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1. 发明申请

US20160048081A1 MASKLESS EXPOSURE METHOD AND A MASKLESS EXPOSURE DEVICE FOR PERFORMING THE EXPOSURE METHOD 有权
标题翻译：无接触曝光方法和用于实施曝光方法的遮蔽曝光装置
公开(公告)号：US20160048081A1
公开(公告)日：2016-02-18
申请号：US14612648
申请日：2015-02-03
申请人： SAMSUNG DISPLAY CO., LTD.
发明人： JUN-HO SIM , JUNG-IN PARK , KI-BEOM LEE , HI-KUK LEE , HYUN-SEOK KIM , KAB-JONG SEO , SANG-HYUN YUN , SANG-HYUN LEE , JUNG-CHUL HEO , JONG-JOO KIM , CHANG-HOON KIM
IPC分类号： G03F7/20 , G02B26/08
CPC分类号： G03F7/70641 , G02B26/0833 , G03F7/2053 , G03F7/70291 , G03F7/70383 , G03F7/70391
摘要： A maskless exposure device includes a stage on which a substrate is disposed, an optical head, and an optical source part. The optical head irradiates light to the substrate. The light source part provides the optical head with a light. The optical head irradiates the light, according to an average-focus distance, to the substrate. The average-focus distance is determined by averaging best-focus distances for a plurality of regions of the substrate, respectively.
摘要翻译：无掩模曝光装置包括其上设置有基板的台，光学头和光源部。光头将光照射到基板上。光源部分为光头提供光。光头根据平均焦距将光照射到基板上。平均焦点距离分别通过对基板的多个区域的最佳聚焦距离进行平均来确定。

2. 发明申请

US20150248062A1 DIGITAL EXPOSURE METHOD AND DIGITAL EXPOSURE APPARATUS FOR PERFORMING THE SAME 审中-公开
标题翻译：数字曝光方法及其数字曝光装置
公开(公告)号：US20150248062A1
公开(公告)日：2015-09-03
申请号：US14459912
申请日：2014-08-14
申请人： SAMSUNG DISPLAY CO., LTD.
发明人： SANG-HYUN YUN , HYUN-SEOK KIM , HI-KUK LEE , JUNG-IN PARK , JAE-HYUK CHANG , CHANG-HOON KIM , KI-BEOM LEE
IPC分类号： G03F7/20
CPC分类号： G03F7/70508 , G03F7/70358
摘要： A method for digitally exposing a substrate includes generating first horizontal pattern area graphic data and second horizontal pattern area graphic data, where the first horizontal pattern area graphic data corresponds to a first pattern, and the second horizontal pattern area graphic data corresponds to a second pattern, generating a second light incident into the substrate by changing a light path of a first light based on the first horizontal pattern area graphic data and the second horizontal pattern area graphic data, and forming a first pattern on the substrate from the first horizontal pattern area graphic data and a second pattern on the substrate spaced apart in a first direction from the first pattern from the second horizontal pattern area graphic data by exposing the substrate with the second light in a second direction perpendicular to the first direction in a plan view.
摘要翻译：用于数字曝光衬底的方法包括产生第一水平图案区域图形数据和第二水平图案区域图形数据，其中第一水平图案区域图形数据对应于第一图案，而第二水平图案区域图形数据对应于第二图案通过基于第一水平图案区域图形数据和第二水平图案区域图形数据改变第一光线的光路而产生入射到基板中的第二光，并且从第一水平图案区域在基板上形成第一图案图形数据和第二图案，通过在垂直于第一方向的第二方向上以平面图曝光第二光，在与第一图案相距的第一方向上与第二水平图案区域图形数据间隔开的基板。

3. 发明申请

US20160091796A1 MASKLESS EXPOSURE DEVICE, MASKLESS EXPOSURE METHOD AND DISPLAY SUBSTRATE MANUFACTURED BY THE MASKLESS EXPOSURE DEVICE AND THE MASKLESS EXPOSURE METHOD 审中-公开
标题翻译：无障碍曝光装置，由MASKING曝光装置制造的无障碍曝光方法和显示基板以及MASKLESS曝光方法
公开(公告)号：US20160091796A1
公开(公告)日：2016-03-31
申请号：US14738543
申请日：2015-06-12
申请人： SAMSUNG DISPLAY CO., LTD.
发明人： JUN-HO SIM , SANG-HYUN YUN , HI-KUK LEE , HYUN-SEOK KIM
IPC分类号： G03F7/20
CPC分类号： G03F7/70058 , G03F7/70291 , G03F7/70508 , G03F9/7076
摘要： A maskless exposure device includes an exposure head that includes a digital micro-mirror device configured to reflect a source beam received from an exposure source to a substrate to scan an exposure beam to the substrate, and a system control part configured to control the digital micro-mirror device using a graphic data system file. The graphic data system file includes data of an align-key. The align-key includes an X-align-key that extends in a direction parallel to a scan direction of the exposure head, and has a bar shape in a plan view, and a Y-align-key disposed adjacent to the X-align-key that has a frame shape in a plan view.
摘要翻译：无掩模曝光装置包括曝光头，该曝光头包括被配置为将从曝光源接收的源光束反射到基板以扫描到基板的曝光光束的数字微镜装置，以及被配置为控制数字微处理器镜像设备使用图形数据系统文件。图形数据系统文件包括对齐键的数据。对准键包括沿平行于曝光头的扫描方向的方向延伸的X对准键，并且在平面图中具有条形，并且邻近X对齐设置的Y对准键在平面图中具有框架形状的键。

4. 发明申请

US20150205212A1 MASKLESS LIGHT EXPOSURE DEVICE 审中-公开
标题翻译： MASKING LIGHT曝光装置
公开(公告)号：US20150205212A1
公开(公告)日：2015-07-23
申请号：US14322442
申请日：2014-07-02
申请人： SAMSUNG DISPLAY CO., LTD.
发明人： KI-BEOM LEE , HI-KUK LEE , CHA-DONG KIM , CHANG-HOON KIM , JUNG-IN PARK , KAB-JONG SEO , JUN-HO SIM , SANG-HYUN YUN , JAE-HYUK CHANG , HYUN-SEOK KIM , SANG-HYUN LEE
IPC分类号： G03F7/20
CPC分类号： G03F7/70291 , G03F7/70275
摘要： A light exposure device is provided. The light exposure device includes a light source, a light modulation part, and a projection optical part. The light modulation part modulates the light based on a predetermined exposure pattern. The projection optical part projects the light from the light modulation part onto a substrate. The projection optical part includes a first optical part, a hole arrangement part, and a second optical part. The first optical part receives the light from the light modulation part. The first optical part includes a plurality of first lenses. The hole arrangement part emits the light from the first optical part. The second optical part emits the light from the hole arrangement part onto the substrate. The second optical part includes a plurality of second lenses. At least one of the first lenses and the second lenses is a transreflective lens.
摘要翻译：提供曝光装置。曝光装置包括光源，光调制部和投影光学部。光调制部基于预定的曝光图案来调制光。投影光学部件将来自光调制部的光投射到基板上。投影光学部件包括第一光学部件，孔布置部分和第二光学部件。第一光学部件接收来自光调制部分的光。第一光学部件包括多个第一透镜。孔布置部分发射来自第一光学部件的光。第二光学部件将来自孔布置部分的光发射到基板上。第二光学部件包括多个第二透镜。第一透镜和第二透镜中的至少一个是透反透镜。

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