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1. 发明授权

US08951709B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US08951709B2
公开(公告)日：2015-02-10
申请号：US13280969
申请日：2011-10-25
申请人： Tatsuro Masuyama , Satoshi Yamamoto , Koji Ichikawa
发明人： Tatsuro Masuyama , Satoshi Yamamoto , Koji Ichikawa
IPC分类号： G03F7/00 , G03F7/20 , G03F7/004 , G03F7/039
CPC分类号： G03F7/2041 , G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： A resist composition contains a resin having a structural unit represented by the formula (aa) and a structural unit represented by the formula (ab); and an acid generator, wherein Raa1 represents a hydrogen atom and a methyl group; Aaa1 represents an optionally substituted C1 to C6 alkanediyl group etc.; Raa2 represents an optionally substituted C1 to C18 aliphatic hydrocarbon group; Rab1 represents a hydrogen atom and a methyl group; Aab1 represents a single bond, an optionally substituted C1 to C6 alkanediyl group etc.; W1 represents an optionally substituted C4 to C36 alicyclic hydrocarbon group; n represents 1 or 2; Aab2 in each occurrence independently represents an optionally substituted C1 to C6 aliphatic hydrocarbon group; Rab2 in each occurrence independently represents a C1 to C12 fluorinated alkyl group.
摘要翻译：抗蚀剂组合物含有具有由式（aa）表示的结构单元的树脂和由式（ab）表示的结构单元; 和酸产生剂，其中Raa1表示氢原子和甲基; Aaa1表示可以具有取代基的C1〜C6烷二基等。 Raa2表示任选取代的C1至C18脂族烃基; Rab1表示氢原子和甲基; Aab1表示单键，任选取代的C 1至C 6烷二基等; W1表示任选取代的C4至C36脂环族烃基; n表示1或2; Aab2各自独立地表示任选取代的C 1至C 6脂族烃基; Rab2各自独立地表示C1〜C12氟化烷基。

2. 发明授权

US08426106B2 Photoresist composition 有权
标题翻译：光刻胶组成
公开(公告)号：US08426106B2
公开(公告)日：2013-04-23
申请号：US12903146
申请日：2010-10-12
申请人： Tatsuro Masuyama , Kazuhiko Hashimoto , Junji Shigematsu
发明人： Tatsuro Masuyama , Kazuhiko Hashimoto , Junji Shigematsu
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , G03F7/38
CPC分类号： C08F120/34 , C07C251/66 , C07C309/70 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A Photoresist composition comprising a polymer comprising a structural unit derived from a compound represented by the formula (I): wherein R1 represents a hydrogen atom or a methyl group, R2 represents a C6-C12 aromatic hydrocarbon group which can have one or more substituents, R3 represents a cyano group or a C1-C12 hydrocarbon group which can have one or more substituents and which can contain one or more heteroatoms, A1 represents a single bond, —(CH2)g—CO—O—* or —(CH2)h—O—CO—(CH2)i—CO—O—* wherein g, h and i each independently represent an integer of −1 to 6 and * represents a binding position to the nitrogen atom, a resin having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid, and an acid generator.
摘要翻译：一种光致抗蚀剂组合物，其包含包含衍生自由式（I）表示的化合物的结构单元的聚合物：其中R 1表示氢原子或甲基，R 2表示可以具有一个或多个取代基的C 6 -C 12芳族烃基， R3表示可以具有一个或多个取代基且可以含有一个或多个杂原子的氰基或C 1 -C 12烃基，A 1表示单键， - （CH 2）g -CO-O- *或 - （CH 2） hO-CO-（CH2）i-CO-O- *其中g，h和i各自独立地表示1-6的整数，*表示与氮原子的结合位置，具有酸不稳定基团的树脂和在碱性水溶液中不溶或难溶，但通过酸和酸生成剂可溶于碱水溶液。

