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1. 发明授权

US08804112B2 Method of defect inspection and device of defect inspection 有权
标题翻译：缺陷检查方法和缺陷检查装置
公开(公告)号：US08804112B2
公开(公告)日：2014-08-12
申请号：US13265935
申请日：2010-04-22
申请人： Yukihiro Shibata , Toshihiko Nakata , Taketo Ueno , Atsushi Taniguchi , Toshifumi Honda
发明人： Yukihiro Shibata , Toshihiko Nakata , Taketo Ueno , Atsushi Taniguchi , Toshifumi Honda
IPC分类号： G01N21/00
CPC分类号： G01N21/95623 , G01N21/95607 , G01N2021/8822 , G01N2201/062 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A method of inspecting defects and a device inspecting defects of detecting defects at high sensitivity and high capture efficiency even on various patterns existing on a wafer. In the device of inspecting defects, an illumination optical system is formed of two systems of a coherent illumination of a laser 5 and an incoherent illumination of LEDs 6a, 6b, 6c and 6d, and light paths are divided in a detecting system corresponding to respective illumination light, spatial modulation elements 55a and 55b are arranged to detecting light paths, respectively, scattered light inhibiting sensitivity is shielded by the spatial modulating elements 55a and 55b, scattered light transmitted through the spatial modulation elements 55a and 55b is detected by image sensors 90a and 90b arranged to respective light paths, and images detected by these two image sensors 90a and 90b are subjected to a comparison processing, thereby determining a defect candidate.
摘要翻译：一种检测缺陷的方法，以及即使在晶片上存在的各种图案，也可以检测高灵敏度和高捕获效率的缺陷检测缺陷。在检查缺陷的装置中，照明光学系统由激光器5的相干照明和LED 6a，6b，6c和6d的非相干照明的两个系统形成，并且光路被分成对应于相应的照明光，空间调制元件55a和55b分别被布置成检测光路，散射光抑制灵敏度被空间调制元件55a和55b屏蔽，传播通过空间调制元件55a和55b的散射光被图像传感器90a检测和90b，并且由这两个图像传感器90a和90b检测到的图像进行比较处理，从而确定缺陷候选。

2. 发明授权

US08970836B2 Defect inspecting apparatus and defect inspecting method 有权
标题翻译：缺陷检查装置和缺陷检查方法
公开(公告)号：US08970836B2
公开(公告)日：2015-03-03
申请号：US14235916
申请日：2012-05-14
申请人： Atsushi Taniguchi , Taketo Ueno , Shunichi Matsumoto , Yukihiro Shibata , Toshifumi Honda
发明人： Atsushi Taniguchi , Taketo Ueno , Shunichi Matsumoto , Yukihiro Shibata , Toshifumi Honda
IPC分类号： G01N21/00 , G01N21/95 , G01N21/956 , G01N21/21 , G01N21/88 , G01B11/06
CPC分类号： G01N21/95 , G01B11/0641 , G01N21/211 , G01N21/9501 , G01N21/95607 , G01N21/95623 , G01N2021/8822 , G01N2021/9513 , G02F1/1303 , G02F1/136259
摘要： An invention being applied is a defect detecting apparatus that has: an illuminating optical system with a laser light source for irradiating a sample on whose surface a pattern is formed with light; a detecting optical system with a sensor for detecting light generated from the sample illuminated by the illuminating optical system; and a signal processing unit that extracts a defect from an image based on the light detected by the detecting optical system, in which an amplification rate of the sensor is dynamically changed during a time when the light is detected by the detecting optical system.
摘要翻译：一种应用的发明是一种缺陷检测装置，其具有：具有激光光源的照明光学系统，用于对其表面形成有图案的样品进行照射; 检测光学系统，其具有用于检测由照明光学系统照射的样本产生的光的传感器; 以及信号处理单元，其基于由检测光学系统检测到的光的时间期间传感器的放大率动态地改变的检测光学系统检测到的光，从图像中提取缺陷。

