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21. 发明申请

WO2014055974A1 METHOD AND SYSTEM FOR REDUCING CURTAINING IN CHARGED PARTICLE BEAM SAMPLE PREPARATION 审中-公开
标题翻译：用于减少充电颗粒光束样品制备中的遮蔽的方法和系统
公开(公告)号：WO2014055974A1
公开(公告)日：2014-04-10
申请号：PCT/US2013/063640
申请日：2013-10-07
申请人： FEI COMPANY
发明人： SCHMIDT, Michael , KIM, Hyun Hwa , LEE, Sang Hoon , STONE, Stacey , BLACKWOOD, Jeffrey
IPC分类号： H01L21/66
CPC分类号： G01N1/32 , G01N1/286 , H01J37/20 , H01J37/3053 , H01J2237/31745
摘要： A method and system for exposing a portion of a structure in a sample for observation in a charged particle beam system, including extracting a sample from a bulk sample; determining an orientation of the sample that reduces curtaining; mounting the sample to a holder in the charged particle beam system so that the holder orients the sample in an orientation that reduces curtaining when the sample is milled to expose the structure; exposing the structure by milling the sample in a direction that reduces curtaining; and imaging the structure.
摘要翻译：一种方法和系统，用于暴露用于在带电粒子束系统中观察的样品中的结构的一部分，包括从大量样品中提取样品; 确定减少绘制的样品的取向; 将样品安装到带电粒子束系统中的保持器上，使得保持器以样品取向使得当样品被研磨以暴露结构时减少绘制的取向; 通过在减少绘制的方向上研磨样品来暴露结构; 并对结构进行成像。

22. 发明申请

WO2013177209A1 PREPARATION OF LAMELLAE FOR TEM VIEWING 审中-公开
标题翻译：用于TEM观察的LAMELLAE的制备
公开(公告)号：WO2013177209A1
公开(公告)日：2013-11-28
申请号：PCT/US2013/042090
申请日：2013-05-21
申请人： FEI COMPANY
发明人： FULLER, Scott Edward , ROUTH, JR, Brian Roberts , MORIARTY, Michael
IPC分类号： H01J37/30 , H01J37/08
CPC分类号： H01J37/3026 , G01N1/32 , H01J2237/31745
摘要： A method and apparatus for producing thin lamella for TEM observation. The steps of the method are robust and can be used to produce lamella in an automated process. In some embodiments, a protective coating have a sputtering rate matched to the sputtering rate of the work piece is deposited before forming the lamella. In some embodiments, the bottom of the lamella slopes away from the feature of interest, which keeps the lamella stable and reduces movement during thinning. In some embodiments, a fiducial is used to position the beam for the final thinning, instead of using an edge of the lamella. In some embodiments, the tabs are completed after high ion energy final thinning to keep the lamella more stable. In some embodiments, a defocused low ion energy and pattern refresh delay is used for the final cut to reduce deformation of the lamella.
摘要翻译：用于TEM观察的薄片制造方法和装置。该方法的步骤是稳健的并且可以用于在自动化过程中产生薄片。在一些实施例中，在形成薄片之前，保护涂层具有与工件的溅射速率相匹配的溅射速率。在一些实施例中，薄片的底部远离感兴趣的特征，其保持薄片稳定并减少变薄期间的运动。在一些实施例中，使用基准来定位光束以进行最终的变薄，而不是使用薄片的边缘。在一些实施方案中，在高离子能量最终变薄之后，突片完成以保持薄片更稳定。在一些实施例中，散焦的低离子能量和图案刷新延迟用于最终切割以减小薄片的变形。

