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1. 发明授权

US06211397B1 Process for the preparation of &agr;-chloromethylene-triorganylphosphorane derivatives 失效
标题翻译：制备α-氯亚甲基 - 三有机基磷烷衍生物的方法
公开(公告)号：US06211397B1
公开(公告)日：2001-04-03
申请号：US08199286
申请日：1994-03-02
申请人： Bernd Schaefer , Ernst Buschmann , Gernot Reissenweber
发明人： Bernd Schaefer , Ernst Buschmann , Gernot Reissenweber
IPC分类号： C07B3900
CPC分类号： C07F9/5352
摘要： A process for the preparation of &agr;-chloromethylene-triorganylphosphorane derivatives I (radicals R are C-organic substituents and A stands for CN or CO-B where B is a C-organic or O-organic radical which is inert under chlorination conditions) by chlorination of phosphoranes II with chlorine, wherein the chlorination is carried out in the presence of a mineral base as hydrogen chloride acceptor and the chlorine and base are fed to the reaction mixture concurrently but separately at the rates at which they are consumed. The reaction products I are important intermediates for plant protectants.
摘要翻译：制备α-氯亚甲基 - 三有机基磷烷衍生物I（自由基R是<有机取代基）的方法，A代表 CN 或 CO - B，其中B是在氯化条件下为惰性的 - 有机或 O - 有机基团），其中氯化在存在下进行，的矿物碱作为氯化氢受体，氯和碱同时进料到反应混合物中，但分别以它们被消耗的速率进料。反应产物I是植物保护剂的重要中间体。

2. 发明授权

US06469224B1 Process for preparation of substituted aromatic compound 有权
标题翻译：取代芳族化合物的制备方法
公开(公告)号：US06469224B1
公开(公告)日：2002-10-22
申请号：US10018424
申请日：2001-12-20
申请人： Tadahito Nobori , Setsuko Fujiyoshi , Isao Hara , Takaomi Hayashi , Atsushi Shibahara , Katsuhiko Funaki , Kazumi Mizutani , Shinji Kiyono
发明人： Tadahito Nobori , Setsuko Fujiyoshi , Isao Hara , Takaomi Hayashi , Atsushi Shibahara , Katsuhiko Funaki , Kazumi Mizutani , Shinji Kiyono
IPC分类号： C07B3900
CPC分类号： B01J31/0265 , B01J2531/98 , C07B39/00 , C07B41/00 , C07C17/202 , C07C17/208 , C07C41/16 , C07C45/63 , C07C67/11 , C07C201/12 , C07C209/10 , C07C253/14 , C07C319/14 , C07D209/08 , C07D213/61 , C07C25/13 , C07C49/813 , C07C321/28 , C07C321/30 , C07C255/50 , C07C211/50 , C07C205/12 , C07C205/38 , C07C43/205 , C07C43/225 , C07C69/78
摘要： A substituted aromatic compound substituted with Q is obtained by reacting a phosphazenium compound represented by formula (1) (in the formula, Q− represents an anion in a form derived by elimination of a proton from an inorganic acid, or an active hydrogen compound having an active hydrogen on an oxygen atom, a nitrogen atom or a sulfur atom; a, b, c and d, each independently, is 0 or 1, but all of them are not 0 simultaneously; and R groups represent the same or different hydrocarbon groups having 1 to 10 carbon atoms, or two Rs on each common nitrogen atom may be bonded together to form a ring structure) with a halogenated aromatic compound having halogen atoms; whereby, at least one halogen atom in the halogenated aromatic compound is substituted with Q (where, Q represents an inorganic group or an organic group in a form derived by elimination of one electron from Q− in formula (1)).
摘要翻译：被Q取代的取代芳香族化合物是通过使式（1）表示的磷氮烯基鏻化合物（式中的Q表示以无机酸除去质子衍生的阴离子，或具有式氧原子，氮原子或硫原子上的活性氢; a，b，c和d各自独立地为0或1，但它们全部不同时为0; R基表示相同或不同的烃具有1至10个碳原子的基团，或每个常见氮原子上的两个R可以结合在一起形成环结构）与具有卤素原子的卤代芳族化合物; 由此，卤代芳香族化合物中的至少一个卤素原子被Q取代（其中，Q表示通过在式（1）中从Q-中除去一个电子而得到的无机基团或有机基团）。

3. 发明授权

US06307045B1 Process for producing halogenated benzene compound 有权
标题翻译：卤代苯化合物的制备方法
公开(公告)号：US06307045B1
公开(公告)日：2001-10-23
申请号：US09608217
申请日：2000-06-30
申请人： Hiroshi Komori , Kazuhiko Nishioka
发明人： Hiroshi Komori , Kazuhiko Nishioka
IPC分类号： C07B3900
CPC分类号： C07D243/24 , C07B39/00 , C07B59/001 , C07B59/002 , C07C201/12 , C07C201/16 , C07C205/12
摘要： The present invention provides a process for producing halogenated benzene compounds. In the process, an organometallic compound represented by the general formula [I]: wherein M represents an R13Sn group, an R13Si group, an R13Ge group, an (R2CO2)Hg group, a ClHg group or an (R3O)2B group wherein each R1 independently represents a C1-C8 alkyl group, R2 represents a C1-C3 alkyl group or a C1-C3 haloalkyl group, R3 represents a hydrogen atom or a C1-C3 alkyl group, n represents an integer of from 0 to 4, m represents an integer of from 0 to 1, each A independently represents a fluorine atom, a nitro group, a cyano group, a C1-C8 alkyl group, a C1-C8 alkoxy group or a C2-C8 acyloxy group, and Q represents an organic residue, is reacted in a solvent with a halide ion represented by the general formula X−, under light irradiation conditions in the presence of a semiconductor catalyst with a photocatalytic activity.
摘要翻译：本发明提供了制备卤化苯化合物的方法。在该方法中，由通式[I]表示的有机金属化合物：其中M表示R 13 Sn基团，R 13 Si基团，R 13 Ge基团，（R 2 CO 2）Hg基团，Cl Hg基团或（R 3 O） R1独立地表示C1-C8烷基，R2表示C1-C3烷基或C1-C3卤代烷基，R3表示氢原子或C1-C3烷基，n表示0〜4的整数，m 表示0〜1的整数，A各自独立地表示氟原子，硝基，氰基，C 1〜C 8烷基，C 1〜C 8烷氧基或C 2〜C 8酰氧基，Q表示有机残余物在溶剂中与通式X-表示的卤离子在光照射条件下在具有光催化活性的半导体催化剂的存在下反应。

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