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    • 1. 再颁专利
    • Method and apparatus for optical inspection of substrates
    • 用于光学检查基板的方法和装置
    • USRE37740E1
    • 2002-06-11
    • US08373084
    • 1995-01-17
    • Curt H. ChadwickRobert R. SholesJohn D. GreeneFrancis D. Tucker, IIIMichael E. FeinP. C. JannDavid J. HarveyWilliam Bell
    • Curt H. ChadwickRobert R. SholesJohn D. GreeneFrancis D. Tucker, IIIMichael E. FeinP. C. JannDavid J. HarveyWilliam Bell
    • G01B1130
    • G01N21/95684G01N21/8806G01N21/956G01N2021/8908G01N2021/95638G01R31/311
    • Substrate inspection apparatus and methods, and illumination apparatus. The inspection apparatus and method includes memory for storing the desired features of the surface of the substrate, focussed illuminator for substantially uniformly illuminating a region of the surface of the substrate to be inspected. Additionally there is a sensor for imaging the region of the substrate illuminated by the illuminator, and a comparator responsive to the memory and sensor for comparing the imaged region of the substrate with the stored desired features of the substrate. The illumination apparatus is designed to provide substantially uniform focussed illumination along a narrow linear region. This apparatus includes first, second and third reflectors elliptically cylindrical in shape, each with its long axis substantially parallel to the long axes of each of the others. Fourth and fifth reflectors are also included with each being flat and mounted parallel to each other and at opposite ends of each of said first, second and third reflectors, and first, second and third linear light sources each mounted parallel to a corresponding one of said first, second and third reflectors with each of the light sources mounted so that it is at the first focus of the corresponding reflector and the illuminated linear region is at the second focus of each of the first, second and third reflectors. The questions raised in reexamination request No. 90/003,232, filed Oct. 29, 1993, have been considered and the results thereof are reflected in this reissue patent which constitutes the reexamination certificate required by 35 U.S.C. 307 as provided in 37 CFR 1.570(e).
    • 基板检查装置及方法及照明装置。 检查装置和方法包括用于存储基板的表面的期望特征的存储器,用于基本上均匀地照射待检查的基板的表面的区域的聚焦照明器。 另外还有一个传感器,用于对由照明器照射的衬底的区域进行成像,以及响应于存储器和传感器的比较器,用于将衬底的成像区域与存储的衬底的期望特征进行比较。 照明装置被设计成沿狭窄的线性区域提供基本均匀的聚焦照明。 该装置包括椭圆形圆柱形的第一,第二和第三反射器,每个反射器的长轴基本上平行于每个反射器的长轴。 还包括第四和第五反射器,每个反射器是平坦的并且彼此平行并且在每个所述第一,第二和第三反射器的相对端部安装,并且第一,第二和第三线性光源各自平行于所述第一, 第一,第二和第三反射器,其中每个光源安装成使得其处于相应反射器的第一焦点,并且被照射的线性区域处于第一,第二和第三反射器中的每一个的第二焦点。 已经考虑了1993年10月29日提交的第90 / 003,232号复审请求中提出的问题,其结果反映在该重新颁发专利中,该专利构成了35U.S.C.所要求的复审证书。 307如第37 CFR 1.570(e)条。
    • 2. 发明授权
    • Automatic high speed optical inspection system
    • 自动高速光学检测系统
    • US5131755A
    • 1992-07-21
    • US429859
    • 1989-10-31
    • Curt H. ChadwickRobert R. SholesJohn D. GreeneFrancis D. Tucker, IIIMichael E. FeinP. C. JannDavid J. HarveyWilliam Bell
    • Curt H. ChadwickRobert R. SholesJohn D. GreeneFrancis D. Tucker, IIIMichael E. FeinP. C. JannDavid J. HarveyWilliam Bell
    • G06T7/00G01B11/30G01N21/88G01N21/89G01N21/93G01N21/956G01R31/309G01R31/311G06T1/00
    • G01N21/8806G01N21/956G01N21/95607G01R31/309G01R31/311G01N2021/8907G01N2021/8908G01N2021/95615G01N2021/95638G01N2201/06126
