11/322 , G03F7/0007 , G03F7/105 , G03F7/40
摘要： The invention provides a colored curable composition including a dipyrromethene compound having a structure in which a polymerizable group and a carboxyl group are introduced in the same molecule, a resist liquid, an ink for inkjet printing, a color filter, a method of producing a color filter, a solid-state image sensor, a liquid crystal display, an organic EL display, an image display device and a colorant compound.
摘要翻译：本发明提供了一种着色固化性组合物，其包含具有将聚合性基团和羧基引入同一分子的结构的二吡咯亚甲基化合物，抗蚀剂液体，喷墨印刷用油墨，滤色器，颜色的制造方法滤光片，固态图像传感器，液晶显示器，有机EL显示器，图像显示装置和着色剂化合物。

7. 发明申请

WO2013122264A1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE 审中-公开
标题翻译：图案形成方法，抗紫外线敏感性或辐射敏感性树脂组合物，电阻膜，制造电子器件的方法和电子器件
公开(公告)号：WO2013122264A1
公开(公告)日：2013-08-22
申请号：PCT/JP2013/054424
申请日：2013-02-15
申请人： FUJIFILM CORPORATION
发明人： YAMAMOTO, Kei , TAKAHASHI, Hidenori , YAMAGUCHI, Shuhei , ITO, Junichi
IPC分类号： G03F7/038 , G03F7/004 , G03F7/32 , H01L21/027
CPC分类号： G03F7/0388 , G03F7/0048 , G03F7/038 , G03F7/0397 , G03F7/11 , G03F7/20 , G03F7/2041 , G03F7/325 , G03F7/40
摘要： There is provided a pattern forming method, including: (a) forming a film by an actinic ray-sensitive or radiation-sensitive resin composition containing: (A) a resin capable of increasing polarity by an action of an acid to decrease solubility in an organic solvent-containing developer, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (C) a solvent, and (D) a resin, which contains substantially no fluorine atom and silicon atom and is other than the resin (A), (b) exposing the film; and (c) performing development using the organic solvent-containing developer to form a negative type pattern, wherein a receding contact angle of water on the film formed by (a) is 70C or more.
摘要翻译：提供了一种图案形成方法，其包括：（a）通过光化射线敏感或辐射敏感性树脂组合物形成膜，所述树脂组合物包含：（A）能够通过酸的作用增加极性的树脂，以降低溶解度含有有机溶剂的显影剂，（B）能够以光化射线或辐射照射后能够产生酸的化合物，（C）溶剂，（D）基本上不含氟原子和硅原子的树脂，比树脂（A），（b）曝光该膜; 和（c）使用含有机溶剂的显影剂进行显影以形成负型图案，其中由（a）形成的膜上的水的后退接触角为70℃以上。

8. 发明申请

WO2013115345A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME, PATTERN FORMING METHOD, MANUFACTURING METHOD OF ELECTRONIC DEVICE AND ELECTRONIC DEVICE 审中-公开
标题翻译：丙烯酸类敏感性或辐射敏感性树脂组合物，使用其的耐腐蚀膜，图案形成方法，电子器件和电子器件的制造方法
公开(公告)号：WO2013115345A1
公开(公告)日：2013-08-08
申请号：PCT/JP2013/052296
申请日：2013-01-25
申请人： FUJIFILM CORPORATION
发明人： YAMAGUCHI, Shuhei , TAKAHASHI, Hidenori , ITO, Junichi , YAMAMOTO, Kei
IPC分类号： G03F7/039 , C08F220/10 , G03F7/004 , G03F7/038 , G03F7/32 , H01L21/027
CPC分类号： G03F7/0388 , C08F220/18 , G03F7/0045 , G03F7/0046 , G03F7/038 , G03F7/0392 , G03F7/0397 , G03F7/11 , G03F7/20 , G03F7/2041 , G03F7/325
摘要： There is provided an actinic ray-sensitive or radiation-sensitive resin composition, having: (A) a resin having a repeating unit represented by formula (I); (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and (C) a resin having at least one repeating unit (x) out of a repeating unit represented by formula (II) and a repeating unit represented by formula (III) and containing substantially neither fluorine atom nor silicon atom, wherein the content of the repeating unit (x) is 90% or more by mole based on all repeating units in the resin (C): wherein Xa represents a hydrogen atom, an alkyl group, a cyano group or a halogen atom, each of R 1a , R 1b and R 1c independently represents an alkyl group or a cycloalkyl group, two members of R 1a , R 1b and R 1c may combine to form a ring structure, X b1 represents a hydrogen atom, an alkyl group, a cyano group or a halogen atom, R 2 represents an organic group having one or more CH 3 partial structures and being stable to acid, X b2 represents a hydrogen atom, an alkyl group, a cyano group or a halogen atom, R 3 represents an organic group having one or more CH 3 partial structures and being stable to acid, and n represents an integer of 1 to 5.
摘要翻译：提供了一种光化射线敏感或辐射敏感性树脂组合物，其具有：（A）具有由式（I）表示的重复单元的树脂; （B）能够在用光化射线或辐射照射时能产生酸的化合物; 和（C）具有由式（II）表示的重复单元中的至少一个重复单元（x）和基本上不包含氟原子或硅原子的式（III）表示的重复单元的树脂，其中，重复单元（x）基于树脂（C）中的所有重复单元为90％或更多摩尔：其中Xa表示氢原子，烷基，氰基或卤素原子，R1a，R1b和 R1c独立地表示烷基或环烷基，R1a，R1b和R1c的两个成员可以结合形成环结构，Xb1表示氢原子，烷基，氰基或卤素原子，R2表示有机基团具有一个或多个CH3部分结构并且对酸稳定，Xb2表示氢原子，烷基，氰基或卤素原子，R3表示具有一个或多个CH3部分结构并且对酸稳定的有机基团，以及 n表示1〜5的整数。

