会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 7. 发明授权
    • System and process for measuring deflection
    • 用于测量偏转的系统和过程
    • US09261354B1
    • 2016-02-16
    • US14523279
    • 2014-10-24
    • Edward J. Mercado
    • Edward J. Mercado
    • G01B11/14G01B11/16G01N3/00G01B11/24G01B11/03
    • G01B11/16G01B11/167G01B11/24G01B11/30G01N3/00G01N3/42G01N33/42
    • A system for measuring a deflection has a base, a first laser directed downwardly toward an underlying surface at an acute angle, a second laser in spaced relation to the first laser and directed downwardly toward the underlying surface at an approximately vertical angle, a third laser affixed to the base in spaced relation to the second laser and directed downwardly toward the underlying surface at an acute angle in a direction toward the second laser, a camera directed toward the points of reflectance of the lasers with the underlying surface, and a processor cooperative with the camera so as to measure a distance between the points of reflectance of the first and second lasers and measuring the distance between the points of reflectance of the second and third lasers. The processor compares the measured distances so as to produce an angle of deflection of the underlying surface.
    • 用于测量偏转的系统具有底座,第一激光器以锐角向下朝向下面的表面,第二激光器与第一激光器间隔开,并以大致垂直的角度向下朝向下面的表面;第三激光器 以与第二激光器隔开的关系固定到基座,并朝着朝向第二激光器的方向以锐角向下朝向下面的表面,朝向与下面的表面的激光器的反射点指向的相机,以及处理器协作 相机以测量第一和第二激光器的反射点之间的距离并测量第二和第三激光器的反射点之间的距离。 处理器比较测量的距离,以便产生下表面的偏转角度。