3. 发明授权

US09255793B2 Defect inspection method and device thereof 有权
标题翻译：缺陷检查方法及其装置
公开(公告)号：US09255793B2
公开(公告)日：2016-02-09
申请号：US13521086
申请日：2011-02-09
申请人： Yukihiro Shibata , Toshifumi Honda , Taketo Ueno , Atsushi Taniguchi
发明人： Yukihiro Shibata , Toshifumi Honda , Taketo Ueno , Atsushi Taniguchi
IPC分类号： G01N21/55 , G06F19/00 , G01B11/30 , G01N21/956 , H01L21/67
CPC分类号： G01B11/303 , G01N21/956 , H01L21/67288
摘要： A defect inspection device includes an irradiation unit for simultaneously irradiating different regions on a sample with illumination light under different optical conditions, the sample being predesigned to include patterns repeatedly formed thereupon, wherein the patterns are to be formed in the same shape; a detection unit for detecting, for each of the different regions, a beam of light reflected from each region irradiated with the illumination light; a defect candidate extraction unit for extracting defect candidates under the different optical conditions for each of the different regions, by processing detection signals corresponding to the reflected light which is detected; a defect extraction unit for extracting defects by integrating the defect candidates extracted under the different optical conditions; and a defect classifying unit for calculating feature quantities of the extracted defects and classifies the defects according to the calculated feature quantities.
摘要翻译：缺陷检查装置包括：照射单元，用于在不同光学条件下用照明光同时照射样品上的不同区域，所述样品被预先设计为包括在其上重复形成的图案，其中所述图案将被形成为相同的形状; 检测单元，用于针对每个所述不同区域检测从照射光照射的每个区域反射的光束; 缺陷候选提取单元，用于通过处理与检测到的反射光相对应的检测信号来提取在不同区域的不同光学条件下的缺陷候选; 缺陷提取单元，用于通过对在不同光学条件下提取的缺陷候选进行积分来提取缺陷; 以及缺陷分类单元，用于计算提取的缺陷的特征量，并根据所计算的特征量对缺陷进行分类。

4. 发明申请

US20120092657A1 METHOD OF DEFECT INSPECTION AND DEVICE OF DEFECT INSPECTION 有权
标题翻译：缺陷检查方法和缺陷检查装置
公开(公告)号：US20120092657A1
公开(公告)日：2012-04-19
申请号：US13265935
申请日：2010-04-22
申请人： Yukihiro Shibata , Toshihiko Nakata , Taketo Ueno , Atsushi Taniguchi , Toshifumi Honda
发明人： Yukihiro Shibata , Toshihiko Nakata , Taketo Ueno , Atsushi Taniguchi , Toshifumi Honda
IPC分类号： G01N21/88
CPC分类号： G01N21/95623 , G01N21/95607 , G01N2021/8822 , G01N2201/062 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A method of inspecting defects and a device inspecting defects of detecting defects at high sensitivity and high capture efficiency even on various patterns existing on a wafer. In the device of inspecting defects, an illumination optical system is formed of two systems of a coherent illumination of a laser 5 and an incoherent illumination of LEDs 6a, 6b, 6c and 6d, and light paths are divided in a detecting system corresponding to respective illumination light, spatial modulation elements 55a and 55b are arranged to detecting light paths, respectively, scattered light inhibiting sensitivity is shielded by the spatial modulating elements 55a and 55b, scattered light transmitted through the spatial modulation elements 55a and 55b is detected by image sensors 90a and 90b arranged to respective light paths, and images detected by these two image sensors 90a and 90b are subjected to a comparison processing, thereby determining a defect candidate.
摘要翻译：一种检测缺陷的方法，以及即使在晶片上存在的各种图案，也可以检测高灵敏度和高捕获效率的缺陷检测缺陷。在检查缺陷的装置中，照明光学系统由激光器5的相干照明和LED 6a，6b，6c和6d的非相干照明的两个系统形成，并且光路被分成对应于相应的照明光，空间调制元件55a和55b分别被布置成检测光路，散射光抑制灵敏度被空间调制元件55a和55b屏蔽，传播通过空间调制元件55a和55b的散射光被图像传感器90a检测和90b，并且由这两个图像传感器90a和90b检测到的图像进行比较处理，从而确定缺陷候选。

