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    • 1. 发明授权
    • Schottky diode with silver layer contacting the ZnO and MgxZn1−xO films
    • 具有银层的肖特基二极管与ZnO和MgxZn1-xO膜接触
    • US07400030B2
    • 2008-07-15
    • US11042533
    • 2005-01-25
    • Yicheng LuHaifeng ShengSriram MuthukumarNuri William EmanetogluJian ZhongShaohua Liang
    • Yicheng LuHaifeng ShengSriram MuthukumarNuri William EmanetogluJian ZhongShaohua Liang
    • H01L29/04
    • H01L31/0392H01L31/022408H01L31/108H01L31/1123Y02E10/50
    • In the present invention, there is provided semiconductor devices such as a Schottky UV photodetector fabricated on n-type ZnO and MgxZn1-xO epitaxial films. The ZnO and MgxZn1-xO films are grown on R-plane sapphire substrates and the Schottky diodes are fabricated on the ZnO and MgxZn1-xO films using silver and aluminum as Schottky and ohmic contact metals, respectively. The Schottky diodes have circular patterns, where the inner circle is the Schottky contact, and the outside ring is the ohmic contact. Ag Schottky contact patterns are fabricated using standard liftoff techniques, while the Al ohmic contact patterns are formed using wet chemical etching. These detectors show low frequency photoresponsivity, high speed photoresponse, lower leakage current and low noise performance as compared to their photoconductive counterparts. This invention is also applicable to optical modulators, Metal Semiconductor Field Effect Transistors (MESFETs) and more.
    • 在本发明中,提供了半导体器件,例如在n型ZnO和Mg x 1 Zn 1-x O O外延膜上制造的肖特基UV光电探测器。 ZnO和Mg x Zn 1-x O薄膜生长在R平面蓝宝石衬底上,肖特基二极管制造在ZnO和Mg < 分别使用银和铝作为肖特基和欧姆接触金属的ZnO 1-x O O膜。 肖特基二极管具有圆形图案,其中内圆是肖特基接触,外环是欧姆接触。 Ag肖特基接触图案使用标准剥离技术制造,而Al欧姆接触图案是使用湿化学蚀刻法形成的。 与其感光对手相比,这些检测器显示低频光响应,高速光响应,较低的漏电流和低噪声性能。 本发明还可应用于光学调制器,金属半导体场效应晶体管(MESFET)等。
    • 3. 发明授权
    • Method of making a broadband backside illuminated MESFET with collecting
microlens
    • 制造具有收集微透镜的宽带背面照明MESFET的方法
    • US5811322A
    • 1998-09-22
    • US679880
    • 1996-07-15
    • Gerald D. Robinson
    • Gerald D. Robinson
    • H01L31/0232H01L31/112H01L21/84
    • H01L31/0232H01L31/1123
    • A composite-layer semiconductor device includes a gate above a host substrate, an n++ contact layer above the gate, and source and drain ohmic contacts applied to the n++ contact layer. The source and drain ohmic contacts define a central gate location which is recessed through the n++ contact layer toward the gate. The source and drain ohmic contacts create a barrier to chemical etching so that a current path below the central gate location can be incrementally recessed in repeated steps to precisely tailor the operating mode of the device for depletion or enhancement applications. The composite-layer semiconductor device is fabricated by depositing a gate on an n++ contact layer above a semi-insulating substrate. The semi-insulating substrate and gate are flipped onto an epoxy layer on the host substrate so that the gate is secured to the epoxy layer and the semi-insulating substrate presents an exposed backside. A portion of the exposed backside is removed. The source and drain ohmic contacts are applied to the exposed backside. The exposed backside is recessed at the central gate location to define the current path which connects the source and drain ohmic contacts.
    • 复合层半导体器件包括在主体衬底上方的栅极,栅极上方的n ++接触层以及施加到n ++接触层的源极和漏极欧姆接触。 源极和漏极欧姆触点限定了通过n ++接触层向栅极凹陷的中心栅极位置。 源极和漏极欧姆触点产生化学蚀刻的障碍,使得在中心栅极位置下方的电流路径可以以重复的步骤递增地凹入,以精确地定制用于耗尽或增强应用的器件的操作模式。 通过在半绝缘基板上方的n ++接触层上沉积栅极来制造复合层半导体器件。 半绝缘基板和栅极被翻转到主基板上的环氧树脂层上,使得栅极固定到环氧树脂层,半绝缘基板呈现暴露的背面。 暴露背面的一部分被去除。 源极和漏极欧姆接触应用于暴露的背面。 暴露的背面凹陷在中央门位置以限定连接源极和漏极欧姆接触的电流路径。
    • 4. 发明授权
    • Field effect transistor type photo-detector
    • 场效应晶体管型光电检测器
    • US5196717A
    • 1993-03-23
    • US807622
    • 1991-12-13
    • Tamayo HirokiHidetoshi Nojiri
    • Tamayo HirokiHidetoshi Nojiri
    • H01L31/0352H01L31/112
    • B82Y20/00H01L31/035236H01L31/1123
    • A field effect type photo-detector comprises a semiconductor buffer layer arranged on a substrate. A semiconductor activation layer is arranged on that buffer layer, and a source electrode, a drain electrode and a gate electrode are arranged on the activation layer. A depletion layer for controlling a current flow between the source electrode and the drain electrode is created in the activation layer by applying a voltage to the gate electrode. When light irradiates the activation layer, the depletion layer changes. The buffer layer has a wider band gap than that of the activation layer and has an energy gap which serves as a barrier to carriers. The buffer layer has a sufficiently wide band gap to prevent the absorption of light having an equal wavelength to that of the light irradiated to the activation layer.
    • 场效应型光检测器包括布置在基板上的半导体缓冲层。 在该缓冲层上配置有半导体激活层,在激活层上配置有源电极,漏电极和栅电极。 通过向栅电极施加电压,在激活层中产生用于控制源电极和漏电极之间的电流的耗尽层。 当光照射激活层时,耗尽层发生变化。 缓冲层具有比活化层更宽的带隙,并且具有用作载流子屏障的能隙。 缓冲层具有足够宽的带隙,以防止具有与照射到活化层的光的波长相等的波长的光的吸收。