专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

11. 发明申请

WO2010048032A3 PAD CONDITIONER AUTO DISK CHANGE 审中-公开
标题翻译： PAD控制器自动盘更改
公开(公告)号：WO2010048032A3
公开(公告)日：2010-07-15
申请号：PCT/US2009060882
申请日：2009-10-15
申请人： APPLIED MATERIALS INC , CHEN HUNG CHIH , ZUNIGA STEVEN M , OLGADO DONALD J K
发明人： CHEN HUNG CHIH , ZUNIGA STEVEN M , OLGADO DONALD J K
IPC分类号： H01L21/304
CPC分类号： B24B53/017
摘要： A method and apparatus for replacing a polishing pad conditioning disk is a chemical mechanical polishing system is provided. The apparatus comprises a disk load/unload station for unloading used conditioning disks from a pad conditioning assembly and loading unused conditioning disks onto the pad conditioning assembly, on or more disk storage stations for storing both used and unused conditioning disks, and a central robot having a range of motion sufficient for transferring both used an unused conditioning disks between the disk load/unload station and the one or more disk storage stations. Embodiments described herein reduce the length of system interruption by eliminating the need to safety lock out the system for the replacement of polishing pad conditioning disks.
摘要翻译：一种用于更换抛光垫调节盘的方法和装置是提供化学机械抛光系统。该装置包括用于从衬垫调节组件卸载使用的调节盘并将未使用的调节盘装载到衬垫调节组件上的多个盘装载/卸载站，用于存储使用和未使用的调节盘的两个或更多个盘存储站以及具有足够的运动范围，用于在盘装载/卸载站和一个或多个盘存储站之间使用未使用的调节盘。本文所描述的实施例通过消除安全锁定系统来更换抛光垫调节盘来减少系统中断的长度。

12. 发明申请

WO2005049274A3 RETAINING RING WITH SHAPED SURFACE 审中-公开
公开(公告)号：WO2005049274A3
公开(公告)日：2005-11-03
申请号：PCT/US2004038083
申请日：2004-11-12
申请人： APPLIED MATERIALS INC , CHEN HUNG CHIH , ZUNIGA STEVEN M , GARRETSON CHARLES C , MCALLISTER DOUGLAS R , MEYER STACY , LIN JIAN , HUEY SIDNEY P , OH JEONGHOON , DOAN TRUNG T , SCHMIDT JEFFREY , WOHLERT MARTIN S , HUGHES KERRY F , WANG JAMES C , LU DANNY CAM TOAN , DELAMENIE ROMAIN BEAU , BALAGANI VENKATA R , ALLEN ADEN MARTIN , FONG MICHAEL JON
发明人： CHEN HUNG CHIH , ZUNIGA STEVEN M , GARRETSON CHARLES C , MCALLISTER DOUGLAS R , MEYER STACY , LIN JIAN , HUEY SIDNEY P , OH JEONGHOON , DOAN TRUNG T , SCHMIDT JEFFREY , WOHLERT MARTIN S , HUGHES KERRY F , WANG JAMES C , LU DANNY CAM TOAN , DELAMENIE ROMAIN BEAU , BALAGANI VENKATA R , ALLEN ADEN MARTIN , FONG MICHAEL JON
IPC分类号： B24B37/32 , B24B37/04
CPC分类号： B24B37/32 , Y10T29/49815
摘要： A retaining ring can be shaped by machining or lapping the bottom surface of the ring to form a shaped profile in the bottom surface. The bottom surface of the retaining ring can include flat, sloped and curved portion. The lapping can be performed using a machine that dedicated for use in lapping the bottom surface of retaining rings. During the lapping the ring can be permitted to rotate freely about an axis of the ring. The bottom surface of the retaining ring can have curved or flat portions.

13. 发明申请

WO2012021215A3 APPARATUS AND METHOD FOR TEMPERATURE CONTROL DURING POLISHING 审中-公开
标题翻译：在抛光过程中用于温度控制的装置和方法
公开(公告)号：WO2012021215A3
公开(公告)日：2012-04-12
申请号：PCT/US2011040630
申请日：2011-06-16
申请人： APPLIED MATERIALS INC , CHEN HUNG CHIH , HSU SAMUEL CHU-CHIANG , DANDAVATE GAUTAM SHASHANK , KOOSAU DENIS M
发明人： CHEN HUNG CHIH , HSU SAMUEL CHU-CHIANG , DANDAVATE GAUTAM SHASHANK , KOOSAU DENIS M
IPC分类号： H01L21/304
CPC分类号： B24B37/30 , B24B37/015
摘要： Embodiments of the present invention relate to apparatus and method for improve uniformity of a polishing process. Embodiments of the present invention provide a heating mechanism configured to apply thermal energy to a perimeter of a substrate during polishing, or a cooling mechanism configured to cool a central region of the substrate during polishing, or a biased heating mechanism configured to create a temperature step differential on a given radius of a polishing pad.
摘要翻译：本发明的实施例涉及用于改善抛光工艺的均匀性的设备和方法。本发明的实施例提供了一种加热机构，该加热机构被配置为在抛光期间将热能施加到基板的周边，或者被配置为在抛光期间冷却基板的中心区域的冷却机构，或者被配置为产生温度阶跃的偏置加热机构抛光垫给定半径上的差异。

