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    • 1. 发明授权
    • Apparatus for surface inspections
    • 用于表面检查的装置
    • US5377002A
    • 1994-12-27
    • US913592
    • 1992-07-14
    • Comas MalinEdgar F. SteigmeierThomas NesensohnHarry L. SawatzkiHeinrich AudersetGert Schmid
    • Comas MalinEdgar F. SteigmeierThomas NesensohnHarry L. SawatzkiHeinrich AudersetGert Schmid
    • G01M11/02G01N21/89G01N21/93G01N21/95G01N21/00
    • G01M11/0278G01N21/9501G01N2021/8822G01N2021/8867G01N2021/8907G01N21/93G01N21/9503G01N2201/1045
    • This apparatus permits the non-destructive examination of entire surfaces for defects and contamination, and can detect microscopically small dot-shaped and linear defects and extremely fine macroscopic non-homogeneous areas. For this purpose, an adjustable lens system (5) is placed in the optical path between light source (2) and objective (9) which produces various intermediate images (31). A first cigar-shaped intermediate image is used for the first scan of the whole of the surface at a relatively large feed offset, and a second dot-shaped intermediate image is used for a second scan of partial areas of the surface at a small feed offset.A dark-field stop assembly (18) with an adjustable dark-field deflection system (8) is placed in the optical path between the lens system (5) and the objective (9), which projects the light beam (1) after deflection exactly centered at right angles through the objective (9) upon the surface of the object (10). The light reflected by the surface (10) and collected by the objective (9) is projected to a photo detector. An electronic analysis system (21) breaks down the amplified output signals from the photo detector (19) into measured values due to dot-shaped, linear, and planiform defects. The electronic analysis system (21) is connected via a computer unit (22) to peripheral equipment (23, 24, 25) which permits the representation of all the measured values obtained in a measuring cycle.
    • 该装置允许对整个表面进行无损检测以用于缺陷和污染,并且可以检测微小的点状和线性缺陷以及极细的宏观非均匀区域。 为此,将可调透镜系统(5)放置在产生各种中间图像(31)的光源(2)和物镜(9)之间的光路中。 第一个雪茄状中间图像用于以相对大的进给偏移量对整个表面的第一次扫描,并且第二点状中间图像用于在小进给处的表面的部分区域的第二次扫描 抵消。 具有可调暗场偏转系统(8)的暗场停止组件(18)被放置在透镜系统(5)和物镜(9)之间的光路中,其在偏转之后突出光束(1) 在物体(10)的表面上通过物镜(9)以正交的角度准确地居中。 由表面(10)反射并由物镜(9)收集的光被投射到光电探测器。 电子分析系统(21)由于点状,线性和平面状缺陷将放大的从光检测器(19)输出的信号分解为测量值。 电子分析系统(21)经由计算机单元(22)连接到外围设备(23,24,25),其允许表示在测量周期中获得的所有测量值。
    • 2. 发明授权
    • Lateral surface sensor and imaging optical system therefor
    • 侧面传感器及其成像光学系统
    • US07522277B2
    • 2009-04-21
    • US10548922
    • 2004-03-12
    • Norbert LehnMartin Schumacher
    • Norbert LehnMartin Schumacher
    • G01N21/00G01N9/04
    • G01N21/8806G01N21/9054G01N21/952G01N2021/8907
    • The present invention relates to an imaging optical system for imaging the peripherally extending lateral surfaces (9) of an object (10) on to an imaging plane, comprising a reflecting element (6) and a first angle-reducing element (3, 17) which is arranged downstream of the reflecting element in the beam direction and which reduces the angle between a light beam emanating from the object (10) and the optical axis (12). In order to provide an imaging optical system for imaging the peripherally extending lateral surfaces of objects, which is both simple and inexpensive to produce and also has a large acceptance angle for the incident radiation and which is tolerant in relation to inaccurate positioning of the object, it is proposed in accordance with the invention that arranged upstream of the reflecting element (6) in the beam direction is a second angle-reducing element (13) which reduces the angle between a light beam (1, 1) emanating from the object (10) and the optical axis (12).