3. 发明申请

US20120264059A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN 有权
标题翻译：耐蚀组合物及其制造方法
公开(公告)号：US20120264059A1
公开(公告)日：2012-10-18
申请号：US13441205
申请日：2012-04-06
申请人： Koji ICHIKAWA , Takahiro YASUE , Tatsuro MASUYAMA
发明人： Koji ICHIKAWA , Takahiro YASUE , Tatsuro MASUYAMA
IPC分类号： G03F7/027 , G03F7/20
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/027 , G03F7/0397 , G03F7/20 , G03F7/2041
摘要： A resist composition includes (A) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator having a structure to be cleaved by the action of an alkaline developer, and (C) a compound represented by the formula (I), wherein R1 and R2 in each occurrence independently represent a C1 to C12 hydrocarbon group, a C1 to C6 alkoxyl group, a C2 to C7 acyl group, a C2 to C7 acyloxy group, a C2 to C7 alkoxycarbonyl group, a nitro group or a halogen atom; m and n independently represent an integer of 0 to 4.
摘要翻译：抗蚀剂组合物包括（A）在碱性水溶液中不溶或难溶的树脂，但是通过酸的作用可溶于碱性水溶液中，（B）具有要通过碱性显影剂，和（C）由式（I）表示的化合物，其中R1和R2各自独立地表示C1〜C12烃基，C1〜C6烷氧基，C2〜C7酰基，C2 C7酰氧基，C2〜C7烷氧基羰基，硝基或卤素原子; m和n独立地表示0〜4的整数。

4. 发明申请

US20120100483A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN 有权
标题翻译：耐蚀组合物及其制造方法
公开(公告)号：US20120100483A1
公开(公告)日：2012-04-26
申请号：US13281145
申请日：2011-10-25
申请人： Tatsuro MASUYAMA , Satoshi YAMAMOTO , Koji ICHIKAWA
发明人： Tatsuro MASUYAMA , Satoshi YAMAMOTO , Koji ICHIKAWA
IPC分类号： G03F7/20 , G03F7/027 , G03F7/004
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0397 , G03F7/2041
摘要： A resist composition contains; a resin having a structural unit represented by the formula (aa) and a structural unit represented by the formula (ab); and an acid generator, wherein Raa1 represents a hydrogen atom and a methyl group; Aaa1 represents an optionally substituted C1 to C6 alkanediyl group etc.; Raa2 represents an optionally substituted C1 to C18 aliphatic hydrocarbon group; Rab1 represents a hydrogen atom and a methyl group; Aab1 represents a single bond, an optionally substituted C1 to C6 alkanediyl group etc.; W1 represents an optionally substituted C4 to C24 alicyclic hydrocarbon group; n represents 1 or 2; Aab2 in each occurrence independently represents an optionally substituted C1 to C6 aliphatic hydrocarbon group; Rab2 in each occurrence independently represents a C1 to C12 fluorinated alkyl group.
摘要翻译：抗蚀剂组合物含有具有由式（aa）表示的结构单元的树脂和由式（ab）表示的结构单元; 和酸产生剂，其中Raa1表示氢原子和甲基; Aaa1表示可以具有取代基的C1〜C6烷二基等。 Raa2表示任选取代的C1至C18脂族烃基; Rab1表示氢原子和甲基; Aab1表示单键，任选取代的C 1至C 6烷二基等; W1表示任选取代的C4至C24脂环族烃基; n表示1或2; Aab2各自独立地表示任选取代的C 1至C 6脂族烃基; Rab2各自独立地表示C1〜C12氟化烷基。

5. 发明申请

US20110065047A1 PHOTORESIST COMPOSITION 审中-公开
标题翻译：光电组合物
公开(公告)号：US20110065047A1
公开(公告)日：2011-03-17
申请号：US12880750
申请日：2010-09-13
申请人： Tatsuro MASUYAMA , Mitsuhiro HATA
发明人： Tatsuro MASUYAMA , Mitsuhiro HATA
IPC分类号： G03F7/004 , G03F7/20 , C07C271/22 , C07C69/76
CPC分类号： C07C271/22 , G03F7/0397
摘要： The present invention provides a photoresist composition comprising a resin, an acid generator and a compound represented by the formula (I): wherein R1, R2 and R3 each independently represent a hydrogen atom or a C1-C4 alkyl group, A1 represents a single bond or a C1-C2 alkylene group, R4 and R5 each independently represent a hydrogen atom or a C1-C2 alkyl group, R6 and R7 each independently represent a hydrogen atom etc.
摘要翻译：本发明提供一种光致抗蚀剂组合物，其包含树脂，酸产生剂和由式（I）表示的化合物：其中R1，R2和R3各自独立地表示氢原子或C1-C4烷基，A1表示单键或C1-C2亚烷基，R4和R5各自独立地表示氢原子或C1-C2烷基，R6和R7各自独立地表示氢原子等。

