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11. 发明申请

WO2010035128A3 EVAPORATOR FOR ORGANIC MATERIALS AND METHOD FOR EVAPORATING ORGANIC MATERIALS 审中-公开
公开(公告)号：WO2010035128A3
公开(公告)日：2010-04-01
申请号：PCT/IB2009/006988
申请日：2009-09-29
申请人： APPLIED MATERIALS, INC. , HEIN, Stefan , HOFFMANN, Gerd , SKUK, Peter
发明人： HEIN, Stefan , HOFFMANN, Gerd , SKUK, Peter
IPC分类号： C23C14/24
摘要： An evaporator for vaporizing an organic material to be deposited on a flexible substrate is described. The evaporator includes an evaporation tube having a wall encompassing a cavity for vaporizing the organic material; at least one heating device arranged adjacent to the wall and being adapted to heat the evaporation tube; at least one nozzle assembly protruding from the evaporation tube, wherein the nozzle assembly further comprises a nozzle cover with an opening; and a shutter for selectively opening and closing the opening of the nozzle cover, wherein the shutter is adapted to have in operation of the evaporation tube a temperature within a shutter temperature range of 140°C such that the temperature of the nozzle cover is within the shutter temperature range.

12. 发明申请

WO2017202444A1 METHOD OF MANUFACTURING A BATTERY, VACUUM PROCESSING APPARATUS AND BATTERY 审中-公开
标题翻译：制造电池的方法，真空处理装置和电池
公开(公告)号：WO2017202444A1
公开(公告)日：2017-11-30
申请号：PCT/EP2016/061567
申请日：2016-05-23
申请人： APPLIED MATERIALS, INC. , DIETER, Torsten Bruno , HEIN, Stefan , DEPPISCH, Thomas
发明人： DIETER, Torsten Bruno , HEIN, Stefan , DEPPISCH, Thomas
IPC分类号： H01M4/04 , H01M4/38 , H01M4/40
CPC分类号： H01M4/0421 , H01M2/1673 , H01M4/0407 , H01M10/0431 , H01M10/0525 , H01M10/0587
摘要： The present disclosure provides a method of manufacturing a battery. The method includes providing a separator film, processing the separator film by at least two of the actions of depositing an anode material layer onto a first side of the separator film, depositing a cathode material layer onto a second side of the separator film opposite to the first side, coating the anode material layer with an anode contact, and coating the cathode material layer with an anode contact. At least two of these actions are carried out without a break in vacuum in the vacuum processing environment.
摘要翻译：本公开提供了一种制造电池的方法。该方法包括提供分隔膜，通过将阳极材料层沉积到分隔膜的第一侧上的操作中的至少两种来处理分隔膜，将阴极材料层沉积到分隔膜的与第一侧相反的第二侧上第一侧，用阳极触点涂覆阳极材料层，并用阳极触点涂覆阴极材料层。这些行为中至少有两个是在真空处理环境中没有真空中断的情况下进行的。

13. 发明申请

WO2015007858A1 CLEANING METHOD FOR THIN-FILM PROCESSING APPLICATIONS AND APPARATUS FOR USE THEREIN 审中-公开
标题翻译：薄膜加工应用的清洗方法及其使用的装置
公开(公告)号：WO2015007858A1
公开(公告)日：2015-01-22
申请号：PCT/EP2014/065424
申请日：2014-07-17
申请人： APPLIED MATERIALS, INC. , RIES, Florian , HEIN, Stefan , LORENZ, Stefan , MORRISON, Neil , STOLLEY, Tobias
发明人： RIES, Florian , HEIN, Stefan , LORENZ, Stefan , MORRISON, Neil , STOLLEY, Tobias
IPC分类号： H01J37/32
CPC分类号： C23C16/4405 , H01J37/3277 , H01J37/32862 , Y10T428/18 , Y10T428/192
摘要： According to the present disclosure, a method for cleaning the processing chamber of a flexible substrate processing apparatus without breaking the vacuum in the processing chamber is provided. The method for cleaning the processing chamber includes guiding a sacrificial foil into the processing chamber; initiating a first pump process in the processing chamber; plasma cleaning the processing chamber while the sacrificial foil is provided in the processing chamber; initiating a second pump process in the processing chamber; and guiding the sacrificial foil out of the processing chamber.
摘要翻译：根据本公开，提供了一种用于清洁柔性基板处理设备的处理室而不破坏处理室中的真空的方法。用于清洁处理室的方法包括将牺牲箔引导到处理室中; 在处理室中启动第一泵过程; 等离子体清洁处理室，同时牺牲箔设置在处理室中; 在处理室中启动第二泵过程; 并将牺牲箔引导出处理室。

