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    • 2. 发明授权
    • Electro-optical interferometric microdensitometer system
    • 电光干涉微量密度计系统
    • US5255069A
    • 1993-10-19
    • US829366
    • 1992-02-03
    • Francisco J. Duarte
    • Francisco J. Duarte
    • G01N15/02G01N21/59G01N21/89G01B9/02
    • G01N21/59G01N15/0205G01N15/0211G01N2021/5957G01N2021/8907G01N2201/06113
    • There is disclosed an interferometric system including electro-optical apparatus and method for examining and characterizing ultra fine details of various specimens such as a piece of photographic film. The method includes illuminating a specimen with a thin wide substantially pure Gaussian light beam, detecting the interfering patterns of light from the specimen, and characterizing ultra fine details of elements of the specimen by means of the detected light patterns. The apparatus includes a laser, a magnifying telescope, a multi-prism beam expander, and a linear array of photo-diodes. Signals from the photo-diodes are displayed on an optical multichannel analyzer (OMA) to provide a waveform characteristic of ultra fine elements of the specimen. Both "near-field" and "far-field" characterizations are possible and details of elements having diameters of the order of the wavelength of the light used (e.g., about 0.6 .mu.m) are detected.
    • 公开了一种干涉测量系统,包括电光装置和用于检查和表征各种样品的超细细节的方法,例如摄影胶片。 该方法包括用宽的宽基本上纯的高斯光束照射样本,检测来自样本的光的干扰图案,以及通过检测到的光图案来表征样本的元素的超细节细节。 该装置包括激光器,放大望远镜,多棱镜光束扩展器和光电二极管的线性阵列。 来自光电二极管的信号显示在光学多通道分析仪(OMA)上,以提供样品超细元件的波形特征。 “近场”和“远场”表征都是可能的,并且检测到所使用的光的波长的数量级(例如,约0.6μm)的元件的细节。
    • 4. 发明授权
    • Laser sensitometer using multiple-prism beam expansion and a polarizer
    • 激光感光仪采用多棱镜光束扩张和偏光片
    • US06236461B1
    • 2001-05-22
    • US09219042
    • 1998-12-23
    • Francisco J. Duarte
    • Francisco J. Duarte
    • G01N2100
    • G03C5/04B23K26/066G02B27/28G03C5/02
    • An electro-optical apparatus particularly suitable for exposing a sample of light sensitive material to provide a graded series of exposures of different intensity levels. The apparatus includes a light source, beam shaping optics, and a rotatable polarizer. The light source provides a Gaussian beam of light directed along an optical axis. The beam shaping optics are disposed in the optical path and are adapted to expand the Gaussian beam of light into an elongated beam of light and to project the elongated beam of light along the optical axis toward a sample. The rotatable polarizer, disposed in the optical path intermediate the light source and the beam shaping optics, is rotated to vary the intensity level of the beam of light.
    • 特别适用于曝光光敏材料样品以提供不同强度水平的分级曝光的电光装置。 该装置包括光源,光束整形光学器件和可旋转偏振器。 光源提供沿光轴指向的高斯光束。 光束整形光学器件设置在光路中并且适于将高斯光束扩展成细长的光束并且将细长的光束沿着光轴朝向样品投影。 设置在光源和光束整形光学器件之间的光路中的可旋转偏振器被旋转以改变光束的强度水平。
    • 5. 发明授权
    • Laser oscillator
    • 激光振荡器
    • US5181222A
    • 1993-01-19
    • US831011
    • 1992-02-04
    • Francisco J. Duarte
    • Francisco J. Duarte
    • H01S3/08H01S3/081H01S3/098H01S3/105
    • H01S3/08036H01S3/08004H01S3/0811H01S3/105
    • Laser apparatus is described in which the optical cavity of a laser oscillator is specially provided with a polarizing device which has on its outer face a partially reflecting coating (such as a thin partially reflecting layer of low-loss dielectric material). The polarizing device serves both as an output coupler for narrow linewidth laser emission from the optical cavity and also as a means for substantially suppressing amplified spontaneous emission (ASE). A multiple-prism Littrow-mounted grating (MPL) dye laser apparatus embodying the invention achieves a laser linewidth of less than about 0.1 GHz (.DELTA..nu.), a ratio of intensity I of the ASE to the intensity I.sub..lambda. of the desired laser emission of about 10.sup.-10, an efficiency of somewhat more than 10%, and a short optical cavity length of less than 10 cm. The apparatus is also more rugged, more stable in frequency with changes in temperature, and less costly than similar previous lasers.
    • 激光装置的特征在于激光振荡器的光腔特别设有偏振装置,该偏振装置在其外表面上具有部分反射的涂层(例如低损耗介电材料的薄的部分反射层)。 偏振装置既用作用于来自光腔的窄线宽激光发射的输出耦合器,也用作用于基本上抑制放大的自发发射(ASE)的手段。 实施本发明的多棱镜Littrow安装光栅(MPL)染料激光装置实现小于约0.1GHz(DELTA nu)的激光线宽,ASE的强度I与所需激光发射强度Iλ的比 约10-10的效率,稍高于10%的效率,以及小于10cm的短的光腔长度。 该设备也更加坚固,在温度变化的频率上更稳定,并且比先前的激光器成本更低。