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    • 1. 发明授权
    • Continual flow rapid thermal processing apparatus and method
    • 持续流动快速热处理装置及方法
    • US6114662A
    • 2000-09-05
    • US870355
    • 1997-06-05
    • Daniel GuidottiKam Leung Lee
    • Daniel GuidottiKam Leung Lee
    • H01L21/00H01L21/677F27N9/06F26B19/00
    • H01L21/67109H01L21/67745
    • A rapid thermal processing apparatus and a method of using such apparatus for the continuous heat treatment of at least one workpiece, which apparatus includes a cavity of generally elongated shape, a process chamber defined by interior walls inside the cavity, a device for delivering, regulating and extracting process gases from the chamber, a device for transporting at least one workpiece through the chamber in a substantially forward direction, a device for heating at least a section of the chamber, and a device for cooling the at least one workpiece downstream from the heating device. The cavity for the apparatus may also be provided in either a curved or a linear configuration for carrying out the present invention method.
    • 一种快速热处理装置和使用这种装置对至少一个工件进行连续热处理的方法,该装置包括大致细长形状的空腔,由腔内的内壁限定的处理室,用于输送调节的装置 以及从所述室中提取工艺气体,用于沿基本向前的方向输送至少一个工件通过所述室的装置,用于加热所述室的至少一部分的装置,以及用于冷却所述至少一个工件 加热装置。 用于装置的空腔也可以以弯曲或线性构造提供,以实现本发明的方法。