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1. 发明授权

US5395727A Positive resist composition containing a novolak resin made from an aldehyde and dimer of isopropenyl phenol 失效
标题翻译：含有由醛形成的酚醛清漆树脂和异丙烯基苯酚二聚体的正性抗蚀剂组合物
公开(公告)号：US5395727A
公开(公告)日：1995-03-07
申请号：US158817
申请日：1993-11-29
申请人： Yasunori Uetani , Haruyoshi Osaki , Naoki Takeyama , Yuji Ueda , Hiromi Ueki , Takehiro Kusumoto
发明人： Yasunori Uetani , Haruyoshi Osaki , Naoki Takeyama , Yuji Ueda , Hiromi Ueki , Takehiro Kusumoto
IPC分类号： C08G8/08 , C08G8/20 , G03F7/023 , G03F7/30
CPC分类号： C08G8/08 , C08G8/20 , G03F7/0236
摘要： A novolak resin made from a carbonyl compound and a specific phenol compound, which resin has good properties, in particular, as a base resin of a photoresist.
摘要翻译：由羰基化合物和特定酚化合物制成的酚醛清漆树脂，该树脂具有良好的性能，特别是光致抗蚀剂的基础树脂。

2. 发明授权

US5304456A Negative photoresist composition 失效
标题翻译：负光致抗蚀剂组合物
公开(公告)号：US5304456A
公开(公告)日：1994-04-19
申请号：US827423
申请日：1992-01-29
申请人： Yuji Ueda , Hiromi Ueki , Naoki Takeyama , Takehiro Kusumoto
发明人： Yuji Ueda , Hiromi Ueki , Naoki Takeyama , Takehiro Kusumoto
IPC分类号： G03F7/004 , G03F7/038 , C08L61/10 , C08L61/28 , C08L61/34
CPC分类号： G03F7/038 , G03F7/0045 , Y10S430/106 , Y10S430/115 , Y10S430/122
摘要： A negative photoresist composition containing an alkali-soluble resin which is obtainable through a condensation reaction of an aldehyde with a phenol compound containing a compound of the general formula: ##STR1## wherein R.sup.1 to R.sup.9 are independently a hydrogen atom, an alkyl group, an alkenyl group, an alkylcarbonyl group, a halogen atom or a hydroxyl group, provided that at least one of R.sup.1 to R.sup.9 is a hydroxyl group and, at the ortho- or para-position to the hydroxyl group, at least two hydrogen atoms are present; a cross linking agent; and a photo-acid generator, and a negative photoresist composition comprising an alkali-soluble resin, a cross linking agent and a photo-acid generator having a trifluoromethanesulfonic acid ester group, which can increase resolution and contrast of a photoresist pattern.
摘要翻译：含有碱溶性树脂的负性光致抗蚀剂组合物，其通过醛与含有下列通式化合物的酚化合物的缩合反应获得：（*化学结构*）（1）其中R1至R9独立地为氢原子，烷基，烯基，烷基羰基，卤素原子或羟基，条件是R 1至R 9中的至少一个是羟基，并且在羟基的邻位或对位，在存在至少两个氢原子; 交联剂; 和光酸产生剂，以及含有碱溶性树脂，交联剂和具有三氟甲磺酸酯基的光酸发生剂的负性光致抗蚀剂组合物，其可以增加光致抗蚀剂图案的分辨率和对比度。

3. 发明授权

US5397679A Cyclic carbonate compounds, method for producing the same and positive photoresist composition using the same 失效
标题翻译：环状碳酸酯化合物，其制造方法和使用其的正性光致抗蚀剂组合物
公开(公告)号：US5397679A
公开(公告)日：1995-03-14
申请号：US44482
申请日：1993-04-09
申请人： Yuji Ueda , Naoki Takeyama , Hiromi Ueki , Takehiro Kusumoto
发明人： Yuji Ueda , Naoki Takeyama , Hiromi Ueki , Takehiro Kusumoto
IPC分类号： C07C68/06 , C07C69/96 , G03F7/004 , G03F7/039 , H01L21/027 , G03C1/492
CPC分类号： C07C69/96 , G03F7/0045 , Y10S430/106 , Y10S430/11 , Y10S430/121 , Y10S430/122
摘要： This invention provides a process for producing a cyclic carbonate compound represented by the following formula (5): ##STR1## or the like which is useful as a dissolution inhibitor for use in a chemically amplified positive photoresist, as well as a positive photoresist composition comprising said cyclic carbonate compound, an alkali-soluble resin and a photo-induced acid precursor. This composition gives a positive photoresist excellent in performances such as resolution, profile, sensitivity, etc.
摘要翻译：本发明提供一种制备由下式（5）表示的环状碳酸酯化合物的方法：作为化学放大型正性光致抗蚀剂中使用的溶解抑制剂，以及阳离子包含所述环状碳酸酯化合物，碱溶性树脂和光致酸性前体的光致抗蚀剂组合物。该组合物提供了在分辨率，轮廓，灵敏度等性能方面优异的正性光致抗蚀剂。