    • 成像光学系统本发明涉及一种成像光学系统,用于将物体(10)的外围延伸的侧面(9)成像到成像平面上,该成像光学系统包括反射元件(6)和第一减角元件(3,17) 其沿着光束方向布置在反射元件的下游,并且减小从物体(10)发射的光束与光轴(12)之间的角度。 为了提供成像光学系统,用于对物体的外围延伸的侧表面进行成像,其既简单又廉价,并且对于入射辐射也具有大的接受角,并且相对于物体的不准确的定位是宽容的, 根据本发明,提出了在射束方向上布置在反射元件(6)的上游的第二减角元件(13),其减小从物体(1)发出的光束(1,1)之间的角度 10)和光轴(12)。
    • 3. 发明授权
    • Electro-optical interferometric microdensitometer system
    • 电光干涉微量密度计系统
    • US5255069A
    • 1993-10-19
    • US829366
    • 1992-02-03
    • Francisco J. Duarte
    • Francisco J. Duarte
    • G01N15/02G01N21/59G01N21/89G01B9/02
    • G01N21/59G01N15/0205G01N15/0211G01N2021/5957G01N2021/8907G01N2201/06113
    • There is disclosed an interferometric system including electro-optical apparatus and method for examining and characterizing ultra fine details of various specimens such as a piece of photographic film. The method includes illuminating a specimen with a thin wide substantially pure Gaussian light beam, detecting the interfering patterns of light from the specimen, and characterizing ultra fine details of elements of the specimen by means of the detected light patterns. The apparatus includes a laser, a magnifying telescope, a multi-prism beam expander, and a linear array of photo-diodes. Signals from the photo-diodes are displayed on an optical multichannel analyzer (OMA) to provide a waveform characteristic of ultra fine elements of the specimen. Both "near-field" and "far-field" characterizations are possible and details of elements having diameters of the order of the wavelength of the light used (e.g., about 0.6 .mu.m) are detected.
    • 公开了一种干涉测量系统,包括电光装置和用于检查和表征各种样品的超细细节的方法,例如摄影胶片。 该方法包括用宽的宽基本上纯的高斯光束照射样本,检测来自样本的光的干扰图案,以及通过检测到的光图案来表征样本的元素的超细节细节。 该装置包括激光器,放大望远镜,多棱镜光束扩展器和光电二极管的线性阵列。 来自光电二极管的信号显示在光学多通道分析仪(OMA)上,以提供样品超细元件的波形特征。 “近场”和“远场”表征都是可能的,并且检测到所使用的光的波长的数量级(例如,约0.6μm)的元件的细节。
    • 4. 发明授权
    • Automatic high speed optical inspection system
    • 自动高速光学检测系统
    • US5131755A
    • 1992-07-21
    • US429859
    • 1989-10-31
    • Curt H. ChadwickRobert R. SholesJohn D. GreeneFrancis D. Tucker, IIIMichael E. FeinP. C. JannDavid J. HarveyWilliam Bell
    • Curt H. ChadwickRobert R. SholesJohn D. GreeneFrancis D. Tucker, IIIMichael E. FeinP. C. JannDavid J. HarveyWilliam Bell
    • G06T7/00G01B11/30G01N21/88G01N21/89G01N21/93G01N21/956G01R31/309G01R31/311G06T1/00
    • G01N21/8806G01N21/956G01N21/95607G01R31/309G01R31/311G01N2021/8907G01N2021/8908G01N2021/95615G01N2021/95638G01N2201/06126
    • In each configuration, at least one TDI sensor is used to image substrate portions of interest, with those portions illuminated with substantially uniform illumination. In one configuration, a substrate is compared to prestored expected characteristic features. In a second configuration, first and second patterns in a region of the surface of at least one substrate are inspected by comparing one pattern against the other and noting whether they agree with each other. This is accomplished by illuminating the two patterns, imaging the first pattern and storing its characteristics in a temporary memory, then imaging the second pattern and comparing it to the stored characteristics from the temporary memory. Then the comparisons continue sequentially with the second pattern becoming the first pattern in the next imaging/comparison sequence against a new second pattern. Each time the comparison is performed, it is noted whether or not there has been agreement between the two patterns and which two patterns where compared. This inspection technique is useful for doing die-to-die inspections. A variation of the second configuration uses two TDI sensors to simultaneously image the first and second patterns, thus eliminating the need for temporary memory. In this configuration, the two patterns are simultaneously imaged and compared, then additional patterns are compared sequentially, in the same manner with the results of the comparisons and the pattern locations stored to determine which patterns are bad when the inspection of all patterns is completed.
