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1. 发明授权

US09372416B2 Method for manufacturing electrophotographic photosensitive member 有权
标题翻译：电子照相感光构件的制造方法
公开(公告)号：US09372416B2
公开(公告)日：2016-06-21
申请号：US13608843
申请日：2012-09-10
申请人： Satoshi Kojima , Kazunari Ooyama , Yukihiro Abe
发明人： Satoshi Kojima , Kazunari Ooyama , Yukihiro Abe
IPC分类号： G03G5/082 , G03G5/043 , C23C16/24 , C23C16/32 , C23C16/515 , H01J37/32
CPC分类号： G03G5/0433 , C23C16/24 , C23C16/325 , C23C16/515 , G03G5/08214 , G03G5/08278 , H01J37/32018 , H01J37/32036 , H01J37/3244 , H01J37/32449 , H01J37/32715
摘要： A method for manufacturing an electrophotographic photosensitive member using plasma CVD includes steps of placing a cylindrical base member in a reactor which can be evacuated, the reactor having an electrode therein, so as to be spaced apart from the electrode, introducing a raw material gas for deposited film formation into the reactor, and applying an alternating voltage of a rectangular wave having a frequency in the range of 3 kHz to 300 kHz between the electrode and the cylindrical base member so that a potential at one of the electrode and the cylindrical base member with respect to a potential at the other becomes alternately positive and negative, to decompose the raw material gas, and forming a deposited film on the cylindrical base member. The magnitude of the potential difference between the electrode and the cylindrical base member is selectively controlled.
摘要翻译：使用等离子体CVD制造电子照相感光构件的方法包括以下步骤：将圆筒形基底构件放置在可被抽真空的反应器中，反应器具有电极，以与电极间隔开，将原料气体引入将沉积的膜形成到反应器中，并且在电极和圆筒形基底构件之间施加频率在3kHz至300kHz范围内的矩形波的交流电压，使得电极和圆柱形基底构件中的一个电位相对于另一方的电位交替地为正负，分解原料气体，并在圆筒状基材上形成沉积膜。选择性地控制电极和圆筒形基体之间的电位差的大小。

2. 发明授权

US07550180B2 Plasma treatment method 失效
标题翻译：等离子体处理方法
公开(公告)号：US07550180B2
公开(公告)日：2009-06-23
申请号：US12055431
申请日：2008-03-26
申请人： Toshiyasu Shirasuna , Tatsuyuki Aoike , Kazuyoshi Akiyama , Hitoshi Murayama , Takashi Otsuka , Daisuke Tazawa , Kazuto Hosoi , Yukihiro Abe
发明人： Toshiyasu Shirasuna , Tatsuyuki Aoike , Kazuyoshi Akiyama , Hitoshi Murayama , Takashi Otsuka , Daisuke Tazawa , Kazuto Hosoi , Yukihiro Abe
IPC分类号： H01L21/00 , C23C16/00
CPC分类号： C23C16/24 , C23C16/505 , H01J37/32082 , H01J37/32183 , H05H1/46
摘要： In a plasma treatment method of and apparatus for treating the surface of a treatment target substrate by utilizing glow discharge produced by supplying high-frequency power into an inside-evacuated reactor through a high-frequency power supply means, a plurality of impedance regulation means for regulating impedances on the side of the reactor and on the side of the high-frequency power supply means are provided correspondingly to the impedances of a plurality of reactors, and the high-frequency power is supplied into the reactors via the impedance regulation means corresponding to the reactors. Plasma treatment can be made in a good efficiency and a low cost on a plurality of reactors having different impedances.
摘要翻译：在通过利用通过高频电源装置将高频电力提供给内部抽真空电抗器而产生的辉光放电来处理目标衬底表面的等离子体处理方法和装置中，多个阻抗调节装置对应于多个电抗器的阻抗设置在电抗器一侧和高频电源装置一侧上的调节阻抗，并且高频电力通过对应于反应堆。可以在具有不同阻抗的多个反应器中以高效率和低成本进行等离子体处理。