4. 发明授权

US5800966A Positive photoresist composition 失效
标题翻译：正光致抗蚀剂组合物
公开(公告)号：US5800966A
公开(公告)日：1998-09-01
申请号：US44487
申请日：1993-04-09
申请人： Yuji Ueda , Naoki Takeyama , Hiromi Ueki , Takehiro Kusumoto
发明人： Yuji Ueda , Naoki Takeyama , Hiromi Ueki , Takehiro Kusumoto
IPC分类号： G03F7/004 , G03F7/023 , G03C1/725
CPC分类号： G03F7/0045 , G03F7/0236
摘要： This invention provides a positive photoresist composition comprising an alkali-soluble resin, a dissolution inhibitor and a photo-induced acid precursor, wherein said alkali-soluble resin is obtainable through a condensation reaction of a compound represented by the general formula (I): ##STR1## wherein R.sub.1 to R.sub.9 each represent hydrogen atom, halogen atom, alkyl group, alkenyl group, --OH group or the like, provided that at least one of R.sub.1 to R.sub.9 is --OH group and at least two hydrogen atoms are attached to the o- or p-position of the --OH group, and an aldehyde. This positive photoresist composition is excellent in performances such as resolution, profile, sensitivity, etc.
摘要翻译：本发明提供一种正型光致抗蚀剂组合物，其包含碱溶性树脂，溶解抑制剂和光诱导酸前体，其中所述碱溶性树脂可通过通式（I）表示的化合物的缩合反应获得：其中，R 1〜R 9分别表示氢原子，卤素原子，烷基，链烯基，-OH基等，但如果R 1〜R 9中的至少一个为-OH基且至少2个氢原子为连接到-OH基团的邻位或对位，和醛。该正性光致抗蚀剂组合物的分辨率，外形，灵敏度等性能优异。

5. 发明授权

US6156476A Positive photoresist composition 失效
标题翻译：正光致抗蚀剂组合物
公开(公告)号：US6156476A
公开(公告)日：2000-12-05
申请号：US179196
申请日：1994-01-10
申请人： Naoki Takeyama , Hiromi Ueki , Yuji Ueda , Takehiro Kusumoto , Yuko Nakano
发明人： Naoki Takeyama , Hiromi Ueki , Yuji Ueda , Takehiro Kusumoto , Yuko Nakano
IPC分类号： C08F212/14 , C08F12/00 , C09D125/00 , C09D125/18 , G03F7/004 , G03F7/039 , H01L21/027 , G03C1/492
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/111
摘要： The present invention provides a positive photoresist composition comprising an alkali-soluble resin containing a copolymer of p-vinylphenol or a derivative thereof and styrene, a dissolution inhibitor and a photo-induced acid precursor. This positive photoresist composition exhibits excellent sensitivity and resolution while maintaining excellence in other properties such as heat resistance, film thickness retention, adhesion and profile, in far ultraviolet ray lithography.
摘要翻译：本发明提供一种正型光致抗蚀剂组合物，其包含含有对乙烯基苯酚或其衍生物与苯乙烯的共聚物的碱溶性树脂，溶解抑制剂和光诱导的酸前体。这种正性光致抗蚀剂组合物在远紫外线光刻中显示出优异的灵敏度和分辨率，同时保持其他性能如耐热性，膜厚保持性，粘合性和轮廓的卓越性。

6. 发明授权

US5420331A Cyclic carbonate compounds, method for producing the same and positive photoresist composition using the same 失效
公开(公告)号：US5420331A
公开(公告)日：1995-05-30
申请号：US223115
申请日：1994-04-05
申请人： Yuji Ueda , Naoki Takeyama , Hiromi Ueki , Takehiro Kusumoto
发明人： Yuji Ueda , Naoki Takeyama , Hiromi Ueki , Takehiro Kusumoto
IPC分类号： C07C68/06 , C07C69/96 , G03F7/004 , G03F7/039 , H01L21/027
CPC分类号： C07C69/96 , G03F7/0045 , Y10S430/106 , Y10S430/11 , Y10S430/121 , Y10S430/122
摘要： This invention provides a process for producing a cyclic carbonate compound represented by the following formula (5): ##STR1## or the like which is useful as a dissolution inhibitor for use in a chemically amplified positive photoresist, as well as a positive photoresist composition comprising said cyclic carbonate compound, an alkali-soluble resin and a photo-induced acid precursor. This composition gives a positive photoresist excellent in performances such as resolution, profile, sensitivity, etc.