    • 在每个配置中,使用至少一个TDI传感器来对感兴趣的衬底部分进行成像,其中那些部分用基本上均匀的照明照亮。 在一种配置中,将基底与预先存储的预期特征特征进行比较。 在第二配置中,通过将一个图案与另一个图案相比较并注意它们是否彼此一致来检查至少一个基板的表面区域中的第一和第二图案。 这是通过照亮两个图案,对第一图案进行成像并将其特征存储在临时存储器中,然后对第二图案进行成像并将其与来自临时存储器的存储特性进行比较来实现的。 然后,相对于新的第二图案,比较继续顺序地与第二图案成为下次成像/比较序列中的第一图案。 每次进行比较时,都注意到两种模式之间是否有一致,哪两种模式相比较。 这种检查技术对于进行模 - 模检查是有用的。 第二配置的变型使用两个TDI传感器来同时对第一和第二图案进行成像,从而消除对临时存储器的需要。 在该配置中,两个图案被同时成像和比较,然后以与比较的结果相同的方式对附加图案进行比较,并且存储的图案位置以确定当所有图案的检查完成时哪些图案是不良的。
    • 6. 发明申请
    • Lateral surface sensor and imaging optical system therefor
    • 侧面传感器及其成像光学系统
    • US20060176474A1
    • 2006-08-10
    • US10548922
    • 2004-03-12
    • Norbert LehnMartin Schumacher
    • Norbert LehnMartin Schumacher
    • G01N21/88
    • G01N21/8806G01N21/9054G01N21/952G01N2021/8907
    • The present invention relates to an imaging optical system for imaging the peripherally extending lateral surfaces (9) of an object (10) on to an imaging plane, comprising a reflecting element (6) and a first angle-reducing element (3, 17) which is arranged downstream of the reflecting element in the beam direction and which reduces the angle between a light beam emanating from the object (10) and the optical axis (12). In order to provide an imaging optical system for imaging the peripherally extending lateral surfaces of objects, which is both simple and inexpensive to produce and also has a large acceptance angle for the incident radiation and which is tolerant in relation to inaccurate positioning of the object, it is proposed in accordance with the invention that arranged upstream of the reflecting element (6) in the beam direction is a second angle-reducing element (13) which reduces the angle between a light beam (1, 1) emanating from the object (10) and the optical axis (12).
    • 成像光学系统本发明涉及一种成像光学系统,用于将物体(10)的外围延伸的侧面(9)成像到成像平面上,该成像光学系统包括反射元件(6)和第一减角元件(3,17) 其沿着光束方向布置在反射元件的下游,并且减小从物体(10)发射的光束与光轴(12)之间的角度。 为了提供成像光学系统,用于对物体的外围延伸的侧表面进行成像,其既简单又廉价,并且对于入射辐射也具有大的接受角,并且相对于物体的不准确的定位是宽容的, 根据本发明,提出了在射束方向上布置在反射元件(6)的上游的第二减角元件(13),其减小从物体(1)发出的光束(1,1)之间的角度 10)和光轴(12)。
    • 8. 发明授权
    • Apparatus for surface inspection
    • 表面检查装置
    • US5377001A
    • 1994-12-27
    • US913236
    • 1992-07-14
    • Cosmas MalinEdgar F. SteigmeierThomas NesensohnHarry L. SawatzkiHeinrich Auderset
    • Cosmas MalinEdgar F. SteigmeierThomas NesensohnHarry L. SawatzkiHeinrich Auderset
    • G01M11/02G01N21/89G01N21/93G01N21/95G01N21/00
    • G01M11/0278G01N21/9501G01N2021/8822G01N2021/8867G01N2021/8907G01N21/93G01N21/9503G01N2201/1045
    • This apparatus permits the non-destructive examination of entire surfaces for defects and contamination, and can detect microscopically small dot-shaped and linear defects and extremely fine macroscopic non-homogeneous areas. For this purpose, an astigmatic lens system (5) is placed in the optical path between light source (2) and objective (9) which produces a cigar-shaped intermediate image (31), in which the feed offset in scanning the surface (10) depends on the intermediate image (31) and is equal to the length of the intermediate image (31) projected upon this surface (10). A dark-field stop assembly (18) with an adjustable dark-field deflection system (8) is placed in the optical path between the lens system (5) and the objective (9), which projects the light beam (1) after deflection exactly centered at right angles through the objective (9) upon the surface of the object (10). The light reflected by the surface (10) and collected by the objective (9) is projected to a photo detector. An electronic analysis system (21) breaks down the amplified output signals from the photo detector (19) into measured values due to dot-shaped, linear, and planiform defects. The electronic analysis system (21) is connected via a computer unit (22) to peripheral equipment (23, 24, 25) which permits the representation of all the measured values obtained in a measuring cycle.
