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    • 18. 发明申请
    • METHOD OF MEASURING A DEVIATION AN OPTICAL SURFACE FROM A TARGET SHAPE
    • 测量目标形状的光学表面的方法
    • WO2009006919A1
    • 2009-01-15
    • PCT/EP2007/006069
    • 2007-07-09
    • CARL ZEISS SMT AGARNOLD, RalfSCHULTE, StefanDOERBAND, Bernd
    • ARNOLD, RalfSCHULTE, StefanDOERBAND, Bernd
    • G01B9/021G01B11/24
    • G01B9/021G01B9/02039G01B11/2441G01M11/025G01M11/0271Y10T29/49771
    • A method of aligning at least two wave shaping elements, a method of measuring a deviation of an optical surface from a target shape and a measuring apparatus for interferometrically measuring a deviation of an optical surface from a target shape are provided. The method of aligning at least two wave shaping elements, each of which wave shaping elements comprises a diffractive measurement structure for adapting part of a wave front of incoming light to a respective portion of the target shape, comprises the steps of: providing a first one of the wave shaping elements with a diffractive alignment structure, arranging the wave shaping elements relative to each other such that each of the diffractive measurement structures is traversed by a separate subset of rays of the incoming light during operation of the measuring apparatus, and aligning the first wave shaping element in a second one of the wave shaping elements relative to each other by evaluating alignment light having consecutively interacted with the diffractive alignment structure and with the second wave shaping element.
    • 提供了对准至少两个波形整形元件的方法,测量光学表面与目标形状的偏差的方法以及用于干涉测量光学表面与目标形状的偏差的测量装置。 对准至少两个波形整形元件的方法,其中每个波形整形元件包括用于将入射光的波前部分的一部分适配到目标形状的相应部分的衍射测量结构,包括以下步骤:提供第一个 的具有衍射对准结构的波形成形元件,将波形整形元件相对于彼此布置,使得每个衍射测量结构在测量装置的操作期间被入射光的单独的子集子穿过,并将 通过评估与衍射对准结构和第二波形整形元件连续相互作用的对准光,第二波形成形元件中的第一波形整形元件相对于彼此。