7. 发明授权

US5811513A Process for producing polyethylene naphthalate 失效
标题翻译：生产聚萘二甲酸乙二醇酯的方法
公开(公告)号：US5811513A
公开(公告)日：1998-09-22
申请号：US860701
申请日：1997-07-09
申请人： Hiroshi Iwasaki , Masayasu Ishibashi , Hiromi Ueki , Shoji Hiraoka , Toru Matsuyoshi , Satoshi Inoki
发明人： Hiroshi Iwasaki , Masayasu Ishibashi , Hiromi Ueki , Shoji Hiraoka , Toru Matsuyoshi , Satoshi Inoki
IPC分类号： C08G63/189 , C08G63/672 , C08G63/78 , C08G63/82
CPC分类号： C08G63/189 , C08G63/78 , C08G63/82
摘要： In the production of polyethylene naphthalate of the present invention, the esterification reaction between naphthalenedicarboxylic acid and ethylene glycol is conducted while causing water to be present in a reaction system from a start of reaction, in the presence of at least one catalyst selected from the group consisting of nitric, carboxylic, phosphoric and hydrogenphosphoric acid metal salts and alkyl amines according to necessity, to thereby attain an esterification ratio of 45 to 80%, so that a liquid mixture of naphthalenedicarboxylic acid esterification reaction products containing naphthalenedicarboxylic acid, carboxyl-hydroxyethoxycarbonylnaphthalene and bis(hydroxyethoxycarbonyl)naphthalene is obtained. Subsequently, a crystallized reaction product is separated from this liquid mixture to thereby obtain a mixture of esterification reaction products. Thereafter, this mixture having ethylene glycol added thereto according to necessity is subjected to polycondensation. The polyethylene naphthalate obtained by the process of the present application ensures a low content of naphthalenedicarboxylic acid esters each having diethylene glycol skeleton therein, thereby having excellent quality, for example, in appearance.
摘要翻译： PCT No.PCT / JP96 / 03116 Sec。 371日期1997年7月9日第 102（e）日期1997年7月9日PCT 1996年10月25日PCT公布。公开号WO97 / 17391 日期1997年5月15日在本发明的聚萘二甲酸乙二醇酯的制造中，在反应开始时，在存在至少一种催化剂的同时，使反应体系中存在水，进行萘二甲酸与乙二醇的酯化反应根据需要选自硝酸，羧酸，磷酸和氢磷酸金属盐和烷基胺，从而达到45-80％的酯化比，使得含萘二羧酸的萘二甲酸酯化反应产物的液体混合物，羧基 - 羟基乙氧基羰基萘和双（羟基乙氧基羰基）萘。随后，从该液体混合物中分离出结晶的反应产物，由此得到酯化反应产物的混合物。然后，将根据需要添加有乙二醇的混合物进行缩聚。通过本申请的方法获得的聚萘二甲酸乙二醇酯确保了在其中具有二甘醇骨架的低含量的萘二羧酸酯，从而具有优异的质量，例如外观。

8. 发明授权

US6100374A Method of purifying crude naphthalenedicarboxlic acid and process for preparing polyethylene naphthalate 失效
公开(公告)号：US6100374A
公开(公告)日：2000-08-08
申请号：US254439
申请日：1999-03-09
申请人： Hiroshi Iwasaki , Satoshi Inoki , Hiromi Ueki
发明人： Hiroshi Iwasaki , Satoshi Inoki , Hiromi Ueki
IPC分类号： C07C51/493 , C07C67/60 , C08G63/189 , C08G63/78 , C08F6/00
CPC分类号： C08G63/78 , C07C51/493 , C07C67/60 , C08G63/189
摘要： The process for preparing polyethylene naphthalate according to the invention is intended to obtain polyethylene naphthalate having a low impurity content from naphthalenedicarboxylic acid containing impurities. This process comprises the steps of: mixing crude naphthalenedicarboxylic acid and an ethylene glycol aqueous solution, heating the resulting mixture to esterify a part of the naphthalenedicarboxylic acid and thereby give a naphthalenedicarboxylic acid ester and dissolving the naphthalenedicarboxylic acid ester in the ethylene glycol aqueous solution; then contacting impurities, which are contained in the crude naphthalenedicarboxylic acid and capable of being hydrogenated, with hydrogen in the presence of a hydrogenation catalyst to hydrogenate the impurities and dissolving the hydrogenated impurities in the ethylene glycol aqueous solution; and subsequently crystallizing the naphthalenedicarboxylic acid ester, separating the resulting crystals from the ethylene glycol aqueous solution and polycondensing the resulting naphthalenedicarboxylic acid ester. The method of purifying crude naphthalenedicarboxylic acid is intended to obtain naphthalenedicarboxylic acid and a naphthalenedicarboxylic acid ester having a low content of aldehydes from naphthalenedicarboxylic acid containing aldehydes. This method comprises the steps of: mixing crude naphthalenedicarboxylic acid and an alcohol aqueous solution, heating the resulting mixture to esterify a part of the naphthalenedicarboxylic acid and thereby give a naphthalenedicarboxylic acid ester and dissolving the naphthalenedicarboxylic acid ester in the alcohol aqueous solution; then contacting aldehydes, which are contained in the crude naphthalenedicarboxylic acid, with a sulfite to give aldehyde adducts and dissolving the aldehyde adducts in the alcohol aqueous solution; and subsequently crystallizing the naphthalenedicarboxylic acid and the naphthalenedicarboxylic acid ester and separating them from the alcohol aqueous solution.

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