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    • 5. 发明申请
    • PROCESS FOR FABRICATING AN OPTIMALLY-ACTUATING PIEZOELECTRIC MEMBRANE
    • 制造最佳实施压电膜的工艺
    • US20110061215A1
    • 2011-03-17
    • US12881955
    • 2010-09-14
    • Emmanuel DEFAYGwenaël LE RHUN
    • Emmanuel DEFAYGwenaël LE RHUN
    • H01L41/22
    • H01L41/0973B41J2/14233B41J2/161H01L41/047H01L41/053H01L41/25H01L41/29H01L41/314H01L41/317H01L41/318H01L41/43H01L41/47Y10T29/42Y10T29/49155Y10T29/49156Y10T29/49401
    • In a process for fabricating a membrane, including, on a substrate, a thin-film multilayer including a film of piezoelectric material placed between a top electrode film and a bottom electrode film and an elastic film supporting said piezoelectric film, the process includes: determining at least one concavity/convexity curvature of said membrane along an axis parallel to the plane of the films so that at least one inflection point is defined, said point allowing a first region and a second region, corresponding to a concave part and a convex part or vice versa, to be isolated; depositing, on the surface of the substrate, a thin-film multilayer including at least one film of piezoelectric material, one bottom electrode film and one top electrode film; and structuring at least one of the electrode films to define at least said first membrane region, in which an electric field perpendicular to the plane of the films may be applied, and at least said second region, in which an electric field parallel to the plane of the films may be applied.
    • 在制造膜的方法中,包括在基板上的包括放置在顶电极膜和底电极膜之间的压电材料膜的薄膜多层膜和支撑所述压电膜的弹性膜,所述方法包括:确定 所述膜沿着平行于所述膜的平面的轴线的至少一个凹凸曲率,使得至少一个拐点被限定,所述点允许对应于凹部和凸部的第一区域和第二区域 或反之亦然,被隔离; 在基板的表面上沉积包括至少一层压电材料薄膜,一个底部电极薄膜和一个顶部电极薄膜的薄膜多层膜; 并且构造至少一个所述电极膜以至少限定所述第一膜区域,其中可以施加垂直于所述膜的平面的电场,以及至少所述第二区域,其中平行于所述平面的电场 的膜可以被应用。
    • 6. 发明授权
    • Method of fabricating a MEMS/NEMS electromechanical component
    • 制造MEMS / NEMS机电元件的方法
    • US07906439B2
    • 2011-03-15
    • US12488898
    • 2009-06-22
    • François PerruchotBernard DiemVincent LarreyLaurent ClavelierEmmanuel Defay
    • François PerruchotBernard DiemVincent LarreyLaurent ClavelierEmmanuel Defay
    • H01L21/302H01L21/461
    • B81C1/00507B81B2201/0271B81C2201/0115B81C2201/0136B81C2201/0177B81C2203/0136B81C2203/0145H03H3/0072H03H9/175H03H9/2436Y10S438/933
    • The invention provides a method of fabricating and electromechanical device having an active element on at least one substrate, the method having the steps of: a) making a heterogeneous substrate having a first portion, an interface layer, and a second portion, the first portion including one or more buried zones sandwiched between first and second regions formed in a first monocrystalline material, the first region extending to the surface of the first portion, and the second region extending to the interface layer, at least one said buried zone being made at least in part out of a second monocrystalline material so as to make it selectively attackable relative to the first and second regions; b) making openings from the surface of the first portion and through the first region, which openings open out to at least one said buried zone; and c) etching at least part of at least one buried zone to form at least one cavity so as to define at least one active element that is at least a portion of the second region between said cavity and said interface layer; wherein the first and second portions of the substrate are constituted respectively from first and second substrates that are assembled together by bonding, at least one of them including at least one said interface layer over at least a fraction of its surface.
    • 本发明提供一种在至少一个基板上具有有源元件的制造方法和机电装置,该方法具有以下步骤:a)制造具有第一部分,界面层和第二部分的非均相基底,第一部分 包括夹在形成于第一单晶材料中的第一和第二区域之间的一个或多个掩埋区域,第一区域延伸到第一部分的表面,第二区域延伸到界面层,至少一个所述掩埋区域 至少部分地由第二单晶材料制成,以使其相对于第一和第二区域选择性地具有攻击性; b)从所述第一部分的表面和所述第一区域制造开口,所述第一区域开放到至少一个所述掩埋区域; 以及c)蚀刻至少一个掩埋区域的至少一部分以形成至少一个空腔,以便限定至少一个有源元件,所述至少一个有源元件是所述腔和所述界面层之间的第二区域的至少一部分; 其中所述基板的第一和第二部分分别由通过粘接而组装在一起的第一和第二基板构成,其中至少一个在其表面的至少一部分上包括至少一个所述界面层。
    • 8. 发明授权
    • Electromechanical transducer device and method of forming a electromechanical transducer device
    • 机电换能器装置及形成机电换能装置的方法
    • US08445978B2
    • 2013-05-21
    • US13128035
    • 2009-11-25
    • Francois PerruchotEmmanuel DefayPatrice ReyLianjun LiuSergio Pacheco
    • Francois PerruchotEmmanuel DefayPatrice ReyLianjun LiuSergio Pacheco
    • G01P15/08
    • B81B3/0072B81B2201/032H01L41/0933H01L41/094
    • A micro or nano electromechanical transducer device formed on a semiconductor substrate comprises a movable structure which is arranged to be movable in response to actuation of an actuating structure. The movable structure comprises a mechanical structure comprising at least one mechanical layer having a first thermal response characteristic and a first mechanical stress response characteristic, at least one layer of the actuating structure, the at least one layer having a second thermal response characteristic different to the first thermal response characteristic and a second mechanical stress response characteristic different to the first mechanical stress response characteristic, a first compensation layer having a third thermal response characteristic and a third mechanical stress characteristic, and a second compensation layer having a fourth thermal response characteristic and a fourth mechanical stress response characteristic. The first and second compensation layers are arranged to compensate a thermal effect produced by the different first and second thermal response characteristics of the mechanical structure and the at least one layer of the actuating structure such that movement of the movable structure is substantially independent of variations in temperature and to adjust a stress effect produced by the different first and second stress response characteristics of the mechanical structure and the at least one layer of the actuating structure such that the movable structure is deflected a predetermined amount relative to the substrate when the electromechanical transducer device is in an inactive state.
    • 形成在半导体衬底上的微型或纳米机电换能器装置包括可移动结构,其被布置成响应于致动结构的致动而是可移动的。 可移动结构包括机械结构,其包括具有第一热响应特性和第一机械应力响应特性的至少一个机械层,所述致动结构的至少一层,所述至少一层具有与 第一热响应特性和与第一机械应力响应特性不同的第二机械应力响应特性,具有第三热响应特性和第三机械应力特性的第一补偿层,以及具有第四热响应特性的第二补偿层和 第四机械应力响应特性。 第一和第二补偿层布置成补偿由机械结构和致动结构的至少一个层的不同的第一和第二热响应特性产生的热效应,使得可移动结构的移动基本上与 并且调节由所述机械结构和所述致动结构的所述至少一个层的不同的第一和第二应力响应特性产生的应力效应,使得当所述机电换能器装置 处于非活动状态。