    • 该装置允许对整个表面进行无损检测以用于缺陷和污染,并且可以检测微小的点状和线性缺陷以及极细的宏观非均匀区域。 为此目的,将散光透镜系统(5)放置在光源(2)和物镜(9)之间的光路中,产生一个雪茄形中间图像(31),其中扫描表面的进给偏移 10)取决于中间图像(31)并且等于投影在该表面(10)上的中间图像(31)的长度。 具有可调暗场偏转系统(8)的暗场停止组件(18)被放置在透镜系统(5)和物镜(9)之间的光路中,其在偏转之后突出光束(1) 在物体(10)的表面上通过物镜(9)以正交的角度准确地居中。 由表面(10)反射并由物镜(9)收集的光被投射到光电探测器。 电子分析系统(21)由于点状,线性和平面状缺陷将放大的从光检测器(19)输出的信号分解为测量值。 电子分析系统(21)经由计算机单元(22)连接到外围设备(23,24,25),其允许表示在测量周期中获得的所有测量值。
    • 9. 发明授权
    • Optical inspection apparatus
    • 光学检测装置
    • US5243402A
    • 1993-09-07
    • US771468
    • 1991-10-04
    • Klaus WeberWolfgang Siersch
    • Klaus WeberWolfgang Siersch
    • G01B11/30G01N21/84G01N21/88G01N21/89G01N21/892
    • G01N21/8901G01N2021/8907
    • The invention relates to an optical inspection apparatus comprising an illuminating means which has a linear light source (11) and a concave cylindrical mirror (10) which forms an image of the light source (11), with the cylindrical axis of the cylindrical mirror extending essentially parallel to the light source (11) in order to generate an illuminated strip (31) on a web (12) to be monitored, with the illuminated strip preferably extending over the entire width of the web (12). By means of an optical system (24) a light receiving means forms an image of an inspection line (32) extending on the material web (12) at the center of the illuminated strip (31) on a row-like photoreceiver arrangement (25), so that light emerging from the material web (12) is detected. The photoreceiver arrangement (25) is connected to an electronic processing circuit (26). The cylindrical mirror (10) which forms an image of the linear light source (11) has circumferentially extending grooves (17) arranged alongside one another in the cylindrical surface.
    • 本发明涉及一种光学检查装置,其包括具有形成光源(11)的图像的线性光源(11)和凹圆柱形反射镜(10)的照明装置,圆柱形镜的圆柱轴线延伸 基本上平行于光源(11),以便在待监测的幅材(12)上产生照明条(31),其中所述照射条优选地在幅材(12)的整个宽度上延伸。 借助于光学系统(24),光接收装置形成在行式光接收器装置(25)上在照射条(31)的中心处在材料幅(12)上延伸的检查线(32)的图像 ),从而检测从材料网(12)出射的光。 光接收器装置(25)连接到电子处理电路(26)。 形成线状光源(11)的图像的圆柱形反射镜(10)在圆柱形表面上具有彼此并排布置的周向延伸的凹槽(17)。