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21. 发明申请

WO2007087101A3 SYSTEMS AND METHODS FOR INSPECTING A WAFER WITH INCREASED SENSITIVITY 审中-公开
公开(公告)号：WO2007087101A3
公开(公告)日：2007-08-02
申请号：PCT/US2006/062097
申请日：2006-12-14
申请人： KLA-TENCOR TECHNOLOGIES CORPORATION , SHORTT, David , HALLER, Kurt L. , WOLTERS, Christian
发明人： HALLER, Kurt L. , WOLTERS, Christian
IPC分类号： B08B3/12
摘要： Systems and methods for inspecting a wafer with increased sensitivity are provided. One system includes an inspection subsystem configured to direct light to a spot on the wafer and to generate output signals responsive to light scattered from the spot on the wafer. The system also includes a gas flow subsystem configured to replace a gas located proximate to the spot on the wafer with a medium that scatters less of the light than the gas thereby increasing the sensitivity of the system. In addition, the system includes a processor configured to detect defects on the wafer using the output signals.

22. 发明申请

WO2006133235A2 SERRATED FOURIER FILTERS AND INSPECTION SYSTEMS 审中-公开
标题翻译： SERIED过滤器和检测系统
公开(公告)号：WO2006133235A2
公开(公告)日：2006-12-14
申请号：PCT/US2006/022009
申请日：2006-06-06
申请人： KLA-TENCOR TECHNOLOGIES CORPORATION , JEONG, Hwan, J. , HILL, Andrew, V. , WANG, Mark, S.
发明人： JEONG, Hwan, J. , HILL, Andrew, V. , WANG, Mark, S.
IPC分类号： G01N21/88
CPC分类号： G01N21/95623
摘要： Serrated Fourier filters and inspection systems are provided. One Fourier filter includes one or more blocking elements configured to block a portion of light from a wafer. The Fourier filter also includes periodic serrations formed on edges of the one or more blocking elements. The periodic serrations define a transition region of the one or more blocking elements. The periodic serrations are configured to vary transmission across the transition region such that variations in the transmission across the transition region are substantially smooth. One inspection system includes a Fourier filter configured as described above and a detector that is configured to detect light transmitted by the Fourier filter. Signals generated by the detector can be used to detect the defects on the wafer.
摘要翻译：提供锯齿傅立叶滤波器和检测系统。一个傅立叶滤波器包括被配置为阻挡来自晶片的一部分光的一个或多个阻挡元件。傅立叶滤波器还包括形成在一个或多个阻挡元件的边缘上的周期性锯齿。周期性锯齿限定了一个或多个阻挡元件的过渡区域。周期性锯齿被配置为改变穿过过渡区域的传输，使得跨越过渡区域的透射率的变化基本上是平滑的。一个检查系统包括如上所述构造的傅里叶滤波器和被配置为检测由傅里叶滤波器发送的光的检测器。由检测器产生的信号可用于检测晶片上的缺陷。

23. 发明申请

WO2006055360A1 METHODS AND SYSTEMS FOR POSITIONING MICROSPHERES FOR IMAGING 审中-公开
标题翻译：定位微球用于成像的方法和系统
公开(公告)号：WO2006055360A1
公开(公告)日：2006-05-26
申请号：PCT/US2005/040532
申请日：2005-11-09
申请人： LUMINEX CORPORATION , PEMPSELL, Paul
发明人： PEMPSELL, Paul
IPC分类号： G01N15/06 , G01N1/28 , G01N33/487 , A61M1/00
CPC分类号： G01N1/4077 , B01J2219/00414 , B01J2219/00423 , B01J2219/00466 , B01J2219/005 , B01L3/502753 , B01L3/502761 , B01L3/5085 , B01L2200/0668 , B01L2300/0819 , B01L2400/049 , G01N15/0618 , G01N15/1475 , G01N2015/1472 , G01N2035/00574
摘要： Various methods and systems for positioning microspheres for imaging are provided. One system includes a filter medium that includes openings. The openings are spaced in a substantially equidistant manner across the filter medium. The system also includes a flow subsystem coupled to the filter medium. The flow subsystem is configured to exert a force on the microspheres such that the microspheres are positioned above the openings. A method for positioning microspheres for imaging includes exerting a force on the microspheres through a filter medium such that the microspheres are positioned above openings in the filter medium. The openings are spaced as described above.
摘要翻译：提供了用于定位用于成像的微球体的各种方法和系统。一个系统包括包含开口的过滤介质。开口在过滤介质上以基本上等距的方式间隔开。该系统还包括耦合到过滤介质的流量子系统。流动子系统被配置成对微球施加力，使得微球位于开口上方。用于定位用于成像的微球体的方法包括通过过滤介质对微球体施加力，使得微球体定位在过滤介质中的开口上方。开口如上所述间隔开。