    • In each configuration, at least one TDI sensor is used to image substrate portions of interest, with those portions illuminated with substantially uniform illumination. In one configuration, a substrate is compared to prestored expected characteristic features. In a second configuration, first and second patterns in a region of the surface of at least one substrate are inspected by comparing one pattern against the other and noting whether they agree with each other. This is accomplished by illuminating the two patterns, imaging the first pattern and storing its characteristics in a temporary memory, then imaging the second pattern and comparing it to the stored characteristics from the temporary memory. Then the comparisons continue sequentially with the second pattern becoming the first pattern in the next imaging/comparison sequence against a new second pattern. Each time the comparison is performed, it is noted whether or not there has been agreement between the two patterns and which two patterns where compared. This inspection technique is useful for doing die-to-die inspections. A variation of the second configuration uses two TDI sensors to simultaneously image the first and second patterns, thus eliminating the need for temporary memory. In this configuration, the two patterns are simultaneously imaged and compared, then additional patterns are compared sequentially, in the same manner with the results of the comparisons and the pattern locations stored to determine which patterns are bad when the inspection of all patterns is completed.
    • 在每个配置中,使用至少一个TDI传感器来对感兴趣的衬底部分进行成像,其中那些部分用基本上均匀的照明照亮。 在一种配置中,将基底与预先存储的预期特征特征进行比较。 在第二配置中,通过将一个图案与另一个图案相比较并注意它们是否彼此一致来检查至少一个基板的表面区域中的第一和第二图案。 这是通过照亮两个图案,对第一图案进行成像并将其特征存储在临时存储器中,然后对第二图案进行成像并将其与来自临时存储器的存储特性进行比较来实现的。 然后,相对于新的第二图案,比较继续顺序地与第二图案成为下次成像/比较序列中的第一图案。 每次进行比较时,都注意到两种模式之间是否有一致,哪两种模式相比较。 这种检查技术对于进行模 - 模检查是有用的。 第二配置的变型使用两个TDI传感器来同时对第一和第二图案进行成像,从而消除对临时存储器的需要。 在该配置中,两个图案被同时成像和比较,然后以与比较的结果相同的方式对附加图案进行比较,并且存储的图案位置以确定当所有图案的检查完成时哪些图案是不良的。
    • 3. 发明授权
    • Method and apparatus for optical inspection of substrates
    • 用于光学检查基板的方法和装置
    • US4877326A
    • 1989-10-31
    • US158289
    • 1988-02-19
    • Curt H. ChadwickRobert R. SholesJohn D. GreeneFrancis D. Tucker, IIIMichael E. FeinP. C. JannDavid J. HarveyWilliam Bell
    • Curt H. ChadwickRobert R. SholesJohn D. GreeneFrancis D. Tucker, IIIMichael E. FeinP. C. JannDavid J. HarveyWilliam Bell
    • H05K3/00G01N21/88G01N21/89G01N21/93G01N21/956G01R31/311
    • G01N21/95684G01N21/8806G01N21/956G01R31/311G01N2021/8908G01N2021/95638
    • Substrate inspection apparatus and methods, and illumination apparatus. The inspection apparatus and method includes memory for storing the desired features of the surface of the substrate, focussed illuminator for substantially uniformly illuminating a region of the surface of the substrate to be inspected. Additionally there is a sensor for imaging the region of the substrate illuminated by the illuminator, and a comparator responsive to the memory and sensor for comparing the imaged region of the substrate with the stored desired features of the substrate. The illumination apparatus is designed to provide substantially uniform focussed illumination along a narrow linear region. This apparatus includes first, second and third reflectors elliptically cylindrical in shape, each with its long axis substantially parallel to the long axes of each of the others. Fourth and fifth reflectors are also included with each being flat and mounted parallel to each other and at opposite ends of each of said first, second and third reflectors, and first, second and third linear light sources each mounted parallel to a corresponding one of said first, second and third reflectors with each of the light sources mounted so that it is at the first focus of the corresponding reflector and the illuminated linear region is at the second focus of each of the first, second and third reflectors.