3. 发明申请

US20080271676A1 PLASMA TREATMENT METHOD AND PLASMA TREATMENT APPARATUS 失效
标题翻译：等离子体处理方法和等离子体处理装置
公开(公告)号：US20080271676A1
公开(公告)日：2008-11-06
申请号：US12055431
申请日：2008-03-26
申请人： Toshiyasu Shirasuna , Tatsuyuki Aoike , Kazuyoshi Akiyama , Hitoshi Murayama , Takashi Otsuka , Daisuke Tazawa , Kazuto Hosoi , Yukihiro Abe
发明人： Toshiyasu Shirasuna , Tatsuyuki Aoike , Kazuyoshi Akiyama , Hitoshi Murayama , Takashi Otsuka , Daisuke Tazawa , Kazuto Hosoi , Yukihiro Abe
IPC分类号： C23C16/00
CPC分类号： C23C16/24 , C23C16/505 , H01J37/32082 , H01J37/32183 , H05H1/46
摘要： In a plasma treatment method of and apparatus for treating the surface of a treatment target substrate by utilizing glow discharge produced by supplying high-frequency power into an inside-evacuated reactor through a high-frequency power supply means, a plurality of impedance regulation means for regulating impedances on the side of the reactor and on the side of the high-frequency power supply means are provided correspondingly to the impedances of a plurality of reactors, and the high-frequency power is supplied into the reactors via the impedance regulation means corresponding to the reactors. Plasma treatment can be made in a good efficiency and a low cost on a plurality of reactors having different impedances.
摘要翻译：在通过利用通过高频电源装置将高频电力提供给内部抽真空电抗器而产生的辉光放电来处理目标衬底表面的等离子体处理方法和装置中，多个阻抗调节装置对应于多个电抗器的阻抗设置在电抗器一侧和高频电源装置一侧上的调节阻抗，并且高频电力通过对应于反应堆。可以在具有不同阻抗的多个反应器中以高效率和低成本进行等离子体处理。

4. 发明申请

US20080199794A1 ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER, METHOD OF MANUFACTURING ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER, PROCESS CARTRIDGE, AND ELECTROPHOTOGRAPHIC APPARATUS 有权
标题翻译：电子照相感光构件，制造电子感光元件的方法，工艺盒和电子照相设备
公开(公告)号：US20080199794A1
公开(公告)日：2008-08-21
申请号：US12103175
申请日：2008-04-15
申请人： Hirotoshi Uesugi , Yukihiro Abe , Daisuke Miura , Nobumichi Miki , Harunobu Ogaki
发明人： Hirotoshi Uesugi , Yukihiro Abe , Daisuke Miura , Nobumichi Miki , Harunobu Ogaki
IPC分类号： G03G5/00 , G03G21/16
CPC分类号： G03G5/14734 , G03G5/0539 , G03G5/0546 , G03G5/056 , G03G5/0592 , G03G5/14726 , G03G5/1473 , G03G5/14752 , G03G5/14791
摘要： An electrophotographic photosensitive member having excellent electrophotographic properties while being prevented from the generation of blade turn-up, a method of manufacturing the electrophotographic photosensitive member, and a process cartridge and an electrophotographic apparatus each having the electrophotographic photosensitive member are provided. The surface layer of the electrophotographic photosensitive member contains a polymer having a specific repeating structural unit.
摘要翻译：提供具有优异的电子照相特性的电子照相感光构件，同时防止产生叶片翻转，电子照相感光构件的制造方法以及具有电子照相感光构件的处理盒和电子照相设备。电子照相感光构件的表面层含有具有特定重复结构单元的聚合物。

