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    • 4. 发明申请
    • MULTICARRIER REFLECTOMETRY DEVICE AND METHOD FOR ON-LINE DIAGNOSIS OF AT LEAST ONE TRANSMISSION LINE
    • 用于一次传输线的在线诊断的多功能反射装置和方法
    • US20110035168A1
    • 2011-02-10
    • US12936929
    • 2009-05-12
    • Adrien LelongMarc Olivas
    • Adrien LelongMarc Olivas
    • G01R13/00
    • H04B3/46G01R31/11
    • A multi-carrier reflectometry device and method for on-line diagnosis of at least one transmission line. The device includes: a transmission part that includes successively: a module for parameterizing a test signal SF, such that: sF=[0, c1ejθ1, c2ejθ2, . . . , CN/2-1ejθN/2-1, CN/2, CN/2-1ejθN/2-1, cN/2-2ejθN/2-2, . . . , c1ejθ1]T, a module for synthesising the test signal by inverse discrete Fourier transform, and a digital to analog converter, connected to the line; and a detection part that includes successively: an analog to digital converter connected to this transmission line, a discrete Fourier transform module, and an analysis module containing a deconvolution module, which also receives the test signal sF.
    • 一种用于至少一条传输线的在线诊断的多载波反射测量装置和方法。 该装置包括:传输部分,其连续包括:用于参数化测试信号SF的模块,使得:sF = [0,c1ej&thetas; 1,c2ej&thetas; 2,..., 。 。 ,CN / 2-1ej&thetas; N / 2-1,CN / 2,CN / 2-1ej&thetas; N / 2-1,cN / 2-2ej&thetas; N / 2-2, 。 。 ,c1ej&thetas; 1] T,用于通过反离散傅立叶变换合成测试信号的模块和连接到线路的数模转换器; 以及检测部,其连续地包括:连接到该传输线的模数转换器,离散傅立叶变换模块和包含反卷积模块的分析模块,其还接收测试信号sF。
    • 9. 发明申请
    • METHOD FOR PRODUCING A TRANSISTOR WITH METALLIC SOURCE AND DRAIN
    • 用于生产具有金属源和漏极的晶体管的方法
    • US20110003443A1
    • 2011-01-06
    • US12796282
    • 2010-06-08
    • Bernard PrevitaliThierry PoirouxMaud Vinet
    • Bernard PrevitaliThierry PoirouxMaud Vinet
    • H01L21/336H01L21/762
    • H01L21/84H01L27/1203H01L29/66772H01L29/78648H01L29/78696Y10S438/924
    • A method for producing a transistor with metallic source and drain including the steps of: a) producing a gate stack, b) producing two portions of a material capable of being selectively etched relative to a second dielectric material and arranged at the locations of the source and of the drain of the transistor, c) producing a second dielectric material-based layer covering the stack and the two portions of material, d) producing two holes in the second dielectric material-based layer forming accesses to the two portions of material, e) etching of said two portions of material, f) depositing a metallic material in the two formed cavities, and also including, between steps a) and b), a step of deposition of a barrier layer on the stack, against the lateral sides of the stack and against the face of the first dielectric material-based layer.
    • 一种用于制造具有金属源极和漏极的晶体管的方法,包括以下步骤:a)产生栅极堆叠,b)产生能够相对于第二介电材料选择性蚀刻的材料的两部分,并且布置在源极的位置处 和晶体管的漏极,c)产生覆盖堆叠和两部分材料的第二介电材料基层,d)在第二介电材料基层中产生形成访问两部分材料的两个孔, e)蚀刻所述两部分材料,f)在两个形成的空腔中沉积金属材料,并且还包括在步骤a)和b)之间,将阻挡层沉积在堆叠上的侧面 并且抵靠第一介电材料层的表面。