    • 基板检查装置及方法及照明装置。 检查装置和方法包括用于存储基板的表面的期望特征的存储器,用于基本上均匀地照射待检查的基板的表面的区域的聚焦照明器。 另外还有一个传感器,用于对由照明器照射的衬底的区域进行成像,以及响应于存储器和传感器的比较器,用于将衬底的成像区域与存储的衬底的期望特征进行比较。 照明装置被设计成沿狭窄的线性区域提供基本均匀的聚焦照明。 该装置包括椭圆形圆柱形的第一,第二和第三反射器,每个反射器的长轴基本上平行于每个反射器的长轴。 还包括第四和第五反射器,每个反射器是平坦的并且彼此平行并且在每个所述第一,第二和第三反射器的相对端部安装,并且第一,第二和第三线性光源各自平行于所述第一, 第一,第二和第三反射器,其中每个光源安装成使得其处于相应反射器的第一焦点,并且被照射的线性区域处于第一,第二和第三反射器中的每一个的第二焦点。
    • 5. 发明授权
    • Method of molding a precision surface on an instrument table
    • 在仪表上成型精密表面的方法
    • US4889676A
    • 1989-12-26
    • US158252
    • 1988-02-19
    • Larry RosenbergCurt H. ChadwickAlex Brudny
    • Larry RosenbergCurt H. ChadwickAlex Brudny
    • B23Q3/08B29C43/18B29C70/74B29D99/00
    • B23Q3/086B29C43/18B29C70/74
    • An instrument table having two features is disclosed. The first is a stable instrument bench that is constructed of sections of precast reinforced concrete. Each of these sections are then moisture sealed with a plastic coat or paint, then assembled using epoxy and bolts. The second element of the present invention is the replication of a precision surface on the table portion of an instrument bench. The replication of the precision surface entails the application of a dollop of plastic to the selected portions of the instrument table, lowering a jig having a portion of the underside thereof machined or ground to the selected specifications of the surface to be replicated onto the instrument table thereonto, supporting the jig a selected distance above the surface of the instrument table to push out the plastic into a pad of a thickness that is equivalent to the distance above the table at which the jig is supported, and removing the jig after the plastic is cured thus leaving behind the plastic pad that has thereon a precision surface that replicates the machined or ground surface on the underside of the jig.
    • 公开了具有两个特征的仪表。 第一个是由预制钢筋混凝土部分构成的稳定的工作台。 然后将这些部分用塑料涂层或涂料进行水分密封,然后使用环氧树脂和螺栓进行组装。 本发明的第二个要素是在仪表台的台部上复制精密表面。 精密表面的复制需要向仪器台的选定部分施加一桶塑料,将具有其下侧的一部分加工或研磨的夹具降低到要复制到仪表上的表面的所选规格 在其上支撑夹具在仪表的表面上方选定的距离,以将塑料推出到相当于夹具被支撑的工作台上方的距离的厚度的垫中,并且在塑料之后移除夹具 固化,从而留下塑料垫,其上具有复制在夹具下侧上的加工或磨削表面的精密表面。
    • 6. 发明授权
    • Rotational and focusing apparatus for turret mounted lenses
    • 用于转塔安装镜头的旋转和聚焦设备
    • US4647764A
    • 1987-03-03
    • US582586
    • 1984-02-22
    • Curt H. ChadwickAnil A. Desai
    • Curt H. ChadwickAnil A. Desai
    • G02B7/16G02B21/24H01J3/14
    • G02B7/16G02B21/241
    • In an automatic wafer inspection system, the objective lenses used in micro inspection are mounted on a turret which is attached to an adjustable turret support member. Several lenses may be brought sequentially into position for inspection of the patterned wafer and it is necessary that the handoff be precise so as to maintain the same pattern in the viewing position. V-slots are mounted on the turret in such a location as to be correctly associated with the precise position for each lens. A detent ball spring is biased to drive into a V-slot so as to hold the associated lens in the precise viewing position. When hand-off to the next lens is to be accomplished, a counter force is applied which overcomes the spring bias and pulls the detent ball out of the V-slot. A drive motor is then enabled, which turns the turret a predetermined distance to bring the wide opening of the next adjacent V-slot into approximate alignment with the detent ball and the drive motor is disabled. The counter force is released which allows the spring bias to force the detent ball into the now partially aligned V-slot to precisely align the lens and hold the lens in alignment. The adjustable turret support member is then raised or lowered to automatically focus the lens on the patterned wafer.