5. 发明申请

US20140233024A1 Defect Inspecting Apparatus and Defect Inspecting Method 有权
标题翻译：缺陷检查仪器和缺陷检查方法
公开(公告)号：US20140233024A1
公开(公告)日：2014-08-21
申请号：US14235916
申请日：2012-05-14
申请人： Atsushi Taniguchi , Taketo Ueno , Shunichi Matsumoto , Yukihiro Shibata , Toshifumi Honda
发明人： Atsushi Taniguchi , Taketo Ueno , Shunichi Matsumoto , Yukihiro Shibata , Toshifumi Honda
IPC分类号： G01N21/95
CPC分类号： G01N21/95 , G01B11/0641 , G01N21/211 , G01N21/9501 , G01N21/95607 , G01N21/95623 , G01N2021/8822 , G01N2021/9513 , G02F1/1303 , G02F1/136259
摘要： An invention being applied is a defect detecting apparatus that has: an illuminating optical system with a laser light source for irradiating a sample on whose surface a pattern is formed with light; a detecting optical system with a sensor for detecting light generated from the sample illuminated by the illuminating optical system; and a signal processing unit that extracts a defect from an image based on the light detected by the detecting optical system, in which an amplification rate of the sensor is dynamically changed during a time when the light is detected by the detecting optical system.
摘要翻译：一种应用的发明是一种缺陷检测装置，其具有：具有激光光源的照明光学系统，用于对其表面形成有图案的样品进行照射; 检测光学系统，其具有用于检测由照明光学系统照射的样本产生的光的传感器; 以及信号处理单元，其基于由检测光学系统检测到的光的时间期间传感器的放大率动态地改变的检测光学系统检测到的光，从图像中提取缺陷。

6. 发明申请

US20120296576A1 DEFECT INSPECTION METHOD AND DEVICE THEREOF 有权
标题翻译：缺陷检查方法及其设备
公开(公告)号：US20120296576A1
公开(公告)日：2012-11-22
申请号：US13521086
申请日：2011-02-09
申请人： Yukihiro Shibata , Toshifumi Honda , Taketo Ueno , Atsushi Taniguchi
发明人： Yukihiro Shibata , Toshifumi Honda , Taketo Ueno , Atsushi Taniguchi
IPC分类号： G01N21/55 , G06F19/00
CPC分类号： G01B11/303 , G01N21/956 , H01L21/67288
摘要： The present invention relates to a defect inspection device which includes: irradiating means for simultaneously irradiating different regions on a sample with illumination light under different optical conditions, the sample being predesigned to include patterns repeatedly formed thereupon, wherein the patterns are to be formed in the same shape; detection means for detecting, for each of the different regions, a beam of light reflected from each region irradiated with the illumination light; defect candidate extraction means for extracting defect candidates under the different optical conditions for each of the different regions, by processing detection signals corresponding to the reflected light which is detected; defect extraction means for extracting defects by integrating the defect candidates extracted under the different optical conditions; and defect classifying means for calculating feature quantities of the extracted defects and classifies the defects according to the calculated feature quantities.
摘要翻译：缺陷检查装置技术领域本发明涉及一种缺陷检查装置，包括：照射装置，用于在不同光学条件下用照明光同时照射样品上的不同区域，所述样品被预先设计为包括在其上重复形成的图案，其中，图案将形成在相同的形状; 检测装置，用于针对每个不同区域检测从照射光照射的每个区域反射的光束; 缺陷候选提取装置，用于通过处理与所检测的反射光相对应的检测信号，提取在不同区域的不同光学条件下的缺陷候选; 缺陷提取装置，用于通过对在不同光学条件下提取的缺陷候选进行积分来提取缺陷; 以及用于计算提取的缺陷的特征量并根据计算的特征量对缺陷进行分类的缺陷分类装置。

