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1. 发明申请

WO2004111623B1 SYSTEMS FOR INSPECTION OF PATTERNED OR UNPATTERNED WAFERS AND OTHER SPECIMEN 审中-公开
标题翻译：用于检查图案或未加掩模的其他样本的系统
公开(公告)号：WO2004111623B1
公开(公告)日：2005-03-17
申请号：PCT/US2004017707
申请日：2004-06-04
申请人： KLA TENCOR TECH CORP , BEVIS CHRISTOPHER F , KIRK MIKE , VAEZ-IRAVANI MEHDI
发明人： BEVIS CHRISTOPHER F , KIRK MIKE , VAEZ-IRAVANI MEHDI
IPC分类号： G01N21/47 , G01N21/94 , G01N21/95
CPC分类号： G01N21/956 , G01N21/474 , G01N21/94 , G01N21/9501
摘要： Systems for inspection of patterned and unpatterned wafers are provided. One system includes an illumination system configured to illuminate the specimen. The system also includes a collector configured to collect light scattered from the specimen. In addition, the system includes a segmented detector configured to separately detect different portions of the light such that azimuthal and polar angular information about the different portions of light is preserved. The detector may also be configured to produce signals representative of the different portions of the light. The system may also include a processor configured to detect defects on the specimen from the signals. In another embodiment, the system may include a stage that is configured to rotate and translate the specimen. In one such embodiment, the system may also include an illumination system configured to scan the specimen in a wide scan path during rotation and translation of the specimen.
摘要翻译：提供了用于图案化和未图案化晶片检查的系统。一个系统包括被配置为照亮样本的照明系统。该系统还包括收集器，用于收集从样品散射的光。此外，该系统包括分段检测器，其被配置为分别检测光的不同部分，使得保持关于光的不同部分的方位角和极坐标信息。检测器还可以被配置为产生表示光的不同部分的信号。该系统还可以包括处理器，其配置成从信号中检测样本上的缺陷。在另一个实施例中，系统可以包括被配置为旋转和平移样本的台。在一个这样的实施例中，系统还可以包括被配置为在样本的旋转和平移期间以宽扫描路径扫描样本的照明系统。

2. 发明申请

WO2004111623A1 SYSTEMS FOR INSPECTION OF PATTERNED OR UNPATTERNED WAFERS AND OTHER SPECIMEN 审中-公开
标题翻译：用于检查图案或未加掩模的其他样本的系统
公开(公告)号：WO2004111623A1
公开(公告)日：2004-12-23
申请号：PCT/US2004/017707
申请日：2004-06-04
申请人： KLA-TENCOR TECHNOLOGIES CORP. , BEVIS, Christopher, F. , KIRK, Mike , VAEZ-IRAVANI, Mehdi
发明人： BEVIS, Christopher, F. , KIRK, Mike , VAEZ-IRAVANI, Mehdi
IPC分类号： G01N21/95
CPC分类号： G01N21/956 , G01N21/474 , G01N21/94 , G01N21/9501
摘要： Systems for inspection of patterned and unpatterned wafers are provided. One system includes an illumination system configured to illuminate the specimen. The system also includes a collector configured to collect light scattered from the specimen. In addition, the system includes a segmented detector configured to separately detect different portions of the light such that azimuthal and polar angular information about the different portions of light is preserved. The detector may also be configured to produce signals representative of the different portions of the light. The system may also include a processor configured to detect defects on the specimen from the signals. In another embodiment, the system may include a stage that is configured to rotate and translate the specimen. In one such embodiment, the system may also include an illumination system configured to scan the specimen in a wide scan path during rotation and translation of the specimen.
摘要翻译：提供了用于图案化和未图案化晶片检查的系统。一个系统包括被配置为照亮样本的照明系统。该系统还包括收集器，用于收集从样品散射的光。此外，该系统包括分段检测器，其被配置为分开地检测光的不同部分，使得关于光的不同部分的方位角和极坐标信息被保留。检测器还可以被配置为产生表示光的不同部分的信号。该系统还可以包括被配置成从信号中检测样本上的缺陷的处理器。在另一个实施例中，系统可以包括被配置为旋转和平移样本的台。在一个这样的实施例中，系统还可以包括被配置为在样本的旋转和平移期间以宽扫描路径扫描样本的照明系统。

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