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11. 发明申请

WO2009048676A1 HYBRID PERIODIC CELLULAR MATERIAL STRUCTURES, SYSTEMS, AND METHODS FOR BLAST AND BALLISTIC PROTECTION 审中-公开
标题翻译：混合周期细胞材料结构，系统和方法用于BLAST和BALLISTIC保护
公开(公告)号：WO2009048676A1
公开(公告)日：2009-04-16
申请号：PCT/US2008/071848
申请日：2008-07-31
申请人： UNIVERSITY OF VIRGINIA PATENT FOUNDATION , CELLULAR MATERIALS INTERNATIONAL, INC. (CMI) , DEPARTMENT OF THE ARMY , WADLEY, Haydn N. G. , MURTY, Yellapu V. , JONES, Tyrone , GUPTA, Rahul , BURKINS, Matthew
发明人： WADLEY, Haydn N. G. , MURTY, Yellapu V. , JONES, Tyrone , GUPTA, Rahul , BURKINS, Matthew
IPC分类号： F41H5/04
CPC分类号： F41H5/023 , B32B3/12 , B32B5/02 , B32B15/04 , F41H5/0414 , F41H5/0442 , F41H5/0471
摘要： Structures based upon periodic cellular materials that provide a potential for defeating combinations of both air blast loading and ballistic attack either sequentially or simultaneously, or combination of both. The cellular structures may also be configured to meet the stiffness and strength support requirements of particular vehicle or other applications, systems or structures. The armor is therefore potentially able to support normal service loads and defeat blast and ballistic threats when necessary. The structure provides for using efficient load support capabilities of the material (without a high armor protection level) in low threat conditions, as well as the ability to modify the system to increase its level protection to a desired or required level. This would reduce the weight of the protection system in normal (low threat) conditions which reduces vehicle wear and tear, as well as cost savings in fabrication of applicable structures or systems.
摘要翻译：基于周期性细胞材料的结构，其提供依次或同时地击打气吹加载和弹道攻击的组合的潜力，或两者的组合。蜂窝结构还可以被配置为满足特定车辆或其他应用，系统或结构的刚度和强度支持要求。因此，护甲有可能支持正常的服务负载，并在必要时抵御爆炸和弹道威胁。该结构提供了在低威胁条件下使用材料的有效负载支持能力（无高防护等级），以及修改系统以将其级别保护增加到所需或所需级别的能力。这将减少保护系统在正常（低威胁）条件下的重量，从而减少车辆磨损，以及节省制造适用结构或系统的成本。

12. 发明申请

WO2018126206A1 IODINE-CONTAINING COMPOUNDS FOR ETCHING SEMICONDUCTOR STRUCTURES 审中-公开
公开(公告)号：WO2018126206A1
公开(公告)日：2018-07-05
申请号：PCT/US2017/069085
申请日：2017-12-29
申请人： L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE , AMERICAN AIR LIQUIDE, INC. , AIR LIQUIDE ELECTRONICS U.S. LP , SURLA, Vijay , GUPTA, Rahul , SUN, Hui , PALLEM, Venkateswara R. , STAFFORD, Nathan , MARCHEGIANI, Fabrizio , OMARJEE, Vincent M. , ROYER, James
发明人： SURLA, Vijay , GUPTA, Rahul , SUN, Hui , PALLEM, Venkateswara R. , STAFFORD, Nathan , MARCHEGIANI, Fabrizio , OMARJEE, Vincent M. , ROYER, James
IPC分类号： H01L21/311 , H01L21/3065 , H01L21/308 , H01L27/115
摘要： A method for etching silicon-containing films is disclosed. The method includes the steps of introducing a vapor of an iodine-containing etching compound into a reaction chamber containing a silicon-containing film on a substrate, wherein the iodine-containing etching compound has the formula CaHxFylz, wherein a=1 -3, x=0-6, y=1 -7, z=1 -2, x+y+z=4 when a=1, x+y+z=4 or 6 when a=2, and x+y+z=6 or 8 when a=3; introducing an inert gas into the reaction chamber; and activating a plasma to produce an activated iodine-containing etching compound capable of etching the silicon-containing film from the substrate.