6. 发明申请

US20100304294A1 SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME 有权
标题翻译：含有它的盐和光催化剂组合物
公开(公告)号：US20100304294A1
公开(公告)日：2010-12-02
申请号：US12786799
申请日：2010-05-25
申请人： Koji ICHIKAWA , Masako Sugihara , Tatsuro Masuyama
发明人： Koji ICHIKAWA , Masako Sugihara , Tatsuro Masuyama
IPC分类号： G03F7/004 , C07D307/00 , G03F7/20 , C07D307/04
CPC分类号： C07D307/80 , G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： A salt represented by the formula (I-AA): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C4 perfluoroalkyl group, X1 represents a single bond etc., Y1 represents a C1-C36 aliphatic hydrocarbon group etc., A1 and A2 independently each represents a C1-C20 aliphatic hydrocarbon group etc., Ar1 represents a (m4+1)-valent C6-C20 aromatic hydrocarbon group which can have one or more substituents, B1 represents a single bond etc., m1 and m2 independently each represents an integer of 0 to 2, m3 represents an integer of 1 to 3, with the proviso that m1 plus m2 plus m3 equals 3, and m4 represents an integer of 1 to 3, and a photoresist composition comprising the salt represented by the formula (I-AA) and a resin comprising a structural unit having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid.
摘要翻译：由式（I-AA）表示的盐：其中Q1和Q2各自独立地表示氟原子或C1-C4全氟烷基，X1表示单键等，Y1表示C1-C36脂族烃基等， A1和A2各自独立地表示C1-C20脂族烃基等，Ar1表示可具有一个或多个取代基的（m4 + 1）价C6-C20芳族烃基，B1表示单键等，m1和 m2独立地表示0至2的整数，m3表示1至3的整数，条件是m1加上m2加m3等于3，m4表示1至3的整数，并且包含表示的盐的光致抗蚀剂组合物通过式（I-AA）和包含具有酸不稳定基团的结构单元的树脂，并且在碱性水溶液中不溶或难溶，但通过酸作用而溶于碱水溶液中。

7. 发明授权

US09176379B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US09176379B2
公开(公告)日：2015-11-03
申请号：US13441205
申请日：2012-04-06
申请人： Koji Ichikawa , Takahiro Yasue , Tatsuro Masuyama
发明人： Koji Ichikawa , Takahiro Yasue , Tatsuro Masuyama
IPC分类号： G03F7/004 , G03F7/027 , G03F7/20 , G03F7/039
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/027 , G03F7/0397 , G03F7/20 , G03F7/2041
摘要： A resist composition includes (A) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator having a structure to be cleaved by the action of an alkaline developer, and (C) a compound represented by the formula (I), wherein R1 and R2 in each occurrence independently represent a C1 to C12 hydrocarbon group, a C1 to C6 alkoxyl group, a C2 to C7 acyl group, a C2 to C7 acyloxy group, a C2 to C7 alkoxycarbonyl group, a nitro group or a halogen atom; m and n independently represent an integer of 0 to 4.
摘要翻译：抗蚀剂组合物包括（A）在碱性水溶液中不溶或难溶的树脂，但是通过酸的作用可溶于碱性水溶液中，（B）具有要通过碱性显影剂，和（C）由式（I）表示的化合物，其中R1和R2各自独立地表示C1〜C12烃基，C1〜C6烷氧基，C2〜C7酰基，C2 C7酰氧基，C2〜C7烷氧基羰基，硝基或卤素原子; m和n独立地表示0〜4的整数。