23. 发明申请

WO2012044977A2 COMPACT RF ANTENNA FOR AN INDUCTIVELY COUPLED PLASMA ION SOURCE 审中-公开
标题翻译：用于感应耦合等离子体源的紧凑射频天线
公开(公告)号：WO2012044977A2
公开(公告)日：2012-04-05
申请号：PCT/US2011/054299
申请日：2011-09-30
申请人： FEI Company , ZHANG, Shouyin
发明人： ZHANG, Shouyin
IPC分类号： H01J37/08 , H01J27/16 , H05H1/46
CPC分类号： H01J37/08 , H01J37/3211 , H01J2237/0815
摘要： An inductively coupled plasma ion source for a focused ion beam (FIB) system is disclosed, comprising an insulating plasma chamber with a feed gas delivery system, a compact radio frequency (RF) antenna coil positioned concentric to the plasma chamber and in proximity to, or in contact with, the outer diameter of the plasma chamber. In some embodiments, the plasma chamber is surrounded by a Faraday shield to prevent capacitive coupling between the RF voltage on the antenna and the plasma within the plasma chamber. High dielectric strength insulating tubing is heat shrunk onto the outer diameter of the conductive tubing or wire used to form the antenna to allow close packing of turns within the antenna coil. The insulating tubing is capable of standing off the RF voltage differences between different portions of the antenna, and between the antenna and the Faraday shield.
摘要翻译：公开了一种用于聚焦离子束（FIB）系统的电感耦合等离子体离子源，其包括具有进料气体输送系统的绝缘等离子体室，与等离子体腔室同心定位的紧凑型射频（RF）天线线圈，或与等离子体室的外径接触。在一些实施例中，等离子体室由法拉第屏蔽围绕，以防止天线上的RF电压与等离子体室内的等离子体之间的电容耦合。高介电强度绝缘管热收缩到用于形成天线的导电管或导线的外径上，以允许天线线圈内的匝紧密封装。绝缘管能够防止天线的不同部分之间以及天线和法拉第屏蔽之间的RF电压差异。

24. 发明申请

WO2012021652A2 CHARGED PARTICLE DETECTOR 审中-公开
标题翻译：充电颗粒检测器
公开(公告)号：WO2012021652A2
公开(公告)日：2012-02-16
申请号：PCT/US2011/047294
申请日：2011-08-10
申请人： FEI COMPANY , KNEEDLER, Eric , ORLOFF, Jonathan, H.
发明人： KNEEDLER, Eric , ORLOFF, Jonathan, H.
IPC分类号： H01J37/22 , H01J37/244
CPC分类号： H01J37/244 , H01J37/28 , H01J2237/04 , H01J2237/04756 , H01J2237/0535
摘要： A charged particle beam system for imaging and processing targets is disclosed, comprising a charged particle column, a secondary particle detector, and a secondary particle detection grid assembly between the target and detector. In one embodiment, the grid assembly comprises a multiplicity of grids, each with a separate bias voltage, wherein the electric field between the target and the grids may be adjusted using the grid voltages to optimize the spatial distribution of secondary particles reaching the detector. Since detector lifetime is determined by the total dose accumulated at the area on the detector receiving the largest dose, detector lifetime can be increased by making the dose into the detector more spatially uniform. A single resistive grid assembly with a radial voltage gradient may replace the separate grids. A multiplicity of deflector electrodes may be located between the target and grid to enhance shaping of the electric field.
摘要翻译：公开了一种用于成像和处理目标的带电粒子束系统，包括带电粒子柱，二次粒子检测器和靶和检测器之间的二次粒子检测栅组件。在一个实施例中，电网组件包括多个栅格，每个具有单独的偏置电压，其中可以使用电网电压来调整目标和栅极之间的电场，以优化到达检测器的次级颗粒的空间分布。由于检测器寿命由在接收最大剂量的检测器上的区域累积的总剂量确定，所以可以通过使检测器中的剂量在空间上更均匀地增加检测器寿命。具有径向电压梯度的单个电阻栅组件可以替代单独的栅极。多个偏转器电极可以位于靶和栅格之间以增强电场的形状。

25. 发明申请

WO2012006558A2 CHARGED PARTICLE BEAM PROCESSING SYSTEM WITH VISUAL AND INFRARED IMAGING 审中-公开
标题翻译：带视觉和红外成像的带电粒子束处理系统
公开(公告)号：WO2012006558A2
公开(公告)日：2012-01-12
申请号：PCT/US2011/043410
申请日：2011-07-08
申请人： FEI COMPANY , RUE, Chad , CROWLEY, Daniel
发明人： RUE, Chad , CROWLEY, Daniel
IPC分类号： H01J37/22 , H01J37/08 , H01J37/20 , H01J37/244
CPC分类号： G01J3/0262 , G01J3/0208 , G01J3/0278 , G01N21/9501 , G01N21/95684 , G01N2021/8825 , G01N2021/95653 , H01J37/226 , H01J37/3005 , H01J37/3056 , H01J2237/31749
摘要： A charged particle beam system for processing substrates is disclosed, comprising a charged particle column, combination infrared radiation and visible light illumination and imaging subsystems, in-vacuum optics, and a precision stage for supporting and positioning the substrate alternately under the charged particle column and the imaging system. The axes of the charged particle column and imaging system are offset to enable much closer working distances for both imaging and beam processing than would be possible in a single integrated assembly. A method for extremely accurately calibrating the offset between the column and imaging system is disclosed, enabling beam processing at precisely-determined locations on the substrate. The imaging system is capable of locating sub-surface features on the substrate which cannot be seen using the charged particle beam. Two illumination modes are disclosed, enabling both bright-field and dark-field imaging in infrared radiation and visible light.
摘要翻译：公开了一种用于处理基板的带电粒子束系统，其包括带电粒子柱，组合式红外辐射和可见光照明和成像子系统，真空中光学器件以及用于支撑和定位衬底交替地位于带电粒子柱和成像系统下方。带电粒子柱和成像系统的轴偏移，使得成像和光束处理的工作距离比单个集成组件中的可能距离更近。公开了一种用于非常准确地校准柱和成像系统之间的偏移的方法，使得能够在衬底上精确确定的位置处进行光束处理。成像系统能够在衬底上定位使用带电粒子束无法看到的子表面特征。公开了两种照明模式，使红外辐射和可见光中的明场和暗场成像成为可能。