    • 在自动晶片检查系统中,用于微观检查的物镜安装在附接到可调节转台支撑构件的转台上。 可以将多个透镜顺序地放置到用于检查图案化晶片的位置,并且必须精确地进行切换以便将相同图案保持在观察位置。 V形槽安装在转台上,以便与每个镜头的精确位置正确相关联。 定位球弹簧被偏压以驱动到V形槽中,以将相关镜片保持在精确的观察位置。 当切换到下一个镜头时,将施加一个抵抗弹簧偏压并将制动球从V形槽中拉出的反作用力。 然后启动驱动电机,使转台转动预定距离,使下一相邻V形槽的宽开口与制动球大致对准,并且驱动电机被禁用。 抵消力被释放,这允许弹簧偏压力将制动球推动到现在部分对准的V形槽中,以精确对准透镜并将透镜保持对准。 然后将可调节的转塔支撑构件升高或降低以自动将透镜聚焦在图案化的晶片上。
    • 8. 发明授权
    • Adjustable mirror mount assembly
    • 可调式镜座组件
    • US4023891A
    • 1977-05-17
    • US642125
    • 1975-12-15
    • Curt H. Chadwick
    • Curt H. Chadwick
    • G02B7/182G02B5/08
    • G02B7/1821
    • An adjustable two-axis lockable vibration resistant mirror mount assembly with an accuracy of approximately two arc seconds features separately adjustable inner and outer coaxial gimbals having locks which clamp the gimbals in the adjusted position without altering that position. An adjusting screw for each gimbal is mounted on the frame and abuts the respective gimbal offset from its pivotal axis. Diagonally opposed pairs of U-shaped locking clips mounted on the outer gimbal straddle bosses on adjacent parts of the frame and inner gimbal, respectively, and are moved tightly against the bosses in directions parallel to the respective gimbal axes by locking screws to secure the gimbals in relatively fixed positions. After locking, the adjusting screws may be removed from the assembly. The center of the reflective mirror surface lies at the intersection of mutually perpendicular pivot axes with the normal to the mirror surface at its center substantially perpendicular to the pivot axes. The intersection of the pivot axes is very close to the front surface of the mount which allows the mirror surface to be desirably close to other elements of the optical system.
