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    • 4. 发明申请
    • PAD CONDITIONER AUTO DISK CHANGE
    • PAD控制器自动盘更改
    • WO2010048032A3
    • 2010-07-15
    • PCT/US2009060882
    • 2009-10-15
    • APPLIED MATERIALS INCCHEN HUNG CHIHZUNIGA STEVEN MOLGADO DONALD J K
    • CHEN HUNG CHIHZUNIGA STEVEN MOLGADO DONALD J K
    • H01L21/304
    • B24B53/017
    • A method and apparatus for replacing a polishing pad conditioning disk is a chemical mechanical polishing system is provided. The apparatus comprises a disk load/unload station for unloading used conditioning disks from a pad conditioning assembly and loading unused conditioning disks onto the pad conditioning assembly, on or more disk storage stations for storing both used and unused conditioning disks, and a central robot having a range of motion sufficient for transferring both used an unused conditioning disks between the disk load/unload station and the one or more disk storage stations. Embodiments described herein reduce the length of system interruption by eliminating the need to safety lock out the system for the replacement of polishing pad conditioning disks.
    • 一种用于更换抛光垫调节盘的方法和装置是提供化学机械抛光系统。 该装置包括用于从衬垫调节组件卸载使用的调节盘并将未使用的调节盘装载到衬垫调节组件上的多个盘装载/卸载站,用于存储使用和未使用的调节盘的两个或更多个盘存储站以及具有 足够的运动范围,用于在盘装载/卸载站和一个或多个盘存储站之间使用未使用的调节盘。 本文所描述的实施例通过消除安全锁定系统来更换抛光垫调节盘来减少系统中断的长度。
    • 6. 发明申请
    • CARRIER HEAD WITH CONTROLLABLE EDGE PRESSURE
    • 带控制边缘压力的承载头
    • WO0172473A2
    • 2001-10-04
    • PCT/US0108070
    • 2001-03-13
    • APPLIED MATERIALS INC
    • ZUNIGA STEVEN MPRABHU GOPALAKRISHNA BMEAR STEVEN T
    • B24B37/30H01L21/304B24B37/04B24B41/06
    • B24B37/30
    • A carrier head (100) for a chemical mechanical polishing apparatus includes a flexible membrane (150) that applies a load to a substrate. The substrate backing assembly (112) includes an internal membrane (150), an external membrane (152), an internal membrane support structure (160), an upper membrane spacer ring (162), a lower membrane spacer ring (164), and an edge control ring (166). The edge control ring (166) is a generally annular member positioned between the retaining ring (110) and the external membrane (152). The edge control ring (166) includes a cylindrical portion (210) and a flange portion (212) which extends outwardly toward inner surface (118) of retaining ring (110) to maintain the lateral position of the external spacer ring. An overhang (214) formed in the cylindrical portion (210) can fit over the thick portion (186) so that the edge control ring (166) tests on the external membrane (152).
    • 用于化学机械抛光装置的载体头(100)包括向基底施加载荷的柔性膜(150)。 衬底背衬组件(112)包括内膜(150),外膜(152),内膜支撑结构(160),上隔膜间隔环(162),下隔膜间隔环(164)和 边缘控制环(166)。 边缘控制环(166)是位于保持环(110)和外部膜(152)之间的大致环形的构件。 边缘控制环(166)包括圆柱形部分(210)和朝向保持环(110)的内表面(118)向外延伸以保持外部间隔环的横向位置的凸缘部分(212)。 形成在圆筒部分(210)中的突出部分(214)可以装配在厚部分(186)上,使得边缘控制环(166)在外部膜(152)上测试。
    • 7. 发明申请
    • CARRIER HEAD WITH FLEXIBLE MEMBRANES TO CONTROL THE APPLIED LOAD AND THE DIMENSION OF THE LOADING AREA
    • 具有柔性膜的载体头控制应用负载和加载区域的尺寸
    • WO0204172A3
    • 2002-07-18
    • PCT/US0121967
    • 2001-07-11
    • APPLIED MATERIALS INC
    • ZUNIGA STEVEN MCHEN HUNG CHIHTSENG MING KUIE
    • B24B37/30B24B49/16B24B37/04B24B41/06
    • B24B37/30B24B49/16
    • A carrier head (300) for a chemical mechanical polishing apparatus includes two membranes (352, 350). The external membrane (352) includes a central portion (380) that provides a mounting surface to engage the substrate (10), a lip portion (382), and a perimeter portion (384) that extends in a convoluted path between the spacer rings (362, 364, 366) to be secured to the base assembly. The internal membrane (350) includes a central portion (370) that will contact the upper surface of the external membrane (352) in a controllable annular area, a relatively thick annular portion (372), an annular outer flap (374) that extends from the outer rim of the thick portion (372), an annular inner flap (376) that extends from the inner edge of the thick portion (372). The contact area of the internal membrane (350) against the external membrane (352), thus the loading area in which pressure is applied to the substrate (10), may be controlled by varying the pressure in the chambers (354, 356, 358) formed between the two membranes (350, 352) and the housing (302).