24. 发明申请

WO2005071389A1 METHODS FOR ALTERING ONE OR MORE PARAMETERS OF A MEASUREMENT SYSTEM 审中-公开
标题翻译：用于改变测量系统的一个或多个参数的方法
公开(公告)号：WO2005071389A1
公开(公告)日：2005-08-04
申请号：PCT/US2005/000509
申请日：2005-01-07
申请人： LUMINEX CORPORATION , CALVIN, Edward
发明人： CALVIN, Edward
IPC分类号： G01N15/14
CPC分类号： G06K9/6262 , G01N15/1459 , G01N15/1463 , G01N2015/1465 , G01N2015/1497 , G06K9/00147 , G06K9/6228
摘要： Methods for altering one or more parameters of a measurement system are provided. One method includes analyzing a sample using the system to generate values from classification channels of the system for a population of particles in the sample. The method also includes identifying a region in a classification space in which the values for the populations are located. In addition, the method includes determining an optimized classification region for the population using one or more properties of the region. The optimized classification region contains a predetermined percentage of the values for the population. The optimized classification region is used for classification of particles in additional samples.
摘要翻译：提供了用于改变测量系统的一个或多个参数的方法。一种方法包括使用系统分析样品以从样品中的颗粒群体的系统的分类通道产生值。该方法还包括识别分类空间中的群体的值所位于的区域。此外，该方法包括使用区域的一个或多个属性来确定群体的优化分类区域。优化的分类区域包含对于群体的值的预定百分比。优化的分类区域用于附加样品中颗粒的分类。

25. 发明申请

WO2005061849A1 METHODS AND APPARATUS FOR SUBTERRANEAN FLUID SEPARATION AND REMOVAL 审中-公开
标题翻译：用于流体分离和去除的方法和装置
公开(公告)号：WO2005061849A1
公开(公告)日：2005-07-07
申请号：PCT/US2003/037957
申请日：2003-11-21
申请人： JACOBSON OIL ENTERPRISES
发明人： JACOBSON, Henry, P. , ROCKLEY, Mark, G.
IPC分类号： E21B43/00
CPC分类号： F04B19/14 , E21B43/00
摘要： A method and an apparatus for producing a liquid-phase hydrocarbon fluid (50) from a producing formation (10) are provided. The method includes moving a continuous loop of absorbent material (20) through a well (12), which is disposed in the formation (10). The absorbent material (20) absorbs the hydrocarbon fluid (50) in the well (12) without absorbing a substantial amount of water in the well (12). The method further includes removing the hydrocarbon fluid (50) from the absorbent material (20). Likewise, the apparatus includes a continuous loop of absorbent material (20) configured to absorb hydrocarbon fluid (50) without absorbing a substantial amount of water. The apparatus further includes a drive assembly (22) configured to move the absorbent material (20) through a well (12) disposed in the formation (10). Additionally, the apparatus includes a collection assembly (32) configured to remove the hydrocarbon fluid (50) from the absorbent material (20). Furthermore, alternative apparatus embodiments with their respective methods, similar to those listed above, are additionally provided. The absorbent material (20) found in all embodiments may be hydrophobic or hydrophilic.
摘要翻译：提供了一种从生产层（10）生产液相烃流体（50）的方法和装置。该方法包括使吸收材料（20）的连续环通过设置在地层（10）中的井（12）移动。吸收材料（20）吸收井（12）中的烃流体（50）而不在井（12）中吸收大量的水。该方法还包括从吸收材料（20）中去除烃流体（50）。类似地，该设备包括吸收材料（20）的连续回路，其构造成吸收烃流体（50）而不吸收大量的水。该装置还包括驱动组件（22），其构造成通过设置在地层（10）中的井（12）移动吸收材料（20）。此外，该装置包括构造成从吸收材料（20）去除烃流体（50）的收集组件（32）。此外，附加地提供了与各自方法类似的替代装置实施例。在所有实施方案中发现的吸收材料（20）可以是疏水的或亲水的。