9. 发明申请

WO2013047911A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM, METHOD OF FORMING PATTERN USING THE COMPOSITION, PROCESS FOR MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE 审中-公开
标题翻译：抗紫外线或辐射敏感性树脂组合物，其抗紫外线或辐射敏感膜，使用该组合物形成图案的方法，制造电子器件和电子器件的方法
公开(公告)号：WO2013047911A1
公开(公告)日：2013-04-04
申请号：PCT/JP2012/075880
申请日：2012-09-28
申请人： FUJIFILM Corporation
发明人： ITO, Junichi , SHIBUYA, Akinori , MATSUDA, Tomoki , TOKUGAWA, Yoko , FUKUHARA, Toshiaki , TANGO, Naohiro , IWATO, Kaoru , YOSHIDOME, Masahiro , SUGIYAMA, Shinichi , KATAOKA, Shohei
IPC分类号： G03F7/004 , C07C381/12 , C07D327/08 , C07D333/76 , G03F7/039
CPC分类号： G03F7/027 , C07C309/06 , C07C309/12 , C07C309/17 , C07C311/48 , C07C381/12 , C07C2601/08 , C07C2601/14 , C07C2603/74 , C07D279/30 , C07D307/33 , C07D327/08 , C07D333/76 , C07D335/16 , C07D339/08 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： Provided is an actinic-ray- or radiation-sensitive resin composition, including any of compounds of general formula (1) below that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid and a resin that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer.
摘要翻译：本发明提供了一种光化学射线或辐射敏感性树脂组合物，其包括以下通式（1）的任何化合物，当暴露于光化射线或辐射时，其被分解，从而产生酸和树脂，当被酸分解，从而增加其在碱性显影剂中的溶解度。

10. 发明申请

WO2011040628A1 COLORANT MULTIMER, COLORED CURABLE COMPOSITION, COLOR FILTER AND METHOD FOR PRODUCING THE SAME, AND SOLID-STATE IMAGE SENSOR, IMAGE DISPLAY DEVICE, LIQUID CRYSTAL DISPLAY DEVICE AND ORGANIC EL DISPLAY WITH THE COLOR FILTER 审中-公开
标题翻译：彩色多彩色彩，彩色滤光片及其制造方法，固体摄影传感器，图像显示装置，液晶显示器件和有机EL显示器与彩色滤光片
公开(公告)号：WO2011040628A1
公开(公告)日：2011-04-07
申请号：PCT/JP2010/067321
申请日：2010-09-28
申请人： FUJIFILM Corporation , ITO, Junichi , YOSHIKAWA, Masaru , MIZUKAWA, Yuki , USHIJIMA, Kenta , KANNA, Shinichi , INABE, Haruki , FUJIE, Yoshihiko , GOTO, Akiyoshi , KANEKO, Yushi , IDEI, Hiroaki
发明人： ITO, Junichi , YOSHIKAWA, Masaru , MIZUKAWA, Yuki , USHIJIMA, Kenta , KANNA, Shinichi , INABE, Haruki , FUJIE, Yoshihiko , GOTO, Akiyoshi , KANEKO, Yushi , IDEI, Hiroaki
IPC分类号： C09B69/10 , C08F2/50 , C08F20/02 , C08F20/34 , C08F20/38 , C08F20/56 , C08F20/60 , C08F220/36 , C08F220/60 , C09B23/00 , C09B57/10 , G02B5/20 , G02B5/22 , G02F1/1335 , G03F7/004 , G03F7/032 , G03F7/033 , G03F7/038 , G03F7/40 , H01L27/14 , H01L51/50 , H05B33/12
CPC分类号： C08F2/50 , C08F220/36 , C08F220/60 , C09B23/04 , C09B57/10 , C09B69/108 , C09K11/06 , C09K2211/1408 , C09K2211/188 , G02B5/22 , G02F1/133516 , G03F7/0007 , G03F7/027 , G03F7/033 , G03F7/0388 , G03F7/105 , H01L27/322 , H05B33/12
摘要： A colorant multimer includes, as a partial structure of a colorant moiety, a dipyrromethene metal complex compound or tautomer thereof obtained from: (i) a dipyrromethene compound represented by the following Formula (M); and (ii) a metal or a metal compound: wherein in Formula (M), R 4 , R 5 , R 6 , R 7 , R 8 , R 9 , and R 10 each independently represent a hydrogen atom or a monovalent substituent.
摘要翻译：着色剂多聚体包括作为着色剂部分的部分结构的二吡咯亚甲基金属络合物或其互变异构体，其由以下物质获得：（i）由下式（M）表示的二吡咯亚甲基化合物; 和（ii）金属或金属化合物：其中在式（M）中，R 4，R 5，R 6，R 7，R 8，R 9和R 10各自独立地表示氢原子或一价取代基。

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