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    • 4. 发明授权
    • Flash memory with improved read performance
    • 具有改进的读取性能的闪存
    • US09401217B2
    • 2016-07-26
    • US14470359
    • 2014-08-27
    • Anirban RoyJon S. Choy
    • Anirban RoyJon S. Choy
    • G11C16/26G11C29/02G11C16/30G11C16/34
    • G11C16/26G11C16/30G11C16/3445G11C16/3459G11C16/349G11C29/021G11C29/028G11C2216/04
    • A non-volatile memory device includes an array of memory cells and a plurality of word lines and voltage supply lines. Each memory cell of the array is coupled to one of the word lines. Each of the plurality of voltage supply lines is coupled to a first voltage supply terminal of a subset of memory cells of a plurality of subsets of memory cells of the array. Each subset includes a plurality of memory cells. A voltage switch supplies a respective one of a plurality of aged voltages to each of the plurality of subsets of memory cells in the memory array on respective ones of the voltage supply lines. The aged voltage supplied to a first of the plurality of subsets of memory cells is different than the aged voltage supplied to a second of the plurality of subsets of memory cells.
    • 非易失性存储器件包括存储器单元阵列和多个字线和电压供应线。 阵列的每个存储单元耦合到一行字线。 多个电压供给线中的每一个耦合到该阵列的多个存储器单元的子集的存储单元子集的第一电压供应端。 每个子集包括多个存储单元。 电压开关将多个老化电压中的相应一个向存储器阵列中的各个电压供应线上的多个存储单元子集中的每一个提供。 提供给存储器单元的多个子集中的第一个的老化电压与提供给多个存储单元子集中的第二子集的老化电压不同。
    • 6. 发明申请
    • Self-aligned split-gate NAND flash memory and fabrication process
    • 自对准分闸门NAND闪存和制造工艺
    • US20050207225A1
    • 2005-09-22
    • US10803183
    • 2004-03-17
    • Chiou-Feng ChenCaleb ChoMing-Jer ChenDer-Tsyr FanPrateep Tuntasood
    • Chiou-Feng ChenCaleb ChoMing-Jer ChenDer-Tsyr FanPrateep Tuntasood
    • G11C16/00G11C16/04H01L21/8247H01L27/105H01L27/115
    • G11C16/0483G11C2216/04H01L27/115H01L27/11521H01L27/11524
    • Self-aligned split-gate NAND flash memory cell array and process of fabrication in which rows of self-aligned split-gate cells are formed between a bit line diffusion and a common source diffusion in the active area of a substrate. Each cell has control and floating gates which are stacked and self-aligned with each other, and erase and select gates which are split from and self-aligned with the stacked gates, with select gates at both ends of each row which partially overlap the bit line the source diffusions. The channel regions beneath the erase gates are heavily doped to reduce the resistance of the channel between the bit line and source diffusions, and the floating gates are surrounded by the other gates in a manner which provides significantly enhanced high voltage coupling to the floating gates from the other gates. The memory cells are substantially smaller than prior art cells, and the array is biased so that all of the memory cells in it can be erased simultaneously, while programming is bit selectable.
    • 自对准分裂栅极NAND闪速存储单元阵列及其制造工艺,其中自对准分裂栅极单元行在衬底的有源区域中的位线扩散与公共源极扩散之间形成。 每个单元具有彼此堆叠和自对准的控制和浮置栅极,并且擦除和选择与层叠栅极分离并与堆叠栅极自对准的栅极,每行的两端的选择栅极部分地重叠位 排列源扩散。 擦除栅极下面的沟道区域是重掺杂的,以减小位线和源极扩散之间的沟道电阻,并且浮置栅极以其它栅极包围,从而提供显着增强的与浮栅的高电压耦合 其他大门。 存储器单元比现有技术的单元小得多,并且阵列被偏置,使得其中的所有存储单元可以被同时擦除,而编程是位可选择的。