14. 发明申请

WO2012072132A1 EVAPORATION UNIT AND VACUUM COATING APPARATUS 审中-公开
标题翻译：蒸发单元和真空涂料设备
公开(公告)号：WO2012072132A1
公开(公告)日：2012-06-07
申请号：PCT/EP2010/068661
申请日：2010-12-01
申请人： APPLIED MATERIALS, INC. , HEIN, Stefan , HOFFMANN, Gerd
发明人： HEIN, Stefan , HOFFMANN, Gerd
IPC分类号： C23C14/56
CPC分类号： C23C14/24 , C23C14/562
摘要： Vacuum coating apparatus for coating a web includes a first rotatable coating drum (11) and a second rotatable coating drum (12) disposed parallel to the first drum (11) with a gap (17) formed between the first and the second coating drums (11, 12) for transporting at least one web (15). A first evaporator (21) has at least one evaporation source (21a) for generating a first evaporation beam (31b), wherein the first evaporator (21) is arranged next to the first coating drum (11). A second evaporator (22) has at least one evaporation source (22a) for generating a second evaporation beam (32b), wherein the second evaporator (22) is arranged next to the second coating drum (12). The first and the second evaporators (21, 22) are inclined relative to each other.
摘要翻译：用于涂布卷材的真空涂布装置包括：第一可旋转涂布滚筒（11）和平行于第一滚筒（11）设置的第二可旋转涂布滚筒（12），在第一和第二涂布滚筒之间形成间隙（17）用于运输至少一个网（15）的装置（11,12）。第一蒸发器（21）具有用于产生第一蒸发束（31b）的至少一个蒸发源（21a），其中第一蒸发器（21）设置在第一涂布滚筒（11）的旁边。第二蒸发器（22）具有用于产生第二蒸发束（32b）的至少一个蒸发源（22a），其中所述第二蒸发器（22）设置在所述第二涂布滚筒（12）的旁边。第一和第二蒸发器（21,22）相对于彼此倾斜。

15. 发明申请

WO2010136464A1 PLASMA DEPOSITION SOURCE AND METHOD FOR DEPOSITING THIN FILMS 审中-公开
标题翻译：等离子体沉积源和沉积薄膜的方法
公开(公告)号：WO2010136464A1
公开(公告)日：2010-12-02
申请号：PCT/EP2010/057181
申请日：2010-05-25
申请人： APPLIED MATERIALS, INC. , MORRISON, Neil , HERZOG, Andre , HEIN, Stefan , SKUK, Peter
发明人： MORRISON, Neil , HERZOG, Andre , HEIN, Stefan , SKUK, Peter
IPC分类号： H01J37/32
CPC分类号： H01J37/32 , C23C14/505 , H01J37/3277
摘要： A plasma deposition source for transferring a deposition gas into a plasma phase and for depositing, from the plasma phase, a thin film onto a substrate moving in a substrate transport direction in a vacuum chamber is described. The plasma deposition source includes a multiregion electrode device adapted to be positioned in the vacuum chamber and including at least one RF electrode arranged opposite to the moving substrate, and an RF power generator adapted for supplying RF power to the RF electrode. The RF electrode has at least one gas inlet arranged at one edge of the RF electrode and at least one gas outlet arranged at the opposed edge of the RF electrode. A normalized plasma volume is provided by a plasma volume defined between an electrode surface and an opposite substrate position, divided by an electrode length. The normalized plasma volume is tuned to a depletion length of the deposition gas.
摘要翻译：一种等离子体沉积源，用于将沉积气体转移到等离子体相中，并且用于从等离子体相将薄膜沉积到在真空室中沿基板输送方向移动的基板上。等离子体沉积源包括多电极电极装置，其适于定位在真空室中并且包括与移动衬底相对布置的至少一个RF电极，以及适于向RF电极提供RF功率的RF功率发生器。 RF电极具有布置在RF电极的一个边缘处的至少一个气体入口和布置在RF电极的相对边缘处的至少一个气体出口。通过在电极表面和相对的衬底位置之间限定的等离子体体积除以电极长度来提供归一化的等离子体体积。将归一化的等离子体体积调节到沉积气体的耗尽长度。

