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    • 1. 发明授权
    • Vertical JFET source follower for small pixel CMOS image sensors
    • 用于小像素CMOS图像传感器的垂直JFET源极跟随器
    • US08937272B2
    • 2015-01-20
    • US13476784
    • 2012-05-21
    • Jaroslav Hynecek
    • Jaroslav Hynecek
    • H01L31/062H01L31/113H01L27/146G01J1/44
    • H01L27/14689H01L27/1464H01L27/14643H01L27/14679
    • An image sensor pixel suitable for use in a back-side-illuminated or a front-side-illuminated sensor arrangement is provided. The image sensor pixel may be a small size pixel that includes a source follower implemented using a vertical junction field effect (JFET) transistor. The vertical JFET source follower may be integrated directly into the floating diffusion node, thereby eliminating excess metal routing and pixel area typically allocated for the source follower in conventional pixel configurations. Pixel area may instead be allocated for increasing the charge storage capacity of the photodiode or can be used to reduce pixel size while maintaining pixel performance. Using a vertical junction field effect transistor in this way simplifies pixel addressing operations and minimizes random telegraph signal (RTS) noise associated with small size metal-oxide-semiconductor (MOS) transistors.
    • 提供适用于背面照明或前侧照射传感器装置的图像传感器像素。 图像传感器像素可以是包括使用垂直结场效应(JFET)晶体管实现的源极跟随器的小尺寸像素。 垂直JFET源极跟随器可以直接集成到浮动扩散节点中,从而消除了常规像素配置中通常分配给源极跟随器的过量金属布线和像素区域。 可以替代地分配像素区域来增加光电二极管的电荷存储容量,或者可以用于在保持像素性能的同时减小像素尺寸。 以这种方式使用垂直结场效应晶体管简化了像素寻址操作,并使与小尺寸金属氧化物半导体(MOS)晶体管相关联的随机电报信号(RTS)噪声最小化。
    • 2. 发明授权
    • Methods of forming a stratified photodiode for high resolution CMOS image sensor implemented with STI technology
    • 用STI技术实现高分辨率CMOS图像传感器的分层光电二极管形成方法
    • US08703522B2
    • 2014-04-22
    • US13562835
    • 2012-07-31
    • Jaroslav Hynecek
    • Jaroslav Hynecek
    • H01L21/00H01L21/74H01L21/265
    • H01L27/14603H01L27/14643H01L27/14683
    • A stratified photodiode for high resolution CMOS image sensors implemented with STI technology is provided. The photodiode includes a semi-conductive layer of a first conductivity type, multiple doping regions of a second conductivity type, multiple doping regions of the first conductivity type, and a pinning layer. The multiple doping regions of the second conductivity type are formed to different depths in the semi-conductive layer. The multiple doping regions of the first conductivity type are disposed between the multiple doping regions of the second conductivity type and form multiple junction capacitances without full depletion. In particular, the stratified doping arrangement allows the photodiode to have a small size, high charge storage capacity, low dark current, and low operation voltages.
    • 提供了用STI技术实现的高分辨率CMOS图像传感器的分层光电二极管。 光电二极管包括第一导电类型的半导体层,第二导电类型的多个掺杂区域,第一导电类型的多个掺杂区域和钉扎层。 第二导电类型的多个掺杂区域在半导体层中形成为不同的深度。 第一导电类型的多个掺杂区域设置在第二导电类型的多个掺杂区域之间并且形成多个结电容而没有完全耗尽。 特别地,分层掺杂布置允许光电二极管具有小尺寸,高电荷存储容量,低暗电流和低操作电压。
    • 4. 发明授权
    • Back-side-illuminated image sensors with bulk-charge-modulated image sensor pixels
    • 具有体电荷调制图像传感器像素的背面照明图像传感器
    • US08497546B2
    • 2013-07-30
    • US13008784
    • 2011-01-18
    • Jaroslav Hynecek
    • Jaroslav Hynecek
    • H01L29/788
    • H01L27/1464H01L27/14641H01L27/14643H01L27/14656
    • Image sensor arrays may include bulk-charge-modulated-device (BCMD) sensor pixels. The BCMD sensor pixels may be used in back-side-illuminated (BSI) image sensors. A BCMD sensor pixel need not include a dedicated addressing transistor. The BCMD sensor pixel may include a gated drain reset (GDR) structure that is used to perform reset operations. The GDR structure may be shared among multiple pixels, which provides increased charge storage capacity for high resolution image sensors. A negative back body bias may be applied to the BCMD pixel array, allowing the depletion region under each BCMD pixel to extend all the way to the back silicon surface. Extending the depletion region by negatively biasing the back silicon surface may serve to minimize pixel crosstalk.
    • 图像传感器阵列可以包括体电荷调制装置(BCMD)传感器像素。 BCMD传感器像素可用于背面照明(BSI)图像传感器。 BCMD传感器像素不需要包括专用寻址晶体管。 BCMD传感器像素可以包括用于执行复位操作的门控漏极复位(GDR)结构。 GDR结构可以在多个像素之间共享,这为高分辨率图像传感器提供了增加的电荷存储容量。 可以向BCMD像素阵列施加负的后体偏置,从而允许每个BCMD像素下的耗尽区域一直延伸到后硅表面。 通过负偏置背硅表面来延伸耗尽区域可以用于最小化像素串扰。
    • 7. 发明申请
    • STRATIFIED PHOTODIODE FOR HIGH RESOLUTION CMOS IMAGE SENSOR IMPLEMENTED WITH STI TECHNOLOGY
    • 用于STI技术实现的高分辨率CMOS图像传感器的分光光度
    • US20100044824A1
    • 2010-02-25
    • US12608731
    • 2009-10-29
    • Jaroslav Hynecek
    • Jaroslav Hynecek
    • H01L31/101
    • H01L27/14603H01L27/14643H01L27/14683
    • A stratified photodiode for high resolution CMOS image sensors implemented with STI technology is provided. The photodiode includes a semi-conductive layer of a first conductivity type, multiple doping regions of a second conductivity type, multiple doping regions of the first conductivity type, and a pinning layer. The multiple doping regions of the second conductivity type are formed to different depths in the semi-conductive layer. The multiple doping regions of the first conductivity type are disposed between the multiple doping regions of the second conductivity type and form multiple junction capacitances without full depletion. In particular, the stratified doping arrangement allows the photodiode to have a small size, high charge storage capacity, low dark current, and low operation voltages.
    • 提供了用STI技术实现的高分辨率CMOS图像传感器的分层光电二极管。 光电二极管包括第一导电类型的半导体层,第二导电类型的多个掺杂区域,第一导电类型的多个掺杂区域和钉扎层。 第二导电类型的多个掺杂区域在半导体层中形成为不同的深度。 第一导电类型的多个掺杂区域设置在第二导电类型的多个掺杂区域之间并且形成多个结电容而没有完全耗尽。 特别地,分层掺杂布置允许光电二极管具有小尺寸,高电荷存储容量,低暗电流和低操作电压。