14. 发明申请

WO2010008824A4 CLOSED-LOOP CONTROL FOR EFFECTIVE PAD CONDITIONING 审中-公开
标题翻译：闭环控制有效的PAD调节
公开(公告)号：WO2010008824A4
公开(公告)日：2010-05-06
申请号：PCT/US2009048243
申请日：2009-06-23
申请人： APPLIED MATERIALS INC , DHANDAPANI SIVAKUMAR , TSAI STAN D , MAO DAXIN , DESHPANDE SAMEER , CHANG SHOU-SUNG , MENK GREGORY E , GARRETSON CHARLES C , FUNG JASON GARCHEUNG , COCCA CHRISTOPHER D , CHEN HUNG CHIH
发明人： DHANDAPANI SIVAKUMAR , TSAI STAN D , MAO DAXIN , DESHPANDE SAMEER , CHANG SHOU-SUNG , MENK GREGORY E , GARRETSON CHARLES C , FUNG JASON GARCHEUNG , COCCA CHRISTOPHER D , CHEN HUNG CHIH
IPC分类号： H01L21/304 , B24B37/04
CPC分类号： B24B49/18 , B24B37/005 , B24B37/042
摘要： A method and apparatus for conditioning a polishing pad is provided. The conditioning element is held by a conditioning arm rotatably mounted to a base at a pivot point. An actuator pivots the arm about the pivot point. The conditioning element is urged against the surface of the polishing pad, and translated with respect to the polishing pad to remove material from the polishing pad and roughen its surface. The interaction of the abrasive conditioning surface with the polishing pad surface generates a frictional force. The frictional force may be monitored by monitoring the torque applied to the pivot point, and material removal controlled thereby. The conditioning time, down force, translation rate, or rotation of the conditioning pad may be adjusted based on the measured torque.
摘要翻译：提供了一种用于调理抛光垫的方法和装置。调节元件由可旋转地安装到枢轴点处的基座的调节臂保持。执行器绕枢轴点枢转臂。调理元件被推靠在抛光垫的表面上，并相对于抛光垫平移以从抛光垫移除材料并使其表面变粗糙。研磨调理表面与抛光垫表面的相互作用产生摩擦力。可以通过监视施加到枢转点的扭矩来监测摩擦力，并且由此控制材料移除。调节垫的调节时间，下压力，平移速率或旋转可以基于测量的扭矩来调节。

15. 发明申请

WO2008002811B1 PAD CLEANING METHOD 审中-公开
公开(公告)号：WO2008002811B1
公开(公告)日：2008-12-24
申请号：PCT/US2007071701
申请日：2007-06-20
申请人： APPLIED MATERIALS INC , MAVLIEV RASHID A , CHEN HUNG CHIH
发明人： MAVLIEV RASHID A , CHEN HUNG CHIH
IPC分类号： B24B53/00
CPC分类号： B24B53/017
摘要： A method for cleaning a polishing pad is disclosed. In CMP and ECMP, a polishing pad must be conditioned to obtain good and predictable polishing results. During conditioning, debris is generated that must be removed to prevent processing defects. An effective method to clean a polishing pad is disclosed herein. In one embodiment, a washing fluid is directed at the pad to clean debris from the while a second fluid is utilized to remove the washing fluid. In another embodiment, the washing fluid is provided by a high pressure water jet while the second fluid is provided by an air knife.

