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    • 6. 发明申请
    • ANTI MICROBIAL COMPOUNDS AND THEIR USE
    • 抗微生物化合物及其用途
    • US20130040059A1
    • 2013-02-14
    • US13510759
    • 2010-11-19
    • Mahmoud Hossein
    • Mahmoud Hossein
    • C08F120/34B05D5/00C08F120/60B05D1/38C09D5/14C08L33/16
    • Compounds having building blocks according to the general formulae as shown in FIG. 1., wherein [BB1] is building block 1; [BB2] is building block 2; R1 is H or CH3, Z is a bridging group and is an ester group (—C(═O)O—) or an amide group (—C(═O)—NH—), X is an element selected from nitrogen, phosphorus, oxygen and sulfur; i is an integer which is 2 in case of nitrogen and phosphorus and 1 in case of oxygen and sulfur; Rj denotes groups which may be the same or different and have a C1-C20 hydrocarbyl group; Rk is a C7-C50 hydrocarbyl group; Y− is a negatively charged ion; and wherein the molar fraction of [BB2] in a molecule of the compound is between 0.3 and 1 and the weight average molecular weight of the compound is between 1.000 and 100.000 g/mol, determined with GPC. Compositions comprising such compounds and the use of such compounds as surfactants in a method for coating objects and in a method for preparing a latex composition.
    • 具有如图1所示的通式的结构单元的化合物 其中[BB1]是构件块1; [BB2]是第2组; R1为H或CH3,Z为桥基,为酯基(-C(= O)O-)或酰胺基(-C(= O)-NH-),X为选自氮, 磷,氧和硫; 在氮和磷的情况下,i为整数2,在氧和硫的情况下为1; R j表示可以相同或不同且具有C1-C20烃基的基团; Rk是C7-C50烃基; Y-是带负电荷的离子; 并且其中化合物分子中[BB2]的摩尔分数为0.3-1,化合物的重均分子量为1.000至100.000g / mol,用GPC测定。 包含这些化合物的组合物以及这些化合物在用于涂覆物体的方法中的表面活性剂的用途以及制备胶乳组合物的方法。
    • 8. 发明申请
    • PHOTORESIST COMPOSITION
    • 光电组合物
    • US20110091807A1
    • 2011-04-21
    • US12903146
    • 2010-10-12
    • Tatsuro MASUYAMAKazuhiko HASHIMOTOJunji SHIGEMATSU
    • Tatsuro MASUYAMAKazuhiko HASHIMOTOJunji SHIGEMATSU
    • G03F7/004C07C69/527G03F7/20C07C69/34C07C309/70C08F120/34
    • C08F120/34C07C251/66C07C309/70G03F7/0045G03F7/0046G03F7/0397G03F7/2041
    • The present invention provides a photoresist composition comprising a polymer comprising a structural unit derived from a compound represented by the formula (I): wherein R1 represents a hydrogen atom or a methyl group, R2 represents a C6-C12 aromatic hydrocarbon group which can have one or more substituents, R3 represents a cyano group or a C1-C12 hydrocarbon group which can have one or more substituents and which can contain one or more heteroatoms, A1 represents a single bond, —(CH2)g—CO—O—* or —(CH2)h—O—CO—(CH2)i—CO—O—* wherein g, h and i each independently represent an integer of −1 to 6 and * represents a binding position to the nitrogen atom, a resin having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid, and an acid generator.
    • 本发明提供一种光致抗蚀剂组合物,其包含含有衍生自由式(I)表示的化合物的结构单元的聚合物:其中R 1表示氢原子或甲基,R 2表示可以具有1个的C 6 -C 12芳族烃基 或更多取代基,R 3表示可以具有一个或多个取代基并且可以含有一个或多个杂原子的氰基或C 1 -C 12烃基,A 1表示单键, - (CH 2)g -CO-O- *或 - (CH 2)h -O-CO-(CH 2)i-CO-O- *其中g,h和i各自独立地表示-1至6的整数,*表示与氮原子的结合位置, 酸不稳定基团,并且在碱性水溶液中不溶或难溶,但是通过酸和酸产生剂可溶于碱水溶液中。