7. 发明申请

US20130242294A1 DEFECT INSPECTION DEVICE AND DEFECT INSPECTION METHOD 有权
标题翻译：缺陷检查装置和缺陷检查方法
公开(公告)号：US20130242294A1
公开(公告)日：2013-09-19
申请号：US13989835
申请日：2011-11-10
申请人： Atsushi Taniguchi , Taketo Ueno , Shunichi Matsumoto , Toshifumi Honda
发明人： Atsushi Taniguchi , Taketo Ueno , Shunichi Matsumoto , Toshifumi Honda
IPC分类号： G01N21/956
CPC分类号： G01N21/95623 , G01N21/9501 , G01N21/956 , G01N2021/8477
摘要： To prevent overlooking of a defect due to reduction in a defect signal, a defect inspection device is configured such that: light is irradiated onto an object to be inspected on which a pattern is formed; reflected, diffracted, and scattered light generated from the object by the irradiation of the light is collected, such that a first optical image resulting from the light passed through a first spatial filter having a first shading pattern is received by a first detector, whereby a first image is obtained; the reflected, diffracted, and scattered light generated from the object is collected, such that a second optical image resulting from the light passed through a second spatial filter having a second shading pattern is received by a second detector, whereby a second image is obtained; and the first and second images thus obtained are processed integrally to detect a defect candidate(s).
摘要翻译：为了防止由于缺陷信号的减少而忽视缺陷，缺陷检查装置被配置为使得光被照射到形成有图案的待检查对象上; 收集通过照射光从物体产生的反射，衍射和散射光，使得由通过具有第一阴影图案的第一空间滤光器的光产生的第一光学图像由第一检测器接收，由此获得第一幅图像; 从物体产生的反射，衍射和散射光被收集，使得由通过具有第二阴影图案的第二空间滤光器的光产生的第二光学图像由第二检测器接收，由此获得第二图像; 并且由此获得的第一和第二图像被整体地处理以检测缺陷候选。

8. 发明授权

US09019492B2 Defect inspection device and defect inspection method 有权
标题翻译：缺陷检查装置和缺陷检查方法
公开(公告)号：US09019492B2
公开(公告)日：2015-04-28
申请号：US13989835
申请日：2011-11-10
申请人： Atsushi Taniguchi , Taketo Ueno , Shunichi Matsumoto , Toshifumi Honda
发明人： Atsushi Taniguchi , Taketo Ueno , Shunichi Matsumoto , Toshifumi Honda
IPC分类号： G01N21/956 , G01N21/95 , G01N21/84
CPC分类号： G01N21/95623 , G01N21/9501 , G01N21/956 , G01N2021/8477
摘要： To prevent overlooking of a defect due to reduction in a defect signal, a defect inspection device is configured such that: light is irradiated onto an object to be inspected on which a pattern is formed; reflected, diffracted, and scattered light generated from the object by the irradiation of the light is collected, such that a first optical image resulting from the light passed through a first spatial filter having a first shading pattern is received by a first detector, whereby a first image is obtained; the reflected, diffracted, and scattered light generated from the object is collected, such that a second optical image resulting from the light passed through a second spatial filter having a second shading pattern is received by a second detector, whereby a second image is obtained; and the first and second images thus obtained are processed integrally to detect a defect candidate(s).
摘要翻译：为了防止由于缺陷信号的减少而忽视缺陷，缺陷检查装置被配置为使得光被照射到形成有图案的待检查对象上; 收集通过照射光从物体产生的反射，衍射和散射光，使得由通过具有第一阴影图案的第一空间滤光器的光产生的第一光学图像由第一检测器接收，由此获得第一幅图像; 从物体产生的反射，衍射和散射光被收集，使得由通过具有第二阴影图案的第二空间滤光器的光产生的第二光学图像由第二检测器接收，由此获得第二图像; 并且由此获得的第一和第二图像被整体地处理以检测缺陷候选。

