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    • 7. 发明授权
    • Soft magnetic under layer
    • 软磁下层
    • US09064519B2
    • 2015-06-23
    • US13816789
    • 2012-07-05
    • Jun FukuokaKazuya Saitoh
    • Jun FukuokaKazuya Saitoh
    • G11B5/667H01F10/32
    • G11B5/667H01F10/324
    • A soft magnetic under layer has a low antiferromagnetic coupling force and a high saturation magnetic flux density. The soft magnetic under layer includes two soft magnetic layers and a spacer layer. The soft magnetic layers are expressed by a composition formula as (Fe100-XCoX)100-Y-MY by atomic ratio, wherein 15≦X≦30, 10≦Y≦30, and an element M is at least one element selected from a group of Ta, Ti, Zr, Nb, Cr, and B; are composed of residual incidental impurities; and each have a thickness of 10 to 50 nm. The spacer layer is composed of one element selected from a group of Ru, Cr, Cu, Re, and Rh and has a thickness of 0.10 to 0.50 nm. The soft magnetic layers are antiferromagnetically coupled through the spacer layer inserted therebetween. An antiferromagnetic coupling force between the soft magnetic layers is 100 to 4,000 A/m.
    • 软磁下层具有低反铁磁耦合力和高饱和磁通密度。 软磁下层包括两个软磁层和间隔层。 软磁性层由以原子比计的(Fe100-XCoX)100-Y-MY的组成式表示,其中15< NlE; X< NE; 30,10& Y; ​​Y≦̸ 30,元素M为选自 Ta,Ti,Zr,Nb,Cr和B组; 由残留杂质组成; 并且各自具有10至50nm的厚度。 间隔层由选自Ru,Cr,Cu,Re和Rh中的一种元素组成,并且具有0.10至0.50nm的厚度。 软磁性层通过插入其间的间隔层进行反铁磁耦合。 软磁层之间的反铁磁耦合力为100〜4000A / m。