26. 发明申请

WO2011060444A2 GAS DELIVERY FOR BEAM PROCESSING SYSTEMS 审中-公开
标题翻译：用于光束处理系统的气体输送
公开(公告)号：WO2011060444A2
公开(公告)日：2011-05-19
申请号：PCT/US2010/056895
申请日：2010-11-16
申请人： FEI COMPANY , CHANDLER, Clive, D. , RANDOLPH, Steven , HARTIGAN, Gavin
发明人： CHANDLER, Clive, D. , RANDOLPH, Steven , HARTIGAN, Gavin
CPC分类号： C23C16/047 , C23C16/4485 , C23C16/45523 , C23C16/45561 , H01J2237/006
摘要： Gas flow from multiple gas sources into a sample chamber of a beam system is controlled by a cycling valve for each gas source, with the gas pressure in the sample chamber being determined by the relative time that the valve is opened and the upstream pressure at the valve. A gas valve positioned inside the vacuum chamber allows rapid response in shutting off a gas. In some preferred embodiments, a precursor gas is supplied from a solid or liquid material in a container that remains outside the vacuum system while in use and which is readily connected or disconnected to the gas injection system without significant leakage.
摘要翻译：从多个气体源到梁系统的样品室的气体流量由用于每个气体源的循环阀控制，样品室中的气体压力由阀门打开的相对时间和阀。位于真空室内部的气阀允许在关闭气体时快速响应。在一些优选的实施方案中，前体气体从固体或液体材料供应到容器中，该容器在使用过程中保持在真空系统外部，并且容易地与气体注入系统连接或断开而没有显着的泄漏。

27. 发明申请

WO2011035260A4 DISTRIBUTED ION SOURCE ACCELERATION COLUMN 审中-公开
公开(公告)号：WO2011035260A4
公开(公告)日：2011-03-24
申请号：PCT/US2010/049525
申请日：2010-09-20
申请人： FEI COMPANY , UNITED STATES OF AMERICA as respresented by THE SECRETARY OF COMMERCE, THE NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY , MCCLELLAND, Jabez, J. , KNUFFMAN, Brenton, J. , STEELE, Adam, V. , ORLOFF, Jonathan, H.
发明人： MCCLELLAND, Jabez, J. , KNUFFMAN, Brenton, J. , STEELE, Adam, V. , ORLOFF, Jonathan, H.
IPC分类号： H01J27/02 , H01J37/04
摘要： An ion beam system uses a separate accelerating electrode, such as a resistive tube, to accelerate the ions while maintaining a low electric field at an extended, that is, distributed, ion source, thereby improving resolution. A magneto-optical trap can be used as the ion source.