13. 发明申请

WO2015035381A1 METHOD OF ETCHING SEMICONDUCTOR STRUCTURES WITH ETCH GASES 审中-公开
标题翻译：用蚀刻气体蚀刻半导体结构的方法
公开(公告)号：WO2015035381A1
公开(公告)日：2015-03-12
申请号：PCT/US2014/054780
申请日：2014-09-09
申请人： L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE , AMERICAN AIR LIQUIDE, INC. , GUPTA, Rahul , PALLEM, Venkateswara R. , SURLA, Vijay , ANDERSON, Curtis , STAFFORD, Nathan
发明人： GUPTA, Rahul , PALLEM, Venkateswara R. , SURLA, Vijay , ANDERSON, Curtis , STAFFORD, Nathan
IPC分类号： H01L21/3065
CPC分类号： H01L21/3065 , B05D3/141 , B81C1/00404 , C07C323/03 , C23C4/10 , H01L21/02046 , H01L21/30621 , H01L21/3086 , H01L21/31116 , H01L21/32137 , H01L21/76831 , H01L21/76843
摘要： Disclosed are sulfur-containing compounds for plasma etching channel holes, gate trenches, staircase contacts, capacitor holes, contact holes, etc., in Si-containing layers on a substrate and plasma etching methods of using the same. The plasma etching compounds may provide improved selectivity between the Si-containing layers and mask material, less damage to channel region, a straight vertical profile, and reduced bowing in pattern high aspect ratio structures.
摘要翻译：公开了用于等离子体蚀刻通道孔，栅极沟槽，阶梯接触，电容器孔，接触孔等的含硫化合物在基板上的含Si层中，以及使用其的等离子体蚀刻方法。等离子体蚀刻化合物可以在含Si层和掩模材料之间提供改进的选择性，对通道区域的损害更小，直的垂直剖面，以及图案高纵横比结构中的弯曲减小。

14. 发明申请

WO2011097210A1 ELECTRICAL BRAIN STIMULATION IN THE GAMMA BAND 审中-公开
标题翻译： GAMMA BAND中的电脑刺激
公开(公告)号：WO2011097210A1
公开(公告)日：2011-08-11
申请号：PCT/US2011/023307
申请日：2011-02-01
申请人： MEDTRONIC, INC. , WU, Jianping , NELSON, Dwight E. , GUPTA, Rahul
发明人： WU, Jianping , NELSON, Dwight E. , GUPTA, Rahul
IPC分类号： A61N1/36 , A61B5/048 , A61B5/04
CPC分类号： A61N1/36067 , A61B5/048 , A61N1/0534 , A61N1/36171
摘要： This disclosure describes techniques for delivering electrical stimulation to the brain of a patient at a frequency greater than a selected frequency. The techniques may reestablish gamma frequency band activity within the brain of a patient, and thus improve the patient's movements and cognitive states. In one example, the disclosure is directed to a device comprising a processor configured to select a frequency within a gamma frequency band and delivering electrical stimulation at a frequency greater than the selected frequency.
摘要翻译：本公开描述了以大于所选频率的频率向患者的大脑递送电刺激的技术。这些技术可能会重新建立患者脑内的伽马频带活动，从而改善患者的运动和认知状态。在一个示例中，本公开涉及包括处理器的设备，该处理器被配置为选择伽马频带内的频率并以大于所选择的频率的频率递送电刺激。

15. 发明申请

WO2005041322A1 SOLVENT MIXTURES FOR AN ORGANIC ELECTRONIC DEVICE 审中-公开
标题翻译：有机电子设备的溶剂混合物
公开(公告)号：WO2005041322A1
公开(公告)日：2005-05-06
申请号：PCT/EP2004/010418
申请日：2004-09-16
申请人： OSRAM OPTO SEMICONDUCTORS GMBH , GUPTA, Rahul , INGLE, Andrew , NATARAJAN, Sriram
发明人： GUPTA, Rahul , INGLE, Andrew , NATARAJAN, Sriram
IPC分类号： H01L51/40
CPC分类号： H01L51/0004 , H01L51/0007
摘要： An organic polymer solution is made of at least one organic polymer, a first solvent, and a second solvent. The first solvent has a high solubility (e.g., the first solvent dissolves at least about one weight percent of the organic polymers) and has a faster evaporation rate than the second solvent, and the second solvent has a very low solubility (e.g., the second solvent dissolves less than about one-fourth weight percent of the organic polymers). After the solution is deposited on an object, the solution is allowed to dry. As the solution dries, the first solvent due to its faster evaporation rate than the second solvent starts to evaporate from the solution, and soon after the first solvent starts to evaporate, the one or more organic polymers, due to its lower solubility in the second solvent, rapidly gels resulting in a substantially uniform organic polymer layer.
摘要翻译：有机聚合物溶液由至少一种有机聚合物，第一溶剂和第二溶剂制成。第一溶剂具有高溶解度（例如，第一溶剂溶解至少约1重量％的有机聚合物）并且具有比第二溶剂更快的蒸发速率，并且第二溶剂具有非常低的溶解度（例如，第二溶剂溶剂溶解少于约四分之一重量百分比的有机聚合物）。将溶液沉积在物体上后，使溶液干燥。当溶液干燥时，由于其比第二溶剂更快的蒸发速率，第一溶剂开始从溶液中蒸发，并且在第一溶剂开始蒸发之后不久，一种或多种有机聚合物由于其在第二溶剂中的溶解度较低溶剂，快速凝胶，产生基本均匀的有机聚合物层。