16. 发明申请

WO2008002812A2 ELECTROLYTE RETAINING ON A ROTATING PLATEN BY DIRECTIONAL AIR FLOW 审中-公开
标题翻译：方向空气流动下旋转板上电解质的保留
公开(公告)号：WO2008002812A2
公开(公告)日：2008-01-03
申请号：PCT/US2007071705
申请日：2007-06-20
申请人： APPLIED MATERIALS INC , CHEN HUNG CHIH , MAVLIEV RASHID A
发明人： CHEN HUNG CHIH , MAVLIEV RASHID A
IPC分类号： B23H5/08
CPC分类号： B23H5/08 , B24B37/04 , B24B57/02
摘要： A method and apparatus for retaining electrolyte on a rotating platen using directional air flow is provided. In one embodiment, an apparatus for processing a substrate is provided. The apparatus includes a platen assembly having a surface for supporting a processing pad and disposed on a stationary base so that the platen assembly may rotate relative to the base; and an air knife coupled to the base and extended over a portion of the surface, the air knife operable to deliver a stream of air toward the pad to divert at least a portion of a fluid disposed on the pad toward a center of the pad.
摘要翻译：提供了使用定向气流将电解质保持在旋转台板上的方法和设备。在一个实施例中，提供了一种用于处理基板的设备。该设备包括：压板组件，其具有用于支撑处理衬垫并设置在固定基座上的表面，使得压板组件可相对于基座旋转; 以及气刀，所述气刀耦合到所述基座并且在所述表面的一部分上延伸，所述气刀可操作以朝向所述垫递送空气流，以将布置在所述垫上的流体的至少一部分朝向所述垫的中心转向。

17. 发明申请

WO2005058545B1 RETAINING RING WITH SLURRY TRANSPORT GROOVES 审中-公开
标题翻译：带有泥浆运输槽的挡泥板
公开(公告)号：WO2005058545B1
公开(公告)日：2005-07-28
申请号：PCT/US2004041322
申请日：2004-12-08
申请人： APPLIED MATERIALS INC , CHEN HUNG CHIH , ZUNIGA STEVEN M
发明人： CHEN HUNG CHIH , ZUNIGA STEVEN M
IPC分类号： B24B37/04 , B24B41/06
CPC分类号： B24B37/32
摘要： A retaining ring for chemical mechanical polishing has a generally annular body with a top surface, a bottom surface, an inner diameter surface, and an outer diameter surface. The bottom surface includes a plurality of channels, each channel extending from the inner diameter surface to the outer diameter surface and having a rounded ceiling.
摘要翻译：用于化学机械抛光的保持环具有通常为环形的主体，该主体具有顶表面，底表面，内径表面和外径表面。底表面包括多个通道，每个通道从内径表面延伸到外径表面并具有圆形顶部。

18. 发明申请

WO0172472A3 CARRIER HEAD WITH A FLEXIBLE MEMBRANE HAVING PARTS MADE WITH DIFFERENT ELASTOMERS 审中-公开
标题翻译：具有柔性膜的载体头部具有不同弹性体的部件
公开(公告)号：WO0172472A3
公开(公告)日：2002-05-10
申请号：PCT/US0107974
申请日：2001-03-12
申请人： APPLIED MATERIALS INC
发明人： ZUNIGA STEVEN M , CHEN HUNG CHIH , TSENG MING KUIE
IPC分类号： B24B7/22 , B24B37/30 , F16J3/02 , H01L21/304 , B24B37/04 , B24B41/06
CPC分类号： B24B37/30 , F16J3/02
摘要： A carrier head (100) for a chemical mechanical polishing apparatus includes a flexible membrane (150) that applies a load to a substrate. The substrate backing assembly (112) includes an internal membrane (150), an external membrane (152), an internal membrane support structure (160), an upper membrane spacer ring (162), a lower membrane spacer ring (164), and an edge control ring (166). The volume between the base assembly (104) and the internal membrane (150) forms the upper chamber (154) and the internal chamber (156), and the volume between the internal membrane (150) and the external membrane (152) forms the outer chamber (158). The internal membrane (150) includes a circular central portion (170), a relatively thick annular portion (174), an annular inner flap (176) that extends from the corner of the thick portion (174), an annular outer flap (178) that extends from the outer rim of the thick portion (174) and an annular connector portion (172). The inner flap (176) and the outer flap (178) can be formed of a first elastomer, whereas the thick portion (174) and connector portion (172) can be formed of a second elastomer.
摘要翻译：用于化学机械抛光装置的载体头（100）包括向基底施加载荷的柔性膜（150）。衬底背衬组件（112）包括内膜（150），外膜（152），内膜支撑结构（160），上隔膜间隔环（162），下隔膜间隔环（164）和边缘控制环（166）。基部组件（104）和内膜（150）之间的体积形成上室（154）和内室（156），并且内膜（150）和外膜（152）之间的体积形成外室（158）。内膜（150）包括圆形中心部分（170），相对厚的环形部分（174），从厚部分（174）的角部延伸的环形内部折片（176），环形外部皮瓣（178）），其从所述厚部（174）的外缘延伸并且环形连接器部分（172）延伸。内翼片（176）和外翼片（178）可以由第一弹性体形成，而厚部分（174）和连接器部分（172）可以由第二弹性体形成。