28. 发明申请

WO2010006188A2 METHOD AND APPARATUS FOR LASER MACHINING 审中-公开
标题翻译：用于激光加工的方法和设备
公开(公告)号：WO2010006188A2
公开(公告)日：2010-01-14
申请号：PCT/US2009/050135
申请日：2009-07-09
申请人： FEI COMPANY , STRAW, Marcus , SAMSAVAR, Amin , UTLAUT, Mark , TOTH, Milos
发明人： STRAW, Marcus , SAMSAVAR, Amin , UTLAUT, Mark , TOTH, Milos
IPC分类号： B23K26/36 , B23K26/42 , G01N23/225 , G01N23/00
CPC分类号： B23K26/03 , B23K26/0622 , B23K26/0853 , B23K26/14 , B23K26/1423 , B23K26/1429 , H01J2237/2813
摘要： A charged particle beam and a laser beam are used together to micromachine a substrate. A first beam alters the state of a region of the work piece, and the second beam removes material whose state was altered. In one embodiment, an ion beam can create photon absorbing defects to lower the local ablation threshold, allowing the laser beam to remove material in a region defined by the ion beam. The combination of laser beam and charged particle beam allows the creation of features similar in size to the charged particle beam spot size, at milling rates greater than charged particle processing because of the increased energy provided by the laser beam.
摘要翻译：带电粒子束和激光束一起使用以微基板化。第一束改变工件区域的状态，第二束移除其状态改变的材料。在一个实施例中，离子束可以产生光子吸收缺陷以降低局部消融阈值，允许激光束去除由离子束限定的区域中的材料。由于激光束提供的能量增加，激光束和带电粒子束的组合允许产生与带电粒子束斑尺寸类似的特征，其铣削速率高于带电粒子加工。

29. 发明申请

WO2004027809A2 CHARGED PARTICLE BEAM SYSTEM 审中-公开
标题翻译：带电粒子束系统
公开(公告)号：WO2004027809A2
公开(公告)日：2004-04-01
申请号：PCT/US2003/029447
申请日：2003-09-18
申请人： FEI COMPANY , STEWART, Diane, K. , KNOWLES, Ralph, W. , KIMBALL, Brian, T.
发明人： STEWART, Diane, K. , KNOWLES, Ralph, W. , KIMBALL, Brian, T.
IPC分类号： H01J
CPC分类号： H01J37/26 , H01J37/244 , H01J2237/0045 , H01J2237/2448 , H01J2237/2605
摘要： A charged particle beam system uses an ion generator for charge neutralization. In some embodiments, the ion generator is configured to maintain an adequate gas pressure at the ion generator to generate ions, but a reduced pressure in the remainder of the vacuum chamber, so that another column can operate in the chamber either simultaneously or after an evacuation process that is much shorter than a process that would be required to evacuate the chamber from the full pressure required at the ion generator. The invention is particularly useful for repair of photolithography masks in a dual beam system.
摘要翻译：带电粒子束系统使用离子发生器来进行电荷中和。在一些实施例中，离子发生器被配置为在离子发生器处维持足够的气体压力以产生离子，但是在真空室的其余部分中减压，使得另一个塔可以同时或在排空之后在腔室中操作该过程比离子发生器所需的全压抽真空所需的过程短得多。本发明对修复双光束系统中的光刻掩模特别有用。

30. 发明申请

WO2004015496A2 REPAIRING DEFECTS ON PHOTOMASKS USING A CHARGED PARTICLE BEAM AND TOPOGRAPHICAL DATA FROM A SCANNING PROBE MICROSCOPE 审中-公开
标题翻译：使用扫描探针显微镜的充电颗粒光束和地形数据修复光刻胶的缺陷
公开(公告)号：WO2004015496A2
公开(公告)日：2004-02-19
申请号：PCT/US2003/025801
申请日：2003-08-08
申请人： FEI COMPANY , FERRANTI, David, C. , RAY, Valery , SMITH, Gerald , MUSIL, Christian, R.
发明人： FERRANTI, David, C. , RAY, Valery , SMITH, Gerald , MUSIL, Christian, R.
IPC分类号： G03F
CPC分类号： G03F1/74
摘要： Topographical data from a scanning probe microscope or similar device is used as a substitute for endpoint detection to allow accurate repair of defects in phase shift photomasks using a charged particle beam system. The topographical data from a defect area is used to create a display of a semitransparent topographical map, which can be superimposed over a charged particle beam image. The density of the topographical image and the alignment of the two images can be adjusted by the operator in order to accurately position the beam. Topographical data from an SPM can also be used to adjust charged particle beam dose for each point within the defect area based upon the elevation and surface angle at the particular point.
摘要翻译：使用扫描探针显微镜或类似装置的地形数据作为端点检测的替代物，以允许使用带电粒子束系统对相移光掩模进行精确修复。来自缺陷区域的地形数据用于创建可叠加在带电粒子束图像上的半透明地形图的显示。可以通过操作者调整地形图像的密度和两幅图像的对准，以便准确地定位光束。来自SPM的地形数据也可用于根据特定点处的高程和表面角度来调整缺陷区域内每个点的带电粒子束剂量。

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