    • 用于化学机械抛光装置的载体头(300)包括两个膜(352,350)。 外部膜(352)包括中心部分(380),其提供与衬底(10)接合的安装表面,唇缘部分(382)和周边部分(384),其在间隔环之间的回旋路径中延伸 (362,364,366)以固定到基座组件。 内部薄膜(350)包括中心部分(370),该中心部分将在可控的环形区域中接触外部薄膜(352)的上表面,相对较厚的环形部分(372),环形的外部薄片(374) 从所述厚部分(372)的外边缘延伸出从所述厚部分(372)的内边缘延伸的环形内部折片(376)。 可以通过改变腔室(354,356,358)中的压力来控制内部膜(350)与外部膜(352)的接触面积,从而将压力施加到基底(10)的装载区域 )形成在两个膜(350,352)和壳体(302)之间。
    • 9. 发明申请
    • CARRIER HEAD WITH A FLEXIBLE MEMBRANE HAVING PARTS MADE WITH DIFFERENT ELASTOMERS
    • 具有柔性膜的载体头部具有不同弹性体的部件
    • WO0172472A3
    • 2002-05-10
    • PCT/US0107974
    • 2001-03-12
    • APPLIED MATERIALS INC
    • ZUNIGA STEVEN MCHEN HUNG CHIHTSENG MING KUIE
    • B24B7/22B24B37/30F16J3/02H01L21/304B24B37/04B24B41/06
    • B24B37/30F16J3/02
    • A carrier head (100) for a chemical mechanical polishing apparatus includes a flexible membrane (150) that applies a load to a substrate. The substrate backing assembly (112) includes an internal membrane (150), an external membrane (152), an internal membrane support structure (160), an upper membrane spacer ring (162), a lower membrane spacer ring (164), and an edge control ring (166). The volume between the base assembly (104) and the internal membrane (150) forms the upper chamber (154) and the internal chamber (156), and the volume between the internal membrane (150) and the external membrane (152) forms the outer chamber (158). The internal membrane (150) includes a circular central portion (170), a relatively thick annular portion (174), an annular inner flap (176) that extends from the corner of the thick portion (174), an annular outer flap (178) that extends from the outer rim of the thick portion (174) and an annular connector portion (172). The inner flap (176) and the outer flap (178) can be formed of a first elastomer, whereas the thick portion (174) and connector portion (172) can be formed of a second elastomer.
    • 用于化学机械抛光装置的载体头(100)包括向基底施加载荷的柔性膜(150)。 衬底背衬组件(112)包括内膜(150),外膜(152),内膜支撑结构(160),上隔膜间隔环(162),下隔膜间隔环(164)和 边缘控制环(166)。 基部组件(104)和内膜(150)之间的体积形成上室(154)和内室(156),并且内膜(150)和外膜(152)之间的体积形成 外室(158)。 内膜(150)包括圆形中心部分(170),相对厚的环形部分(174),从厚部分(174)的角部延伸的环形内部折片(176),环形外部皮瓣(178) ),其从所述厚部(174)的外缘延伸并且环形连接器部分(172)延伸。 内翼片(176)和外翼片(178)可以由第一弹性体形成,而厚部分(174)和连接器部分(172)可以由第二弹性体形成。