8. 发明申请

US20130040237A1 SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN 有权
标题翻译：盐，光电组合物和生产光电子图案的方法
公开(公告)号：US20130040237A1
公开(公告)日：2013-02-14
申请号：US13569787
申请日：2012-08-08
申请人： Tatsuro MASUYAMA , Yuichi MUKAI
发明人： Tatsuro MASUYAMA , Yuichi MUKAI
IPC分类号： C07C69/675 , G03F7/20 , G03F7/004
CPC分类号： C07C381/12 , C07C309/08 , C07C309/17 , C07C2603/74 , G03F7/0045 , G03F7/20
摘要： A photoresist composition which comprises a salt represented by formula (I): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, R1, R2 and R3 each independently represent a hydrogen atom or a C1-C10 monovalent aliphatic saturated hydrocarbon group, X1 and X2 each independently represent a single bond, a carbonyl group, or a C1-C10 divalent aliphatic saturated hydrocarbon group where a hydrogen atom can be replaced by a hydroxy group and where a methylene group can be replaced by an oxygen atom, a sulfonyl group or a carbonyl group, A1 represents a C1-C30 organic group, m1 represents an integer of 1 to 4, and Z+ represents an organic cation, and a resin which is hardly soluble or insoluble but soluble in an aqueous alkali solution by action of an acid.
摘要翻译：一种光致抗蚀剂组合物，其包含式（I）表示的盐：其中Q1和Q2各自独立地表示氟原子或C1-C6全氟烷基，R1，R2和R3各自独立地表示氢原子或C1-C10一价脂族饱和烃基，X 1和X 2各自独立地表示单键，羰基或C 1 -C 10二价脂族饱和烃基，其中氢原子可以被羟基代替，并且其中亚甲基可被氧代替原子，磺酰基或羰基，A1表示C1-C30有机基团，m1表示1〜4的整数，Z +表示有机阳离子，难溶于或不溶而溶于碱水溶液的树脂溶液通过酸的作用。

9. 发明申请

US20130022921A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN 有权
标题翻译：耐蚀组合物及其制造方法
公开(公告)号：US20130022921A1
公开(公告)日：2013-01-24
申请号：US13552242
申请日：2012-07-18
申请人： Koji ICHIKAWA , Tatsuro MASUYAMA , Satoshi YAMAGUCHI
发明人： Koji ICHIKAWA , Tatsuro MASUYAMA , Satoshi YAMAGUCHI
IPC分类号： G03F7/027 , G03F7/20
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0397 , G03F7/2041
摘要： A resist composition having; a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), an acid generator, and a salt having an anion represented by the formula (IA). wherein R1, A1, A13, X12, A14, R1A and R2A are defined in the specification.
摘要翻译：一种抗蚀剂组合物，具有：具有由式（I）表示的结构单元的树脂，树脂在碱性水溶液中不溶或难溶，但是通过酸的作用而溶解在碱性水溶液中，不包括由式（I），酸产生剂和具有由式（IA）表示的阴离子的盐。其中R1，A1，A13，X12，A14，R1A和R2A在说明书中定义。

10. 发明授权

US08354217B2 Salt and photoresist composition containing the same 有权
标题翻译：含有其的盐和光致抗蚀剂组合物
公开(公告)号：US08354217B2
公开(公告)日：2013-01-15
申请号：US12786799
申请日：2010-05-25
申请人： Koji Ichikawa , Masako Sugihara , Tatsuro Masuyama
发明人： Koji Ichikawa , Masako Sugihara , Tatsuro Masuyama
IPC分类号： G03F7/00 , G03F7/004 , G03F7/028 , G03F7/04
CPC分类号： C07D307/80 , G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： A salt represented by the formula (I-AA): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C4 perfluoroalkyl group, X1 represents a single bond etc., Y1 represents a C1-C36 aliphatic hydrocarbon group etc., A1 and A2 independently each represents a C1-C20 aliphatic hydrocarbon group etc., Ar1 represents a (m4+1)-valent C6-C20 aromatic hydrocarbon group which can have one or more substituents, B1 represents a single bond etc., m1 and m2 independently each represents an integer of 0 to 2, m3 represents an integer of 1 to 3, with the proviso that m1 plus m2 plus m3 equals 3, and m4 represents an integer of 1 to 3, and a photoresist composition comprising the salt represented by the formula (I-AA) and a resin comprising a structural unit having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid.
摘要翻译：由式（I-AA）表示的盐：其中Q1和Q2各自独立地表示氟原子或C1-C4全氟烷基，X1表示单键等，Y1表示C1-C36脂族烃基等， A1和A2各自独立地表示C1-C20脂族烃基等，Ar1表示可具有一个或多个取代基的（m4 + 1）价C6-C20芳族烃基，B1表示单键等，m1和 m2独立地表示0至2的整数，m3表示1至3的整数，条件是m1加上m2加m3等于3，m4表示1至3的整数，并且包含表示的盐的光致抗蚀剂组合物通过式（I-AA）和包含具有酸不稳定基团的结构单元的树脂，并且在碱性水溶液中不溶或难溶，但通过酸作用而溶于碱水溶液中。

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