9. 发明授权

US09239283B2 Defect inspection method and device therefor 有权
标题翻译：缺陷检查方法及其设备
公开(公告)号：US09239283B2
公开(公告)日：2016-01-19
申请号：US13993888
申请日：2011-11-08
申请人： Toshifumi Honda , Yukihiro Shibata , Atsushi Taniguchi
发明人： Toshifumi Honda , Yukihiro Shibata , Atsushi Taniguchi
IPC分类号： G01N21/00 , G01N21/956 , G01N21/95 , G01N21/88
CPC分类号： G01N21/00 , G01N21/8851 , G01N21/9501 , G01N21/956 , G01N2021/8896
摘要： To process a signal from a plurality of detectors without being affected by a variation in the height of a substrate, and to detect more minute defects on the substrate, a defect inspection device is provided with a photoelectric converter having a plurality of rows of optical sensor arrays in each of first and second light-collecting/detecting unit and a processing unit for processing a detection signal from the first and the second light-collecting/detecting unit to determine the extent to which the positions of the focal points of the first and the second light-collecting/detecting unit are misaligned with respect to the surface of a test specimen, and processing the detection signal to correct a misalignment between the first and the second light-collecting/detecting unit, and the corrected detection signal outputted from the first and the second light-collecting/detecting unit are combined together to detect the defects on the test specimen.
摘要翻译：为了处理来自多个检测器的信号而不受基板高度的变化的影响，并且在基板上检测更多的微小缺陷，缺陷检查装置设置有具有多行光学传感器的光电转换器在第一和第二集光/检测单元中的每一个中的阵列，以及处理单元，用于处理来自第一和第二聚光/检测单元的检测信号，以确定第一和第二聚光/ 第二聚光/检测单元相对于试样的表面不对准，并且处理检测信号以校正第一和第二聚光/检测单元之间的未对准，并且校正的检测信号从第一和第二聚光/检测单元组合在一起以检测试样上的缺陷。

10. 发明申请

US20140268122A1 DEFECT INSPECTION METHOD AND DEFECT INSPECTION DEVICE 有权
标题翻译：缺陷检查方法和缺陷检查装置
公开(公告)号：US20140268122A1
公开(公告)日：2014-09-18
申请号：US14232929
申请日：2012-06-28
申请人： Shunichi Matsumoto , Atsushi Taniguchi , Toshifumi Honda , Yukihiro Shibata , Yuta Urano
发明人： Shunichi Matsumoto , Atsushi Taniguchi , Toshifumi Honda , Yukihiro Shibata , Yuta Urano
IPC分类号： G01N21/95
CPC分类号： G01N21/9501 , G01N21/956 , G01N2201/126 , G01N2201/127 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A defect inspection method and device for irradiating a linear region on a surface-patterned sample mounted on a planarly movable table, with illumination light from an inclined direction relative to a direction of a line normal to the sample, next detecting in each of a plurality of directions an image of the light scattered from the sample irradiated with the illumination light, then processing signals obtained by the detection of the images of the scattered light, and thereby detecting a defect present on the sample; wherein the step of detecting the scattered light image in the plural directions is performed through elliptical lenses in which elevation angles of the optical axes thereof are different from each other, within one plane perpendicular to a plane formed by the normal to the surface of the table on which to mount the sample and the longitudinal direction of the linear region irradiated with the irradiation light, the elliptical lenses being formed of circular lenses having left and right portions thereof cut.
摘要翻译：一种用于照射安装在平面可移动台上的表面图案样品上的线性区域的缺陷检查方法和装置，其具有相对于垂直于样品的线的方向的倾斜方向的照明光，接下来在多个指示从照射光照射的样品散射的光的图像，然后处理通过检测散射光的图像而获得的信号，从而检测样品上存在的缺陷; 其特征在于，所述检测多个方向的散射光图像的步骤是通过椭圆形透镜进行的，所述椭圆透镜在光学轴的仰角彼此不同的垂直于与所述表的表面法线形成的平面的一个平面内在其上安装样品和用照射光照射的线性区域的纵向方向，椭圆形透镜由其左侧和右侧部分切割的圆形透镜形成。

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