26. 发明申请

WO2005017498A1 LIGHT EMITTING DIODE BASED MEASUREMENT SYSTEMS 审中-公开
标题翻译：基于发光二极管的测量系统
公开(公告)号：WO2005017498A1
公开(公告)日：2005-02-24
申请号：PCT/US2004/024987
申请日：2004-08-03
申请人： LUMINEX CORPORATION , ROTH, Wayne, D.
发明人： ROTH, Wayne, D.
IPC分类号： G01N15/14
CPC分类号： G01N15/1434
摘要： Various light emitting diode (LED) based measurement systems and methods are provided. One system includes one or more arrays of LEDs (14, 16, 18) arranged along a flow path (20) of a sample (10). The array(s) are configured to illuminate the sample as the sample moves along the flow path. The system also includes one or more detectors (24) configured to detect light resulting from illumination of the sample by the array(s). One method includes illuminating a microsphere at different positions along a flow path of the microsphere. The method also includes detecting light resulting from the illumination to produce individual output signals corresponding to the illumination at the different positions. The method further includes combining the individual OUTPUT signals to produce a single output signal having a signal-to-noise ratio that is greater than a signal-to-noise ratio of the individual output signals.
摘要翻译：提供了各种基于发光二极管（LED）的测量系统和方法。一个系统包括沿着样品（10）的流动路径（20）布置的一个或多个LED阵列（14,16,18）。阵列被配置为当样品沿着流动路径移动时照亮样品。该系统还包括一个或多个检测器（24），其被配置为检测由阵列照射样品产生的光。一种方法包括沿着微球的流动路径在不同位置照射微球。该方法还包括检测由照明产生的光以产生对应于不同位置处的照明的各个输出信号。该方法还包括组合各个OUTPUT信号以产生具有大于各个输出信号的信噪比的信噪比的单个输出信号。

27. 发明申请

WO2004111623A1 SYSTEMS FOR INSPECTION OF PATTERNED OR UNPATTERNED WAFERS AND OTHER SPECIMEN 审中-公开
标题翻译：用于检查图案或未加掩模的其他样本的系统
公开(公告)号：WO2004111623A1
公开(公告)日：2004-12-23
申请号：PCT/US2004/017707
申请日：2004-06-04
申请人： KLA-TENCOR TECHNOLOGIES CORP. , BEVIS, Christopher, F. , KIRK, Mike , VAEZ-IRAVANI, Mehdi
发明人： BEVIS, Christopher, F. , KIRK, Mike , VAEZ-IRAVANI, Mehdi
IPC分类号： G01N21/95
CPC分类号： G01N21/956 , G01N21/474 , G01N21/94 , G01N21/9501
摘要： Systems for inspection of patterned and unpatterned wafers are provided. One system includes an illumination system configured to illuminate the specimen. The system also includes a collector configured to collect light scattered from the specimen. In addition, the system includes a segmented detector configured to separately detect different portions of the light such that azimuthal and polar angular information about the different portions of light is preserved. The detector may also be configured to produce signals representative of the different portions of the light. The system may also include a processor configured to detect defects on the specimen from the signals. In another embodiment, the system may include a stage that is configured to rotate and translate the specimen. In one such embodiment, the system may also include an illumination system configured to scan the specimen in a wide scan path during rotation and translation of the specimen.
摘要翻译：提供了用于图案化和未图案化晶片检查的系统。一个系统包括被配置为照亮样本的照明系统。该系统还包括收集器，用于收集从样品散射的光。此外，该系统包括分段检测器，其被配置为分开地检测光的不同部分，使得关于光的不同部分的方位角和极坐标信息被保留。检测器还可以被配置为产生表示光的不同部分的信号。该系统还可以包括被配置成从信号中检测样本上的缺陷的处理器。在另一个实施例中，系统可以包括被配置为旋转和平移样本的台。在一个这样的实施例中，系统还可以包括被配置为在样本的旋转和平移期间以宽扫描路径扫描样本的照明系统。

