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    • 5. 发明授权
    • Method and system for fabricating light emitting diode (LED) dice with wavelength conversion layers having controlled color characteristics
    • 用于制造具有受控颜色特性的波长转换层的发光二极管(LED)裸片的方法和系统
    • US08841146B2
    • 2014-09-23
    • US13562519
    • 2012-07-31
    • Jui-Kang YenGeorg SoerensenMark Ewing Tuttle
    • Jui-Kang YenGeorg SoerensenMark Ewing Tuttle
    • H01L21/00H01L33/00H01L33/50
    • H01L33/501H01L33/0095H01L2933/0041
    • A method for fabricating light emitting diode (LED) dice includes the steps of coating a transparent substrate with a wavelength conversion material, continuously evaluating a correlated color temperature (CCT) of the output electromagnetic radiation produced by the wavelength conversion material and comparing the correlated color temperature (CCT) to a target correlated color temperature (CCT), and controlling the coating step responsive to feedback from the evaluating and comparing step to adjust the correlated color temperature (CCT) to achieve the target correlated color temperature (CCT). A system for fabricating light emitting diode (LED) dice includes a coating system, a monitoring system, and a control system configured to control the coating system to adjust the correlated color temperature (CCT) of the wavelength conversion material on the transparent substrate to achieve the target correlated color temperature (CCT).
    • 制造发光二极管(LED)晶片的方法包括以下步骤:用波长转换材料涂覆透明衬底,连续评估由波长转换材料产生的输出电磁辐射的相关色温(CCT),并比较相关色彩 温度(CCT)到目标相关色温(CCT),并且响应于来自评估和比较步骤的反馈来控制涂层步骤以调节相关色温(CCT)以实现目标相关色温(CCT)。 一种用于制造发光二极管(LED)裸片的系统包括涂层系统,监测系统和控制系统,其被配置为控制涂层系统以调节透明衬底上的波长转换材料的相关色温(CCT)以实现 目标相关色温(CCT)。
    • 6. 发明授权
    • Method of fabricating semiconductor die using handling layer
    • 使用处理层制造半导体管芯的方法
    • US08802469B2
    • 2014-08-12
    • US13109687
    • 2011-05-17
    • Chen-Fu ChuTrung Tri DoanHao-Chun ChengFeng-Hsu FanFu-Hsien Wang
    • Chen-Fu ChuTrung Tri DoanHao-Chun ChengFeng-Hsu FanFu-Hsien Wang
    • H01L21/301
    • H01L33/0079H01L33/0095
    • A method for the separation of multiple dies during semiconductor fabrication is described. On an upper surface of a semiconductor wafer containing multiple dies, metal layers are deposited everywhere except where a block of stop electroplating material exists. The stop electroplating material is obliterated, and a barrier layer is formed above the entire remaining structure. A sacrificial metal element is added above the barrier layer, and then the substrate is removed. After the semiconductor material between the individual dies is eradicated, any desired bonding pads and patterned circuitry are added to the semiconductor surface opposite the sacrificial metal element, a passivation layer is added to this surface, and then the sacrificial metal element is removed. Tape is added to the now exposed barrier layer, the passivation layer is removed, the resulting structure is flipped over, and the tape is expanded to separate the individual dies.
    • 描述了在半导体制造期间分离多个管芯的方法。 在包含多个模具的半导体晶片的上表面上,除了存在一块停止电镀材料之外,金属层被沉积​​。 停止电镀材料被消除,并且在整个剩余结构上方形成阻挡层。 在阻挡层上方添加牺牲金属元素,然后去除衬底。 在消除各个管芯之间的半导体材料之后,将任何期望的接合焊盘和图案化电路添加到与牺牲金属元件相对的半导体表面,在该表面上添加钝化层,然后去除牺牲金属元件。 将胶带添加到现在暴露的阻挡层中,去除钝化层,将所得结构翻转,并且将带扩展以分离各个模具。