16. 发明申请

WO2010122030A3 GUIDING DEVICES AND METHODS FOR CONTACTLESS GUIDING OF A WEB IN A WEB COATING PROCESS 审中-公开
公开(公告)号：WO2010122030A3
公开(公告)日：2010-10-28
申请号：PCT/EP2010/055212
申请日：2010-04-20
申请人： APPLIED MATERIALS, INC. , HEIN, Stefan , HERZOG, Andre , SKUK, Peter , BUSCH, John D.
发明人： HEIN, Stefan , HERZOG, Andre , SKUK, Peter , BUSCH, John D.
IPC分类号： B65H23/32 , B65H23/24 , B65H27/00
摘要： According to embodiments described herein, a guiding device for contactless guiding of a web (1) in a web coating process application under vacuum conditions is provided. The guiding device (111) includes a curved surface (110) for facing the web, and a group of gas outlets (112) disposed in the curved surface and adapted for giving off a gas flow to form a hover cushion between the curved surface and the web. The guiding device further includes a gas distribution system for selectively providing the gas flow to a first subgroup of the gas outlets (240, 242, 244) and for preventing the gas from flowing to a second subgroup (114) of the gas outlets. The curved surface comprises a web guiding region. The first subgroup of the gas outlets consists of at least one gas outlet in the web guiding region. The second subgroup of gas outlets consists of at least one gas outlet outside of the web guiding region in the web guiding direction.

17. 发明申请

WO2019105533A1 DEPOSITION APPARATUS FOR COATING A FLEXIBLE SUBSTRATE, METHOD OF COATING A FLEXIBLE SUBSTRATE AND FLEXIBLE SUBSTRATE HAVING A COATING 审中-公开
公开(公告)号：WO2019105533A1
公开(公告)日：2019-06-06
申请号：PCT/EP2017/080692
申请日：2017-11-28
申请人： APPLIED MATERIALS, INC. , KURTHEN, Christof , HEIN, Stefan , KUKLA, Reiner , MORRISON, Neil , DEPPISCH, Thomas , LORENZ, Stefan , HABERKORN, Edgar
发明人： KURTHEN, Christof , HEIN, Stefan , KUKLA, Reiner , MORRISON, Neil , DEPPISCH, Thomas , LORENZ, Stefan , HABERKORN, Edgar
IPC分类号： C23C14/06 , C23C14/34 , C23C14/56
摘要： A deposition apparatus (100) for coating a flexible substrate (10) is described. The deposition apparatus comprises a first spool chamber (110) housing a storage spool (112) for providing the flexible substrate (10), a deposition chamber (120) arranged downstream from the first spool chamber (110), and a second spool chamber (150) arranged downstream from the deposition chamber (120) and housing a wind-up spool (152) for winding the flexible substrate (10) thereon after deposition. The deposition chamber (120) comprises a coating drum (122) for guiding the flexible substrate past a plurality of deposition units (121) including at least one deposition unit (124) having a graphite target (125). The coating drum is connected to a device (140) for applying an electrical potential to the coating drum.

18. 发明申请

WO2017198296A1 APPARATUS FOR CONTINUOUS PROCESSING OF A FLEXIBLE SUBSTRATE IN A VACUUM AND METHOD THEREFOR 审中-公开
标题翻译：用于在真空中连续处理柔性基板的装置及其方法
公开(公告)号：WO2017198296A1
公开(公告)日：2017-11-23
申请号：PCT/EP2016/061136
申请日：2016-05-18
申请人： APPLIED MATERIALS, INC. , SAUER, Andreas , GERBER, Gunther , HEIN, Stefan , DEMUTH, Rainer
发明人： SAUER, Andreas , GERBER, Gunther , HEIN, Stefan , DEMUTH, Rainer
IPC分类号： B41F31/02 , B41F33/00 , B05C1/08
CPC分类号： B41F33/00 , B05B1/083 , B05C1/0813 , B05C1/0878 , B41F31/027
摘要： An apparatus (100) for continuous processing of a flexible substrate in a vacuum is provided. The apparatus includes a processing roller (110); a doctor blade assembly (120) having a doctor blade (121) extending in an axial direction of the processing roller (110); and a force transmission assembly (130) configured for moving the doctor blade assembly (120) towards a surface (111) of the processing roller (110). The force transmission assembly (130) includes a pressure unit (131) for applying a force on the doctor blade assembly (120) and a counter-pressure unit (132) for applying a counter-force on the doctor blade assembly (120).
摘要翻译：提供了一种用于在真空中连续处理柔性衬底的设备（100）。该设备包括处理辊（110）; 具有在所述处理辊（110）的轴向上延伸的刮刀（121）的刮刀组件（120）; 以及力传递组件（130），所述力传递组件（130）构造成用于朝向所述处理辊（110）的表面（111）移动所述刮刀组件（120）。力传递组件（130）包括用于在刮片组件（120）上施加力的压力单元（131）和用于在刮片组件（120）上施加反作用力的反压单元（132）。

