会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 4. 发明授权
    • Method of etching semiconductor substrate
    • 蚀刻半导体衬底的方法
    • US5173149A
    • 1992-12-22
    • US665546
    • 1991-03-07
    • Hidetoshi NojiriMakoto Uchiyama
    • Hidetoshi NojiriMakoto Uchiyama
    • H01L21/306H01L21/3063
    • H01L21/3063
    • To eliminate the influence of fluctuations in etching liquid sorts, composition, density, degradation, temperature, agitation etc., a method of selectively etching a semiconductor substrate having an n-type layer and a p-type layer and immersed in an electrolytic solution comprises the steps of: applying an etching voltage to the n-type layer; integrating etching current flowing through the substrate; if the integrated current value exceeds a reference value required to etch the p-type layer to a predetermined depth, increasing the etching voltage; if the potential of the substrate relative to a reference electrode reaches a predetermined value at which only the p-type layer can be etched, keeping the increased etching voltage at the current level to further etch only the p-type layer; and if the etching current drops sharply due to formation of an anodic oxidation film on the n-type layer, completing the substrate etching.
    • 为了消除蚀刻液体种类,组成,密度,降解,温度,搅拌等的波动的影响,选择性地蚀刻具有n型层和p型层并浸没在电解液中的半导体衬底的方法包括 步骤:向n型层施加蚀刻电压; 积分流过衬底的蚀刻电流; 如果积分电流值超过将p型层蚀刻到预定深度所需的参考值,则增加蚀刻电压; 如果衬底相对于参考电极的电位达到只能蚀刻p型层的预定值,则将增加的蚀刻电压保持在当前电平以仅进一步蚀刻p型层; 并且如果蚀刻电流由于在n型层上形成阳极氧化膜而急剧下降,则完成基板蚀刻。
    • 5. 发明授权
    • Optical apparatus using wavelength selective photocoupler
    • 使用波长选择光电耦合器的光学设备
    • US5140149A
    • 1992-08-18
    • US796929
    • 1991-11-22
    • Hajime SakataHidetoshi Nojiri
    • Hajime SakataHidetoshi Nojiri
    • G02B6/124G02B6/34G02B6/42H01L27/15H01S3/00H01S5/026H01S5/042H01S5/10H01S5/50
    • H01S5/5045G02B6/124G02B6/42H01L27/15H01S3/0064H01S5/1032G02B6/29323H01S5/0264H01S5/0425H01S5/1035
    • The present invention relates to optical apparatus such as a photosensor, a semiconductor laser, an optical amplifier in which a wavelength selective photocoupler is used so as to couple two waveguides through a diffraction grating.A photosensor which is one of the optical apparatus according to the present invention comprises a substrate, a first waveguide layer formed on the substrate, a second waveguide layer formed on the first waveguide layer to be stacked in a direction of thickness and which has a guided mode difference from that of the first waveguide layer, a diffraction grating formed on an overlapping region of the guided modes of the first and second waveguide layers and which couples light components of a specific wavelength range of light propagating through the first waveguide layer to the second waveguide layer, a light absorption layer for absorbing at least some light components of the light components coupled to the second waveguide layer, and an electrode for converting the light components absorbed by the light absorption layer into an electrical signal and outputting the electrical signal.
    • 本发明涉及光传感器,半导体激光器,光放大器等光学装置,其中使用波长选择性光电耦合器,以便通过衍射光栅耦合两个波导。 作为本发明的光学装置之一的光电传感器包括基板,形成在基板上的第一波导层,形成在第一波导层上的第二波导层,以沿厚度方向堆叠并且具有引导 与第一波导层的模式差异,形成在第一和第二波导层的引导模式的重叠区域上并且将通过第一波导层传播的特定波长范围的光分量耦合到第二波导层的第二 波导层,用于吸收耦合到第二波导层的光分量的至少一些光分量的光吸收层,以及用于将由光吸收层吸收的光分量转换成电信号并输出​​电信号的电极。
    • 7. 发明授权
    • Method of tightly joining two semiconductor substrates
    • 紧密接合两个半导体衬底的方法
    • US4962062A
    • 1990-10-09
    • US238421
    • 1988-08-31
    • Makoto UchiyamaHidetoshi Nojiri
    • Makoto UchiyamaHidetoshi Nojiri
    • H01L21/02H01L21/18
    • H01L21/187Y10S148/012Y10S148/135
    • Two semiconductor substrates, each having a polished surface and at least one groove is formed in the surface of at least one of the two substrates, are tightly and inseparably joined by the steps of wetting the polished surface of at least one of the two substrates with a liquid not containing any solute that causes precipitation of a solid substance upon evaporation of the liquid, e.g. methanol or water, placing one substrate on the other so as to bring the polished surfaces of the two substrates into contact with each other with intervention of a thin film of the liquid therebetween and, after a while, subjecting the provisionally joined substrates to a heat treatment and then forming a dielectric layer of organic polymer or silicon compound in at least one groove. This method is suitable for joining silicon substrates such as silicon wafers now on the market. The two semiconductor substrates may be different in the type of conductivity or in the concentration of impurity, and at least one of the two substrates may have a diffused layer, a dielectric layer of a polycrystalline layer as a surface layer having the polished surface.
    • 在两个基板中的至少一个基板的表面上形成两个具有抛光表面和至少一个凹槽的半导体基板,通过以下步骤紧密地和不可分离地连接,所述步骤是通过以下步骤将两个基板中的至少一个的抛光表面润湿, 不含任何溶质的液体,其在液体蒸发时引起固体物质的沉淀,例如, 甲醇或水,将一个基板放置在另一个上,以使两个基板的抛光表面彼此接触,同时介入其间的液体薄膜,并且在一段时间之后,使临时接合的基板经受热 处理,然后在至少一个凹槽中形成有机聚合物或硅化合物的介电层。 该方法适用于现在市场上连接诸如硅晶片的硅衬底。 两个半导体衬底的导电类型或杂质浓度可以不同,并且两个衬底中的至少一个可以具有扩散层,作为具有抛光表面的表面层的多晶层的电介质层。