    • 具有大约两弧秒精度的可调节双轴可锁定防振反射镜安装组件,具有独立可调的内部和外部同轴万向架,其具有将万向节夹在调节位置而不改变该位置的锁定。 每个万向节的调节螺钉安装在框架上并与其枢转轴线抵接各个万向架偏移。 对角相对的一对U形锁定夹分别安装在框架和内万向架的相邻部分上的外万向架跨接凸台上,并且通过锁定螺钉紧固抵靠凸起,方向通过锁定螺钉固定到万向节 在相对固定的位置。 锁定后,调整螺丝可从组件中取出。 反射镜表面的中心位于与其基本垂直于枢转轴线的中心处相互垂直的枢转轴线与镜面垂直的交点处。 枢转轴线的交叉点非常靠近安装座的前表面,这允许镜面理想地接近光学系统的其它元件。
    • 9. 发明授权
    • Stable instrument bench with replicated precision surface
    • 稳定的仪表台与复制精密表面
    • US5014627A
    • 1991-05-14
    • US433386
    • 1989-11-06
    • Larry RosenbergCurt H. ChadwickAlex Brudny
    • Larry RosenbergCurt H. ChadwickAlex Brudny
    • B23Q3/08B29C43/18B29C70/74B29D99/00
    • B23Q3/086B29C43/18B29C70/74
    • An instrument table having two features is disclosed. The first is a stable instrument bench that is constructed of sections of precast reinforced concrete. Each of these sections are then moisture sealed with a plastic coat or paint, then assembled using epoxy and bolts. The second element of the present invention is the replication of a precision surface on the table portion of an instrument bench. The replication of the precision surface entails the application of a bead of plastic to the selected portions of the instrument table, lowering of a jig having a portion of the underside thereof machined or ground to the selected specifications of the surface to be replicated onto the instrument table thereonto, supporting the jig a selected distance above the surface of the instrument table to push out the plastic into a pad of a thickness that is equivalent to the distance above the table at which the jig is supported, and removing the jig after the plastic is cured thus leaving behind the plastic pad that has thereon a precision surface that replicates the machined or ground surface on the underside of the jig.
    • 公开了具有两个特征的仪表。 第一个是由预制钢筋混凝土部分构成的稳定的工作台。 然后将这些部分用塑料涂层或涂料进行水分密封,然后使用环氧树脂和螺栓进行组装。 本发明的第二个要素是在仪表台的台部上复制精密表面。 精密表面的复制需要将塑料珠施加到仪表的选定部分,使其具有被加工或研磨的下侧的一部分的夹具降低到要复制到仪器上的所选表面的所选规格 在其上方支撑夹具在仪表的表面上方选定的距离,以将塑料推出到相当于支撑工具的工作台上方的距离的厚度的垫中,并且在塑料之后移除夹具 被固化,因此留在其上具有复制在夹具下侧上的加工或磨削表面的精密表面的塑料垫上。
    • 10. 发明授权
    • Apparatus for accurately positioning an object at each of two locations
    • 用于在两个位置的每一个处精确地定位物体的装置
    • US4604910A
    • 1986-08-12
    • US582585
    • 1984-02-22
    • Curt H. ChadwickAnil A. Desai
    • Curt H. ChadwickAnil A. Desai
    • G02B7/16F16H21/44F16H21/54F16H25/18
    • G02B7/16Y10T74/18856Y10T74/18864Y10T74/2144
    • An object mounting member is slideably interconnected with a guide member which provides a path between two separated fixed locations. The guide member is attached to a support member having fixed stops located between the two fixed locations. A pinion gear is fixedly attached to the shaft of a stepper motor, and a spur gear is held in an engaging relationship with said pinion gear. An eccentric arm is pivotally attached at one end to the spur gear and is driven to provide rapid motion between the two fixed locations with a rate of motion approaching zero hit nears each fixed location. The other end of the eccentric arm is pivotally attached to one end of a drive arm that is pivotally attached to the object mounting member. The drive arm includes a spring loaded member that is used to allow the object mounting member to be preloaded against a stop at each end of its travel.
    • 物体安装部件与提供两个分离的固定位置之间的路径的引导部件可滑动地互连。 引导构件附接到具有位于两个固定位置之间的固定止动件的支撑构件。 小齿轮固定地连接到步进马达的轴上,并且正齿轮与所述小齿轮保持啮合。 偏心臂在一端可枢转地连接到正齿轮上,并且被驱动以在两个固定位置之间以在每个固定位置附近接近零点的运动速度提供快速运动。 偏心臂的另一端枢转地附接到可枢转地附接到物体安装构件的驱动臂的一端。 驱动臂包括弹簧加载部件,该弹簧加载部件用于允许物体安装部件在其行进的每一端被预先抵靠止动件。