28. 发明申请

WO2004008244A2 QUALIFYING PATTERNS, PATTERNING PROCESSES, OR PATTERNING APPARATUS IN THE FABRICATION OF MICROLITHOGRAPHIC PATTERNS 审中-公开
标题翻译：批发图案，绘图工艺或绘图装置制作微型图案
公开(公告)号：WO2004008244A2
公开(公告)日：2004-01-22
申请号：PCT/US2003/021907
申请日：2003-07-15
申请人： KLA-TENCOR TECHNOLOGIES CORP.
发明人： PETERSON, Ingrid, B. , VON DEN HOFF, Mike , WILEY, Jim
IPC分类号： G03F
CPC分类号： G03F1/84 , G03F7/7065 , G03F7/70666
摘要： Methods that include acquiring aerial images of a reticle for different values of a member of a set of lithographic variables are provided. One method also includes determining a presence of an anomaly in a design pattern of the reticle by comparing at least one pair of the aerial images corresponding to at least two of the different values. A different method includes comparing at least one pair of the aerial images corresponding to at least two of the different values and determining an area on the reticle where a lithography process using the reticle is most susceptible to failure based on the results of the comparison. Another embodiment includes determining a presence of transient repeating defects on the reticle by subtracting non-transient defects from the aerial images and comparing at least one pair of the aerial images corresponding to at least two of the different values.
摘要翻译：提供了包括对一组光刻变量的成员的不同值获取掩模版的空间图像的方法。一种方法还包括通过比较对应于至少两个不同值的至少一对空中图像来确定标线的设计图案中的异常的存在。不同的方法包括比较对应于至少两个不同值的至少一对空中图像，并且基于比较的结果，确定使用该掩模版的光刻处理最容易发生故障的掩模版上的区域。另一实施例包括通过从空中图像中减去非瞬态缺陷来确定掩模版上瞬时重复缺陷的存在，并比较至少一对对应于不同值中的至少两个的空中图像。

29. 发明申请

WO2012005863A3 DATA PERTURBATION FOR WAFER INSPECTION OR METROLOGY SETUP 审中-公开
公开(公告)号：WO2012005863A3
公开(公告)日：2012-01-12
申请号：PCT/US2011/039876
申请日：2011-06-09
申请人： KLA-TENCOR CORPORATION , THATTAISUNDARAM, Govind , MAHADEVAN, Mohan , GUPTA, Ajay , CHEN, Chien-Huei Adam , KULKARNI, Ashok , KIRKWOOD, Jason , WU, Kenong , RONG, Songnian
发明人： THATTAISUNDARAM, Govind , MAHADEVAN, Mohan , GUPTA, Ajay , CHEN, Chien-Huei Adam , KULKARNI, Ashok , KIRKWOOD, Jason , WU, Kenong , RONG, Songnian
IPC分类号： G06F19/00
摘要： Various embodiments for determining parameters for wafer inspection and/or metrology are provided.

30. 发明申请

WO2010093733A2 DETECTING DEFECTS ON A WAFER 审中-公开
标题翻译：检测波形上的缺陷
公开(公告)号：WO2010093733A2
公开(公告)日：2010-08-19
申请号：PCT/US2010/023802
申请日：2010-02-10
申请人： KLA-TENCOR CORPORATION , HUANG, Junqing , ZHANG, Yong , CHEN, Stephanie , LUO, Tao , GAO, Lisheng , WALLINGFORD, Richard
发明人： HUANG, Junqing , ZHANG, Yong , CHEN, Stephanie , LUO, Tao , GAO, Lisheng , WALLINGFORD, Richard
IPC分类号： H01L21/66 , G01N21/88
CPC分类号： G01N21/9501 , G01N21/8806 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： Methods and systems for detecting defects on a wafer are provided.
摘要翻译：提供了用于检测晶片上的缺陷的方法和系统。

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