19. 发明申请

WO0207931A3 MULTI-CHAMBER CARRIER HEAD WITH A FLEXIBLE MEMBRANE 审中-公开
标题翻译：带有柔性膜的多层车载头
公开(公告)号：WO0207931A3
公开(公告)日：2002-07-18
申请号：PCT/US0114478
申请日：2001-05-03
申请人： APPLIED MATERIALS INC
发明人： CHEN HUNG CHIH , ZUNIGA STEVEN
IPC分类号： B24B37/27 , B24B37/04 , B24B41/06 , B24B49/16 , H01L21/304
CPC分类号： B24B37/30 , B24B41/061 , B24B49/16
摘要： A carrier head (100) that has a base assembly (104) and a flexible membrane (140). The flexible membrane has a generally circular main portion (142) with a lower surface (144) that provides a substrate-mounting surface and a plurality of concentric annular portions (150, 152, 154, 156, 158) extending from the main portion and secured to the base assembly. The volume between the base assembly and the flexible membrane forming a plurality of pressurizable chambers (160, 162, 164, 166, 168). The inner annular portion (150, 152, 154, 156) may include or a notch (200), or a widened section (230), adjacentajuncture between the inner annular portions and the main portion (142).
摘要翻译：一种具有基座组件（104）和柔性膜（140）的承载头（100）。柔性膜具有大致圆形的主要部分（142），其具有提供衬底安装表面的下表面（144）和从主要部分延伸的多个同心圆环部分（150,152,154,156,158），以及固定到基座组件。基部组件和柔性膜之间的体积形成多个可加压室（160,162,164,166,168）。内部环形部分（150,152,154,156）可以包括在内部环形部分和主要部分（142）之间的邻近的穿孔的凹口（200）或加宽部分（230）。

20. 发明申请

WO0204172A3 CARRIER HEAD WITH FLEXIBLE MEMBRANES TO CONTROL THE APPLIED LOAD AND THE DIMENSION OF THE LOADING AREA 审中-公开
标题翻译：具有柔性膜的载体头控制应用负载和加载区域的尺寸
公开(公告)号：WO0204172A3
公开(公告)日：2002-07-18
申请号：PCT/US0121967
申请日：2001-07-11
申请人： APPLIED MATERIALS INC
发明人： ZUNIGA STEVEN M , CHEN HUNG CHIH , TSENG MING KUIE
IPC分类号： B24B37/30 , B24B49/16 , B24B37/04 , B24B41/06
CPC分类号： B24B37/30 , B24B49/16
摘要： A carrier head (300) for a chemical mechanical polishing apparatus includes two membranes (352, 350). The external membrane (352) includes a central portion (380) that provides a mounting surface to engage the substrate (10), a lip portion (382), and a perimeter portion (384) that extends in a convoluted path between the spacer rings (362, 364, 366) to be secured to the base assembly. The internal membrane (350) includes a central portion (370) that will contact the upper surface of the external membrane (352) in a controllable annular area, a relatively thick annular portion (372), an annular outer flap (374) that extends from the outer rim of the thick portion (372), an annular inner flap (376) that extends from the inner edge of the thick portion (372). The contact area of the internal membrane (350) against the external membrane (352), thus the loading area in which pressure is applied to the substrate (10), may be controlled by varying the pressure in the chambers (354, 356, 358) formed between the two membranes (350, 352) and the housing (302).
摘要翻译：用于化学机械抛光装置的载体头（300）包括两个膜（352,350）。外部膜（352）包括中心部分（380），其提供与衬底（10）接合的安装表面，唇缘部分（382）和周边部分（384），其在间隔环之间的回旋路径中延伸（362,364,366）以固定到基座组件。内部薄膜（350）包括中心部分（370），该中心部分将在可控的环形区域中接触外部薄膜（352）的上表面，相对较厚的环形部分（372），环形的外部薄片（374）从所述厚部分（372）的外边缘延伸出从所述厚部分（372）的内边缘延伸的环形内部折片（376）。可以通过改变腔室（354,356,358）中的压力来控制内部膜（350）与外部膜（352）的接触面积，从而将压力施加到基底（10）的装载区域）形成在两个膜（350,352）和壳体（302）之间。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式