16. 发明申请

WO2022239025A1 AIR PURIFIER 审中-公开
公开(公告)号：WO2022239025A1
公开(公告)日：2022-11-17
申请号：PCT/IN2022/050447
申请日：2022-05-06
申请人： GUPTA, Rahul
发明人： GUPTA, Rahul
IPC分类号： B01D46/10 , B01D50/60 , F24F8/10 , B01D47/028 , F24F8/125 , F24F8/133 , F24F8/30 , F24F8/80
摘要： The present invention relates to an air purifier (40). The air purifier comprises a plurality of chambers (I, II, III) at a first side (a), at least one inlet (44) at the first side (a). The air purifier may further comprise at least one air filter assembly (10) in each of the plurality of chambers. The at least one air filter assembly (10) comprises a separator (14) between a first fine mesh filter fabric (12) and a second fine mesh filter fabric (13). The at least one air filter assembly (10) comprises a non-carcinogenic property, wherein the separator (14) is made up of a porous material.

17. 发明申请

WO2005069403A2 PRINTING OF ORGANIC ELECTRONIC DEVICES 审中-公开
标题翻译：有机电子器件的印刷
公开(公告)号：WO2005069403A2
公开(公告)日：2005-07-28
申请号：PCT/EP2005/000329
申请日：2005-01-14
申请人： OSRAM OPTO SEMICONDUCTORS GMBH , ALLEMAND, Pierre-Marc , GUPTA, Rahul , INGLE, Andrew , NATARAJAN, Sriram
发明人： ALLEMAND, Pierre-Marc , GUPTA, Rahul , INGLE, Andrew , NATARAJAN, Sriram
IPC分类号： H01L51/40
CPC分类号： H01L51/0004 , H01L27/3295 , H01L51/0037 , Y02E10/549 , Y10T428/24802 , Y10T428/24851
摘要： The composition of a organic (e.g. conducting polymer) solution is reformulated and the device upon which the organic solution is to be deposited is plasma treated to provide a more uniform and flat drying profile for the resulting dried film. This reformulation and treatment induces a more uniform and flatter profile when the reformulated organic solution is allowed to dry into a film on the treated device.
摘要翻译：有机溶剂（例如导电聚合物）溶液的组合物被重新配制，并且待沉积有机溶液的装置被等离子体处理以为所得到的干燥膜提供更均匀和平坦的干燥轮廓。当重新形成的有机溶液被干燥成处理过的装置中的薄膜时，该重构和处理诱导更均匀和更平坦的轮廓。

18. 发明申请

WO2005069402A1 DEPOSITION OF CONDUCTING POLYMERS 审中-公开
标题翻译：导电聚合物的沉积
公开(公告)号：WO2005069402A1
公开(公告)日：2005-07-28
申请号：PCT/EP2004/014801
申请日：2004-12-29
申请人： OSRAM OPTO SEMICONDUCTORS GMBH , GUPTA, Rahul , INGLE, Andrew , NATARAJAN, Sriram
发明人： GUPTA, Rahul , INGLE, Andrew , NATARAJAN, Sriram
IPC分类号： H01L51/40
CPC分类号： H01L51/0003 , H01L51/0004 , Y02E10/549
摘要： A precipitation agent is deposited on a lower electrode layer of an organic electronic device prior to fabrication of organic layers. After the precipitation agent is deposited, organic material is deposited over the precipitation agent. The precipitation agent induces a more uniform and flatter profile when the organic material is allowed to dry into a film on the treated surface.
摘要翻译：在制造有机层之前，将沉淀剂沉积在有机电子器件的下电极层上。沉淀剂沉积后，沉淀剂上沉积有机物质。当有机材料被干燥成处理过的表面上的膜时，沉淀剂会引起更均匀和更平坦的轮廓。

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