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    • 5. 发明授权
    • Floating gate charge detection node
    • 浮栅电荷检测节点
    • US5491354A
    • 1996-02-13
    • US297460
    • 1994-08-19
    • Jaroslav Hynecek
    • Jaroslav Hynecek
    • H01L29/762H01L21/339H01L27/148H01L29/768H04N5/357H01L29/765G11C19/28
    • H01L29/76816H01L27/148
    • The charge coupled device charge detection node includes a first semiconductor layer of a first conductivity type; a second semiconductor layer of a second conductivity type in the substrate; virtual gate regions of the first conductivity type formed in the second semiconductor layer, the virtual gate regions forming virtual phase potential areas; an insulating layer on the second semiconductor layer; a floating gate formed on the insulating layer, the floating gate is located above a portion of the second semiconductor layer that is between virtual gate regions, the floating gate forming a floating gate potential well in response to a voltage; a first transfer gate formed on the insulating layer and separated from the floating gate by a virtual gate region, the first transfer gate forming a transfer potential area in response to a voltage; and an electrode coupled to one of the virtual gate regions on the opposite side of the floating gate from the first transfer gate, the electrode increases the potential of the virtual phase potential area below the electrode in response to a voltage.
    • 电荷耦合器件电荷检测节点包括第一导电类型的第一半导体层; 在所述衬底中的第二导电类型的第二半导体层; 形成在第二半导体层中的第一导电类型的虚拟栅极区域,虚拟栅极区域形成虚拟相位电位区域; 第二半导体层上的绝缘层; 形成在所述绝缘层上的浮置栅极,所述浮栅位于所述第二半导体层的位于虚拟栅极区域之间的一部分上,所述浮置栅极响应于电压形成浮置栅极势阱; 形成在所述绝缘层上并通过虚拟栅极区与所述浮动栅极分离的第一传输栅极,所述第一传输栅极响应于电压形成传输电位区域; 以及电极,其耦合到浮置栅极与第一传输栅极的相对侧上的虚拟栅极区域中的一个,电极响应于电压而增加虚拟相电位区域在电极下方的电位。