19. 发明申请

WO2017084720A1 CARRIER FOR FLEXIBLE SUBSTRATES 审中-公开
标题翻译：载体用于柔性基板
公开(公告)号：WO2017084720A1
公开(公告)日：2017-05-26
申请号：PCT/EP2015/077249
申请日：2015-11-20
申请人： APPLIED MATERIALS, INC. , HEIN, Stefan , GERBER, Gunther , SAUER, Andreas
发明人： HEIN, Stefan , GERBER, Gunther , SAUER, Andreas
IPC分类号： C23C14/56 , C23C16/54
CPC分类号： C23C14/562 , C23C16/545
摘要： The present disclosure provides an apparatus (100) for supporting a flexible substrate (10) in a vacuum processing chamber. The apparatus (100) includes a coating drum rotatable around a rotational axis (105), wherein the coating drum has a support surface (110) configured for supporting the fiexible substrate (10), wherein the support surface (110) is symmetrical with respect to the rotational axis (105), and wherein a first distance (120) between the rotational axis (105) and a center portion (112) of the support surface (110) in a direction perpendicular to the rotational axis (105) is smaller than a second distance (122) between the rotational axis (105) and a periphery (114, 116) of the support surface (110).
摘要翻译：本公开提供了一种用于在真空处理室中支撑柔性衬底（10）的设备（100）。所述设备（100）包括可围绕旋转轴线（105）旋转的涂布鼓，其中所述涂布鼓具有构造成用于支撑所述柔性基板（10）的支撑表面（110），其中所述支撑表面（110）到旋转轴线（105），并且其中旋转轴线（105）与支撑表面（110）的中心部分（112）之间在垂直于旋转轴线（105）的方向上的第一距离（120）较小比旋转轴线（105）与支撑表面（110）的周边（114,116）之间的第二距离（122）

20. 发明申请

WO2015149849A1 VACUUM PROCESSING SYSTEM AND METHOD FOR MOUNTING A PROCESSING SYSTEM 审中-公开
标题翻译：真空加工系统和安装加工系统的方法
公开(公告)号：WO2015149849A1
公开(公告)日：2015-10-08
申请号：PCT/EP2014/056605
申请日：2014-04-02
申请人： APPLIED MATERIALS, INC. , RIES, Florian , HEIN, Stefan , HENRICH, Jürgen , SAUER, Andreas
发明人： RIES, Florian , HEIN, Stefan , HENRICH, Jürgen , SAUER, Andreas
IPC分类号： C23C14/52 , C23C14/56 , C23C16/54
CPC分类号： C23C14/24 , C23C14/52 , C23C14/56 , C23C14/562 , C23C16/54 , C23C16/545
摘要： A vacuum processing system (100) for a flexible substrate (260; 560) is provided. The processing system includes a first chamber (110) adapted for housing one of a supply roll for providing the flexible substrate and a take-up roll for storing the flexible substrate (260; 560); a second chamber (120) adapted for housing one of a supply roll for providing the flexible substrate and a take-up roll for storing the flexible substrate (260; 560); a maintenance zone (130) between the first chamber (110) and the second chamber (120; 220; 420; 520); and a first process chamber (140) for depositing material on the flexible substrate, wherein the second chamber (140) is provided between the maintenance zone (130) and the first process chamber (110). The maintenance zone (130) allows for maintenance access to at least one of the first chamber (110) and the second chamber (120).
摘要翻译：提供了一种用于柔性基板（260; 560）的真空处理系统（100）。处理系统包括适于容纳用于提供柔性基底的供应辊中的一个的第一室（110）和用于储存柔性基板（260; 560）的卷取辊。适于容纳用于提供所述柔性基板的供应辊中的一个的第二室（120）和用于存储所述柔性基板（260; 560）的卷取辊; 在所述第一室（110）和所述第二室（120; 220; 420; 520）之间的维护区（130）; 以及用于在所述柔性基板上沉积材料的第一处理室（140），其中所述第二室（140）设置在所述维护区（130）和所述第一处理室（110）之间。维护区域（130）允许维护对第一室（110）和第二室（120）中的至少一个的通路。

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