5. 发明授权

US07357982B2 Polybenzazole fiber and use thereof 失效
标题翻译：聚吲唑纤维及其用途
公开(公告)号：US07357982B2
公开(公告)日：2008-04-15
申请号：US10517832
申请日：2003-06-26
申请人： Yukihiro Abe , Go Matsuoka , Kohei Kiriyama , Hiroki Murase , Muneatsu Nakamura , Yukihiro Nomura , Hironori Eguchi , Yukinari Okuyama , Tadao Kuroki , Takaharu Ichiryu , Hiroshi Tachimori
发明人： Yukihiro Abe , Go Matsuoka , Kohei Kiriyama , Hiroki Murase , Muneatsu Nakamura , Yukihiro Nomura , Hironori Eguchi , Yukinari Okuyama , Tadao Kuroki , Takaharu Ichiryu , Hiroshi Tachimori
IPC分类号： D02G3/00
CPC分类号： E04C5/07 , B63H9/0657 , B63H2009/0678 , D01F6/74 , D07B1/025 , D07B2205/2096 , E04C5/073 , Y10T428/2913 , Y10T428/2967 , Y10T428/2969 , D07B2801/10
摘要： The present invention relates to polybenzazole fibers or filaments, staple fibers, spun yarns, and woven or knitted fabrics containing in themselves an organic pigment having heat resistance as high as a thermal decomposition temperature of 200° C. or higher, and soluble in a mineral acid and having group(s) of —N═ and/or NH— in the molecule, such as any of perinones and/or perylenes, any of phthalocyanines, any of quinacridones, and any of dioxazines, wherein they have a strength retention of 50% or higher when exposed to light from a xenon lamp for 100 hours and having a tensile strength retention of 85% or higher after exposed to an atmosphere of a temperature of 80° C. and a relative humidity of 80% for 700 hours.The polybenzazole fibers or filaments, staple fibers, spun yarns, and woven or knitted fabrics can be used for cords for reinforcing rubber, sheets and rods for reinforcing cement/concrete, composite materials, sail clothes, ropes, knife proof vests and bullet proof vests.
摘要翻译：本发明涉及聚吲哚纤维或长丝，短纤维，短纤纱，以及其本身含有耐热性高达200℃或更高的热分解温度的有机颜料并可溶于矿物的机织或针织织物酸和在分子中具有-N和/或NH-的基团，例如百里香酮和/或苝中的任何一种，酞菁，任何喹吖啶酮和任何二恶嗪，其中它们的强度保留为当暴露于来自氙灯的光100小时并且在暴露于80℃的温度和80％的相对湿度的气氛中700小时之后的拉伸强度保持率为85％或更高时，为50％或更高。聚吲哚纤维或长丝，短纤维，短纤纱和机织或针织织物可用于增强橡胶，用于增强水泥/混凝土，复合材料，帆衣，绳索，防刀背心和防弹背心的橡胶，片材和棒材的帘线。

6. 发明授权

US5143890A Heat sensitive recording material 失效
标题翻译：热感记录材料
公开(公告)号：US5143890A
公开(公告)日：1992-09-01
申请号：US617110
申请日：1990-11-21
申请人： Tetsuo Tsuchida , Yukihiro Abe , Tomoyuki Okimoto , Toranosuke Saito
发明人： Tetsuo Tsuchida , Yukihiro Abe , Tomoyuki Okimoto , Toranosuke Saito
IPC分类号： B41M5/30 , B41M5/327 , B41M5/337
CPC分类号： B41M5/3375 , B41M5/3275
摘要： The present invention provides a heat sensitive recording material, including a substrate and a heat sensitive recording layer thereon incorporating a colorless or light-colored basic dye and a color acceptor reactive with the dye to form a color when contacted therewith, the recording material also including 1-(4-methoxyphenoxy)-2-(2-methylphenoxy)ethane in the heat sensitive recording layer.
摘要翻译：本发明提供了一种热敏记录材料，其包括基底和热敏记录层，其上装有无色或浅色碱性染料和与染料反应以形成颜色的颜色受体，当与其接触时，该记录材料还包括 1-（4-甲氧基苯氧基）-2-（2-甲基苯氧基）乙烷在热敏记录层中。

