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    • 10. 发明授权
    • Method for manufacturing optical nonreciprocal element
    • 制造光学不可逆元件的方法
    • US08335407B2
    • 2012-12-18
    • US12665635
    • 2008-02-25
    • Hideki Yokoi
    • Hideki Yokoi
    • G02B6/12
    • G02B6/132G02F1/0955G02F2201/063G02F2201/07
    • A novel technique is provided, which can secure sufficient adhesion of an Si layer and a magneto-optical material layer while avoiding occurrence of cracks when fabricating an optical nonreciprocal element by bonding the Si layer on which a rib waveguide is formed, and the magneto-optical material layer. The method includes forming a waveguide on the Si layer of an SOI substrate which is a first substrate, forming a first thin-film buffer layer on the aforesaid waveguide, forming a second thin-film buffer layer on an magneto-optical material layer deposited on a second substrate by using a same material as that of the aforesaid first thin-film buffer layer, and bonding the aforesaid first thin-film buffer layer and the aforesaid second thin-film buffer layer in placement where a light propagating in the aforesaid waveguide can be caused to generate nonreciprocal phase change by the aforesaid magneto-optical material layer.
    • 提供了一种新技术,其可以确保Si层和磁光材料层的充分粘合,同时避免当通过结合形成肋波导的Si层制造光学不可逆元件时产生裂纹, 光学材料层。 该方法包括在作为第一衬底的SOI衬底的Si层上形成波导,在上述波导上形成第一薄膜缓冲层,在沉积在...上的磁光材料层上形成第二薄膜缓冲层 通过使用与上述第一薄膜缓冲层相同的材料的第二基板,并且将上述第一薄膜缓冲层和上述第二薄膜缓冲层粘合在布置在上述波导中传播的光的位置 通过上述磁光材料层产生不可逆相变。