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    • 21. 发明申请
    • SEMICONDUCTOR DEVICE, MANUFACTURING METHOD THEREOF, AND DISPLAY DEVICE INCLUDING THE SEMICONDUCTOR DEVICE
    • 半导体装置,其制造方法以及包含该半导体装置的显示装置
    • WO2017149428A1
    • 2017-09-08
    • PCT/IB2017/051122
    • 2017-02-27
    • SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
    • YAMAZAKI, ShunpeiKOEZUKA, JunichiOKAZAKI, KenichiNAKAZAWA, Yasutaka
    • H01L29/786G02F1/1368G09F9/30H01L21/336H01L51/50H05B33/14
    • The field-effect mobility and reliability of a transistor including an oxide semiconductor film are improved. One embodiment of the present invention is a semiconductor device which includes a gate electrode, an insulating film over the gate electrode, an oxide semiconductor film over the insulating film, and a pair of electrodes over the oxide semiconductor film. The oxide semiconductor film includes a first oxide semiconductor film, a second oxide semiconductor film over the first oxide semiconductor film, and a third oxide semiconductor film over the second oxide semiconductor film. The first oxide semiconductor film, the second oxide semiconductor film, and the third oxide semiconductor film include the same element. The second oxide semiconductor film includes a region having lower crystallinity than one or both of the first oxide semiconductor film and the third oxide semiconductor film.
    • 包括氧化物半导体膜的晶体管的场效应迁移率和可靠性得到改善。 本发明的一个实施例是一种半导体器件,其包括栅电极,栅电极上的绝缘膜,绝缘膜上的氧化物半导体膜以及氧化物半导体膜上的一对电极。 氧化物半导体膜包括第一氧化物半导体膜,第一氧化物半导体膜上的第二氧化物半导体膜以及第二氧化物半导体膜上的第三氧化物半导体膜。 第一氧化物半导体膜,第二氧化物半导体膜和第三氧化物半导体膜包括相同的元素。 第二氧化物半导体膜包括具有比第一氧化物半导体膜和第三氧化物半导体膜中的一者或两者低的结晶度的区域。