7. 发明申请

US20110287350A1 ELECTROPHOTOGRAPHIC APPARATUS AND ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER 有权
标题翻译：电子照相设备和电子照相感光构件
公开(公告)号：US20110287350A1
公开(公告)日：2011-11-24
申请号：US13107425
申请日：2011-05-13
申请人： Yukihiro Abe
发明人： Yukihiro Abe
IPC分类号： G03G15/00
CPC分类号： G03G15/75 , G03G5/047 , G03G5/14 , G03G2215/00957
摘要： An electrophotographic apparatus and an electrophotographic photosensitive member for use in the electrophotographic apparatus are provided. The number of intermediate layers between a photoconductive layer and a surface layer is an odd number more than 2, and the refractive index monotonically decreases from the photoconductive layer toward the surface layer. The refractive index of an odd-numbered intermediate layer is in a predetermined range of the geometrical mean of the refractive indices of the two layers adjacent to the odd-numbered intermediate layer, and the product of the refractive index and the thickness is in a specific range of an odd multiple of λ/4n. The sum of the products of the refractive indices and the thicknesses of one or more intermediate layers disposed between at least two odd-numbered intermediate layers is in a range of −π/2
摘要翻译：提供了用于电子照相设备中的电子照相设备和电子照相感光构件。光电导层和表面层之间的中间层的数目是奇数超过2，折射率从光电导层向表面层单调减小。奇数中间层的折射率在与奇数编号的中间层相邻的两层的折射率的几何平均值的预定范围内，折射率和厚度的乘积处于特定的 λ/ 4n的奇数倍的范围。设置在至少两个奇数中间层之间的折射率和一个或多个中间层的厚度的乘积的总和在 - ＆pgr / / 2＆lt;＆lt;＆lt;＆lt;＆lt;＆pgr; / 2的范围内阶段

8. 发明授权

US07799496B2 Electrophotographic photosensitive member, method of manufacturing electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus 有权
标题翻译：电子照相感光构件，电子照相感光构件的制造方法，处理盒和电子照相设备
公开(公告)号：US07799496B2
公开(公告)日：2010-09-21
申请号：US12103175
申请日：2008-04-15
申请人： Hirotoshi Uesugi , Yukihiro Abe , Daisuke Miura , Nobumichi Miki , Harunobu Ogaki
发明人： Hirotoshi Uesugi , Yukihiro Abe , Daisuke Miura , Nobumichi Miki , Harunobu Ogaki
IPC分类号： G03G5/04
CPC分类号： G03G5/14734 , G03G5/0539 , G03G5/0546 , G03G5/056 , G03G5/0592 , G03G5/14726 , G03G5/1473 , G03G5/14752 , G03G5/14791
摘要： An electrophotographic photosensitive member having excellent electrophotographic properties while being prevented from the generation of blade turn-up, a method of manufacturing the electrophotographic photosensitive member, and a process cartridge and an electrophotographic apparatus each having the electrophotographic photosensitive member are provided. The surface layer of the electrophotographic photosensitive member contains a polymer having a specific repeating structural unit.
摘要翻译：提供具有优异的电子照相特性的电子照相感光构件，同时防止产生叶片翻转，电子照相感光构件的制造方法以及具有电子照相感光构件的处理盒和电子照相设备。电子照相感光构件的表面层含有具有特定重复结构单元的聚合物。

9. 发明申请

US20080269455A1 Process for Production of Polybenzazole Polymer and the Polymer 审中-公开
标题翻译：聚吲哚聚合物和聚合物的生产工艺
公开(公告)号：US20080269455A1
公开(公告)日：2008-10-30
申请号：US12066819
申请日：2006-09-11
申请人： Naoki Watanabe , Go Mastuoka , Fuyuhiko Kubota , Yukihiro Abe , Yasuko Mitooka
发明人： Naoki Watanabe , Go Mastuoka , Fuyuhiko Kubota , Yukihiro Abe , Yasuko Mitooka
IPC分类号： C08G73/22
CPC分类号： C08G73/22 , C08G73/18 , C08G75/32
摘要： PROBLEMS The present invention relates to a process for producing a polybenzoxazole polymer and provides a process for producing the polybenzoxazole polymer within a short reaction time. MEANS FOR SOLVING PROBLEMS A process for producing a polybenzazole polymer comprises producing the polybenzazole polymer in a non-oxidizing dehydrating solvent while employing a compound represented by the following general formula (1) as a raw material including a first polymerization step in which polymerization is performed at a temperature of 150° C. or less and a latter polymerization step in which polymerization is performed at a temperature of 200° C. or more, wherein at least the latter polymerization step is performed in a kneading-type reaction apparatus to complete the polymerization reaction: wherein X represents an O atom, an S atom or an NH group; Ar1 represents a tetravalent organic group having two or less of benzene rings, naphthalene rings or pyridine rings; Ar2 represents a bivalent organic group having two or less of benzene rings, naphthalene rings or pyridine rings; both of Ar1 and Ar2 may have one or more functional groups such as a methyl group and a hydroxyl group; and R represents H or a univalent organic group with a carbon number of 1 to 6.
摘要翻译：聚苯并恶唑聚合物的制造方法技术领域本发明涉及聚苯并恶唑聚合物的制造方法，其提供在短的反应时间内生产聚苯并恶唑聚合物的方法。解决问题的手段聚吲哚聚合物的制造方法包括在使用由以下通式（1）表示的化合物作为原料的非氧化性脱水溶剂中制造聚吲哚聚合物，其包括进行聚合的第一聚合步骤在150℃以下的温度下进行聚合，后一聚合步骤在200℃或更高温度下进行聚合，其中至少在后一聚合步骤在捏合型反应设备中进行以完成聚合反应：其中X表示O原子，S原子或NH基团; Ar 1表示具有2个以下苯环，萘环或吡啶环的四价有机基团; Ar 2表示具有两个或更少个苯环，萘环或吡啶环的二价有机基团; Ar 1和Ar 2 2都可以具有一个或多个官能团，例如甲基和羟基; 且R表示H或碳数为1至6的一价有机基团。

10. 发明申请

US20060046049A1 Highly durable polybenzazole composition, fiber and film 审中-公开
标题翻译：高度耐用的聚吲唑组合物，纤维和薄膜
公开(公告)号：US20060046049A1
公开(公告)日：2006-03-02
申请号：US10518406
申请日：2003-06-26
申请人： Yukihiro Abe , Go Matsuoka , Kohei Kiriyama , Hiroki Murase , Muneatsu Nakamura , Yokihiro Nomura , Hironori Eguchi , Yukinari Okuyama , Tadao Kuroki , Takaharu Ichiryu
发明人： Yukihiro Abe , Go Matsuoka , Kohei Kiriyama , Hiroki Murase , Muneatsu Nakamura , Yokihiro Nomura , Hironori Eguchi , Yukinari Okuyama , Tadao Kuroki , Takaharu Ichiryu
IPC分类号： D02G3/00
CPC分类号： C08G73/22 , C08G73/18 , D01F1/10 , D01F6/74 , Y10T428/2913
摘要： There is provided a polybenzazole fiber or film containing a basic organic compound in the form of a monomer or a condensate, selected from the group consisting of guanidines, triazoles, quinazolines, piperidines, anilines, pyridines, cyanuric acids, and p-phenylenediamine, m-phenylenediamine and a mixture thereof. This fiber has characteristics in that the X-ray meridian diffraction half-width factor is 0.3°/GPa or less, that the elasticity decrement (Er) attributed to change of molecular orientation is 30 GPa or less, and that the breaking strength is 1 GPa or more. This fiber can be used in staple fiber, a spun yarn, a woven or knit fabric, a felt material, a composite material, a cord, a rod, a fibrous sheet, a knife proof vest or a bullet proof vest.
摘要翻译：提供了含有选自胍，三唑，喹唑啉，哌啶，苯胺，吡啶，氰尿酸和对苯二胺的单体或缩合物形式的碱性有机化合物的聚吲唑纤维或膜 - 苯二胺及其混合物。该纤维的特征在于X射线子午线衍射半值因子为0.3°/ GPa以下，归因于分子取向的变化引起的弹性减量（Er）为30GPa以下，断裂强度为1 GPa或更多。该纤维可以用于短纤维，细纱，纺织或针织织物，毡材，复合材料，帘线，棒，纤维片，防刀背心或防弹背心中。

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